A Study on the Optimum Process Conditions of Hemispherical trained Silicon formation for High Density DRAM'S Capacitor (고밀도 DRAM 캐패시터에서 HSG-Si형성의 공정최적화에 관한 연구)
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- Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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- 2001.10a
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- pp.634-639
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- 2001