• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.132-132
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• 2015

Virtual metrology (VM) model based on plasma information (PI) parameter for C4F8 plasma-assisted oxide etching processes is developed to predict and monitor the process results such as an etching rate with improved performance. To apply fault detection and classification (FDC) or advanced process control (APC) models on to the real mass production lines efficiently, high performance VM model is certainly required and principal component regression (PCR) is preferred technique for VM modeling despite this method requires many number of data set to obtain statistically guaranteed accuracy. In this study, as an effective method to include the 'good information' representing parameter into the VM model, PI parameters are introduced and applied for the etch rate prediction. By the adoption of PI parameters of b-, q-factors and surface passivation parameters as PCs into the PCR based VM model, information about the reactions in the plasma volume, surface, and sheath regions can be efficiently included into the VM model; thus, the performance of VM is secured even for insufficient data set provided cases. For mass production data of 350 wafers, developed PI based VM (PI-VM) model was satisfied required prediction accuracy of industry in C4F8 plasma-assisted oxide etching process.

• 대한기계학회논문집A
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• 제30권12호
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• pp.1611-1617
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• 2006

A compact and two-dimensional atomic force microscope (AFM) using an orthogonal sample scanner, a calibrated homodyne laser interferometer and a commercial AFM head was developed for use in the nano-metrology field. The x and y position of the sample with respect to the tip are acquired by using the laser interferometer in the open-loop state, when each z data point of the AFM head is taken. The sample scanner which has a motion amplifying mechanism was designed to move a sample up to $100{\times}100{\mu}m^2$ in orthogonal way, which means less crosstalk between axes. Moreover, the rotational errors between axes are measured to ensure the accuracy of the calibrated AFM within the full scanning range. The conventional homodyne laser interferometer was used to measure the x and y displacements of the sample and compensated via an X-ray interferometer to reduce the nonlinearity of the optical interferometer. The repeatability of the calibrated AFM was measured to sub-nm within a few hundred nm scanning range.

• 한국광학회지
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• 제17권1호
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• pp.1-6
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• 2006

우리는 6.7 kPa의 네온 버퍼가스가 포함된 루비듐 증기셀을 이용하여 $^{87}Rb$원자 $D_1$ 전이선에서 레이저의 세기, 증기 셀의 온도, 전이 선에 따른 비선형 광자기 신호(NMOE)의 특성을 조사하였다. 비선형 광자기 신호는 레이저의 세기와 증기셀의 온도가 증가함에 따라 F=2$\to$F'=2 전이선에서는 광자기 신호의 크기와 선폭이 증가하였지만, F=2$\to$F'=1 전이선에서는 확대 없이 신호의 크기만 증가됨으로써 자장 측정 민감도가 향상되는 것을 확인하였으며, 이러한 효과를 자기부준위 사이에서의 원자결맞음 구도의 차이로 설명하였다. 관측된 최적 조건에서 자기장변화에 대한 민감도는 $70pT/\sqrt{Hz}$ 이하로 계산되었다.

• 한국광학회지
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• 제28권6호
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• pp.351-355
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• 2017

본 논문에서는 포화흡수체의 투과변조깊이 조절을 통해 다양한 펄스 상태를 한 공진기 안에서 구현하는 방법에 관한 전산 모사를 진행하였다. 포화흡수체의 투과변조깊이의 크기 변화만으로 큐스위치드 레이저, 큐스위치드 모드 잠금 레이저, 모드 잠금 레이저 등 원하는 펄스 레이저 상태로 전환이 가능하다는 실험적 연구가 있어 왔으며, 이러한 연구가 이론적으로 부합하는 내용임을 확인하기 위해 Haus master 식을 사용하여 전산 모사를 진행하였다. 큐스위칭된 광 파워를 모사하기위해 이득 값은 시간 의존성을 가지도록 반응속도식을 적용하였다. 그 결과 투과변조깊이가 증가함에 따라 모드 잠금 레이저에서부터, 큐스위치드 레이저, 큐스위치드 레이저로 동작함을 확인하였고, 이는 이론적으로 예측된 경향성과 일치하였다.

• International Journal of Precision Engineering and Manufacturing
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• 제9권3호
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• pp.51-54
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• 2008

A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.

• Journal of the Optical Society of Korea
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• 제5권4호
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• pp.140-145
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• 2001

We present a new method of volumetric interferometer, which is intended to measure the three-dimensional coordinates of a moving object in a simultaneous way with a single optical setup. The method is based on the principles of phase-measuring interferometry with phase shifting. Two diffraction point sources, which are made of the polished ends of single-mode optical fibers are embedded on the object. Two spherical wavefronts emanate from the diffraction point sources and interfere with each other within the measurement volume. One wavefront is phase-shifted by elongating the corresponding fiber using a PZT extender. A CCD array sensor fixed at the stationary measurement station detects the resulting interference field. The measured phases are then related to the three-dimensional location of the object with a set of non-liner equations of Euclidean distance, from which the complete set of three-dimensional spatial coordinates of the object is determined through rigorous numerical computation based upon the least square error minimization.

• 한국광학회지
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• 제8권5호
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• pp.366-371
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• 1997

기체상태의 루비듐 원자가 실온에서 Maxwell 속도 분포를 이루고 있을 때 광펌핑 현상과 특정 속도 원자의 선택에 의해 도플러 효과를 제거시키는 속도군 선택 광펌핑(VSOP) 분광학을 실시하였다. 본 실험에서는 주파수가 고정된 locked laser와 주파수 튜닝이 가능한 sweep laser를 동시에 사용하되, 두 빔을 같은 방향으로 진행시키고, 시료 속에서 서로 겹치게 함으로써 주공진 신호만을 발생시킬 수 있었다. 이 방법으로 지금까지 알려진 VSOP 분광학보다 원자들의 속도 선택 범위가 더 넓어졌다.

• Journal of the Optical Society of Korea
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• 제18권1호
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• pp.37-44
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• 2014

The use of a laser interferometer as a metrological tool in micro-optics measurement is demonstrated. A transmissive interferometer is effective in measuring an optical specimen having a high angle slope. A configuration that consists of an optical resolution of 0.62 micron is adapted to measure a specimen, which is a micro-Fresnel lens-shaped lenticular lens. The measurement result shows a good repeatability at each fraction of facets, however, a reconstruction of the lens shape profile is disturbed by a known problem of $2{\pi}$-ambiguity. To solve this $2{\pi}$-ambiguity problem, we propose a two-step phase unwrapping method. In the first step, an unwrapped phase map is obtained by using a conventional unwrapping method. Then, a proposed unwrapping method based on the shape modeling is applied to correct the wrongly unwrapped phase. A measured height of each facet is compared with a profile result measured by AFM.

• 한국광학회:학술대회논문집
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• 한국광학회 2006년도 하계학술발표회 논문집
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• pp.39-40
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• 2006

Digital image-projection and several modifications are the classical applications of Digital Micromirror Devices (DMD), however further applications in the field of optical metrology are also available. Operated with certain patterns, a DMD can function, for instance, as an array of pinholes that may substitute the Galvanic mirror or the stage scanning system presently used for 2 dimensional scanning in confocal microscopes. The various process parameters that influence the result of measurement (e.g. pinhole size, lateral scanning pitch and the number of pinholes used simultaneously, etc.) should be configured precisely for individual measurements by appropriately operating the DMD. This paper presents suitable conditions for the diffraction limited analysis between DMD-optics-CCD to achieve the best performance. Also sampling theorem that is necessary for the image acquisition by scanning system is simulated with OPTISCAN which is the simulator based on the diffraction theory.

• Current Optics and Photonics
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• 제6권1호
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• pp.44-50
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• 2022

An off-axis zone plate is able to focus on a single order while neglecting the zeroth order in a visible imaging system. This allows one to enhance the contrast quality in diffractive images, which is the major advantage of this type of zone plate. However, most previous reflection zone plates are used in focusing X-rays with a small grazing incident angle and are intricately designed with the use of a local grating period. In this study, we suggest the design of an off-axis elliptical zone plate (EZP) that is used to focus a monochromatic light beam with separation between the first and unfocused orders under a large grazing incident angle of 45°. An assumption using the total grating period, which depends on the average and constant grating period, is proposed to calculate the desired distance between the first and zeroth order and to simplify the construction of a novel model off-center EZP. Four diffractive optical elements (DOEs) with different parameters were subsequently fabricated by direct laser lithography and then verified using a performance evaluation system to compare the results from the assumption with the experimental results.