• Title/Summary/Keyword: Nickel film

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Optical Transmittance Variation to Thickness of Nickel Thin Films (니켈박막의 두께에 따른 광투과율변화)

  • Yang, Ki-Won;Son, Jeong-Sik;Kwak, Ho-Weon;Lee, Haeng Ki;Park, Sang Chul
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.1
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    • pp.49-52
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    • 2008
  • To study the optical transmittance through nickel thin films with various thicknesses. Methods: We measured the optical transmittance through thin nickel film with various thicknesses. Results: The thickness dependence of the optical transmittance through nickel thin films deposited by thermal evaporation had been investigated. The optical transmittance rapidly decreased with the Ni film thickness less than 70 nm while it slightly decreased with the thickness more than 70 nm. In the experiment of optical dispersion, most of the light transmitted in the incidence direction. The result of experiment showed that optical dispersion was negligibly. Conclusions: Optical transmittance exponentially decreased as nickel thin film thickness increased.

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The Oxidation of Specpure Nickel (Specpure Nikel의 Oxidation)

  • Choi, Jae-Shi;Sin, Soo-Hee;Lee, Kyu-Yong
    • Journal of the Korean Chemical Society
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    • v.10 no.4
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    • pp.153-157
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    • 1966
  • The measurement of Oxidation of nickel has been investigated using vacuum quartz microbalance in the temperature range of $500^{\circ}{\sim}800^{\circ}C$ at various oxygen pressure. The rate constants of nickel-oxidation were evaluated according to the parabolic rate law. From the Arrhenius equation, the activation energy in the range of experimental temperatures were found that $E_{act}$= 35.4 Kcal/mole. It was also found that the parabolic rate constants varied approximately as the one fifth power of the oxygen pressure for nickel-oxidation. The mechanism for the oxidation of this metal were seemed to be via cation vacancy produced by excess of oxygen dissolved in the oxide film.

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Effects of Naphthalene Trisulfonic Acid on the Surface Properties of Electrodeposited Ni Layer (Naphthalene Trisulfonic Acid가 니켈 전착층의 표면 특성에 미치는 영향)

  • Lee Joo-Yul;Kim Man;Kwon Sik-Chol;Kim Jung-Hwan;Kim In-gon
    • Journal of the Korean institute of surface engineering
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    • v.39 no.1
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    • pp.13-17
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    • 2006
  • The effects of an organic additive, naphthalene trisulfonic acid (NTSA), contained in the nickel sulfamate bath on the surface properties of the electrodeposited nickel layer were investigated through electrochemical technique, x-ray diffraction analysis, and microscopic observation. The addition of NTSA facilitated the oxidation process of electrodeposited nickel layer during anodic scan and also increased the hardness and internal stress of the nickel film as the applied current density became higher. It seems that NTSA modulated the deposit structure during electrodeposition and so induced higher distribution of (110) orientation with respect to (200). With the increase of the NTSA in the bath, nickel layer was formed in small grain size, which resulted in enhanced surface evenness and brightness.

A Composite of Metal and Polymer Films: Thin Nickel Film Coated on a Polypropylene Film after Atmospheric Plasma Induced Surface Modification

  • Song, Ho-Shik;Choi, Jin-Moon;Kim, Tae-Wan
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.3
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    • pp.110-114
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    • 2011
  • Polymeric films of high chemical stability and mechanical strength covered with a thin metallic film have been extensively used in various fields as electric and electronic materials. In this study, we have chosen polypropylene (PP) as the polymer due to its outstanding chemical resistance and good creep resistance. We coated thin nickel film on PP films by the electroless plating process. The surfaces of PP films were pre-treated and modified to increase the adhesion strength of metal layer on PP films, prior to the plating process, by an environment-friendly process with atmospheric plasma generated using dielectric barrier discharges in air. The surface morphologies of the PP films were observed before and after the surface modification process using a scanning electron microscope (SEM). The static contact angles were measured with deionized water droplets. The cross-sectional images of the PP films coated with thin metal film were taken with SEM to see the combined state between metallic and PP films. The adhesion strength of the metallic thin films on the PP films was confirmed by the thermal shock test and the cross-cutting and peel test. In conclusion, we made a composite material of metallic and polymeric films of high adhesion strength.

Improving the Long-term Field Emission Stability of Carbon Nanotubes by Coating Co and Ni Oxide Layers

  • Choe, Ju-Seong;Lee, Han-Seong;Lee, Nae-Seong
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.18.1-18.1
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    • 2011
  • Some applications of carbon nanotubes (CNTs) as field emitters, such as x-ray tubes and microwave amplifiers, require high current emission from a small emitter area. To emit the high current density, CNT emitters should be optimally fabricated in terms of material properties and morphological aspects including high crystallinity, aspect ratio, distribution density, height uniformity, adhesion on a substrate, low outgassing rate during electron emission in vacuum, etc. In particular, adhesion of emitters on the substrate is one of the most important parameters to be secured for high current field emission from CNTs. So, we attempted a novel approach to improve the adhesion of CNT emitters by incorporating metal oxide layers between CNT emitters. In our previous study, CNT emitters were fabricated on a metal mesh by filtrating the aqueous suspensions containing both highly crystalline thin multiwalled CNTs and thick entangled multiwalled CNTs. However, the adhesion of CNT film was not enough to produce a high emission current for an extended period of time even after adopting the metal mesh as a fixing substrate of the CNT film. While a high current was emitted, some part of the film was shown to delaminate. In order to strengthen the CNT networks, cobalt-nickel oxides were incorporated into the film. After coating the oxide layer, the CNT tips seemed to be more strongly adhered on the CNT bush. Without the oxide layer, the field emission voltage-current curve moved fast to a high voltage side as increasing the number of voltage sweeps. With the cobalt-nickel oxide incorporated, however, the curve does not move after the second voltage sweep. Such improvement of emission properties seemed to be attributed to stronger adhesion of the CNT film which was imparted by the cobalt-nickel oxide layer between CNT networks. Observed after field emission for an extended period of time, the CNT film with the oxide layer showed less damage on the surface caused by high current emission.

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A Study of cut off effect of ultraviolet in sunglasses lens coated with nickel-ferrite thin film NxFe3-xO4 (니켈페라이트 박막 NxFe3-xO4를 이용한 선글라스 렌즈의 자외선 차단효과에 대한 연구)

  • Ha, T.W.;Lee, Y.H.;Choi, K.S.;Cha, J.W.
    • Journal of Korean Ophthalmic Optics Society
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    • v.8 no.2
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    • pp.25-29
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    • 2003
  • Nickel-ferrite $Ni_xFe_{3-x}O_4$ thin films with several composition for Ni on glass substrate was prepared by ferrite plating method in order to make sunglass which cut off ultraviolet and shield electromagnetic field. It has single phase of polycrystalline spinel structure and has gloss as mirror and has high hardness which is no scratch while scraping by using nail. The transmittance of nickel-ferrite thin film is lowered to zero below 400 nm manifestly. And it shows that the nickel-ferrite thin film in nickel composition rate x = 0.09 was most cut oil ultraviolet when compared with goods of other company in the cut off effect of ultraviolet. Therefore, sunglasses coated with $Ni_xFe_{3-x}O_4$ thin film can be used in removing ultraviolet and electromagnetic field.

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The electrochromic properties of nickel oxide films (니켈산화물 박막의 전기적착색특성)

  • 이길동
    • Journal of the Korean Vacuum Society
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    • v.8 no.2
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    • pp.127-135
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    • 1999
  • Nickel oxide films were prepard by using the electron beam evaporation technique. Coloring and bleaching experiments for cyclic durability were repeated in KOH electrolyte by cyclic voltammetry. Visible spectrophtometry was used to assess the stability of the transmittance in the degraded films. X-ray photoelectron spectroscopy results showed that the grain surface are oxygen-rich compared to the grain interiors in a NiO film. Open circuit memory of colored films is about 400hours in lN KOH. The rate of self discharge was evaluated by measuring the transmittance at 550nm of a fully oxidized NiO film. The rate of self discharge was increased polynomially with time and the film is nearly bleached after about 400hours. It was also found that the degraded film by repeated cycles in the KOH solution changed the grain shape of film surface The film prepared under a vacuum pressure of $3\times10^{-4}$ mbar was found to be rather stable when subjected to the repeated coloring and bleaching cycles in KOH electrolyte. Band theory applied to explain the electrochromic mechanism was discussed.

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Preparation of Thin Nickel Foam for Nickel-Metal Hydride Battery (Ni-MH 전지용 thin nickel foam의 제조)

  • 신준호;김기원
    • Journal of the Korean institute of surface engineering
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    • v.28 no.2
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    • pp.83-91
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    • 1995
  • A new method for preparation of thin nickel foam for Ni-MH battery was investigated. In this method, fine graphite powders of $1\mu\textrm{m}$$2\mu\textrm{m}$ diameter were pasted into pores of thin polyurethane foam film in order to supply electric conducting seeds for nickel deposition by electroless plating reaction. After electroless plating, remaining polyurethane foam was removed chemically by organic solvent treatment and graphite particles also removed by ultrasonic cleaning. Porosity of formed nickel foam was about 85% During electroplating, porosity of the nickel foam decreased less than 5% up to $30\mu\textrm{m}$ coating thickness. And then it was electroplated and heat-treated to improve mechanical strength and ductility. Finally, thin nickel foam for Ni electrode of Ni-MH battery with 80% porosity and $350\mu\textrm{m}$~X$400\mu\textrm{m}$ thickness was obtained.

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Crystallization of a-Si Induced by Ni-Si oxide source

  • Meng, Z.;Liu, Z.;Zhao, S.;Wu, C.;Wong, M.;Kwok, H.;Xiong, S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.985-988
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    • 2008
  • Metal induced crystallization of a-Si with a source of Ni/Si oxide was studied. Its mechanism to induce crystallization was discussed. It was found that new source behaves an effect of self-released nickel and reducing nickel residua, so can provide a wider process tolerance; improve the uniformity and stability of TFTs.

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Post-annealing Effect of NiO Thin Film Grown by RF Sputtering System on 4H-SiC Substrate (4H-SiC 기판 위에 RF Sputter로 증착된 NiO 박막의 후열처리 효과)

  • Soo-Young Moon;Min-Yeong Kim;Dong-Wook Byun;Geon-Hee Lee;Sang-Mo Koo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.2
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    • pp.170-174
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    • 2023
  • Nickel oxide is a nonstoichiometric transparent conductive oxide with p-type conductivity, a wide-band energy gap of 3.4~4.0 eV, and excellent chemical stability, making it a very important candidate as a material for bipolar devices. P-type conductivity in Transparent Conductive Oxides (TCO) is controlled by the oxygen vacancy concentration. During the TCO film deposition process, additional oxygen diffusing into the NiO structure causes the formation of Ni 3p ions and Ni vacancies. This eventually affects the hole concentration of the p-type oxide thin film. In this work, the surface morphology and the electrical characteristics were confirmed in accordance with the annealing atmosphere of the nickel oxide thin film.