• Title/Summary/Keyword: O-plasma treatment

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Characteristics of Plasma Electrolytic Oxidation Coatings on Mg-Zn-Y Alloys Prepared by Gas Atomization (가스 분사법으로 제조한 Mg-Zn-Y 합금의 플라즈마 전해 산화 피막 특성에 관한 연구)

  • Chang, Si-Young;Cho, Han-Gyoung;Lee, Du-Hyung;Kim, Taek-Soo
    • Journal of Powder Materials
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    • v.14 no.6
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    • pp.372-379
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    • 2007
  • The microstructure, mechanical and electrochemical properties of plasma electrolytic coatings (PEO) coatings on Mg-4.3 wt%Zn-1.0 wt%Y and Mg-1.0 wt%Zn-2.0 wt%Y alloys prepared by gas atomization, followed by compaction at 320 for 10 min under the pressure of 700 MPa and sintering at 380 and 420 respectively for 24 h, were investigated, which was compared with the cast Mg-1.0 wt%Zn alloy. All coatings consisting of MgO and $Mg_2SiO_4$ oxides showed porous and coarse surface features with some volcano top-like pores distributed disorderly and cracks between pores. In particular, the surface of coatings on Mg-1.0 wt%Zn-2.0 wt%Y alloy showed smaller area of pores and cracks compared to the Mg-4.3 wt%Zn-1.0 wt%Y and Mg-1.0 wt%Zn alloys. The cross section micro-hardness of coatings on the gas atomized Mg-Zn-Y alloys was higher than that on the cast Mg-1.0 wt%Zn alloy. Additionally, the coated Mg-1.0 wt%Zn-2.0 wt%Y alloy exhibited the best corrosion resistance in 3.5%NaCl solution. It could be concluded that the addition of Y has a beneficial effect on the formation of protective and hard coatings on Mg alloys by plasma electrolytic oxidation treatment.

Preparation of the SiO2 Films with Low-Dit by Low Temperature Oxidation Process (저온 산화공정에 의해 낮은 Dit를 갖는 실리콘 산화막의 제조)

  • Jeon, Bup-Ju;Jung, Il-Hyun
    • Applied Chemistry for Engineering
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    • v.9 no.7
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    • pp.990-997
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    • 1998
  • In this work, the $SiO_2$ films on the silicon substrate with different orientations were first prepared by the low temperature process using the ECR plasma diffusion as a function of microwave power and oxidation time. Before and after thermal treatment, the surface morphology, Si/O ratio from physicochemical properties, and the electrical properties of the oxide films were also investigated. The oxidation rate increased with microwave power, while surface morphology showed the nonuniform due to etching. The film quality, therefore, was lowered with increasing the defect by etching and the content of positive oxide ions in the oxide films from bulk by higher self-DC bias. The content of positive oxide ions in the oxide films with different Si orientations showed Si(100) < Si(111) < poly Si. The defects in $Si/SiO_2$ interface of $SiO_2$ film could be decreased by annealing, while $Q_{it}$ and $Q_f$ were independent of thermal treatment and the dependent on concentration of reactive oxide ions and self-DC bias of substrate. At microwave power of 300, and 400 W, the high quality $SiO_2$ film that had lower surface roughness and defect in $Si/SiO_2$ interface was obtained. The value of interface trap density, then, was ${\sim}9{\times}10^{10}cm^{-2}eV^{-1}$.

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Cytotoxicity and DNA Damage Induced by Magnetic Nanoparticle Silica in L5178Y Cell

  • Kang, Jin-Seok;Yum, Young-Na;Park, Sue-Nie
    • Biomolecules & Therapeutics
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    • v.19 no.2
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    • pp.261-266
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    • 2011
  • As recent reports suggest that nanoparticles may penetrate into cell membrane and effect DNA condition, it is necessary to assay possible cytotoxic and genotoxic risk. Three different sizes of magnetic nanoparticle silica (MNP@$SiO_2$) (50, 100 and 200 nm diameter) were tested for cytotoxicity and DNA damage using L5178Y cell. MNP@$SiO_2$ had constant physicochemical characteristics confirmed by transmission electron microscope, electron spin resonance spectrometer and inductively coupled plasma-atomic emission spectrometer for 48 h. Treatment of MNP@$SiO_2$ induced dose and time dependent cytotoxicity. At 6 h, 50, 100 or 200 nm MNP@$SiO_2$ decreased significantly cell viability over the concentration of 125 ${\mu}g/ml$ compared to vehicle control (p<0.05 or p<0.01). Moreover, at 24 h, 50 or 100 nm MNP@$SiO_2$ decreased significantly cell viability over the concentration of 125 ${\mu}g/ml$(p<0.01). And treatment of 200 nm MNP@$SiO_2$ decreased significantly cell viability at the concentration of 62.5 ${\mu}g/ml$ (p<0.05) and of 125, 250, 500 ${\mu}g/ml$ (p<0.01, respectively). Furthermore, at 48 h, 50, 100 or 200 nm MNP@$SiO_2$ decreased significantly cell viability at the concentration of 62.5 ${\mu}g/ml$ (p<0.05) and of 125, 250, 500 ${\mu}g/ml$ (p<0.01, respectively). Cellular location detected by confocal microscope represented they were existed in cytoplasm, mainly around cell membrane at 2 h after treatment of MNP@$SiO_2$. Treatment of 50 nm MNP@$SiO_2$ significantly increased DNA damage at middle and high dose (p<0.01), and treatment of 100 nm or 200 nm significantly increased DNA damage in all dose compared to control (p<0.01). Taken together, treatment of MNP@$SiO_2$ induced cytotoxicity and enhanced DNA damage in L5178Y cell.

A Study of Surface Modification of TiO2 Semiconductor Electrode by Various Overlayers Coating in Dye Sensitized Solar Cells(DSSC) (염료감응형 태양전지에서 $TiO_2$ 반도체전극 표면의 다양한 overlayer 코팅에 따른 특성연구)

  • Kim, Jun-Tak;Kim, Sang-Ho
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.100-100
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    • 2009
  • $TiO_2$ is widely being used as a semiconductor electrode for DSSC. Anti-recombination property and surface area of $TiO_2$ give an important influence to the DSSC efficiency. In this study, $TiO_2$ electrode was fabricated on FTO using screen printing method. Various overlayers were coated on them by dip coating in solution of saturated $Ba(NO_3)_2$, $Mg(NO_3)_2$ and $N_{2}O_{6}Sr$. They reduced the recombination of electrons from photo excited state of Ru dye. The atmospheric plasma treatment was applied to both the $TiO_2$ and each overlayer coated $TiO_2$ surfaces to improve contact ability with dye. We prepared four samples, one sample has bare $TiO_2$ surfaces to improve contact ability with dye. We prepared four samples, one sample has bare $TiO_2$ electrode and the other samples consist of each overlayer coated $TiO_2$ electrodes. We used XRD, FE-SEM, J-V, IPCE and EIS in order to investigate characteristic.

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The Synergistic Effect of Nitrogen and Ni2O3 over TiO2 Photocatalyst in the Degradation of 2,4,6-Trichlorophenol Under Visible Light

  • Hu, Shaozheng;Li, Fayun;Fan, Zhiping
    • Bulletin of the Korean Chemical Society
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    • v.33 no.12
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    • pp.4052-4058
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    • 2012
  • The composite photocatalyst, N-$TiO_2$ loaded with $Ni_2O_3$, was prepared by $N_2$ plasma treatment. X-ray diffraction, X-ray fluorescence, $N_2$ adsorption, UV-vis spectroscopy, photoluminescence, and X-ray photoelectron spectroscopy were used to characterize the prepared $TiO_2$ samples. The results indicated that the band gap energy was decreased obviously by nitrogen doping, whereas loading of $Ni_2O_3$ did not influence the band gap and visible light absorption. The photocatalytic activities were tested in the degradation of 2,4,6-trichlorophenol (TCP) under visible light. The photocatalytic activity and stability of composite photocatalyst were much higher than that of catalyst modified with nitrogen or $Ni_2O_3$ alone. The synergistic effect of doping nitrogen and $Ni_2O_3$ over $TiO_2$ was investigated.

Influence of the Duty Cycle on the Characteristics of Al2O3 Coatings Formed on the Al-1050 by Plasma Electrolytic Oxidation (Al-1050 위에 플라즈마 전해 산화법으로 형성된 Al2O3 피막 특성에 미치는 듀티사이클의 영향)

  • Nam, Kyung-Su;Moon, Jung-In;Kongsy, Phimmavong;Song, Jeong-Hwan;Lim, Dae-Young
    • Journal of the Korean Ceramic Society
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    • v.50 no.2
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    • pp.108-115
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    • 2013
  • Oxide coatings were prepared on Al-1050 substrates by an environment-friendly plasma electrolytic oxidation (PEO) process using an electrolytic solution of $Na_2SiO_3$ (8 g/L) and NaOH (3 g/L). The effects of three different duty cycles (20%, 40%, and 60%) and frequencies (50 Hz, 200 Hz, and 800 Hz) on the structure and micro-hardness of the oxide coatings were investigated. XRD analysis revealed that the oxides were mainly composed of ${\alpha}-Al_2O_3$, ${\gamma}-Al_2O_3$, and mullite. The proportion of each crystalline phase depended on various electrical parameters, such as duty cycle and frequency. SEM images indicated that the oxide coatings formed at a 60% duty cycle exhibited relatively coarser surfaces with larger pore sizes and sintering particles. However, the oxides prepared at a 20% duty cycle showed relatively smooth surfaces. The PEO treatment also resulted in a strong adhesion between the oxide coating and the substrate. The oxide coatings were found to improve the micro-hardness with the increase of duty cycle. The structural and physical properties of the oxide coatings were affected by the duty cycles.

Electrical and Optical Characteristics of Plasma Display Panel Fabricated by Vacuum In-line Sealing (진공 인라인 실장에 의해 제작된 플라즈마 디스플레이 패널의 전기적ㆍ광학적 특성)

  • Park, Sung-Hyun;Lee, Neung-Hun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.4
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    • pp.344-349
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    • 2005
  • The optical and electrical characteristics of plasma display panel(PDP) using the vacuum in-line sealing technology compared with the conventional sealing process in this research. This PDP consisted of MgO protecting layer by e-beam evaporation and battier rib, transparent dielectric layer, dielectric layer, and electrodes by screen printer and then sealed off on Ne-Xe(4 %) 400 Torr and 430。C. The brightness and luminous efficiency were good as the base vacuum level was higher, and it was to check the advantage of high vacuum level sealing, one of the strong points of the vacuum in-line sealing process. However, the brightness and luminous efficiency was dropped sharply because of a crack on MgO protecting layer by the difference of the expansion and contraction stress on high temperature in the vacuum states between MgO and substrate. Fortunately, the crack was prevented by MgO was deposited on higher temperature than 300。C. Finally, the PDP, was fabricated by the vacuum in-line sealing process, resulted the lower brightness than processing only the thermal annealing treatment in the vacuum chamber, but the luminous efficiency was increased by the reducing power consumption with the decreasing luminous current. The vacuum in-line sealing technology was not to need the additional thermal annealing process and could reduce the fabrication process and bring the excellent optical and electrical properties without the crack of MgO protecting layer than the conventional sealing process.

Sterilization of Food-Borne Pathogenic Bacteria by Atmospheric Pressure Dielectric Barrier Discharge Plasma (대기압 유전체장벽방전 플라즈마에 의한 식품유해 미생물 살균)

  • Lee, Seung Je;Song, Yoon Seok;Park, Yu Ri;Ryu, Seung Min;Jeon, Hyeong Won;Eom, Sang Heum
    • Journal of Food Hygiene and Safety
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    • v.32 no.3
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    • pp.222-227
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    • 2017
  • This study aimed to explore the potential for food-industry application of atmospheric pressure dielectric barrier discharge plasma (atmospheric pressure DBD plasma) as a non-thermal sterilization technology for microorganism. The effects of the key parameters such as power, oxygen ratio, exposure time and distance on Escherichia coli KCCM 21052 sterilization by the atmospheric pressure DBD plasma treatment were investigated. The experimental results revealed that increasing the power, exposure time or oxygen ratio and decreasing the exposure distance led to an improvement in the sterilization efficiency of E. coli. Furthermore, the atmospheric pressure DBD plasma (1.0 kW power, 1.0% (v/v) $O_2$, 5 min exposure time and 20 mm exposure distance) treatment was very effective for the sterilization of food-borne pathogenic bacteria. The sterilization rate of E. coli, Bacillus cereus KCCM 40935, Bacillus subtilis KCCM 12027, Bacillus thuringiensis KCCM 11429 and Bacillus atrophaeus KCCM 11314 were 72.3%, 74.6%, 88.5%, 84.7% and 91.3%, respectively.

POLYMER SURFACE MODIFICATION WITH PLASMA SOURCE ION IMPLANTATION TECHNIQUE

  • Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;Kim, Hai-Dong;Kim, Gon-ho;Kim, GunWoo
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.345-349
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    • 1996
  • The wetting property of polymer surfaces is very important for practical applications. Plasma source ion implantation technique was used to improve the wetting properties of polymer surfaces. Poly(ethylene terephtalate) and other polymer sheets were mounted on the target stage and an RF plasma was generated by means of an antenna located inside the vacuum chamber. High voltage pulses of up to -10kV, 10 $\mu$sec, and up to 1 kHz were applied to the stage. The samples were implanted for 5 minutes with using Ar, $N_2,O_2,CH_4,CF_4$ and their mixture as source gases. A contact angle meter was used to measure the water contact angles of the implanted samples and of the samples stored in ambient conditions after implantation. The modified surfaces were analysed with Time-Of-Flight Mass Spectrometer (TOF-SIMS) and Auger Electron Spectroscopy (AES). The oxygen-implanted samples showed extremely low water contact angles of $3^{\circ}C$ compared to $79^{\circ}C$ of unimplanted ones. Furthermore, the modified surfaces were relatively stable with respect to aging in ambient conditions, which is one of the major concerns of the other surface treatment techniques. From TOF-SIMS analysis it was found that oxygen-containing functional groups had been formed on the implanted surfaces. On the other hand, the $CF_4$-implanted samples turned out to be more hydro-phobic than unimplanted ones, giving water contact angles exceeding $100^{\circ}C$ . The experiment showed that plasma source ion implantation is a very promising technique for polymer surface modification especially for large area treatment.

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Performance Study on Odor Reduction of Indole/Skatole by Composite

  • Young-Do Kim
    • Journal of Wellbeing Management and Applied Psychology
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    • v.7 no.3
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    • pp.67-72
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    • 2024
  • This study developed a dry composite module-type deodorization facility with Twisting airflow changes and two forms (catalyst, adsorbent) within one module. Experiments were conducted to evaluate the reduction efficiency of odor substances C8H7N and C9H9N. The device combines UV oxidation using TiO2, catalytic oxidation using MnO2, and adsorption using A/C in five different methods. Data analysis of experimental results utilized the statistical package program Python 3.12. The program applied frequency analysis of odor removal efficiency, one-way ANOVA, and post-hoc tests, with statistical significance determined by p-value to ensure reliability and validity of the measurements. Results indicated that the highest removal efficiency of C8H7N and C9H9N was achieved by the UV+A/C method, suggesting the superior effectiveness and efficiency of the developed device. Combining multiple processes and technologies within one module enhanced odor treatment efficiency compared to using a single method. The device's modularity allows for flexibility in adapting to various sewage treatment scenarios, offering easy maintenance and cost-effective deodorization. This composite reaction module device can apply multiple technologies, such as biofilters, plasma, activated carbon filters, UV-photocatalysis, and electromagnetic-chemical systems. However, this study focused on UV-photocatalysis, catalysts, and activated carbon filters. Ultimately, the research demonstrates the practical applicability of this innovative device in real sewage treatment operations, showing excellent reduction efficiency and effectiveness by integrating UV oxidation, TiO2 photocatalysis, MnO2 catalytic oxidation, and A/C adsorption within a modular system.