• Title/Summary/Keyword: Optical conductivity

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A Comparative Study of ITO Glass Ablation Using Femtosecond and Nanosecond Lasers (펨토초 레이저와 나노초 레이저를 이용한 ITO Glass의 어블레이션 비교 연구)

  • Jeon, Jin-Woo;Shin, Young-Gwan;Kim, Hoon-Young;Choi, Wonsuk;Ji, Seok-Young;Kang, Hee-Shin;Ahn, Sanghoon;Chang, Won Seok;Cho, Sung-Hak
    • Korean Journal of Optics and Photonics
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    • v.28 no.6
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    • pp.356-360
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    • 2017
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency at visible and near-IR wavelengths. ITO is widely used as a transparent electrode for the fabrication of LCDs, OLEDs, and many kinds of optical applications. It is widely employed for electrodes in various electric and display sectors because of its transparency in the visible range and high conductivity. Therefore, one issue is removing a specific area of a layer of material such as ITO or metallic film on a substrate, without affecting the properties of the substrate. ITO-on-glass removal using a laser is friendlier to the environment than traditional methods. In this study, ablation of ITO film on glass using a femtosecond-laser micromachining system (wavelength 1026 nm, pulse duration 150 fs) and a nanosecond-laser micromachining system (wavelength 1027 nm, pulse duration 5 ns) are described, compared, and analyzed.

Electrical Conductivity, Optical Transmittance, and Oxidation Stability of Transparent Conductive Polymer Film Coated With Layered Pristine Single-walled Carbon Nanotube and Silver Nanowire (무정제 단일벽 탄소나노튜브와 은나노와이어가 적층으로 코팅된 투명전도성 고분자 필름의 전기 전도성, 광학 투과도 및 산화안정성)

  • Young Sil Lee
    • Korean Chemical Engineering Research
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    • v.61 no.3
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    • pp.456-462
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    • 2023
  • An electrically conductive and transparent electrode was created by applying a dispersion of pristine single-walled carbon nanotubes (SWCNTs) and silver nanowires to a polyethylene terephthalate (PET) film using a bar coating method. The SWCNTs were added to increase the electrical conductivity and transmittance of the silver nanowires while also preventing the haze from increasing due to the stacking of multiple layers containing SWCNTs and silver nanowires on the PET substrate. The silver nanowires in the electrode were also found to be stable against oxidation. The transparent electrode displayed excellent electrical and optical properties, with a sheet resistance of 47 Ω/□, transmittance of 96.72%, and haze of 1.93%. Additionally, the sheet resistance of the electrode remained stable over time, with a change of only 6.4% after a constant temperature and humidity test, making it suitable for long-term use. A hybrid transparent electrode that is economically feasible and environmentally sustainable has been developed through the utilization of pristine SWCNT and silver nanowire.

A Study on the Characteristics of the Adiabatically Expanded Polyolefin Structured Foams (단열 발포 폴리올레핀계 구조체의 특성에 관한 연구)

  • Hwang Jun-Ho;Kim Woo-nyon;Jun Jae-Ho;Kwak Soon-Jong;Hwang Seung-Sang;Hong Soon-Man
    • Polymer(Korea)
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    • v.29 no.6
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    • pp.605-612
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    • 2005
  • This study investigates the isothermal crystallization behaviors of polypropylene-polyethylene-(1-butene) terpolymer and the adiabatically expanded polyolefin structured foams. For this purpose, butane gas was used as a physical blowing agent. Avrami equation has been used to interpret theoretically the experimental results obtained by either DSC or polarized optical microscope. It is believed that elongation induced crystallization occurring during the adiabatic expansion process has resulted in an increase in crystallization rate, eventually leading to a faster growth rate of spherulites and an increase in the nucleation density. An analysis of the foam by SEM images showed that the structure of foam is uniform (below diameter 30 $\mu$m closed cell) In addition, the thermal conductivity and the compressive strength of the polyolefin structured foams was measured. The thermal conductivity of foamed resin with excellent insulation characteristics is reduced compared with unfoamed resin. The compressive strength is decreased with increase in the expansion ratio.

Design and characterization of conductive transparent filter using [TiO2|Ti|Ag|TiO2] multilayer ([TiO2|Ti|Ag|TiO2] 다층구조를 이용한 전도성 투과필터의 설계 및 특성분석)

  • Lee, Seung-Hyu;Lee, Jang-Hoon;Hwangbo, Chang-Kwon
    • Korean Journal of Optics and Photonics
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    • v.13 no.4
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    • pp.363-369
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    • 2002
  • We have designed conductive transparent filters using a low-emissivity coating such as [dielectric|Ag|dielectric] for display applications. The design is the repetition of [$TiO_{2}$|Ti|Ag |$TiO_{2}$] to increase the transmittance in the visible and decrease the transmittance in the near IR. The conductive transparent filters are deposited by a radio frequency(RF) magnetron sputtering system. The optical, structural and electrical properties of the filters were investigated and the optical spectra are compared with simulated spectra. The thickness of the deposited Ag films is above 13 ㎚ to increase the conductivity and that of $TiO_{2}$ films is 24 ㎚ to increase the transmittance in the visible range. Ti blockers are employed to prevent the Ag films from being oxidized by an oxygen gas during the reactive sputtering process. Also, it is shown that the thicker Ti film is necessary as the period increases. Finally, a filter with repetition of the basic structure three times shows the better cut-off near infrared(NIR) and the sheet resistance as low as 2Ω/□ which is enough to shield an unnecessary electromagnetic waves for a display panel.

Structural and Optical Properties of ZnS Thin Films Fabricated by Using RF Sputtering and Rapid Thermal Annealing Process for Buffer Layer in Thin Film Solar Cells (박막태양전지 버퍼층 적용을 위해 RF 스퍼터링 및 급속열처리 공정으로 제작한 황화아연 박막의 구조적 광학적 특성)

  • Park, Chan-Il;Jun, Young-Kil
    • The Journal of the Korea institute of electronic communication sciences
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    • v.15 no.4
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    • pp.665-670
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    • 2020
  • Buffer layer in CIGS thin-film solar cells improves energy conversion efficiency through band alignment between the absorption layer and the window layer. ZnS is a non-toxic II-VI compound semiconductor with direct-transition band gaps and n-conductivity as well as with excellent lattice matching for CIGS absorbent layers. In this study, the structural and optical properties of ZnS thin films, deposited by RF magnetron sputtering method and subsequently performed by the rapid thermal annealing treatment, were investigated for the buffer layer. The zincblende cubic structures along (111), (220), and (311) were shown in all specimens. The rapid thermal annealed specimens at the relatively low temperatures were polycrystalline structure with the wurtzite hexagonal structures along (002). Rapid thermal annealing at high temperatures changed the polycrystalline structure to the single crystal of the zincblende cubic structures. Through the chemical analysis, the zincblende cubic structure was obtained in the specimen with the ratio of Zn/S near stoichiometry. ZnS thin film showed the shifted absorption edge towards the lower wavelength as annealing temperature increased, and the mean optical transmittance in the visible light range increased to 80.40% under 500℃ conditions.

Electrical properties of n-ZnO/p-Si heterojunction photovoltaic devices

  • Kang, Ji Hoon;Lee, Kyoung Su;Kim, Eun Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.306.1-306.1
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    • 2016
  • ZnO semiconductor material has been widely utilized in various applications in semiconductor device technology owing to its unique electrical and optical features. It is a promising as solar cell material, because of its low cost, n-type conductivity and wide direct band gap. In this work ZnO/Si heterojunctions were fabricated by using pulsed laser deposition. Vacuum chamber was evacuated to a base pressure of approximately $2{\times}10^{-6}Torr$. ZnO thin films were grown on p-Si (100) substrate at oxygen partial pressure from 5mTorr to 40mTorr. Growth temperature of ZnO thin films was set to 773K. A pulsed (10 Hz) Nd:YAG laser operating at a wavelength of 266 nm was used to produce a plasma plume from an ablated a ZnO target, whose density of laser energy was $10J/cm^2$. Thickness of all the thin films of ZnO was about 300nm. The optical property was characterized by photoluminescence and crystallinity of ZnO was analyzed by X-ray diffraction. For fabrication ZnO/Si heterojunction diodes, indium metal and Al grid patterns were deposited on back and front side of the solar cells by using thermal evaporator, respectively. Finally, current-voltage characteristics of the ZnO/Si structure were studied by using Keithly 2600. Under Air Mass 1.5 Global solar simulator with an irradiation intensity of $100mW/cm^2$, the electrical properties of ZnO/Si heterojunction photovoltaic devices were analyzed.

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Formation of Plasma Damage-Free ITO Thin Flims on the InGaN/GaN based LEDs by Using Advanced Sputtering

  • Park, Min Joo;Son, Kwang Jeong;Kwak, Joon Seop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.312-312
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    • 2013
  • GaN based light emitting diodes (LEDs) are important devices that are being used extensively in our daily life. For example, these devices are used in traffic light lamps, outdoor full-color displays and backlight of liquid crystal display panels. To realize high-brightness GaN based LEDs for solid-state lighting applications, the development of p-type ohmic electrodes that have low contact resistivity, high optical transmittance and high refractive index is essential. To this effect, indiumtin oxide (ITO) have been investigated for LEDs. Among the transparent electrodes for LEDs, ITO has been one of the promising electrodes on p-GaN layers owing to its excellent properties in optical, electrical conductivity, substrate adhesion, hardness, and chemical inertness. Sputtering and e-beam evaporation techniques are the most commonly used deposition methods. Commonly, ITO films on p-GaN by sputtering have better transmittance and resistivity than ITO films on p-GaN by e-bam evaporation. However, ITO films on p-GaN by sputtering have higher specific contact resistance, it has been demonstrated that this is due to possible plasma damage on the p-GaN in the sputtering process. In this paper, we have investigated the advanced sputtering using plasma damage-free p-electrode. Prepared the ITO films on the GaN based LEDs by e-beam evaporation, normal sputtering and advanced sputtering. The ITO films on GaN based LEDs by sputtering showed better transmittance and sheets resistance than ITO films on the GaN based LEDs by e-beam evaporation. Finally, fabricated of GaN based LEDs by using advanced sputtering. And compared the electrical properties (measurement by using C-TLM) and structural properties (HR-TEM and FE-SEM) of ITO films on GaN based LEDs produced by e-beam evaporation, normal sputtering and advanced sputtering. As a result, It is expected to form plasma damage free-electrode, and better light output power and break down voltage than LEDs by e-beam evaporation and normal sputter.

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The effects of annealing of the ATO films prepared by RF magnetron sputtering (RF 마그네트론 스퍼터를 이용한 ATO 박막의 열처리 효과)

  • Park, Sei-Yong;Lee, Sung-Uk;Park, Mi-Ju;Kim, Young-Ryeol;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.270-271
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    • 2008
  • Antimony (6 wt%) doped tin oxide (ATO) films to improve conductivity were deposited on 7059 coming glass by RF magnetron sputtering method for application to transparent electrodes. The ATO film was deposited at a working pressure of 5 mTorr and RF power of 175 W. We investigated the effects of the post-annealing temperature on structural, electrical and optical properties of the ATO films. The films were annealed at temperatures ranging from $300^{\circ}C$ to $600^{\circ}C$ in step of $100^{\circ}C$ using RTA equipment in vacuum ambient. X-ray diffraction (XRD) measurements showed the ATO films to be crystallized with a strong (101) preferred orientation as the annealing temperature increased. Electrical resistivity decreased significantly with annealing temperatures up to $600^{\circ}C$. ATO film annealed at temperature of $600^{\circ}C$ showed the lowest resistivity of $5.6\times10^{-3}\Omega$-cm. Optical transmittance increased significantly with annealing temperatures up to $600^{\circ}C$. The highest transmittance was 90.8 % in the visible range from 400 to 800 nm.

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Preparation and Characterization of IZO Thin Films grown by DC Magnetron Sputtering (DC 마그네트론 스퍼터링을 이용한 IZO 박막의 제조와 특성 연구)

  • Park Chang-Ha;Lee Hak-Jun;Kim Hyeon-Boum;Kim Dong-Ho;Lee Gun-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.38 no.5
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    • pp.188-192
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    • 2005
  • Indium zinc oxide (IZO) thin films were deposited on glass substrate by dc magnetron sputtering. The effects of oxygen flow rate and deposition temperature on electrical and optical properties of the films were investigated. With addition of small amount of oxygen gas, the characteristic properties of amorphous IZO films were improved and the specific resistivity was about $4.8{\times}10^{-4}\Omega{\cdot}cm$. Change of structural properties according to the deposition temperature was observed with XRD, SEM, and AFM. Films deposited above $300^{\circ}C$ were found to be polycrystalline. Surface roughness of the films was increased due to the formation of grains on the surface. Electrical conductivity became deteriorated for polycrystalline IZO films. Consequently, high quality IZO films could be prepared by do sputtering with $O_{2}/Ar{\simeq}0.03$ and deposition temperature in range of $150\~200^{\circ}C$; a specific resistivity of $3.4{\times}10^{-4}{\Omega}{\cdot}cm$, an optical transmission over $90\%$ at wavelength of 550 nm, and a rms value of surface roughness about $3{\AA}$.

Effect of the substrate temperature on the properties of transparent conductive IZTO films prepared by pulsed DC magnetron sputtering

  • Ko, Yoon-Duk;Kim, Joo-Yeob;Joung, Hong-Chan;Son, Dong-Jin;Choi, Byung-Hyun;Kim, Young-Sung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.167-167
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    • 2010
  • Indium tin oxide (ITO) has been widely used as transparent conductive oxides (TCOs) for transparent electrodes of various optoelectronic devices, such as liquid crystal displays (LCD) and organic light emitting diodes (OLED). However, indium has become increasingly expensive and rare because of its limited resources. In addition, ITO thin films have some problems for OLED and flexible displays, such as imperfect work function, chemical instability, and high deposition temperature. Therefore, multi-component TCO materials have been reported as anode materials. Among the various materials, IZTO thin films have been gained much attention as anode materials due to their high work function, good conductivity, high transparency and low deposition temperature. IZTO thin films with a thickness of 200nm were deposited on Corning glass substrate at different substrate temperature by pulsed DC magnetron sputtering with a sintered ceramic target of IZTO (In2O3 70 wt%, ZnO 15 wt%, SnO2 15 wt%). We investigated the electrical, optical, structural properties of IZTO thin films. As the substrate temperature is increased, the electrical properties of IZTO are improved. All IZTO thin films have good optical properties, which showed an average of transmittance over 80%. These IZTO thin films were used to fabricate organic light emitting diodes (OLEDs) as anode and the device performances studied. As a result, IZTO has utility value of TCO electrode although it reduced indium and we expect it is possible for the IZTO to apply to flexible display due to the low processing temperature.

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