• Title/Summary/Keyword: Optical-density-based feedback

검색결과 5건 처리시간 0.018초

An Optical-Density-Based Feedback Feeding Method for Ammonium Concentration Control in Spirulina platensis Cultivation

  • Bao, Yilu;Wen, Shumei;Cong, Wei;Wu, Xia;Ning, Zhengxiang
    • Journal of Microbiology and Biotechnology
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    • 제22권7호
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    • pp.967-974
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    • 2012
  • Cultivation of Spirulina platensis using ammonium salts or wastewater containing ammonium as alternative nitrogen sources is considered as a commercial way to reduce the production cost. In this research, by analyzing the relationship between biomass production and ammonium-N consumption in the fed-batch culture of Spirulina platensis using ammonium bicarbonate as a nitrogen nutrient source, an online adaptive control strategy based on optical density (OD) measurements for controlling ammonium feeding was presented. The ammonium concentration was successfully controlled between the cell growth inhibitory and limiting concentrations using this OD-based feedback feeding method. As a result, the maximum biomass concentration (2.98 g/l), productivity (0.237 g/l d), nitrogen-to-cell conversion factor (7.32 gX/gN), and contents of protein (64.1%) and chlorophyll (13.4mg/g) obtained by using the OD-based feedback feeding method were higher than those using the constant and variable feeding methods. The OD-based feedback feeding method could be recognized as an applicable way to control ammonium feeding and a benefit for Spirulina platensis cultivations.

Blind Signal Processing for Medical Sensing Systems with Optical-Fiber Signal Transmission

  • Kim, Namyong;Byun, Hyung-Gi
    • 센서학회지
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    • 제23권1호
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    • pp.1-6
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    • 2014
  • In many medical image devices, dc noise often prevents normal diagnosis. In wireless capsule endoscopy systems, multipath fading through indoor wireless links induces inter-symbol interference (ISI) and indoor electric devices generate impulsive noise in the received signal. Moreover, dc noise, ISI, and impulsive noise are also found in optical fiber communication that can be used in remote medical diagnosis. In this paper, a blind signal processing method based on the biased probability density functions of constant modulus error that is robust to those problems that can cause error propagation in decision feedback (DF) methods is presented. Based on this property of robustness to error propagation, a DF version of the method is proposed. In the simulation for the impulse response of optical fiber channels having slowly varying dc noise and impulsive noise, the proposed DF method yields a performance enhancement of approximately 10 dB in mean squared error over its linear counterpart.

Plasma Etching Process based on Real-time Monitoring of Radical Density and Substrate Temperature

  • Takeda, K.;Fukunaga, Y.;Tsutsumi, T.;Ishikawa, K.;Kondo, H.;Sekine, M.;Hori, M.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.93-93
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    • 2016
  • Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

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A low-luminosity type-1 QSO sample Optical spectroscopic properties and activity classification

  • Tremou, Evangelia;Zuther, Jens;Marin, Macarena Garcia;Eckart, Andreas
    • 천문학회보
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    • 제39권2호
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    • pp.43.1-43.1
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    • 2014
  • We report on the optical spectroscopic analysis of a Low Luminosity Quasi Stellar Objects (LLQSOs) sample at $z{\leq}0.06$ based on the Hamburg/ESO QSO survey (HES). To better relate the low-redshift Active Galactic Nucleus (AGN) to the QSO population it is important to study samples of the latter type at a level of detail similar to that of the low-redshift AGN. Powerful QSOs, however, are absent at low redshifts due to evolutionary effects and their small space density. Our understanding of the (distant) QSO population is, therefore, significantly limited by angular resolution and sensitivity. The LLQSOs presented here offer the possibility to study the faint end of this population at smaller cosmological distances and, therefore, in greater detail. This, in turn, provides information about the key ingredients with respect to fueling and feedback of QSOs, and their relative importance/strength. Here, we present results of the analysis of visible wavelength spectroscopy provided by the HES and the 6 Degree Field Galaxy Survey (6dFGS). Interesting differences in the taxonomy of the sources having both types of spectra have been noticed and will be discussed.

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1018 nm 파장의 고출력 Yb 광섬유 레이저 (High-power Operation of a Yb Fiber Laser at 1018 nm)

  • 오예진;박혜미;박종선;박은지;김진필;정훈;김지원;김태형;정성묵;김기혁;양환석
    • 한국광학회지
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    • 제32권5호
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    • pp.209-214
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    • 2021
  • 본 논문에서는 단파장 영역인 1018 nm에서 최고 출력 626 W를 가진 고출력 이터븀(ytterbium, Yb) 첨가 광섬유 레이저에 대해 보고한다. Yb 광섬유 레이저에서 이득률이 낮은 단파장 영역인 1018 nm에서 레이저를 발진시키기 위한 조건을 이론적으로 조사해보고, 광섬유 끝 단단면 조건에 따른 되먹임 신호를 측정하여 안정적인 레이저 발진 조건에 대하여 연구하였다. 그 결과를 바탕으로 제작한 단일 공진기 구조의 Yb 광섬유 레이저 시스템으로부터 729 W의 펌프 출력에서 최고 출력 626 W의 1018 nm 파장 레이저 출력을 안정적으로 얻을 수 있었으며 그때 기울기 효율은 86.6%로 측정되었다. 본 연구에서 얻은 1018 nm 파장의 Yb 광섬유 레이저 결과는 지금까지 국내에서 보고된 1030 nm 이하 단파장에서 발진된 Yb 광섬유 레이저 출력 중 가장 높은 출력이며, 세계적으로도 상용 Yb 광섬유와 광부품을 사용한 결과 중 가장 높은 출력에 해당된다. 그리고 향후 더 높은 출력을 얻기 위한 방법에 대해 논의하고자 한다.