• Korean Journal of Food Science and Technology
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• v.52 no.5
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• pp.560-563
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• 2020

Cold plasma has been applied to improve quality of food product; however, studies on its effects on microbial and physicochemical qualities of rice noodles are rarely conducted. In this study, changes in the quality characteristics of rice noodles treated by cold plasma were determined. Cold plasma was generated in a square-shaped plastic container (250 W, 15 kHz, ambient air), and dielectric barrier discharge plasma treatments were applied to rice noodle samples for 0, 10, or 20 min. Rice noodles inoculated with either Bacillus cereus or Escherichia coli O157:H7 were subjected to plasma treatment for 20 min, and the approximate bacterial count reduction were 4.10 and 2.75 log CFU/g, respectively. The Hunter color values of the sample were increased after cold plasma treatment. Peroxide values and thiobarbituric acid reactive substance (TBARS) were increased with an increase in cold plasma treatment time. Futhermore, lipid oxidation was enhanced. Although further studies are warranted to evaluate changes in chemical qualities, such as lipid oxidation of rice noodles, induced by cold plasma, the results suggest that cold plasma can improve the microbial and physical qualities of rice noodles.

• Corrosion Science and Technology
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• v.5 no.2
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• pp.77-83
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• 2006

The plasma electrolytic oxidation (PEO) process is a relatively new surface treatment technique that produces a chemically stable and environment-friendly electrolytic coating that can be applied to all types of magnesium alloys. In this study, the characteristics of oxide film were examined after coating the extruded AZ31 alloy through the PEO process. Hard ceramic coatings were obtained on the AZ31 alloy by changing the coating time from 10min to 60min. The morphologies of the surface and the cross-section of the PEO coatings were examined by scanning electron microscopy and optical microscopy, and the thickness of the coating was measured. The X-ray diffraction pattern of the coating shows that the coated layer consists mainly of the MgO and $Mg_2SiO_4$ phases after the oxidation reaction. The hardness of the coated AZ31 alloy increased with increasing coating time. In addition, the corrosion rates of the coated and uncoated AZ31 alloys were examined by salt spray tests according to ASTM B 117 and the results show that the corrosion resistance of the coated AZ31 alloy was superior to that of the un-coated AZ31 alloy.

• Journal of Powder Materials
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• v.12 no.5 s.52
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• pp.345-350
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• 2005

In this study the nanostructured ${\alpha}-Al_{2}O_3$ ceramics have been fabricated by the combined application of magnetic pulsed compaction (MPC) and subsequent spark plasma sintering (SPS), and their density and hardness properties were investigated. The ${\alpha}-Al_{2}O_3$ prepared by the combined processes showed an increase by $8.4\%$ in density, approaching the value close to the true density, and an enhancement by $210\~400\;Hv$ in hardness, compared to those fabricated by MPC or static compaction method followed by sintering treatment.

• Journal of the Korean institute of surface engineering
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• v.55 no.3
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• pp.143-155
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• 2022

Ceramic oxide layers successfully were formed on the surface of cast Al alloys with high Si contents using plasma electrolytic oxidation (PEO) process in electrolytes containing Na₂SiO₃, NaOH, and additives. The microstructure of the oxide layers was systematically analyzed using scanning electron microscopy (SEM), cross-sectional transmission electron microscopy (TEM), X-ray diffraction patterns (XRD), and energy X-ray dispersive spectroscopy (EDS). XRD analysis indicated that the PEO untreated high-silicon Al alloys (i.e., 17.1 and 11.7 wt.% Si) consist of Al, Si and Al₂Cu phases whereas Al₂Cu phase selectively disappeared after PEO treatment. PEO process yielded an amorphous oxide layer with few second phases including γ-Al₂O₃ and Fe-rich phases. The corrosion behaviors of high-silicon Al alloys treated by PEO process were investigated using electrochemical impedance spectroscopy (EIS) and other electrochemical techniques (i.e., open circuit potential and polarization curve). Electroanalytical studies indicated that high-silicon Al alloys treated by PEO process have greater corrosion resistance than high-silicon alloys untreated by PEO process.

• Journal of the Korean Ceramic Society
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• v.45 no.1
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• pp.60-64
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• 2008

[ $B_4C$ ] ceramics were fabricated by spark plasma sintering process and their sintering behavior, microstructure and mechanical properties were evaluated. Relative density of $B_4C$ ceramics could be achieved by spark plasma sintering method reached as high as 99% at lower temperature than conventional sintering method, in addition, without any sintering additives. The mechanical properties of $B_4C$ ceramics could be improved by the heat treatment at $1300^{\circ}C$ during sintering process which can be removed $B_2O_3$ phase from a $B_4C$ powder surface. This improvement results from the formation of a fine and homogeneous microstructure because the grain coarsening was suppressed by the elimination of $B_2O_3$ phase. Particularly, mechanical properties of the specimen experienced the $B_2O_3$ removing process improved over 30% compared with the specimen without that process.

• Applied Science and Convergence Technology
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• v.26 no.2
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• pp.21-25
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• 2017

The shape of the reflection spectrum is complex and appears to overlap with several signals, because the surface state is uneven due to the natural oxide film, so that the spectrum becomes a complicated signal shape divided into regions 1 and 2 due to diffuse reflection. On the other hand, it is seen that the reflection spectrum after PEO surface treatment is overlapped with several signals. In addition, the reflectance of the energy band varies from 1.32 to 1.46 eV. Usually, the MgO-type oxide film was observed at an energy band of ~4.2 eV. The thickness of the oxide film was increased as the DC voltage was increased by the thin film thickness meter (QuaNix; 7500M) after Plasma Electrolytic Oxidation (; PEO) surface treatment. This is because the higher the DC voltage, the easier the binding of the $OH^-$ ions in the solution solution and the $Mg^+$ ions of the magnesium alloy. An important part of the bonding of ordinary ions is the energy source (plasma) which can promote bonding. However, when a certain threshold voltage or more is applied, the material is adversely affected. The oxide film of the surface may be destroyed without increasing the thickness of the oxide film, that is, whitening of the material may occur.

• Korean Journal of Materials Research
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• v.13 no.3
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• pp.174-179
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• 2003

Thin copper films were grown by electrodeposition on copper seed layers which were grown by sputtering of an ultra-pure copper target on tantalum nitride-coated silicon wafers and subsequently, cleaned in ECR plasma. The copper films were then subjected to ⅰ) vacuum annealing, ⅱ) rapid thermal annealing (RTA) and ⅲ) rapid thermal nitriding (RTN) at various temperatures over different periods of time. XRD, SEM, AFM and resistivity measurements were done to ascertain the optimum heat treatment condition for obtaining film with minimum resistivity, predominantly (111)-oriented and smoother surface morphology. The as-deposited film has a resistivity of ∼6.3 $\mu$$\Omega$-cm and a relatively small intensity ratio of (111) and (200) peaks. With heat treatment, the resistivity decreases and the (111) peak becomes dominant, along with improved smoothness of the copper film. The optimum condition (with a resistivity of 1.98 $\mu$$\Omega$-cm) is suggested as the rapid thermal nitriding at 400oC for 120 sec.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.1
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• pp.23-30
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• 1993

Hydrogenation on the top gate and bottom gate Poly-Si TET's was performed by using Nh$_{3}$ plasma and annealing SiN film deposited by PECVD and then the electric characteristics on Poly-Si TET were investigated. As the time of NA$_{3}$ plasma treatment increaes, on/off current ratio gradually increases and the swing value decreases. The trap densities of graim boundaries in Poly-Si decrease very much during the inital 20min of hydrogenation time, and the decreasing scale becomes smaller after 20 min. The electric characteristics of the top gate TFT are better than those of the bottom gate TFT, it is considered due to the defects at the interface between the Poly-Si and the underlayer, SiO$_{2}$. After NH$_{3}$ plasma was treated for 2 hours for the top gate TFT, as the aging time atroon temperature increases on current was not scacely changed and off current decreases more than 1 order. Gate current density recovers to original value after the aging treatment for 8 days and then the electric characteristics are finally improved. It is suggested that the degraded characteristics of gate oxide are improved, from the variations of C-V characteristics with aging time. For the hydrogenation of isothermal and isochronal annealing SiN film deposited by PECVD, the characteristics of Poly-Si TFT are improved with increasing annealing temperature and are not largely changed with increasing annealing time. This results is good in agreement with the hydrogen reduction in Sin film as variations of annealing temperature and time.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.582-582
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• 2013

Oxide TFT (thin film transistor) active channel layer에 대한 저온 열처리 공정은 투명하고 flexibility을 기반으로하는 display 산업과 AMOLED (active matrix organic light emitting diode) 분야 등 다양한 분야에서 필요로 하는 기술로서 많은 연구가 이루어지고 있다. 과거 active layer는 ALD (atomic layer deposition), CVD (chemical vapor deposition), pulse laser deposition, radio frequency-dc (RF-dc) magnetron sputtering 등과 같은 고가의 진공 장비를 이용하여 증착 되어져 왔으나 현재에는 진공 장비 없이 spin-coating 후 열처리 하는 저가의 공정이 주로 연구되어 지고 있다. Flexible 기판들은 일반적인 OTFT (oxide thin films Transistor)에 적용되는 열처리 온도로 공정 진행시 열에 의한 기판의 손상이 발생한다. Flexible substrate의 열에 의한 기판 손상을 막기 위해 저온 열처리 공정이 연구되고 있지만 기존 열처리와 비교하여 소자의 특성 저하가 동반 되었다. 본 연구에서는 Si 기판위에 SiO2 (100)를 절연층으로 증착하고 그 위에 IZO (indium zinc oxide) solution을 spin-coating 한뒤 $250^{\circ}C$ 이하의 온도에서 열처리하였다. 저온 공정으로 인하여 소자의 특성 저하가 동반 되었으므로 소자의 저하된 특성 복원하고자 post-treatment로 고가의 진공장비가 필요 없고 roll-to roll system 적용이 수월한 remote-type의 APP (atmospheric pressure plasma) 처리를 하였다. Post-treatment로 APP를 이용하여 $250^{\circ}C$ 이하에서 소자에 적용 가능한 on/off ratio를 얻을 수 있었다.

• Journal of the Korean Society of Combustion
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• v.5 no.2
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• pp.37-50
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• 2000

In the present study, a systematic chemical kinetic calculations were made to investigate the augmentation of $NO-NO_2$ conversion due to the addition of various hydrocarbons (methane, ethylene, ethane, propylene, propane) in the nonthermal plasma treatment. It is included in the present conclusion that the reaction between hydrocarbon and oxygen radicals induced by electron collision, is believed to be a primarily process for triggering the overall NO oxidation and the eventual NOx reduction. Upon the completion of the initiating step, various radicals (OH, $HO_2$ etc.) successively are produced by hydrocarbon decomposition form the primary path of $NO-NO_2$ conversion. When the initiating step is not activated, hydrocarbon consumption rate appeared to be very low, thereby the targeted level of NO conversion can only be achieved by the addition of more input energy. Present study showed ethylene and propylene to have higher affinity with O radical under all conditions, thereby both of these hydrocarbons show very fast and efficient $NO-NO_2$ oxidation. It was also shown that propylene is superior to ethylene in the aspect of NOx removal.