• Journal of the Korean institute of surface engineering
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• v.41 no.4
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• pp.129-133
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• 2008

Nitrogen and aluminum codoped ZnO(NAZO) thin films were grown on glass substrates with changing the nitrogen flow ratio by radio-frequency magnetron sputtering. The structural, optical, and electrical properties of the NAZO films were investigated. The surface morphologies and the structural properties of the thin films were analyzed by using the X-ray diffraction and scanning electron microscopy. The NAZO thin film, deposited at nitrogen flow ratio of 0%, showed a strongly c-axis preferred orientation and the lowest resistivity of $3.2{\times}10^{-3}{\Omega}cm$. The intensity of ZnO(002) diffraction peak was decreased gradually with increasing the nitrogen flow ratio. The optical properties of the films were measured by UV-VIS spectrophotometer and the optical transmittances for all the samples were found to be an average 90% in the visible range. Based on the transmittance value, the optical bandgap energy for the NAZO thin film deposited at nitrogen flow ratio of 0% was determined to be 3.46 eV. As for the electrical properties, the carrier concentration and the hall mobility were decreased, but the electrical resistivity was increased as the nitrogen flow ratio was increased.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.283-283
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• 2007

Titanium nitride thin films were deposited on $SiO_2$/Si substrate by rf-reactive magnetron sputtering. The structural and electrical properties of the films were investigated with various $N_2/(Ar+N_2)$ flow ratios (nitrogen/argon flow ratio). The resistivity as well as temperature coefficient of resistance (TCR) of the films strongly depends on phase structure. For the films deposited at nitrogen/argon flow ratio of below 5%, the resistivity increased with increasing nitrogen/argon flow ratios. However, the resistivity of the film deposited at nitrogen/argon flow ratio of 7% decreased drastically; it is even smaller than that of metal titanium nitride. A near-zero TCR value of approximately 9 ppm/K was observed for films deposited at nitrogen/argon flow ratio of 3%.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.156-156
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• 2016

The effect of nitrogen doping on the mechanical and tribological performance of single-layer tetrahedral amorphous carbon (ta-C:N) coatings of up to $1{\mu}m$ in thickness was investigated using a custom-made filtered cathode vacuum arc (FCVA). The results obtained revealed that the hardness of the coatings decreased from $65{\pm}4.8GPa$ to $25{\pm}2.4GPa$ with increasing nitrogen gas ratio, which indicates that nitrogen doping occurs through substitution in the $sp^2$ phase. Subsequent AES analysis showed that the N/C ratio in the ta-C:N thick-film coatings ranged from 0.03 to 0.29 and increased with the nitrogen flow rate. Variation in the G-peak positions and I(D)/I(G) ratio exhibit a similar trend. It is concluded from these results that micron-thick ta-C:N films have the potential to be used in a wide range of functional coating applications in electronics. To achieve highly conductive and wear-resistant coatings in system components, the friction and wear performances of the coating were investigated. The tribological behavior of the coating was investigated by sliding an SUJ2 ball over the coating in a ball-on-disk tribo-meter. The experimental results revealed that doping using a high nitrogen gas flow rate improved the wear resistance of the coating, while a low flow rate of 0-10 sccm increased the coefficient of friction (CoF) and wear rate through the generation of hematite (${\alpha}-Fe_2O_3$) phases by tribo-chemical reaction. However, the CoF and wear rate dramatically decreased when the nitrogen flow rate was increased to 30-40 sccm, due to the nitrogen inducing phase transformation that produced a graphite-like structure in the coating. The widths of the wear track and wear scar were also observed to decrease with increasing nitrogen flow rate. Moreover, the G-peaks of the wear scar around the SUJ2 ball on the worn surface increased with increasing nitrogen doping.

• Transactions on Electrical and Electronic Materials
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• v.9 no.1
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• pp.12-15
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• 2008

Hafnium oxynitride films have been deposited onto a silicon substrate by means of radio frequency (RF) reactive sputtering using a hafnium dioxide $(HfO_2)$ target with a variety of nitrogen! argon $(N_2/Ar)$ gas flow ratios. Auger electron spectroscopy (AES)results confirm that $N_2$ was successfully incorporated into the HfON films. An increase in the $N_2/Ar$ gas flow ratio resulted in metal oxynitride formation. The films prepared with a $N_2/Ar$ flow ratio of 20/20 sccm show (222), (530), and (611) directions of $HfO_2N_2$, and the (-111), (311) directions of $HfO_2$. From X-ray reflectometry measurements, it can be concluded that with $N_2$ incorporated into the HfON films, the film density increases. The density increases from 9.8 to $10.1g/cm^3$. XRR also reveals that the surface roughness is related to the $N_2/Ar$ flow ratio.

• Journal of Korean Society on Water Environment
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• v.22 no.2
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• pp.203-208
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• 2006

A continuous feed and cyclic draw SBR process was developed to overcome flow rate fluctuation and to maximize organic matters utilization efficiency for nitrogen and phosphorus removal. The developed SBR process was operated with two parallel reactors. Influent was supplied to one reactor which was not obligately aerated. At the same time, the other reactor was just aerated without supplying influent. In addition this mode was changed periodically. Cycle time was 6hr and aeration time ratio($t_{aer}/t_{total}$) was 0.33, respectively. $COD_{cr}$ and SS removal efficiencies of 95% or higher were achieved. Nitrogen removal was so greatly influenced by influent $COD_{cr}/T-N$ ratio. At influent $COD_{cr}/T-N$ ratio of 5.7, removal efficiencies of ammonia-N, T-N and T-P were 96%, 78% and 55%, respectively. Influent $COD_{cr}/T-N$ of 4 or higher ratio was necessary to achieve 60% or higher nitrogen removal. Organic matters of influent was efficiently utilized in denitrification reaction and consumed COD has a good correlation with removed T-N(about 6.5 mgCOD/mgTN). Continuous feed and cyclic draw SBR process could be one of alternative processes for the removal of nutrients in rural area where $COD_{cr}/T-N$ ratio was low and fluctuation of flow rate was severe.

• Journal of Environmental Health Sciences
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• v.35 no.1
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• pp.64-70
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• 2009

The aims of this study is to examine the effects of the changes in HRT(Hydraulic Retention Time) and media charge in a water-mill, among other operation factors, on the nitrogen and phosphorus removal in order to use up-flow anaerobic reactors, anoxic reactors and water-mill aerobic reactors for sewage treatment. The extension of HRT improved the nitrogen removal efficiency, however the removal pattern was constant regardless of HRT. The removal of phosphorus was constant (80%-90%) regardless of the change in HRT. The removal rate with change in influx load varied such that at the OLR (Organic Load Rate) of 1-3 kg/d, the T-N removal efficiency was 80.7%-88.9% and the T-P removal efficiency was 82.9%-89.3% while at the NLR (Nitrogen Loading Rate) of 0.108-0.156 kg/d the removal efficiencies were 80.7-88.9% (T-N) and 82.9-89.3% (T-P). The analyses of the nitrogen and phosphorous removal characteristics with the C/N and C/P ratio showed that the mean T-N removal rate was 88% at the C/N ratio of 1.2-2.6, and that the mean T-P removal rate was 86% at the C/P ratio of 7.2-14.1. Also, the analysis of nitrogen and phosphorous removal characteristics were analyzed in relation to media charge. The comparison between with and without media charge in the water-mill showed that while the nitrogen removal efficiencies were 86-94% and 85-89% respectively, the difference of phosphorous removal efficiencies were between the two conditions was not significant, thus it suggested that the media charge has less effect on the removal efficiency of phosphorous compared to that of nitrogen.

• Journal of the Korean institute of surface engineering
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• v.27 no.5
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• pp.253-260
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• 1994

Ta-N films were reactively sputter deposited by dc magnetron sputtering from a Ta target with a various Ar-N, gas ratio. Electrical resistivity of pure Ta film was 150$\mu$$\Omega$cm and decreased initially with nitrogen addition, and then increased to a value of 220$\mu$$\Omega$-cm~260$\mu$$\Omega$-cm at 9%~23% nitrogen partial flow. Rutherford backscattering spectrometry(RBS) and Auger electron spectroscopy (AES) analysis show that nitrogen content in the film is increased with the nitrogen partial flow. The film contains 58at.% nitrogen at 36% nitrogen partial flow. Both the phase and the microstructure of the as-deposisted films were investigated by x-ray diffractometry(XRD) adn transmission electron microscopy (TEM) at various nitrogen content. The phase of pure Ta film is identified as $\beta$-Ta with a 200$\AA$~300$\AA$ grain size. The phase of Ta film is changed to bcc-Ta as small amount of nitrogen is added. Crystalline Ta2N film was deposited at 24at.% nitrogen content. Amorphous phase is formed over a range of nitrogen content from about 33at.% to 35at.% while crystalline fcc-TaN is observed to form at 39at.%~48at.% nitrogen content.

• Environmental Sciences Bulletin of The Korean Environmental Sciences Society
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• v.1 no.1
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• pp.11-17
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• 1997

The treatment performances of anaerobic-aerobic activated sludge process were investigated under various operation conditions. The treatment system proposed in this study gave a relatively stable performance against hourly change of the flow rate and showed a satisfactory removal efficiency of nitrogen and phosphorus compounds under experimental conditions. The average removal efficiency of total nitrogen gradually decreased as the influent total nitrogen concentration was increased. High C/N ratio of the wastewater was required for the complete removal of nitrogen. Glucose as a carbon source was more efficient than starch and the removal ability for all components become higher with the increase of the fraction of glucose.

• Journal of Environmental Science International
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• v.1 no.1
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• pp.11-17
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• 1992

The treatment performances of anaerobic-aerobic activated sludge Process were investigated under various operation conditions. The treatment system proposed in this study gave a relatively stable performance against hourly change of the flow rate and showed a satisfactory removal efficiency of nitrogen and phosphorus compounds under experimental conditions. The average removal efficiency of total nitrogen gradually decreased as the influent total nitrogen concentration was increased. High C/N ratio of the wastewater was required for the complete removal of nitrogen. Glucose as a carbon source was more efficient than starch and the removal ability for all components become hither with the increase of the fraction of glucose.

• Journal of Environmental Science International
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• v.4 no.5
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• pp.509-516
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• 1995

The treatment performances of anaerobic-aerobic activated sludge process were investigated under various operation conditions. The treatment system proposed in this study gave a relatively stable performance against hourly change of the flow rate and showed a satisfactory removal of nitrogen and phosphorus compounds under experimental conditions. The recycle ratio of mixed liquor from aerobic to anaerobic region and peak coefficient primarily controlled the extent of nitrogen removal. The recycle ratio had the optimum values which were determined by the microbial activities of nitrification and denitrification. The behavior of the treatment unit could be simulated by using the kinetic equations and reactor models which considered the treatment units as complete mixing tanks.