• Title/Summary/Keyword: Optical Fabrication

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Fabrication and Characterization of $CuInSe_2$Thin Films from $In_2Se_3$ and$Cu_2Se$Precursors ($In_2Se_3$$Cu_2Se$를 이용한 $CuInSe_2$박막제조 및 특성분석)

  • Heo, Gyeong-Jae;Gwon, Se-Han;Song, Jin-Su;An, Byeong-Tae
    • Korean Journal of Materials Research
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    • v.5 no.8
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    • pp.988-996
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    • 1995
  • CuInSe$_2$this films as a light absorber layer were fabricated by vacuum evaporation using In$_2$Se$_3$and Cu$_2$Se precursors and their properties were analyzed. Indium selenide films of 0.5${\mu}{\textrm}{m}$ thickness were first deposited by vacuum evaporation of In$_2$Se$_3$ on a Corning 7059 glass substrate. The films deposited at suscepor temperature of 40$0^{\circ}C$ showed a flat surface morphology with densely Packed grain structure. CuInSe$_2$films directly formed by evaporating Cu$_2$Se on the predeposited In$_2$Se$_2$films also showed a very flat surface when the susceptor temperature was $700^{\circ}C$. Cu$_2$Se, a second phase in the CuInSe$_2$film, was removed by evaporating additional In$_2$Se$_3$on the CuInSe$_2$film at $700^{\circ}C$. The grain size of 1.2${\mu}{\textrm}{m}$ thick CuInSe$_2$, film was about 2${\mu}{\textrm}{m}$ and the film had a (112) preferred orientation. As the amount of deposited In$_2$Se$_3$increased, the electrical resistivity of CuInSe$_2$films increased because of the decrease of hole concentration. But the optical band gap was almost constant at the value of 1.04eV, The CuInSe$_2$film grown on a Mo/glass substrate had a similar smooth microstructure compared to that on a glass substrate. A solar cell with ZnO/CdS/CuInSe$_2$/Mo structure may be realized based on the above CuInSe$_2$films.

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A study of the antifungal properties and flexural strength of 3D printed denture base resin containing titanium dioxide nanoparticles (이산화티타늄 나노입자를 함유한 3D 프린팅 의치상 레진의 항진균성 및 굽힘 강도에 대한 연구)

  • Seok-Won Yoon;Young-Eun Cho
    • The Journal of Korean Academy of Prosthodontics
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    • v.62 no.2
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    • pp.95-103
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    • 2024
  • Purpose. With the advancement of digital technology, 3D printing is being utilized in the fabrication of denture base. Nevertheless, increasing microbial adhesion to the surface of denture base has been reported as the disadvantage of 3D-printed denture base. The purpose of this study is to investigate the antifungal properties and flexural strength of 3D-printed denture base resin according to the different contents of titanium dioxide nanoparticles. Materials and methods. Titanium dioxide nanoparticles were mixed with the 3D printing resin at the ratios of 0.5, 1, 1.5, and 2 wt%. Twenty specimens per each group were printed in the form of cylindrical shape (diameter: 20 mm, height: 3 mm) to evaluate antifungal properties. Ten specimens from each group underwent polishing using autogrinder, while the remaining ten specimens did not. Candida albicans in hyphae form was inoculated onto each specimen, optical density and colony-forming unit were analyzed. The surface of the specimen was observed using scanning electron microscopy. To evaluate the flexural strength, twenty specimens per each group were 3D printed in the form of rectangular prism shape (length: 64 mm, height: 10 mm, width: 3 mm) and three-point bending tests were conducted using universal testing machine according to ISO 20795-1. Results. Colony-forming unit of C.albicans and optical density of culture medium showed no difference between non-polished groups, but decreased in the polished groups at concentration of 1, 1.5, 2 wt% titanium dioxide nanoparticles. Flexural strength increased with titanium dioxide nanoparticle at concentration of 0.5, 1, 1.5 wt%, but decreased at 2 wt% compared to 1.5 wt%. Conclusion. When 1.5 wt% of titanium dioxide nanoparticles were added to the 3D-printed denture base resin with polishing, antifungal properties were increased.

The Fabrication and Characteristic for Narrow-band Pass Color-filter Deposited by Ti3O5/SiO2 Multilayer (Ti3O5/SiO2 다층박막를 이용한 협대역 칼라투과필터 제작 및 특성연구)

  • Park, Moon-Chan;Ko, Kyun-Chae;Lee, Wha-Ja
    • Journal of Korean Ophthalmic Optics Society
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    • v.16 no.4
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    • pp.357-362
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    • 2011
  • Purpose: The narrow-band pass color-filters with a 500 nm central wavelength and 12 nm FWHM using $Ti_3O_5/SiO_2$ mutilayer were fabricated, and their characteristics and structures were studied. Methods: the optical constants, n and k, of the $Ti_3O_5$ and $SiO_2$ thin films were obtained from the transmittances of their thin film. The narrow-band pass color-filters were designed with these optical constants and the AR coating of the filter was also designed. $Ti_3O_5/SiO_2$ multilayer filters were made by electron beam evaporation apparatus and the transmittaces of the filters were measured by spectrophotometer. the number of layers and the thicknesses of filters were calculated from the cross section of filters by SEM image and the composition of filters was analysed by XPS analysis. Results: The optimization of AR coating for the narrow-band pass color-filter was [air$|SiO_2(90)|Ti_3O_5(36)|SiO_2(5)|Ti_3O_5(73)|SiO_2(30)|Ti_3O_5(15)|$ glass], and the optimization of filter layer for the color filter was [air$|SiO_2(192)|Ti_3O_5(64)|SiO_2(102)|Ti_3O_5(66)|SiO_2(112)|Ti_3O_5(74)|SiO_2(120)|Ti_3O_5(68)|SiO_2(123)|Ti_3O_5(80)|SiO_2(109)|Ti_3O_5(70)|SiO_2(105)|Ti_3O_5(62)|SiO_2(99)|Ti_3O_5(63)|SiO_2(98)|Ti_3O_5(51)|SiO_2(60)|Ti_3O_5(42)|SiO_2(113)|Ti_3O_5(88)|SiO_2(116)|Ti_3O_5(68)|SiO_2(89)|Ti_3O_5(49)|SiO_2(77)|Ti_3O_5(48)|SiO_2(84)|Ti_3O_5(51)|SiO_2(85)|Ti_3O_5(48)|SiO_2(59)|Ti_3O_5(34)|SiO_2(71)|Ti_3O_5(44)|SiO_2(65)|Ti_3O_5(45)|SiO_2(81)|Ti_3O_5(52)|SiO_2(88)|$ glass]. It was known that the color-filters fabricated by the simulation data were composed of 41 layers by SEM image and the top layer of filters was $SiO_2$ layer and the filters were composed of $SiO_2$/$Ti_3O_5$ multilayer by XPS analysis. It was also known that the mixed thin film of TiO2 and $Ti_3O_5$ was made during the deposition of the $Ti_3O_5$ material. Conclusions: The narrow-band pass color-filters with a 500 nm central wavelength and 12 nm FWHM using $Ti_3O_5/SiO_2$ mutilayer of 41 layer were fabricated, and it was known that the mixed form of TiO2 and $Ti_3O_5$ thin film was made during the deposition of the $Ti_3O_5$ material.