• Title/Summary/Keyword: NmF2

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The height variation of F2 peak density using Anyang Ionosonde measurements for GNSS ionospheric model

  • Kim, Eo-Jin;Chung, Jong-Kyun;Kim, Yong-Ha;Cho, Jung-Ho
    • Bulletin of the Korean Space Science Society
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    • 2008.10a
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    • pp.24.3-24.3
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    • 2008
  • The signals transmitted from satellites of Global Navigation Satellite System (GNSS) interact with the plasma of the ionosphere. To study the impact of the ionospheric plasma on GNSS applications a comprehensive knowledge of the ionosphere is required. Especially the correct measurement of the ionosphere such as the peak height of the F2 layer peak electron density (hmF2) is important for the GNSS ionospheric model. Anyang ionosonde station ($37.39^{\circ}N$, $126.95^{\circ}E$) has been operating from October 2000 and the accumulated data for 8 years may allow us to obtain climatological characteristics of middle latitude ionospheric F region for GNSS application. We analyzed the variations of the hmF2 and NmF2 over Anyang station for different conditions of solar activity, geomagnetic activity, season, and local time, and we compared our results with the IRI model.

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Texture, Morphology and Photovoltaic Characteristics of Nanoporous F:SnO2 Films

  • Han, Deok-Woo;Heo, Jong-Hyun;Kwak, Dong-Joo;Han, Chi-Hwan;Sung, Youl-Moon
    • Journal of Electrical Engineering and Technology
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    • v.4 no.1
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    • pp.93-97
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    • 2009
  • The nanoporous $F:SnO_2$ materials have been prepared through the controlled hydrolysis of fluoro(2-methylbutan-2-oxy)di(pentan-2,4-dionato)tin followed by thermal treatment at $400-550^{\circ}C$. The main IR features include resonances at 660, 620 and 540 cm-1. From the TG-DTG result, three main mass losses of 6.5, 13.3 and 3.8 at 81, 289 and $490^{\circ}C$ are observed between 50 and $650^{\circ}C$ yielding a final residue of 76.0%. The size of Sn $O_2$ nanoparticles rose from 5 nm to 10-12 nm as the temperature of thermal treatment is increased from 400 to $550^{\circ}C$.

UV-Nanoimprint Lithography Using Fluorine Doped Diamond-Like Carbon Stamp (불화 함유 다이아몬드 상 탄소 스탬프를 사용하는 UV 나노 임프린트 리소그래피)

  • Jeong, Jun-Ho;Ozhan, Altun Ali;Rha, Jong-Joo;Choi, Dae-Geun;Kim, Ki-Don;Choi, Jun-Hyuk;Lee, Eung-Sug
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2006.05a
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    • pp.109-112
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    • 2006
  • A fluorine-doped diamond-like carbon (F-DLC) stamp which has high contact angle, high UV-transmittance and sufficient hardness, was fabricated using the following direct etching method: F-DLC is deposited on a quartz substrate using DC and RF magnetron sputtering, PMMA is spin coated and patterned using e-beam lithography and finally, $O_2$ plasma etching is performed to transfer the line patterns having 100 nm line width, 100 nm line space and 70 nm line depth on F-DLC. The optimum fluorine concentration was determined after performing several pre-experiments. The stamp was applied successfully to UV-NIL without being coated with an anti-adhesion layer.

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Fabrication of Fluorine Doped Diamond-Like Carbon Stamp for UV-Nanoimprint Lithography (UV 나노임프린트 리소그래피를 위한 불화 함유 다이아몬드 상 탄소 스탬프의 제작)

  • Ozhan Altun Ali;Jeong Jun-Ho;Rha Jong-Joo;Choi Dae-Geun;Kim Ki-Don;Lee Eung-Sug
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.145-146
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    • 2006
  • A fluorine-doped diamond-like carbon (F-DLC) stamp which has high contact angle, high UV-transmittance and sufficient hardness, was fabricated using the following direct etching method: F-DLC is deposited on a quartz substrate using DC and RF magnetron sputtering, PMMA is spin coated and patterned using e-beam lithography and finally, O2 plasma etching is performed to transfer the line patterns having 100 nm line width, 100 nm line space and 70 nm line depth on F-DLC. The optimum fluorine concentration was determined after performing several pre-experiments. The stamp was applied successfully to UV-NIL without being coated with an anti-adhesion layer.

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Ultra Thin Film Encapsulation of OLED on Plastic Substrate

  • Ko Park, Sang-Hee;Oh, Ji-Young;Hwang, Chi-Sun;Yang, Yong-Suk;Lee, Jeong-Ik;Chu, Hye-Yong
    • Journal of Information Display
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    • v.5 no.3
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    • pp.30-34
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    • 2004
  • Fabrications of barrier layer on a polyethersulfon (PES) film and OLED based on a plastic substrate by atomic layer deposition (ALD) have been carried out. Simultaneous deposition of 30 nm of $AlO_x$ film on both sides of PES film gave film MOCON value of 0.0615 g/$m^2$/day (@38$^{\circ}C$, 100 % R.H.). Moreover, the double layer of 200 urn $SiN_x$ film deposited by PECVD and 20 nm of $AlO_x$ film by ALD resulted in the MOCON value lower than the detection limit of MOCON. The OLED encapsulation performance of the double layer have been investigated using the OLED structure of ITO/MTDATA(20 nm)/NPD(40 nm)/AlQ(60 nm)/LiF(1 nm)/Al(75 nm) based on the plastic substrate. Preliminary life time to 91 % of initial luminance (1300 cd/$m^2$) was 260 hours for the OLED encapsulated with 100 nm of PECVD deposited $SiN_x$/30 nm of ALD deposited $AlO_x$.

Gate length scaling behavior and improved frequency characteristics of In0.8Ga0.2As high-electron-mobility transistor, a core device for sensor and communication applications (센서 및 통신 응용 핵심 소재 In0.8Ga0.2As HEMT 소자의 게이트 길이 스케일링 및 주파수 특성 개선 연구)

  • Jo, Hyeon-Bhin;Kim, Dae-Hyun
    • Journal of Sensor Science and Technology
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    • v.30 no.6
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    • pp.436-440
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    • 2021
  • The impact of the gate length (Lg) on the DC and high-frequency characteristics of indium-rich In0.8Ga0.2As channel high-electron mobility transistors (HEMTs) on a 3-inch InP substrate was inverstigated. HEMTs with a source-to-drain spacing (LSD) of 0.8 ㎛ with different values of Lg ranging from 1 ㎛ to 19 nm were fabricated, and their DC and RF responses were measured and analyzed in detail. In addition, a T-shaped gate with a gate stem height as high as 200 nm was utilized to minimize the parasitic gate capacitance during device fabrication. The threshold voltage (VT) roll-off behavior against Lg was observed clearly, and the maximum transconductance (gm_max) improved as Lg scaled down to 19 nm. In particular, the device with an Lg of 19 nm with an LSD of 0.8 mm exhibited an excellent combination of DC and RF characteristics, such as a gm_max of 2.5 mS/㎛, On resistance (RON) of 261 Ω·㎛, current-gain cutoff frequency (fT) of 738 GHz, and maximum oscillation frequency (fmax) of 492 GHz. The results indicate that the reduction of Lg to 19 nm improves the DC and RF characteristics of InGaAs HEMTs, and a possible increase in the parasitic capacitance component, associated with T-shap, remains negligible in the device architecture.

A Study on the Luminescence Properties of LiGd9(SiO4)6O2:Ce3+ (LiGd9(SiO4)6O2:Ce3+ 형광 특성 연구)

  • Jin, Seongjin
    • Journal of the Korean Society of Radiology
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    • v.9 no.3
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    • pp.169-174
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    • 2015
  • $LiGd_9(SiO_4)_6O_2:Ce^{3+}$ phosphors were synthesized by solid-state reaction method. The structural characteristic was investigated by X-ray powder diffraction analysis. The emission and excitation spectra of the $Ce^{3+}$ ions doped $LiGd_9(SiO_4)_6O_2$ phosphors were obtained under the UV excitation. The emission spectra of $LiGd_9(SiO_4)_6O_2:Ce^{3+}$ shows the band at 410 nm corresponding to the $^2F_{5/2}$ and $^2F_{7/2}$ states of $Ce^{3+}$. The red shift of $Ce^{3+}$ emission is found as the $Ce^{3+}$ concentration increases, which could be explained by the change in crystal-field symmetry and strength with increasing $Ce^{3+}$ concentration. Fluorescence decay time of $Ce^{3+}$ was about 20 ns. When the concentration of $Ce^{3+}$ increases life time was slightly reduced.

Study on the fabrication and the characterization of 100 nm T-gate InGaAs/InAlAs/GaAs Metamorphic HEMTs (100 nm T-gate의 InGaAs/InAlAs/GaAs metamorphic HEMT 소자 제작 및 특성에 관한 연구)

  • Kim, H.S.;Shin, D.H.;Kim, S.K.;Kim, H.B.;Im, Hyun-Sik;Kim, H.J.
    • Journal of the Korean Vacuum Society
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    • v.15 no.6
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    • pp.637-641
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    • 2006
  • We present the DC and RF characteristics of 100 nm gate length InGaAs/InAlAs/GaAs metamorphic high electron mobility transistors (MHEMTs). We fabricated the T-gate with 100 nm foot print by using a positive resist ZEP520/P (MMA-MAA)/PMMA trilayer by double exposure method. The fabricated 100 nm MHEMT with a $70\;{\mu}m$ unit gate width and two fingers were characterized through do and rf measurements. The maximum drain current density of 465 mA/mm and extrinsic transconductance $(g_m)$ of 844 mS/mm were obtained with our devices. From rf measurements, we obtained the current gain cut-off frequency $(f_T)$ of 192 GHz, and maximum oscillation frequency $(f_{max})$ 310 GHz.

Mössbauer Study of Al0.2CoFe1.8O4 Ferrite Powders (Mössbauer 분광법에 의한 Al0.2CoFe1.8O4분말의 자기적 특성 연구)

  • Chae, Kwang-Pyo;Lee, Jae-Gwang;Kweon, Hyuck-Su;Lee, Young-Bae
    • Journal of the Korean Magnetics Society
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    • v.13 no.6
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    • pp.231-236
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    • 2003
  • The $Al_{0.2}$CoF $e_{1.8}$ $O_4$ferrite powders have been prepared by the sol-gel method. The crystallographic and magnetic properties of the sample depending on annealing temperature have been investigated by means of x-ray diffraction, FE SEM, Mossbauer spetroscopy and vibrating sample magnetometry. The x-ray diffractions of all samples annealing temperature above 873 K clearly indicate the presence of spinel structure, the lattice constant decrease from 8.425 $\AA$ at 873 K to 8.321 $\AA$ at 1073 K, whereas the particle size rapidly increase from about 39 nm at 673 K to about 108 nm at 1073 K. The Mossbauer spectra annealed above 873 K could be fitted as the superposition of two sextets due to F $e^{3+}$ at A-site and B-site. The isomer shift (IS) and quadruple splitting (QS) values nearly constant with annealing temperature, whereas magnetic hyperfine field ( $H_{hf}$) of A-site slowly in crease and that of B-site fastly increases with increasing annealing temperature. The magnetic behaviour of powders shows that the saturation magnetization increase from 0.7 emu/g at 473 K to 72.1 emu/g at 1073 K while the coercivity decrease from 0.951 kOe at 673 K to 0.374 kOe at 1073 K with increasing annealing temperature.

Structural, Morphological, and Optical Properties of LaNbO4:RE3+ (RE = Dy, Dy/Sm, Sm) Phosphors (LaNbO4:RE3+ (RE = Dy, Dy/Sm, Sm) 형광체의 구조, 표면, 광학 특성)

  • Lee, Jinhong;Cho, Shinho
    • Journal of the Korean institute of surface engineering
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    • v.51 no.5
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    • pp.271-276
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    • 2018
  • The effects of activator ion on the structural, morphological, and optical properties of $LaNbO_4:RE^{3+}$ (RE = Dy, Dy/Sm, Sm) phosphors were investigated. X-ray diffraction patterns exhibited that all the phosphors showed a monoclinic system with a main (112) diffraction peak, irrespective of the concentration and type of activator ions. The grain size showed a slightly decreasing tendency as the concentration of $Sm^{3+}$ ions increased. The excitation spectra of the $LaNbO_4:Dy^{3+}$, $Sm^{3+}$ phosphor powders consisted of a strong charge transfer band centered at 259 nm in the range of 220-290 nm and five weak peaks. The emission spectra of the $La_{0.95}NbO_4$:5 mol% $Dy^{3+}$ phosphors exhibited two intense yellow and blue bands centered at 575 nm and 479 nm respectively, which resulted from the $^4F_{9/2}{\rightarrow}^6H_{13/2}$ and $^4F_{9/2}{\rightarrow}^6H_{15/2}$ transitions of $Dy^{3+}$. As the concentration of $Sm^{3+}$ was increased, the intensity of the yellow emission band was gradually decreased, while those of orange and red emission bands centered at 604 and 646 nm began to appear and reached maxima at 5 mol%, and then decreased rapidly with further increases in the $Sm^{3+}$ concentration. These results indicated that white light emission could be realized by controlling the concentrations of the $Dy^{3+}$ and $Sm^{3+}$ ions incorporated into the $LaNbO_4$ host crystal.