• Current Photovoltaic Research
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• v.1 no.1
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• pp.38-43
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• 2013

$Cu(In,Ga)_3Se_5$ is a candidate material for the top cell of $Cu(In,Ga)Se_2$ tandem cells. This phase is often found at the surface of the $Cu(In,Ga)Se_2$ film during $Cu(In,Ga)Se_2$ cell fabrication, and plays a positive role in $Cu(In,Ga)Se_2$ cell performance. However, the exact properties of the $Cu(In,Ga)_3Se_5$ film have not been extensively studied yet. In this work, $Cu(In,Ga)_3Se_5$ films were fabricated on Mo-coated soda-lime glass substrates by a three-stage co-evaporation process. The Cu content in the film was controlled by varying the deposition time of each stage. X-ray diffraction and Raman spectroscopy analyses showed that, even though the stoichiometric Cu/(In+Ga) ratio is 0.25, $Cu(In,Ga)_3Se_5$ is easily formed in a wide range of Cu content as long as the Cu/(In+Ga) ratio is held below 0.5. The optical band gap of $Cu_{0.3}(In_{0.65}Ga_{0.35})_3Se_5$ composition was found to be 1.35eV. As the Cu/(In+Ga) ratio was decreased further below 0.5, the grain size became smaller and the band gap increased. Unlike the $Cu(In,Ga)Se_2$ solar cell, an external supply of Na with $Na_2S$ deposition further increased the cell efficiency of the $Cu(In,Ga)_3Se_5$ solar cell, indicating that more Na is necessary, in addition to the Na supply from the soda lime glass, to suppress deep level defects in the $Cu(In,Ga)_3Se_5$ film. The cell efficiency of $CdS/Cu(In,Ga)_3Se_5$ was improved from 8.8 to 11.2% by incorporating Na with $Na_2S$ deposition on the CIGS film. The fill factor was significantly improved by the Na incorporation, due to a decrease of deep-level defects.

• Korean Journal of Materials Research
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• v.3 no.2
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• pp.111-120
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• 1993

Abstract In this study, the Mo-Hf-O ingots containing 0.31-1.14at % Hf and 0.08-1.00at % 0 were prepared by plasma arc melting. The change of microstructure depending on the condition of heat treatmen~ was analysed by optical microscophy, auger electron microscophy, and transmission electron microscophy. Molybdenum powder with the oxygen content of 830ppm was compacted, and then melted. The oxygen content of molybdenum ingots was detected to be 40 -130ppm. As the contents of Hf and 0 increased, the grain size of ingots decreased. When molybdenum igot containing l.14at % Hf and 1.00at % C was heat treated, p-molybdenum carbide in grains was transformed into ${\alpha}$-molybdenum carbide at 130$0^{\circ}C$. Between 140$0^{\circ}C$ and 150$0^{\circ}C$, the precipitation of hafnium carbide was due to the reaction of solute Hf and C, and the hafnium carbide was saturated at grain boundaries at 150$0^{\circ}C$. When the sample was heat treated from 150$0^{\circ}C$ to 170$0^{\circ}C$, Hafnium oxide more stable thermodynamically precipitated both at grain boundaries and in grains after hafnium carbide had been dissolved at grain boundaries.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.76-76
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• 2000

최근 비정질 SiC 박막은 열과 광안정도면에서 비정질 Si 박막에 비해 우수하며 공정변수들을조절함으로써 비교적 쉽고 다양하게 광학적.전기적 특성을 얻을 수 있고, 낮은 광흡수계수 및 105($\Omega$cm)1 이상의 높은 전도도를 가지고 있어 Plasma Enhanced Chemical Vapor Deposition(PECVD)을 통해 가전자제어 (Valency electron control)가 가능한 비정질 SiC 박막이 제작된 이래 대한 많은 연구가 진행되고 있다. 결정성이 없는 비정질 물질은 상대적으로 낮은 온도에서 성장이 가능하며, 특히 glow-sidcharge 방식으로 저온에서 성장시킬 수 있음에 따라 유리등과 같은 다른 저렴한 물질을 기판으로 이용, 넓은 면적의 비정질 SiC 박막을 성장시켜 여러 분야의 소자에 응용되고 있다. 비정질 SiC 박막이 넓은 에너지띠 간격을 갖는 물질이라는 점과 화학적 안정성 및 높은 경도, 비정질성에 기인한 대면적 성장의 용이성 등의 장점이외에, 원자의 성분비 변화에 의해 에너지띠 간격(1.7~3.1eV)을 조절할 수 있다는 점은 광전소자의 응용에 큰 잠재성이 있음을 나타낸다. PECVD 방식으로 성장된 비정질 SiC 박막은 태양전지의 Window층이나 발광다이오드, 광센서, 광트랜지스터 등에 응용되어 오고 있다. 본 연구에서는, RF-PECVD(ULVAC CPD-6018) 방법에 의하여 비정질 Si1-xCx 박막을 2.73Torr의 고정된 압력에서 RF 전력(50~300W), 증착온도(150~30$0^{\circ}C$), 주입 가스량 (SiH4:CH4)등의 조건을 다양하게 변화시켜가며 증착된 막의 특성을 평가하였다. 성장된 박막을 X-ray Photoelectron Spectroscopy(XPS), UV-VIS spectrophotometer, Ellipsometry, Atomic Force Microscopy(AFM)등을 이용하여 광학적 밴드갭, 광흡수 계수, Tauc Plot, 그리고 파장대별 빛의 투과도의 변화를 분석하였으며 각 변수가 변화함에 따라 광학적 밴드갭의 변화를 정량적으로 조사함으로써 분자결합상태와 밴드갭과 광 흡수 계수간의상관관계를 규명하였고, 각 변수에 따른 표면의 조도를 확인하였다. 비정질 Si1-xCx 박막을 증착하여 특성을 분석한 결과 성장된 박막의 성장률은 Carbonfid의 증가에 따라 다른 성장특성을 보였고, Silcne(SiH4) 가스량의 감소와 함께 박막의 성장률이 둔화됨을 볼 수 있다. 또한 Silane 가스량이 적어지는 영역에서는 가스량의 감소에 의해 성장속도가 둔화됨을 볼 수 있다. 또한 Silane 가스량이 적어지는 영역에서는 가스량의 감소에 의해 성장속도가 줄어들어 성장률이 Silane가스량에 의해 지배됨을 볼 수 있다. UV-VIS spectrophotometer에 의한 비정질 SiC 박막의 투과도와 파장과의 관계에 있어 유리를 기판으로 사용했으므로 유리의투과도를 감안했으며, 유리에 대한 상대적인 비율 관계로 투과도를 나타냈었다. 또한 비저질 SiC 박막의 흡수계수는 Ellipsometry에 의해 측정된 Δ과 Ψ값을 이용하여 시뮬레이션한 결과로 비정질 SiC 박막의 두께를 이용하여 구하였다. 또한 Tauc Plot을 통해 박막의 optical band gap을 2.6~3.7eV로 조절할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.186-186
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• 2000

After LeComber et al. reported the first amorphous hydrogenated silicon (a-Si: H) TFT, many laboratories started the development of an active matrix LCDs using a-Si:H TFTs formed on glass substrate. With increasing the display area and pixel density of TFT-LCD, however, high mobility TFTs are required for pixel driver of TF-LCD in order to shorten the charging time of the pixel electrodes. The most important of these drawbacks is a-Si's electron mobiliy, which is the speed at which electrons can move through each transistor. The problem of low carier mobility for the a-Si:H TFTs can be overcome by introducing polycrystalline silicon (poly-Si) thin film instead of a-Si:H as a semiconductor layer of TFTs. Therefore, poly-Si has gained increasing interest and has been investigated by many researchers. Recnetly, fabrication of such poly-Si TFT-LCD panels with VGA pixel size and monolithic drivers has been reported, . Especially, fabricating poly-Si TFTs at a temperature mach lower than the strain point of glass is needed in order to have high mobility TFTs on large-size glass substrate, and the monolithic drivers will reduce the cost of TFT-LCDs. The conventional methods to fabricate poly-Si films are low pressure chemical vapor deposition (LPCVD0 as well as solid phase crystallization (SPC), pulsed rapid thermal annealing(PRTA), and eximer laser annealing (ELA). However, these methods have some disadvantages such as high deposition temperature over $600^{\circ}C$, small grain size (<50nm), poor crystallinity, and high grain boundary states. Therefore the low temperature and large area processes using a cheap glass substrate are impossible because of high temperature process. In this study, therefore, we have deposited poly-Si thin films on si(100) and glass substrates at growth temperature of below 40$0^{\circ}C$ using newly developed high rate magnetron sputtering method. To improve the sputtering yield and the growth rate, a high power (10~30 W/cm2) sputtering source with unbalanced magnetron and Si ion extraction grid was designed and constructed based on the results of computer simulation. The maximum deposition rate could be reached to be 0.35$\mu$m/min due to a high ion bombardment. This is 5 times higher than that of conventional sputtering method, and the sputtering yield was also increased up to 80%. The best film was obtained on Si(100) using Si ion extraction grid under 9.0$\times$10-3Torr of working pressure and 11 W/cm2 of the target power density. The electron mobility of the poly-si film grown on Si(100) at 40$0^{\circ}C$ with ion extraction grid shows 96 cm2/V sec. During sputtering, moreover, the characteristics of si source were also analyzed with in situ Langmuir probe method and optical emission spectroscopy.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.81-81
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• 2013

반도체, LCD, MEMs 등 미세 전자소자의 제작과 깊은 관련이 있는 IT 산업은 자동차 산업과 함께 세계 경제를 이끌고 있는 핵심 산업이며, 그 발전 가능성이 크다고 할 수 있다. 이 중 반도체, LCD 공정 기술에 관해서 대한민국은 세계를 선도하여 시장을 이끌어 나가고 있는 실정이다. 이들의 공정기술은 주로 높은 수율(yield)을 기반으로 한 대량 생산 기술에 초점이 맞추어져 있기 때문에, 현재와 같은 첨예한 가격 경쟁력이 요구되는 시대에서 공정 기술 개발을 통해 수율을 최대한으로 이끌어 내는 것이 현재 반도체를 비롯한 미세소자 산업이 직면하고 있는 하나의 중대한 과제라 할 수 있다. 특히 반도체공정에 있어 발전을 거듭하여 현재 20 nm 수준의 선폭을 갖는 소자들의 양산이 계획 있는데 이와 같은 나노미터급 선폭을 갖는 소자 양산과 관련된 CD (critical dimension)의 감소는 공차의 감소를 유발시키고 있으며, 패널의 양산에 있어서 생산 효율 증가를 위한 기판 크기의 대형화가 이루어지고 있다. 또한, 소자의 집적도를 높이기 위하여 높은 종횡비(aspect ratio)를 요구하는 공정이 일반화됨에 따라 단일 웨이퍼 내에서의 공정의 균일도(With in wafer uniformity, WIWU) 및 공정이 진행되는 시간에 따른 균일도(Wafer to wafer uniformity)의 변화 양상에 대한 파악을 통한 공정 진단에 대한 요구가 급증하고 있는 현실이다. 반도체 및 LCD 공정에 있어서 공정 균일도의 감시 및 향상을 위하여 박막, 증착, 식각의 주요 공정에 널리 사용되고 있는 플라즈마의 균일도(uniformity)를 파악하고 실시간으로 감시하는 것이 반드시 필요하며, 플라즈마의 균일도를 파악한다는 것은 플라즈마의 기판 상의 공간적 분포(radial direction)를 확인하여 보는 것을 의미한다. 현재까지 플라즈마의 공간적 분포를 진단하는 대표적인 방법으로는 랭뮤어 탐침(Langmuir Probe), 레이저 유도 형광법(Laser Induced Fluorescence, LIF) 그리고 광섬유를 이용한 발광분광법(Optical Emission Spectroscopy, OES)등이 있으나 랭뮤어 탐침은 플라즈마 본연의 상태에서 섭동(pertubation) 현상에 의한 교란, 이온에너지 측정의 한계로 인하여 공정의 실시간 감시에 적합하지 않으며, 레이저 유도 형광법은 측정 물질의 제한성 때문에 플라즈마 내부에 존재하는 다양한 종의 거동을 살필 수 없다는 단점 및 장치의 설치와 정렬(alignment)이 상대적으로 어려워 산업 현장에서 사용하기에 한계가 있다. 본 연구에서는 최소 50 cm에서 최대 400 cm까지 플라즈마 내 측정 거리에서 최대 20 mm 공간 분해가 가능한 광 수광 시스템 및 플라즈마 공정에서의 라디칼의 상태 변화를 분광학적 비접촉 방법으로 계측할 수 있는 발광 분광 분석기를 접목하여 플라즈마 챔버 내의 라디칼 공간 분포를 계측할 수 있는 진단 센서를 고안하고 이를 실 공정에 적용하여 보았다. 플라즈마 증착 및 식각 공정에서 형성된 박막의 두께 및 식각률과 공간 분해발광 분석법을 통하여 계측된 결과와의 매우 높은 상관관계를 확인하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.97-97
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• 2013

Recently, Cu2ZnSn(S,Se)4 (CZTSS), which is one of the In- and Ga- free absorber materials, has been attracted considerable attention as a new candidate for use as an absorber material in thin film solar cells. The CZTSS-based absorber material has outstanding characteristics such as band gap energy of 1.0 eV to 1.5 eV, high absorption coefficient on the order of 104 cm-1, and high theoretical conversion efficiency of 32.2% in thin film solar cells. Despite these promising characteristics, research into CZTSS based thin film solar cells is still incomprehensive and related reports are quite few compared to those for CIGS thin film solar cells, which show high efficiency of over 20%. I will briefly overview the recent technological development of CZTSS thin film solar cells and then introduce our research results mainly related to sputter based process. CZTSS thin film solar cells are prepared by sulfurization of stacked both metallic and sulfide precursors. Sulfurization process was performed in both furnace annealing system and rapid thermal processing system using S powder as well as 5% diluted H2S gas source at various annealing temperatures ranging from $520^{\circ}C$ to $580^{\circ}C$. Structural, optical, microstructural, and electrical properties of absorber layers were characterized using XRD, SEM, TEM, UV-Vis spectroscopy, Hall-measurement, TRPL, etc. The effects of processing parameters, such as composition ratio, sulfurization pressure, and sulfurization temperature on the properties of CZTSS absorber layers will be discussed in detail. CZTSS thin film solar cell fabricated using metallic precursors shows maximum cell efficiency of 6.9% with Jsc of 25.2 mA/cm2, Voc of 469 mV, and fill factor of 59.1% and CZTS thin film solar cell using sulfide precursors shows that of 4.5% with Jsc of 19.8 mA/cm2, Voc of 492 mV, and fill factor of 46.2%. In addition, other research activities in our lab related to the formation of CZTS absorber layers using solution based processes such as electro-deposition, chemical solution deposition, nano-particle formation will be introduced briefly.

• Applied Chemistry for Engineering
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• v.23 no.6
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• pp.546-553
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• 2012

Urushiol extracted from lacquer tree exhibits good thermal stabilities as well as antimicrobial andantioxidant properties. However, it has been known that the urushiol derivates bring out allergy. In this study, polyurushiol (PUOH) powders were successfully synthesized for the safe and convenient handling of allergic urushiol. First, the as-synthesized PUOH was confirmed by Fourier transform infrared spectroscopy (FTIR), scanning electron microscope (SEM), thermal gravimetric analyzer (TGA), antioxidant test and antimicrobial test. And then, six different LDPE/PUOH composite films were prepared via a twin screw extruder system and investigated their feasibility to use as active packaging materials. Their chemical structures, morphology, thermal optical and antimicrobial properties of the LDPE/PUOH composite films were investigated as a function of PUOH contents. FTIR and SEM results showed that LDPE/PUOH composite films have a weak interfacial interaction and poor dispersion with a high PUOH loading. The thermal properties increased up to 3 wt% as the content of PUOH increases. Compared to the pure LDPE films, LDPE/PUOH composite films are more effective in the UV absorbance and antibacterial activity against E. coli. To maximize the performance of LDPE/PUOH compositefilms as the packaging materials, further researches are required to enhance the dispersion of PUOH powders in the LDPE matrix.

• Korean Journal of Remote Sensing
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• v.21 no.4
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• pp.341-369
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• 2005

Hyperspectral images have emerged as a new and promising remote sensing data that can overcome the limitations of existing optical image data. This study was designed to provide a comprehensive review on definition, data processing methods, and applications of hyperspectral data. Various types of airborne, spaceborne, and field hyperspectral image sensors were surveyed from the available literatures and internet search. To understand the current status of hyperspectral remote sensing technology and research development, we collected several hundreds research papers from international journals (IEEE Transactions on Geoscience and Remote Sensing, International Journal of Remote Sensing, Remote Sensing of Environment and AVIRIS Workshop Proceedings), and categorized them by sensor types, data processing techniques, and applications. Although several hyperspectral sensors have been developing, AVIRIS has been a primary data source that the most hyperspectral remote sensing researches were relied on. Since hyperspectral data have very large data volume with many spectral bands, several data processing techniques that are particularly oriented to hyperspectral data have been developed. Although atmospheric correction, spectral mixture analysis, and spectral feature extraction are among those processing techniques, they are still in experimental stage and need further refinement until the fully operational adaptation. Geology and mineral exploration were major application in early stage of hyperspectral sensing because of the distinct spectral features of rock and minerals that could be easily observed with hyperspectral data. The applications of hyperspectral sensing have been expanding to vegetation, water resources, and military areas where the multispectral sensing was not very effective to extract necessary information.

• Resources Recycling
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• v.30 no.5
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• pp.38-48
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• 2021

In this study, we determine the optimal process conditions for selectively recovering Si from a solar cell surface by removal of impurities (Al, Zn, Ag, etc.). To selectively recover Si from solar cells, leaching is performed using HCl solution and an ultrasonic cleaner. After leaching, the solar cells are washed using distilled water and dried in an oven. Decompression filtration is performed on the HCl solution, and ICP-OES (Inductively Coupled Plasma Optical Emission spectroscopy) full scan analysis is performed on the filtered solution. Furthermore, XRD (X-ray powder diffraction), XRF (X-ray fluorescence), and ICP-OES are performed on the dried solar cells after crushing, and the purity and recovery rate of Si are obtained. In this experiment, the concentration of acid solution, reaction temperature, reaction time, and ultrasonic intensity are considered as variables. The results show that the optimal process conditions for the selective recovery of Si from the solar cells are as follows: the concentration of acid solution = 3 M HCl, reaction temperature = 60℃, reaction time = 120 min, and ultrasonic intensity = 150 W. Further, the Si purity and recovery rate are 99.85 and 99.24%, respectively.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.20 no.6
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• pp.80-85
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• 2019

Vanadium dioxide is a well-known metal-insulator phase transition material. Lots of researches of vanadium redox flow batteries have been researched as large scale energy storage system. In this study, vanadium oxide($VO_x$) thin films were applied to cathode for lithium ion battery. The $VO_x$ thin films were deposited on Si substrate($SiO_2$ layer of 300 nm thickness was formed on Si wafer via thermal oxidation process), quartz substrate by RF magnetron sputter system for 60 minutes at $500^{\circ}C$ with different RF powers. The surface morphology of as-deposited $VO_x$ thin films was characterized by field-emission scanning electron microscopy. The crystallographic property was confirmed by Raman spectroscopy. The optical properties were characterized by UV-visible spectrophotometer. The coin cell lithium-ion battery of CR2032 was fabricated with cathode material of $VO_x$ thin films on Cu foil. Electrochemical property of the coin cell was investigated by electrochemical analyzer. As the results, as increased of RF power, grain size of as-deposited $VO_x$ thin films was increased. As-deposited thin films exhibit $VO_2$ phase with RF power of 200 W above. The transmittance of as-deposited $VO_x$ films exhibits different values for different crystalline phase. The cyclic performance of $VO_x$ films exhibits higher values for large surface area and mixed crystalline phase.