• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.85-85
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• 2017

ISO (International Organization for Standardization) is an independent, non-governmental international organization with a membership of 163 national standards bodies (NSB). The ISO standards are developed and processed within the technical committees (TC) or their subcommittees (SC) dealing with the different subject matters. The first technical committee, ISO/TC1, deals with screw threads and was created back in 1947. While, more recently, TC 309 was created to standardize organizational governance. The ISO technical committee in the field of metallic coatings was created in 1962 with the title ISO/TC107- Metallic and other inorganic coatings. This ISO/TC107 technical committee is dealing with the standardization of the characteristics of protective and decorative metallic coatings applied by electrolysis, fusion, vacuum or chemical means, mechanical deposition and ion plating. similarly, it also covers the standardization of the characteristics of protective and decorative non-metallic coatings (excluding paints and other organic coatings) on metal surface applied by electrolysis, fusion, vacuum or chemical means. Scope is further extended to the Standardization of the preparation of the substrates prior to the deposition of metallic and inorganic coatings. There are a total of 144 existing ISO standards published by this technical committee and has 19 participating countries (P-members) and 24 observing countries (O-members). Korean Agency for Technology and Standards (KATS), being the secretariat of ISO/TC107, is constantly supporting this technical committee for the development of standards and related activities.

• 한국진공학회지
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• 제14권3호
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• pp.115-118
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• 2005

모델 고분자 미셀(서로 결합하거나, 결합하지 않는 두 경우)의 구조를 분석하기 위해 중성자 소각 산란(small angle neutron scattering)법을 이용하였다. 소수성 결합체의 응집수와 농도의 증가에 따른 정렬상태의 변화를 폴리에틸렌글라이콜(PEG, 6 K나 10 K고몰 분자량) 끝에 불화알킬그룹(pefluoroalkyl groups $(-(CH_2)_2C_OnF_{2n+1}$, (n = 6, 8,혹은 10)이 붙은 고분자용액을 이용하여 분석하였다. 결합체의 응집수는 소수성 말단기의 길이에 의해서만 주로 결정이 되고, 고분자의 농도나 온도에 의해 영향을 받지 않는다. 또한, 서로 결합하는 고분자 미셀과, 서로 결합하지 않는 고분자 미셀간에도 결합수에는 차이가 없다. 이러한 모델계는 농도가 증가함에 따라서 체심 입방구조로 정렬된다.

• Applied Science and Convergence Technology
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• 제24권2호
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• pp.33-40
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• 2015

$ZrO_2$ and Al-Zr composite oxide film was prepared by vacuum assisted sol-gel dip coating method and anodizing. $ZrO_2$ films annealed above $400^{\circ}C$ have tetragonal structure. $ZrO_2$ layers inside etch pits were successfully coated from the $ZrO_2$ sol. The double layer structures of samples were obtained after being anodized at 100 V to 600 V. From the TEM images, it was found that the outer layer was $Al_2O_3$, the inner layer was multi-layer of $ZrO_2$, Al-Zr composite oxide and Al hydrate. The capacitance of $ZrO_2$ coated foil exhibited about 28.3% higher than that of non-coating foil after being anodized at 100 V. The high capacitance of $ZrO_2$ coated foils anodized at 100 V can be attributed to the relatively high percentage of inner layer in total thickness. The electrical properties, such as withstanding voltage and leakage current of coated and non-coated Al foils showed similar values. From the results, $ZrO_2$ and Al-Zr composite oxide is promising to be used as the partial dielectric of high voltage capacitor to increase the capacitance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.196-197
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• 2010

NAND형 charge trap flash (CTF) non-volatile memory (NVM) 소자가 30nm node 이하로 고집적화 되면서, 기존의 SONOS형 CTF NVM의 tunnel barrier로 쓰이는 SiO2는 direct tunneling과 stress induced leakage current (SILC)등의 효과로 인해 data retention의 감소 등 물리적인 한계에 이르렀다. 이에 따라 개선된 retention과 빠른 쓰기/지우기 속도를 만족시키기 위해서 tunnel barrier engineering (TBE)가 제안되었다. TBE NVM은 tunnel layer의 전위장벽을 엔지니어드함으로써 낮은 전압에서 전계의 민감도를 향상 시켜 동일한 두께의 단일 SiO2 터널베리어 보다 빠른 쓰기/지우기 속도를 확보할 수 있다. 또한 최근에 각광받는 high-k 물질을 TBE NVM에 적용시키는 연구가 활발히 진행 중이다. 본 연구에서는 Si3N4와 HfAlO (HfO2 : Al2O3 = 1:3)을 적층시켜 staggered의 새로운 구조의 tunnel barrier Capacitor를 제작하여 전기적 특성을 후속 열처리 온도와 방법에 따라 평가하였다. 실험은 n-type Si (100) wafer를 RCA 클리닝 실시한 후 Low pressure chemical vapor deposition (LPCVD)를 이용하여 Si3N4 3 nm 증착 후, Atomic layer deposition (ALD)를 이용하여 HfAlO를 3 nm 증착하였다. 게이트 전극은 e-beam evaporation을 이용하여 Al를 150 nm 증착하였다. 후속 열처리는 수소가 2% 함유된 질소 분위기에서 $300^{\circ}C$와 $450^{\circ}C$에서 Forming gas annealing (FGA) 실시하였고 질소 분위기에서 $600^{\circ}C{\sim}1000^{\circ}C$까지 Rapid thermal annealing (RTA)을 각각 실시하였다. 전기적 특성 분석은 후속 열처리 공정의 온도와 열처리 방법에 따라 Current-voltage와 Capacitance-voltage 특성을 조사하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.509-509
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• 2011

Superhydrophobic surfaces on alloyed steels were fabricated with a non-conventional method of plasma etching and subsequent water immersion procedure. High aspect ratio nanopatterns of nanoflake or nano-needle were created on the steels with various Cr content in its composition. With CF4 plasma treatment in radio-frequence chemical vapor deposition (r.-f. CVD) method, steel surfaces were etched and fluorinated by CF4 plasma, which induced the nanopattern evolution through the water immersion process. It was found that fluorine ion played a role as a catalyst to form nanopatterns in water elucidated with XPS and TEM analysis. The hierarchical patterns in micro- and nano scale leads to superhydrophobic properties on the surfaces by deposition of a hydrophobic coating with a-C:H:Si:O film deposited with a gas precursor of hexamethlydisiloxane (HMDSO) with its lower surface energy of 24.2 mN/m, similar to that of curticular wax covering lotus surfaces. Since this method is based on plasma dry etching & coating, precise patterning of surface texturing would be potential on steel or metal surfaces. Patterned hydrophobic steel surfaces were demonstrated by mimicking the Robinia pseudoacacia or acacia leaf, on which water was collected from the humid air using a patterned hydrophobicity on the steels. It is expected that this facile, non-toxic and fast technique would accelerate the large-scale production of superhydrophobic engineering materials with industrial applications.

• 한국재료학회지
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• 제18권6호
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• pp.294-297
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• 2008

In this paper, a novel non-vacuum technique is described for the fabrication of a $CuInSe_2$ (CIS) absorber layer for thin film solar cells using a low-cost precursor solution. A solution containing Cu- and Inrelated chemicals was coated onto a Mo/glass substrate using the Doctor blade method and the precursor layer was then selenized in an evaporation chamber. The precursor layer was found to be composed of CuCl crystals and amorphous In compound, which were completely converted to chalcopyrite CIS phase by the selenization process. Morphological, crystallographic and compositional analyses were performed at each step of the fabrication process by SEM, XRD and EDS, respectively.

• 한국재료학회지
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• 제15권8호
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• pp.496-502
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• 2005

Green-light emitting $BaMgAl_{10}O_{19}:Mn^{2+}$ (BAM:Mn) phosphor particles were prepared by spray Pyrolysis. The effect of reactor temperature and flow rate of carrier gas in the spray Pyrolysis on the morphology, crystallinity and photoluminescence characteristics under vacuum ultraviolet were investigated. The morphology of the as-Prepared Particles obtained by spray Pyrolysis had spherical shape and non-aggregation characteristics regardless of the reactor temperature. The spherical shape of the as-prepared Particles obtained by spray pyrolysis at low temperature disappeared after Post-treatment. On the other hand the as-Prepared Particles obtained by spray Pyrolysis at $1600^{\circ}C$ maintained spherical shape and non-aggregation characteristics after post-treatment at $1400^{\circ}C$ for 3 h under reducing atmosphere. The BAM:Mn Phosphor Particles Prepared by spray Pyrolysis at different reactor temperatures had pure crystal structure and high photoluminescence intensities under vacuum ultraviolet after post-treatment. BAM:Mn phosphor particles prepared by spray Pyrolysis at low How rate of carrier gas had complete spherical shape and filed morphology and high photoluminescence intensity after post-treatment under reducing atmosphere.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.512-513
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• 2013

Space and time resolved discharge images from an atmospheric pressure non-thermal Ar plasma jet have been observed by a ICCD camera to investigate the electron temperatures. Plasma jet device consisting of a syringe electrode inserted into a glass tube has been introduced. A high voltage is applied to the syringe electrode. The syringe needle has an outer diameter of 1.8 mm, an inner diameter of 1.3 mm, and a total length of 39.0 mm. The needle is inserted into a glass tube of outer diameter 2.4 mm and inner diameter 2.0 mm, and a total length of 80.0 mm. The Ar plasma propagation speed on the cathode has been shown to be about 2.1 km/s at input discharge voltage of 3.6 kV, discharge current of 19.9 mA and driving frequency of about 45 kHz. Particularly, the electron temperature in plasma jet were found to be about 1.8 eV at input discharge voltage of 3.6 kV and driving frequency of 45 kHz, respectively.

• 반도체디스플레이기술학회지
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• 제14권3호
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• pp.61-66
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• 2015

Recently, the major trends of NIL are high throughput and large area patterning. For UV NIL, if it can be proceeded in the non-vacuum environment, which greatly simplifies tool construction and greatly shorten process times. However, one key issue in non-vacuum environment is air bubble formation problem. In this paper, numerical analysis of bubble defect of UV NIL is performed. Fluent, flow analysis focused program was utilized and VOF (Volume of Fluid) skill was applied. For various resist-substrate and resist-mold angles, effects of velocity inlet and residual layer thickness of resist on bubble defect formation were investigated. The numerical analyses show that the increases of velocity inlet and residual layer thickness can cause the bubble defect formation, however the decreases of velocity inlet and residual layer thickness take no difference in the bubble defect formation.

• 한국진공학회지
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• 제17권6호
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• pp.501-510
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• 2008

비행체를 레이더의 시야에 들어나지 않도록 하기 위한 은신 (stealth) 기술은 일반적으로 비행체 표면에 특수도료를 도포하는 방식을 사용하여 실현하고 있지만 요즈음 플라즈마의 전자기파 흡수 능력을 이용하려는 연구가 활발히 진행되고 있다. 대기압 플라즈마가 은신기술에 응용될 수 있는가 우선 물리적인 타당성을 알아보기 위해 이 논문에서는 대기층에서 비행하는 비행체 표면을 어떤 정도의 플라즈마로 얼마나 덮어야 원하는 은신 기능을 나타낼 수 있는지 판단할 수 있도록 비 자장, 비 균일, 평판 플라즈마 모델을 사용하여 계산한 결과를 제시하고 논의한다.