• Title/Summary/Keyword: Optical transmittance spectra

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A Study on the Characteristics of High Energy Nitrogen ion Implanted CdS Thin Films (고에너지 질소 이온 주입된 CdS 박막 특성에 관한 연구)

  • 이재형;홍석주;양계준
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.4
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    • pp.712-718
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    • 2003
  • The effects of nitrogen ion implantation on vacuum evaporated cadmium sulphide (CdS) thin films were investigated by X-ray diffraction, optical transmittance spectra, and Raman scattering studies. The as-deposited CdS films have a hexagonal structure with preferential (0 0 2) orientation. Formation of Cd metallic clusters was observed in ion implanted films from the XRD patterns. The band gap of N+ implanted films decreased, whereas the optical absorption coefficient values increased with the increase of implantation dose. The Raman peak position appeared at 299 cm-1 and the FWHM increased with the ion dose. A decrease in the area of Raman peak of CdS Al(LO) mode is seen on implantation.

The Influence of Substrate Temperature on the Structural and Optical Properties of ZnS Thin Films (기판온도가 ZnS 박막의 구조 및 광학적 특성에 미치는 영향)

  • Hwang, Dong-Hyun;Ahn, Jung-Hoon;Son, Young-Guk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.9
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    • pp.760-765
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    • 2011
  • Znic sulfide (ZnS) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The substrate temperature varied from room temperature (RT) to $500^{\circ}C$. The structural and optical properties of ZnS films were studied by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive analysis of X-ray (EDAX) and UV-visible transmission spectra. The XRD analyses reveal that ZnS films have cubic structures with (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures. The FESEM images indicate that ZnS films deposited at $400^{\circ}C$ have nano-sized grains with a grain size of ~ 67 nm. Then films exhibit relatively high transmittance of 80% in the visible region, with an energy band gap of 3.71 eV. One obvious result is that the energy band gap of the film increases with increasing the substrate temperatures.

UV-cut Lens Manufacture using Optical Absorption Edge Control (광흡수단을 제어를 이용한 UV 차단렌즈 개발)

  • Kim, Yong Geun;Park, Dong Hwa;Sung, Jung Sub
    • Journal of Korean Ophthalmic Optics Society
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    • v.7 no.1
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    • pp.29-34
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    • 2002
  • Because do dilution (5%) in Venzotriazol distilled water and is kept UV interception departure woe which make to time each 1, 2, 5, 15, 20, 30 minutes by dip method, produced sample ore of UV interception lens. Spectrum of transmittance for each sample are measured in 320~450nm sacred grounds. The result optical absorption edge is each 403, 408, 414, 419nm regions, and absorption edge appeared in each band of 3.07, 3.04, 2.99, 2.96 eV. UV-cut lens departure solution make 2-Hydroxy-4-n-octoxyhenzophenones of 5%, 10% because solvent methanol and UV-cut lens made by Spray pyrolysis method. Transmission edge of each lens that do spray to same warelength showed sameinwavelength spectra. Being storehouse absorption edgethat increase 385, 398 and 417nm region of when do spray for 2, 4 and 6 minutes, band is accomplishing each 3.22, 3.11, 2.97 eV.

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Optical properties of top-emission organic light-emitting diodes due to a change of cathode electrode (음전극 변화에 따른 전면 유기 발광 소자의 광학적 특성)

  • Joo, Hyun-Woo;An, Hui-Chul;Na, Su-Hwan;Kim, Tae-Wan;Jang, Kyung-Wook;Oh, Hyun-Suk;Oh, Yong-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.345-346
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    • 2008
  • We have studied an emission spectra of top-emssion organic light-emitting diodes(TEOLED) due to a change of cathode and organic layer thickness. Device structure is Al(100nm)/TPD(xnm)/$Alq_3$(ynm)/LiF(0.5nm)/cathode. And two different types of cathode were used; one is LiF(0.5nm)/Al(25nm) and the other is LiF(0.5nm)/Al(2nm)/Ag(30nm). While a thickness of hole-transport layer of TPD was varied from 35 to 65nm, an emissive layer thickness of $Alq_3$ was varied from 50 to 100nm for two devices. A ratio of those two layer was kept to be about 2:3. Al and Al/Ag double layer cathode devices show that the emission spectra were changed from 490nm to 560nm and from 490nm to 560nm, respectively, when the total organic layer increase. Full width at half maximum was changed from 67nm to 49nm and from 90nm to 35nm as the organic layer thickness increases. All devices show that view angle dependent emission spectra show a blue shift. Blue shift is strong when the organic layer thickness is more than 140nm. Devece with Al/Ag double layer cathode is more vivid.

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Study on crystallization of $PbTiO_3$ thin films by the Sol-Gel method (Sol-Gel법을 이용한 $PbTiO_3$ 박막의 결정화에 관한 연구)

  • Kyu Seog Hwang;Byung Wan Yoo;Byung Hoon Kim
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.2
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    • pp.199-209
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    • 1994
  • $PbTiO_3$ thin films were prepared on soda-lime-silica slide glasses, Si-wafer and sapphire substrate by the dip-coating of precursor solution. As starting materials, titanium tetra iso-propoxide and lead acetate trihydrate were used. Then acetylacetone was added to prepare stable sol. The effect of the parameters such as viscosity and composition of sol were investigated. The optical transmittance at visible range, refractive index, IR spectra were measured in varying compositions, thickness and heat treatment temperature. The crystallization of $PbTiO_3$ films were measured by using XRD and SEM. Diffusion of compositions from slide glass to thin film were investigated by using EDX, too. These sols not precipitated for 20 days. Transmittance of $PbTiO_3$ films at visible range were decreased with the increase of thickness and heat treatment temperatures, and were exhibited flat spectra. Pyrochlore type appeared in the films on slide glass and perovskite type appeared in the films on Si-wafer or sapphire at $600^{\circ}C$. Perovskite crystals transformed to $PbTi_3O_7$ phase at $800^{\circ}C$.

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Structural and Optical Properties of SnS Thin Films Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터링법으로 제조한 SnS 박막의 구조적 및 광학적 특성)

  • Hwang, Donghyun
    • Journal of the Korean institute of surface engineering
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    • v.51 no.2
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    • pp.126-132
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    • 2018
  • SnS thin films with different substrate temperatures ($150 {\sim}300^{\circ}C$) as process parameters were grown on soda-lime glass substrates by RF magnetron sputtering. The effects of substrate temperature on the structural and optical properties of SnS thin films were investigated by X-ray diffraction (XRD), Raman spectroscopy (Raman), field-emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy (EDS), and Ultraviolet-visible-near infrared spectrophotometer (UV-Vis-NIR). All of the SnS thin films prepared at various substrate temperatures were polycrystalline orthorhombic structures with (111) planes preferentially oriented. The diffraction intensity of the (111) plane and the crystallite size were improved with increasing substrate temperature. The three major peaks (189, 222, $289cm^{-1}$) identified in Raman were exactly the same as the Raman spectra of monocrystalline SnS. From the XRD and Raman results, it was confirmed that all of the SnS thin films were formed into a single SnS phase without impurity phases such as $SnS_2$ and $Sn_2S_3$. In the optical transmittance spectrum, the critical wavelength of the absorption edge shifted to the long wavelength region as the substrate temperature increased. The optical bandgap was 1.67 eV at the substrate temperature of $150^{\circ}C$, 1.57 eV at $200^{\circ}C$, 1.50 eV at $250^{\circ}C$, and 1.44 eV at $300^{\circ}C$.

The post annealing effect on the properties of AZO films (AZO 박막의 후 열처리에 따른 특성변화)

  • Ko, Ki-Han;Seo, Jae-Keun;Kim, Jae-Kwang;Cho, Hyung-Jun;Hong, Byung-You;Choi, Won-Seok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.457-458
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    • 2009
  • In this work, transparent conducting Al-doped zinc oxide (AZO) films were prepared on Coming glass substrate by RF magnetron sputtering using an Al-doped ZnO target (Al: 2 wt.%) at room temperature and all films were deposited with athickness of 150 nm. We investigated the effects of the post-annealing temperature and the annealing ambient on structural, electrical and optical properties of AZO films. The films were annealed at temperatures ranging from 300 to $500^{\circ}C$ in steps of $100^{\circ}C$ using rapid thermal annealing equipment in oxygen. The thickness of the film was observed by field emission scanning electron microscopy (FE-SEM) and grain size was calculated from the XRD spectra using the Scherrer equation and their electrical properties were investigated using a hole measurement and the reflectance of AZO films was investigated by UV-VIS spectrometry.

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Synthesis and Emission Properties of CaMoO4:Tb3+ Green Phosphor Powders and Thin Films (CaMoO4:Tb3+ 녹색 형광체 분말과 박막의 제조와 발광 특성)

  • Jeon, Yongil;Cho, Shinho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.4
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    • pp.264-270
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    • 2013
  • $CaMoO_4:Tb^{3+}$ green phosphor powders and thin films were successfully prepared by using the solid-state reaction method and the radio-frequency magnetron sputtering technique, respectively. The crystalline structure of all phosphor powders with different $Tb^{3+}$ ion concentrations was found to be a tetragonal system with the maximum diffraction intensity at $28.58^{\circ}$, while that of the phosphor thin films, irrespective of the type of substrate, was amorphous. As for the phosphor powders, the grain particles showed the chain-like patterns with inhomogeneous size distribution, the excitation spectra were composed of a broad band peaked at 307 nm and two small narrow bands centered at 381 and 492 nm, and the highest green emission spectrum was observed at 0.01 mol of $Tb^{3+}$ ions. As for the phosphor thin films, the average transmittance exceeding 85% was measured in the 400~1,100 nm range and the optical band gap showed a significant dependence on the type of substrate.

Effects of Concentration of ZnO Nanoparticles on Mechanical, Optical, Thermal, and Antimicrobial Properties of Gelatin/ZnO Nanocomposite Films

  • Shankar, Shiv;Teng, Xinnan;Rhim, Jong-Whan
    • KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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    • v.20 no.2
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    • pp.41-49
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    • 2014
  • This study illustrates the synthesis of gelatin based zinc oxide nanoparticle (ZnONPs) incorporated nanocomposite films using different concentrations of ZnONPs. The ZnONPs were oval in shape and the size ranged from 100- 200 nm. The nanocomposite films were characterized by UV-visible, FE-SEM, FT-IR, and XRD. The concentrations of ZnONPs greatly influenced the properties of nanocomposite films. The absorption peaks around 360 nm increased with the increasing concentrations of ZnONPs. The surface color of film did not change while transmittance at 280 nm was greatly reduced with increase in the concentration of ZnONPs. FTIR spectra showed the interaction of ZnONPs with gelatin. XRD data demonstrated the crystalline nature of ZnONPs. The thermostability, char content, water contact angle, water vapor permeability, moisture content, and elongation at break of nanocomposite films increased, whereas, tensile strength and modulus decreased with increase in the concentrations of ZnONPs. The gelatin/ZnONPs nanocomposite films showed profound antibacterial activity against both Gram-positive and Gram-negative food-borne pathogenic bacteria. The gelatin/$ZnONP^{1.5}$ nanocomposite film showed the best UV barrier and antimicrobial properties among the tested-films, which indicated a high potential for use as an active food packaging films with environmentally-friendly nature.

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$H_2$ plasma treatment effects on electrical and optical properties of the BZO (ZnO:B) thin films

  • Yoo, Ha-Jin;Son, Chan-Hee;Choi, Joon-Ho;Kang, Jung-Wook;Cho, Won-Tae;Park, Sang-Gi;Lee, Yong-Hyun;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.309-309
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    • 2010
  • We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

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