• 제목/요약/키워드: Nickel film

검색결과 244건 처리시간 0.029초

Anodic deposition된 $MnO_2$ 막의 열분석 특성 (Thermal analysis of anodically deposited manganese oxide film)

  • 김봉서;이동윤;이희웅;정원섭
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.900-903
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    • 2003
  • Using $DV-X{\alpha}$ method, it is calculated that nickel reduces the energy band gap of manganese oxide in 3 additives of titanium, nickel and tin. Therefore, it is estimated that the electrical conductivity of manganese-nickel oxide has the lowest value in 3 kinds of manganese oxide. The manganese oxide and manganese-nickel oxide which were produced by anodic deposition under $30mA/cm^2$ at room temperature in manganese sulfate and manganese-nickel sulfate solution were thermal-analyzed by DTA and TGA. The weight change of manganese oxide continuously decreased below $508^{\circ}C$ and kept constant at $518{\sim}600^{\circ}C$. However, the manganeses-nickel oxide transformed at the temperature range of $510{\sim}537^{\circ}C$. It is observed that the nickel addition to manganese oxide increases transformation temperature and its range.

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Edge Cut Process for Reducing Ni Content at Channel Edge Region in Metal Induced Lateral Crystallization Poly-Si TFTs

  • SEOK, Ki Hwan;Kim, Hyung Yoon;Park, Jae Hyo;Lee, Sol Kyu;Lee, Yong Hee;Joo, Seung Ki
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제16권2호
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    • pp.166-171
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    • 2016
  • Nickel silicide is main issue in Polycrystalline silicon Thin Film Transistor (TFT) which is made by Metal Induced Lateral Crystallization (MILC) method. This Nickel silicide acts as a defect center, and this defect is one of the biggest reason of the high leakage current. In this research, we fabricated polycrystalline TFTs with novel method called Edge Cut (EC). With this new fabrication method, we assumed that nickel silicide at the edge of the channel region is reduced. Electrical properties are measured and trap state density also calculated using Levinson & Proano method.

패터닝된 Ni 촉매 금속 위에서의 탄소나노튜브 성장 (Selective growth of carbon notubes by patterning nickel catalyst metal)

  • 방윤영;장원석;한창수
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.473-474
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    • 2006
  • Aligned carbon nanotubes(CNTs) array were synthesized using direct current plasma-enhanced chemical vapor deposition. The nickel microgrids catalyzed the growth of carbon nanotubes which take on the area of the nickel microgrids. Selective growth of areas of nanotubes was achieved by patterning the nickel film. CNTs were grown on the pretreated substrates at 30% $C_2H_2:NH_3$ flow ratios for 10min. Carbon nanotubes with diameters about 20 nanometers and lengths approximately 720 nanometers were obtained. Morphologies of carbon nanotubes were observed by FE-SEM and TEM.

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DC magnetron 방법과 RF 스퍼터링 방법으로 제작된 Nickel Oxide 박막의 특성 연구 (A study of Nickel Oxide thin film deposited by DC magnetron and RF sputtering method)

  • 최광남;박준우;백숭호;이호선;곽성관;정관수
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2007년도 하계종합학술대회 논문집
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    • pp.441-442
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    • 2007
  • We deposited nickel oxide(NiO) thin films on silicon(Si) substrates at Room temperature and $500^{\circ}C$ using a nickel target by reactive DC and RF sputtering. In addition, we anneal to NiO thin films deposited at room temperature. Using spectroscopic eillipsometry, we obtained optical characteristics of every films. We discussed relations of the optical and structural properties of NiO thin films with the oxygen flow rate, substrate temperature and annealing temperatures. Refraction was decreased and defect was increased when NiO thin films was annealed. We also analyzed the electrical characteristics of NiO films which deposited DC and RF sputtering method.

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Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

  • Ji, Su-Hyeon;Jang, Woo-Sung;Son, Jeong-Wook;Kim, Do-Heyoung
    • Korean Journal of Chemical Engineering
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    • 제35권12호
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    • pp.2474-2479
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    • 2018
  • Plasma-enhanced atomic layer deposition (PEALD) is well-known for fabricating conformal and uniform films with a well-controlled thickness at the atomic level over any type of supporting substrate. We prepared nickel oxide (NiO) thin films via PEALD using bis(ethylcyclopentadienyl)-nickel ($Ni(EtCp)_2$) and $O_2$ plasma. To optimize the PEALD process, the effects of parameters such as the precursor pulsing time, purging time, $O_2$ plasma exposure time, and power were examined. The optimal PEALD process has a wide deposition-temperature range of $100-325^{\circ}C$ and a growth rate of $0.037{\pm}0.002nm$ per cycle. The NiO films deposited on a silicon substrate with a high aspect ratio exhibited excellent conformality and high linearity with respect to the number of PEALD cycles, without nucleation delay.

전착된 나노 결정질 니켈-철 합금의 미세구조 및 물성에 대한 철의 영향 (Effect of Iron Co-deposited Nickel on the Microstructures and Properties of Electroplated Nanocrystalline Nickel-iron Alloys)

  • 변명환;조진우;송용승
    • 한국표면공학회지
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    • 제38권4호
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    • pp.156-162
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    • 2005
  • Nickel-iron nanocrystalline alloys with different compositions and grain sizes were fabricated by electro-plating for MEMS devices. The iron content of the deposits was changed by varying the nickel/iron ion ratio in the electrolyte. X-ray diffraction (XRD) analysis was applied for measuring the strength of the texture and grain size of the deposits. The nickel/iron atom ratio of the deposits was analyzed by EDS. The hardness of the alloys was evaluated by Vickers hardness indenter. The internal stress of the deposits was measured by Thin Film Stress Measurement using Stoney's formula. Surface morphology and roughness were investigated by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). The results of this study revealed that at a grain size of approximately $17\~24$nm the hardness, internal stress and roughness depend strongly on the iron content. With increasing the iron content, the hardness and internal stress of the deposits increased. An excellent correlation between the increase in the internal stress and the loss of (200) texture was found.

강자성체박막의 회전에 따른 자기저항의 변화 (Magnetoresistance Variation for Rotation in Ferromagnetic Thin Films)

  • 양기원;박상철
    • 한국안광학회지
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    • 제11권3호
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    • pp.225-229
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    • 2006
  • 강자성체인 철과 니켈의 박막에서 전류와 자기장이 이루는 각도의 변화에 따른 자기저항의 변화를 관찰하였다. 경사각에 따른 PMR과 NMR의 크기가 같은 ${\phi}_{mix}$의 변화는 전류에 수직한 자기장의 성분과 평행한 자기장의 성분이 같게 되는 각도에서 자기저항 루프의 역전이 되는 것을 이용하면 ${\phi}_{mix}=tan^{-1}(1+tan{\theta})$와 같이 구해진다. 위 관계식은 실험치와 잘 일치함을 보여준다. 반면에 철박막의 경우에는 니켈박막과 자화축이 다르게 나타나서 ${\phi}_{mix}$가 위 식으로 주어진 관계와 일치하지 않는다.

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금속 전극 알루미나 박막 캐패시터의 전기적 특성에 미치는 미세구조의 영향 (Effect of Microstructure on Electrical Properties of Thin Film Alumina Capacitor with Metal Electrode)

  • 정명선;주병권;오영제;이전국
    • 한국재료학회지
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    • 제21권6호
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    • pp.309-313
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    • 2011
  • The power capacitors used as vehicle inverters must have a small size, high capacitance, high voltage, fast response and wide operating temperature. Our thin film capacitor was fabricated by alumina layers as a dielectric material and a metal electrode instead of a liquid electrolyte in an aluminum electrolytic capacitor. We analyzed the micro structures and the electrical properties of the thin film capacitors fabricated by nano-channel alumina and metal electrodes. The metal electrode was filled into the alumina nano-channel by electroless nickel plating with polyethylene glycol and a palladium catalyst. The spherical metals were formed inside the alumina nano pores. The breakdown voltage and leakage current increased by the chemical reaction of the alumina layer and $PdCl_2$ solution. The thickness of the electroless plated nickel layer was 300 nm. We observed the nano pores in the interface between the alumina layer and the metal electrode. The alumina capacitors with nickel electrodes had a capacitance density of 100 $nF/cm^2$, dielectric loss of 0.01, breakdown voltage of 0.7MV/cm and leakage current of $10^4{\mu}A$.

Electrochromic Performance of NiOx Thin Film on Flexible PET/ITO Prepared by Nanocrystallite-Dispersion Sol

  • Kwak, Jun Young;Jung, Young Hee;Park, Juyun;Kang, Yong-Chul;Kim, Yeong Il
    • 대한화학회지
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    • 제65권2호
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    • pp.125-132
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    • 2021
  • An electrochromic nickel oxide thin film was fabricated on a flexible PET/ITO substrate using a nanocrystallite- dispersed coating sol and bar coater. Nanocrystalline NiOx of 3-4 nm crystallite size was first synthesized by base precipitation and thermal conversion. This NiOx nanocrystallite powder was mechanically dispersed in an alcoholic solvent mixed with a silane binder to prepare a coating sol for thin film. This sol method is different from the normal sol-gel method in that it does not require the conversion of precursor by heat treatment. Therefore, this method provides a very facile method to prepare NiOx thin films on any kind of substrate and it can be easily applied to mass production. The electrochromic performance of this NiOx thin film on PET/ITO electrode with a thickness of about 400 nm was investigated in a nonaqueous LiClO4 electrolyte solution by cyclic voltammetric and repeated chronoamperometric measurements in conjunction with spectrophotometry. The visible light modulation of 44% and the colorization efficiency of 41 ㎠/C at 550 nm were obtained at the step potentials of -0.8/+1.2 V vs Ag and a duration of 30 s.

Nickel Phosphide Electroless Coating on Cellulose Paper for Lithium Battery Anode

  • Kang, Hyeong-Ku;Shin, Heon-Cheol
    • Journal of Electrochemical Science and Technology
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    • 제11권2호
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    • pp.155-164
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    • 2020
  • Here we report our preliminary results about nickel phosphide (Ni-P) electroless coating on the surface of cellulose paper (CP) and its feasibility as the anode for lithium (Li) batteries. In particular, CP can act as a flexible skeleton to maintain the mechanical structure, and the Ni-P film can play the roles of both the anode substrate and the active material in Li batteries. Ni-P films with different P contents were plated uniformly and compactly on the microfiber strands of CP. When they were tested as the anode for Li battery, their theoretical capacity per physical area was comparable to or higher than hypothetical pure graphite and P film electrodes having the same thickness. After the large irreversible capacity loss in the first charge/discharge process, the samples showed relatively reversible charge/discharge characteristics. All samples showed no separation of the plating layer and no detectable micro-cracks after cycling. When the charge cut-off voltage was adjusted, their capacity retention could be improved significantly. The electrochemical result was just about the same before and after mechanical bending with respect to the overall shape of voltage curve and capacity.