• Asian Journal of Atmospheric Environment
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• 제8권2호
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• pp.96-107
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• 2014

Extreme recovery of the thermal energy from the combustion of flue gas may bring about early gas condensation resulting in the increased formation of nitric acid vapor. The behavior of the nitric acid formed inside the stack and in the atmosphere was investigated through a computer-aided simulation in this study. Low temperatures led to high conversion rates of the nitrogen oxide to nitric acid, according to the Arrhenius relationship. Larger acid plumes could be formed with the cooled flue gas at $40^{\circ}C$ than the present exiting gas at $115^{\circ}C$. The acid vapor plume of 0.1 ppm extended to 25 m wide and 200 m high. The wind, which had a seasonal local average of 3 m/s, expanded the influencing area to 170 m along the ground level. Its tail stretched 50 m longer at $40^{\circ}C$ than at $115^{\circ}C$. The emission concentration of the acid vapor in the summer season was a little lower than in the winter. However, a warm atmosphere facilitated the Brownian motion of the discharged flue gas, finally leading to more vigorous dispersion.

• 한국표면공학회지
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• 제45권5호
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• pp.198-205
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• 2012

The corrosion properties of anodized films on aluminium 6070 alloy in a sulfuric acid have been studied. Comparison to evaluate the anodized A6070 and pure 6070 specimen, corrosion tests in $HNO_3$ vapor environment of the 20 wt.% were performed up to 72 hours. Characteristics of film formation and surface morphology were examined by optical microscopy, FE-SEM, and EDS. The oxide film anodized in the sulfuric acid solution contained 5 to 10 wt.% of sulfur. In the initial stages of corrosion, anodized specimens exhibited corrosion resistance than the pure specimen. However, the corrosion conditions in 24 hours, corrosion was far more anodized specimen than pure specimen. Therefore, anodized films contained sulfur, nitric acid vapor in the environment is thought to stimulate corrosion.

• 한국환경과학회지
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• 제17권5호
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• pp.565-571
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• 2008

The surface properties of activated carbon modified by acids and base were studied. The influence of the surface chemistry on the adsorption of benzene and acetone vapor on modified activated carbons has been investigated The modified activated carbons were obtained by treatment with acetic acid ($CH_3COOH$), nitric acid ($HNO_3$) and sodium hydroxide (NaOH). The modified activated carbons had similar porosity but different surface chemistry and adsorption characteristics. The total surface acidity (sum of functional groups) of activated carbon (AC-AN) treated by nitric acid was 2.6 times larger than that of activated carbon (AC) before the acid treatment. Especially, carboxyl group was much developed by nitric acid treatment. The benzene equilibrium adsorption capacity of AC-AN decreased 20% more than that of AC. However, the acetone equilibrium adsorption capacity of AC-AN increased 20% more than that of AC because of the large increase of carboxyl group and acidity.

• 한국대기환경학회지
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• 제29권1호
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• pp.64-73
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• 2013

Because some particulate matter emission sources may inherently produce soluble species, or some soluble species may be produced during atmospheric transport, it is important to understand the origin of a particles's solubility when water-soluble tracers are used in source apportionment studies. Laboratory experiments were performed on three types of soils (Mongolia grassland, Mongolia desert, and Korean rural soils), to study the impact of acidification by nitric acid vapor on the solubility of metals in the soils. To achieve this goal, concentrations of water-soluble metals (Na, Mg, Al, K, Ca, Mn, and Fe) in the soils measured before and after acidification. Contributions of concentrations of water-soluble metal species before and after acidification attack to their total concentrations varied little with soil type. Concentrations of water-soluble Mg, Al, K, Ca, Mn, and Fe from the soils after interaction with nitric acid vapor increased, with significant increases in soluble Ca and Mn for all soil types suggesting soil acidification enhances the amount of leachable metal species in soil dust. There was little increase in water-soluble Na and K after acidification for each soil type. This experiment demonstrates that quantities of water-soluble metal species in particulate matter are produced under high gaseous nitric acid conditions.

• Carbon letters
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• 제12권4호
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• pp.207-217
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• 2011

We discuss the influence of few-walled carbon nanotubes (FWCNTs) treated with nitric acid and/or sulfuric acid on field emission characteristics. FWCNTs/tetraethyl orthosilicate (TEOS) thin film field emitters were fabricated by a spray method using FWCNTs/TEOS sol one-component solution onto indium tin oxide (ITO) glass. After thermal curing, they were found tightly adhered to the ITO glass, and after an activation process by a taping method, numerous FWCNTs were aligned preferentially in the vertical direction. Pristine FWCNT/TEOS-based field emitters revealed higher current density, lower turn-on field, and a higher field enhancement factor than the oxidized FWCNTs-based field emitters. However, the unstable dispersion of pristine FWCNT in TEOS/N,N-dimethylformamide solution was not applicable to the field emitter fabrication using a spray method. Although the field emitter of nitric acid-treated FWCNT showed slightly lower field emission characteristics, this could be improved by the introduction of metal nanoparticles or resistive layer coating. Thus, we can conclude that our spray method using nitric acid-treated FWCNT could be useful for fabricating a field emitter and offers several advantages compared to previously reported techniques such as chemical vapor deposition and screen printing.

• 한국재료학회지
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• 제28권2호
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• pp.118-123
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• 2018

5 nm-thick $SiO_2$ layers formed by plasma-enhanced chemical vapor deposition (PECVD) are densified to improve the electrical and interface properties by using nitric acid oxidation of Si (NAOS) method at a low temperature of $121^{\circ}C$. The physical and electrical properties are clearly investigated according to NAOS times and post-metallization annealing (PMA) at $250^{\circ}C$ for 10 min in 5 vol% hydrogen atmosphere. The leakage current density is significantly decreased about three orders of magnitude from $3.110{\times}10^{-5}A/cm^2$ after NAOS 5 hours with PMA treatment, although the $SiO_2$ layers are not changed. These dramatically decreases of leakage current density are resulted from improvement of the interface properties. Concentration of suboxide species ($Si^{1+}$, $Si^{2+}$ and $Si^{3+}$) in $SiO_x$ transition layers as well as the interface state density ($D_{it}$) in $SiO_2/Si$ interface region are critically decreased about 1/3 and one order of magnitude, respectively. The decrease in leakage current density is attributed to improvement of interface properties though chemical method of NAOS with PMA treatment which can perform the oxidation and remove the OH species and dangling bond.

• 공업화학
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• 제16권3호
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• pp.312-316
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• 2005

본 연구에서는 원시 활성탄에 질산을 이용한 산 처리 또는 LiOH를 첨착한 후, 이에 대한 이산화탄소의 흡착 특성을 수분의 공존 유, 무 상태에서 고정층 파과 실험을 통해 평가하였다. 질산 처리 및 LiOH 첨착에 따른 활성탄의 표면 성상 및 물리, 화학적 특성은 SEM, EDS, 질소 흡착, FTIR, XRD를 이용하여 고찰하였다. 질산 처리로 인해 원시 활성탄의 비표면적은 감소하였지만 활성탄 표면에서 산소 함량은 증가하였으며, 질산의 산화 반응으로 활성탄 표면에 탄소 및 산소 외에 질소를 포함한 새로운 관능기가 생성되었다. LiOH 첨착으로 인한 비표면적의 감소 폭은 질산 처리한 활성탄이 원시 활성탄에 비해 작게 나타났다. LiOH를 2 wt% 이상으로 첨착하면 상당 부분의 LiOH가 활성탄 세공 내부에 들어가지 못하고 외부 표면에 존재하였다. 고정층 파과 실험을 통해 질산 처리 및 LiOH 첨착량 증가에 따라 활성탄의 이산화탄소 흡착 성능은 향상되었다. 또한 공급가스 내에 수분이 공존함에 따라 이산화탄소 흡착량이 증가하였다. LiOH가 첨착된 활성탄에서 이산화탄소 흡착 후 LiOH는 화학반응에 의해 $Li_2CO_3$로 전환함을 확인하였다.

• Carbon letters
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• 제6권1호
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• pp.31-40
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• 2005

The carbon nanofibers (CNFs) were synthesized through the catalytic decomposition of hydrocarbons in a quartz tube reactor. The CNFs prepared from $C_3H_8$ at $550^{\circ}C$ was selected as the purification sample due to the higher content of impurity than that prepared from other conditions. In this study, we carried out the purification of CNFs by oxidation in air or carbon dioxide after acid treatment, and investigated the influence of purification parameters such as kind of acid, concentration, oxidation time, and oxidation temperature on the structure of CNFs. The metal catalysts could be easily eliminated from the prepared CNFs by liquid phase purification with various acids and it was verified by ICP analysis, in which, for example, Ni content decreased from 2.51% to 0.18% with 8% nitric acid. However, the particulate carbon and heterogeneous fibers were not removed from the prepared CNFs by thermal oxidation in air and carbon dioxide. This result can be explained by that the direction of graphene sheet in CNFs is vertical to the fiber axis and the CNFs are oxidized at about the similar rate with the impurity carbon.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.280-284
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• 2004

Multicrystalline silicon wafers were textured in an alkaline bath, basically using sodium hydroxide and in acidic bath, using mainly hydrofluoric acid (HF), nitric acid $(HNO_3)$ and de-ionized water (DIW). Some wafers were also acid polished for the comparative study. Comparison of average reflectance of the samples treated with the new recipe of acidic solution showed average diffuse reflectance less than even 5 percent in the optimized condition. Solar cells were thus fabricated with the samples following the main steps such as phosphorus doping for emitter layer formation, silicon nitride deposition for anti-reflection coating by plasma enhanced chemical vapor deposition (PECVD) and front surface passivation, screen printing metallization, co-firing in rapid thermal processing (RTP) Furnace and laser edge isolation and confirmed >14 % conversion efficiency from the best textured samples. This isotropic texturing approach can be instrumental to achieve high efficiency in mass production using relatively low cost silicon wafers as starting material.

• 한국산업보건학회지
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• 제29권3호
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• pp.310-321
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• 2019

Objectives: The purpose of this study was to investigate types and characteristics of chemical substances used in LCD(Liquid crystal display) panel manufacturing process. Methods: The LCD panel manufacturing process is divided into the fabrication(fab) process and module process. The use of chemical substances by process was investigated at four fab processes and two module processes at two domestic TFT-LCD(Thin film transistor-Liquid crystal display) panel manufacturing sites. Results: LCD panels are manufactured through various unit processes such as sputtering, chemical vapor deposition(CVD), etching, and photolithography, and a range of chemicals are used in each process. Metal target materials including copper, aluminum, and indium tin oxide are used in the sputtering process, and gaseous materials such as phosphine, silane, and chlorine are used in CVD and dry etching processes. Inorganic acids such as hydrofluoric acid, nitric acid and sulfuric acid are used in wet etching process, and photoresist and developer are used in photolithography process. Chemical substances for the alignment of liquid crystal, such as polyimides, liquid crystals, and sealants are used in a liquid crystal process. Adhesives and hardeners for adhesion of driver IC and printed circuit board(PCB) to the LCD panel are used in the module process. Conclusions: LCD panels are produced through dozens of unit processes using various types of chemical substances in clean room facilities. Hazardous substances such as organic solvents, reactive gases, irritants, and toxic substances are used in the manufacturing processes, but periodic workplace monitoring applies only to certain chemical substances by law. Therefore, efforts should be made to minimize worker exposure to chemical substances used in LCD panel manufacturing process.