• Title/Summary/Keyword: Non-uniform Exposure

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Comparative Study of Coupling Factors for Assessment of Low-Frequency Magnetic Field Exposure

  • Shim, Jae-Hoon;Choi, Min-Soo;Jung, Kyu-Jin;Kwon, Jong-Hwa;Byun, Jin-Kyu
    • Journal of Magnetics
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    • v.21 no.4
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    • pp.516-523
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    • 2016
  • In this paper, coupling factors are calculated based on numerical analysis in order to assess various non-uniform low-frequency magnetic field exposure situations. Two types of non-uniform magnetic field sources are considered; circular coil and parallel wires with balanced currents. For each magnetic field source, source current values are determined so that reference magnetic field magnitude can be measured at the specified point on the human model. Various exposure situations are investigated by changing parameters such as the distance between source and human model, radius of circular coil, and the gap between parallel wires. For equivalent human models, prolate spheroid model and simplified human model from IEC 62311 standard are used. The calculated coupling factor values are compared with those obtained by 2D uniform disk human model, and the dependence of coupling factor on the choice of equivalent human model is analyzed.

Microstructural Analysis on Oxide Film of Al6061 Exposed to Atmospheric Conditions (대기 노출된 Al6061 알루미늄 합금 산화막에 대한 미세조직 분석)

  • Jo, Junyeong;Kwon, Daeyeop;Choi, Wonjun;Bahn, Chi Bum
    • Journal of the Korean institute of surface engineering
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    • v.55 no.5
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    • pp.273-283
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    • 2022
  • Al6061 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months. 24-month exposure specimen showed some more frequent and larger size of corrosion products and pitting on the surface compared with the 12-month exposure specimens. The XRD examination revealed the dominant surface oxide phases of Al2O3 and Al(OH)3. The oxide thickness at uniform oxidation (or non-pitting) region was not much changed over exposure time. The 1.2 ㎛ deep oxygen penetration area was found in the 12-months exposed specimen near the thin uniform aluminum oxide film. The line-EDS was conducted through the penetration regions and non-penetrated grain boundary. There were signs of O and Si concentration through the penetration region, whereas non-penetration region showed no concentration of O or Si. It was confirmed that pitting is a more severe degradation mode in Al6061 (max. >4 ㎛ deep) compared with the uniform oxidation (max. ~200 nm deep) up to 24-months exposure.

Non-uniform Deblur Algorithm using Gyro Sensor and Different Exposure Image Pair (자이로 센서와 노출시간이 다른 두 장의 영상을 이용한 비균일 디블러 기법)

  • Ryu, Ho-hyeong;Song, Byung Cheol
    • Journal of Broadcast Engineering
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    • v.21 no.2
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    • pp.200-209
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    • 2016
  • This paper proposes a non-uniform de-blur algorithm using IMU sensor and a long/short exposure-time image pair to efficiently remove the blur phenomenon. Conventional blur kernel estimation algorithms using sensor information do not provide acceptable performance due to limitation of sensor performance. In order to overcome such a limitation, we present a kernel refinement step based on images having different exposure times which improves accuracy of the estimated kernel. Also, in order to figure out the phenomenon that conventional non-uniform de-blur algorithms suffer from severe degradation of visual quality in case of large blur kernels, this paper a homography-based residual de-convolution which can minimize quality degradation such as ringing artifacts during de-convolution. Experimental results show that the proposed algorithm is superior to the state-of-the-art methods in terms of subjective as well as objective visual quality.

Microstructural Analysis on Oxide Film of Al2024 Exposed to Atmospheric Conditions (대기 노출된 Al2024 알루미늄 합금 산화막에 대한 미세조직 분석)

  • Kwon, Daeyeop;Choi, Wonjun;Bahn, Chi Bum
    • Journal of the Korean institute of surface engineering
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    • v.54 no.2
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    • pp.62-70
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    • 2021
  • Al2024 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months and analyzed by electron microscopes to characterize their corrosion behavior and oxide film characteristics. As the exposure time increased from 12 months to 24 months, the number of pitting sites per 1 mm2 increased from ~100 to ~200. The uniform oxidation (or non-pitting) region of the 12-month exposure specimen showed 30~120 nm thick oxide layer, whereas the 24-month exposure specimen showed 170~200 nm thick oxide with the local oxygen penetration region up to 1 ㎛ deep. There was no local corrosion area observed in the 12-month exposure specimen except pitting. However, in the 24-month exposure specimen, local oxygen penetration region was observed beneath the uniform oxide layer and near the pitting cavity. Al2024 showed two times thicker uniform oxide layer but much shallower local oxygen penetration region than Al1050, which appears to be related to low Si concentration. Further research is needed on the effects of Mg segregation near the tip of the oxygen penetration region.

A Study on the Exposure Assessment of Extremely Low Frequency Magnetic Fields (극저주파 자계의 노출 평가에 대한 연구)

  • Kim, Eung-Sik;Kim, Myeong-Hun;Min, Suk-Won
    • Journal of the Korean Society of Safety
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    • v.32 no.1
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    • pp.33-40
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    • 2017
  • This paper addresses the assessment methods used to evaluate the magnetic exposure of a human to ELF EMF (Extremely Low Frequency Electromagnetic Field) which is caused by the process of power delivery from 60 Hz commercial power. These days the main concern is primarily focused on the magnetic field. For the exposure assessment, both numerical studies and laboratory experiments were studied and the results of the two compared for methodological suitability. The numerical analyses employ the Impedance Method (IM), Boundary Element Method (BEM), and Finite Element Method (FEM) and the laboratory experiments used various human phantom models made with conductivities congruent to human organs and then exposed to uniform/non-uniform magnetic fields to produce eddy currents. Under these conditions a number of examples have been evaluated and the reliability assessed to present the pros and cons of each methodology.

The Automatic equipments Non-Exposure waterproofing method of reduced construction hours integrated with the improved URE-Sheet and UREPALT adhesives (우레팔트 접착제를 사용한 개량형 우레시트 일체식 공기단축형 기계화 시공 비노출 방수공법)

  • Min, Sung-Woo;Oh, Chang-Won;Yang, Jae-Bong
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2009.05c
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    • pp.135-141
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    • 2009
  • This technology is able to construct with hardening UREPALT adhesives and TPO URE-Sheet simultaneously using automatic equipments. the benefit of this construction method is that The layer of waterproofing is uniform and defect of construction would be reduced because of no construction joints between UREPALT adhesives and TPO URE-Sheet. Furthermore, this new method could accomplish shortening of construction period, quality control and saving of labor costs. Also the non-exposure waterproofing method would be protected from fire and safe for workers without using a torch.

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Analysis of Current Density Distribution and In Vitro Exposur System fot ELF Exposed Cell Experiments (ELF 전자파 피폭 세포실험을 위한 배양기의 전류밀도 분포 해석 및 In Vitro 노출장치 설계)

  • 김대근;정재승;안재목
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.12 no.1
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    • pp.84-91
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    • 2001
  • In in vitro cell experiments for the biological assessment of electromagnetic (EM) field, exposure system (ES) must be analyzed in terms of current density (J) and induced electric field intensity (E). Although in uniform B field, E and J in the sample medium are not distributed uniformly because of conductivity in sample dish. Thus, the precise estimation for E and J induced by uniform ELF within sample media is very important keys for successful in in vitro experiments. In this paper, we designed in vitro ELF ES with electromagnetic analysis using MATLAB simulator. Then we calculated from the measured B field to verify induced E & J distribution for random locations of cells within media in two cases of samples existence or not. ES with B field ranging from 0 to 20G consists of Helmholz coil and current generator based on the microprocessor. Also, we developed ELFES for each B field generation as uniform and non-uniform modes.

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Microbial Risk Assessment of Non-Enterohemorrhagic Escherichia coli in Natural and Processed Cheeses in Korea

  • Kim, Kyungmi;Lee, Heeyoung;Lee, Soomin;Kim, Sejeong;Lee, Jeeyeon;Ha, Jimyeong;Yoon, Yohan
    • Food Science of Animal Resources
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    • v.37 no.4
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    • pp.579-592
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    • 2017
  • This study assessed the quantitative microbial risk of non-enterohemorrhagic Escherichia coli (EHEC). For hazard identification, hazards of non-EHEC E. coli in natural and processed cheeses were identified by research papers. Regarding exposure assessment, non-EHEC E. coli cell counts in cheese were enumerated, and the developed predictive models were used to describe the fates of non-EHEC E. coli strains in cheese during distribution and storage. In addition, data on the amounts and frequency of cheese consumption were collected from the research report of the Ministry of Food and Drug Safety. For hazard characterization, a doseresponse model for non-EHEC E. coli was used. Using the collected data, simulation models were constructed, using software @RISK to calculate the risk of illness per person per day. Non-EHEC E. coli cells in natural- (n=90) and processed-cheese samples (n=308) from factories and markets were not detected. Thus, we estimated the initial levels of contamination by Uniform distribution ${\times}$ Beta distribution, and the levels were -2.35 and -2.73 Log CFU/g for natural and processed cheese, respectively. The proposed predictive models described properly the fates of non-EHEC E. coli during distribution and storage of cheese. For hazard characterization, we used the Beta-Poisson model (${\alpha}=2.21{\times}10^{-1}$, $N_{50}=6.85{\times}10^7$). The results of risk characterization for non-EHEC E. coli in natural and processed cheese were $1.36{\times}10^{-7}$ and $2.12{\times}10^{-10}$ (the mean probability of illness per person per day), respectively. These results indicate that the risk of non-EHEC E. coli foodborne illness can be considered low in present conditions.

Detection of Lens Scan Alluk on LCD Surface (LCD 표면의 렌즈 스캔 얼룩 검출 기법)

  • Shin, Ji-Young;Kim, Jeong-Tae
    • The Transactions of the Korean Institute of Electrical Engineers D
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    • v.55 no.12
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    • pp.547-549
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    • 2006
  • We have proposed a novel algorithm for detecting scan alluk on the surface of a TFT-LCD device that is generated by non-uniform exposure during fabrication. The scan alluk is known to have similar intensity values on paths that are determined by the shape of lens for light exposure. Based on the observation, the proposed algorithm inspects the uniformity on the paths using 1D projection image of 2D LCD image and 2D backprojection image of the 1D image. We have shown the usefullness of the proposed method by theoretical analysis and experimental results.

Performance Enhancement due to Oxygen Plasma Treatment on the Gate Dielectrics of OTFTs (게이트 절연막의 $O_2$플라즈마 처리에 의한 펜타센 OTFT의 성능 개선)

  • 이명원;김광현;허영헌;안정근
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.40 no.7
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    • pp.494-498
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    • 2003
  • In this paper, the plasma treatment on gate surface has been applied prior to deposition of pentacene and the effects on performance were investigated. The Plasma treatment produced the mobility of 0.05$\textrm{cm}^2$/V.sec which is 10 times larger than the non-treated. The resistance was also reduced from 400K$\Omega$ to 50K$\Omega$. In addition, the standard deviation of performance parameters variation was reduced with the plasma exposure time, which implies that plasma treatment makes the gate surface states be uniform across the whole wafer area. The performance parameters were increased with the exposure time up to 5min, after which they degraded again. Therefore, the optimal exposure time was found to be 5min.