• 대한기계학회논문집A
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• 제34권11호
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• pp.1643-1648
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• 2010

비자성체의 자기연마 공정에서는 공작물 표면에 발생하는 자속밀도가 매우 낮아 자기연마입자에 작용하는 절삭력이 현저히 낮아진다. 따라서 공작물 반대편에 전자석을 설치하여 공작물 표면의 자속밀도를 효과적으로 증가 시킬 수 있다. 본 연구에서는 전자석 배열 테이블을 비자성체의 자기연마에 활용하기 위해 전자석 배열에 따른 자속밀도 및 극성변화에 대한 시뮬레이션 및 실험적 검증을 수행하였다. 그 결과 전자석이 같은 극성을 가질 때 보다 중심부분 전자석을 기준으로 주변 전자석이 반대의 극성을 가질 때 중심부분의 전자석에서 가장 높은 자속밀도를 가지는 것을 확인할 수 있었다.

• 한국전기전자재료학회논문지
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• 제17권10호
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• pp.1041-1048
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• 2004

Chemical mechanical polishing (CMP) process was studied in terms of tribology in this paper. CMP performed by the down force and the relative motion of pad and wafer with slurry is typically tribological system composed of friction, wear and lubrication. The piezoelectric quartz sensor for friction force measurement was installed and the friction force was detected during CMP process. Various friction signals were attained and analyzed with the kind of pad, abrasive and abrasive concentration. As a result of experiment, the lubrication regime is classified with ηv/p(η, v and p; the viscosity, relative velocity and pressure). The characteristics of friction and material removal mechanism is also different as a function of the kind of abrasive and the abrasive concentration in slurry. Especially, the material removal per unit distance is directly proportional to the friction force and the non~uniformity has relation to the coefficient of friction.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권6호
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• pp.291-296
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• 2006

In this study, the sputtered BTO film was polished by CMP process with the self-developed $BaTiO_3$- and $TiO_2$-mixed abrasives slurries (MAS), respectively. The removal rate of BTO ($BaTiO_3$) thin film using the $BaTiO_3$-mixed abrasive slurry (BTO-MAS) was higher than that using the $TiO_2$-mixed abrasives slurry ($TiO_2$-MAS) in the same concentrations. The maximum removal rate of BTO thin film was 848 nm/min with an addition of $BaTiO_3$ abrasive at the concentration of 3 wt%. The sufficient within-wafer non-uniformity (WIWNU%) below 5% was obtained in each abrsive at all concentrations. The surface morphology of polished BTO thin film was investigated by atomic force microscopy (AFM).

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2012년도 춘계학술대회 논문집
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• pp.535-536
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• 2012

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 춘계학술대회 논문집
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• pp.913-914
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• 2009

• 대한소아치과학회지
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• 제24권4호
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• pp.763-770
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• 1997

The air abrasive technique is a non-mechanical method by which teeth are treated before restoration and stains and calculi are removed from tooth surfaces using the kinetic energy of small particles. The air abrasive technique in dentistry was first introduced in the 1950's with as instrument called 'Airdent'. But, as the main restorative materials of the period were amalgam and gold, and the instrument's inability to control the flow of particles caused the particles to be spread throughout the clinics, widespread use was not possible. In the 1990's, as these techincal problems were solved and more interest in new restorative materials rose in an effort to preserve sound tooth structure, new developements took place in instruments related to the air abrasive technique. The air abrasive technique produces less pressure, vibration and heat that might cause patient discomfort and facilitates the preservation of sound tooth structure. It also reduces the need for anesthesia and is less harmful to the pulp. Other advantages include increase in dentin bonding strength of composite resin, lower possibility of saliva contamination and maintenance of a dry field. But there is not direct contact between the nozzle and the tooth, the operator cannot use his or her tactile sense and must rely solely upon visual input. Other disadvantages are: the tooth preparation depends on the operator's ability; alpha-alumina particles, after bouncing off the tooth surface, cause damage to dental mirrors; the equipment is expensive and takes up a certain amount of space in the clinic. The author conducted case report using the air abrasive technique on patient visiting the Department of Pediatric Dentistry at Seoul National University Dental Hospital and arrived at the following conclusions. 1. The tooth preparation capability of different air abrasive devices varied widely among manufacturers. 2. It was more effective in treating early caries lesions and stains compared to lesions where caries had already progressed to produce soft dentin. 3. The cold stream and noise caused by the evacuation system was a major cause of discomfort to pediatric patients. 4. As there is no direct contact with tooth surface when using the air abrasive technique for tooth preparation, considerable experience and skill is required for proper tooth preparation.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2007년도 추계학술대회 논문집
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• pp.197-198
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• 2007

• 대한기계학회논문집A
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• 제36권3호
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• pp.259-264
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• 2012

비자성체의 자유곡면 자기연마 공정에서 자기력 세기의 향상은 매우 중요하다. 비자성체 자유곡면의 표면에 발생하는 자기력의 세기에 따라 자기연마 입자가 가지는 수직 절삭력이 변화하기 때문이다. 이러한 자기력 향상을 위하여 전자석 배열 테이블이 적용된 제 2세대 자기연마공정이 비자성체의 자유곡면 자기연마에 적용된다. 본 연구에서는 이러한 제 2세대 자기연마공정에서 전자석 배열 테이블에 발생하는 자기력 세기 향상을 위한 극성배열 방법을 제시하고 이를 알루미늄합금의 곡률 자기연마에 적용하였다. 그 결과 볼록 및 오목 형상에서 각각 S-N-S와 S-N-N-N-S 극성 배열에서 가장 높은 표면거칠기의 향상을 확인하였다. 또한 상승 가공경로에서 상대적으로 높은 표면거칠기 향상을 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.68-69
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• 2005

BTO ($BaTiO_3$) thin film is one of the high dielectric materials for high-density dynamic random access memories (DRAMs) due to its relatively high dielectric constant. It is generally known that BTO film is difficult to be etched by plasma etching, but high etch rate with good selectivity to pattern mask was required. The problem of sidewall angle also still remained to be solved in plasma etching of BTO thin film. In this study, we first examined the patterning possibility of BTO film by chemical mechanical polishing (CMP) process instead of plasma etching. The sputtered BTO film on TEOS film as a stopper layer was polished by CMP process with the self-developed $BaTiO_3$- and $TiO_2$-mixed abrasives slurries (MAS), respectively. The removal rate of BTO thin film using the$ BaTiO_3$-mixed abrasive slurry ($BaTiO_3$-MAS) was higher than that using the $TiO_2$-mixed abrasive slurry ($TiO_2$-MAS) in the same concentrations. The maximum removal rate of BTO thin film was 848 nm/min with an addition of $BaTiO_3$ abrasive at the concentration of 3 wt%. The sufficient within-wafer non-uniformity (WIWNU%)below 5% was obtained in each abrasive at all concentrations. The surface morphology of polished BTO thin film was investigated by atomic force microscopy (AFM).

• Tribology and Lubricants
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• 제33권1호
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• pp.31-35
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• 2017

Recently, international attention has been focused on the development of non-traditional energy resources such as shale gas and oil sands, due to the steep increase in the demand for natural resources. The materials incorporated in an oil gas plant module experience extreme environments, and are prone to various problem such as fracture, corrosion and abrasion due to low-temperature brittleness. In order to improve the plant life, it is necessary to perform characteristics study and performance evaluation of the materials. In particular, this paper explains the main set of materials which are most frequently used in oil sands plant project. In order to investigate wear characteristics, the authors carried out abrasive wear tests of TP 316, stainless steel and SS 400, structural rolled steel. For the analysis of the abrasive wear resistance of an oil sands plant, the authors carried out the test according to ASTM G 105 "Standard Test Method for Conducting Wet Sand/Rubber Wheel Abrasion Test" standard guidelines. The authors have derived the results from the data associated with the loss of mass with respect to wear rate. During the test, for a given wear length for 10,000 revolutions, the rotational speed and applied force of the rubber wheel were varied.