• Journal of Surface Science and Engineering
• /
• v.26 no.4
• /
• pp.175-182
• /
• 1993

Electroless plating of nickel was studied electrochemically in the presence of complexing agents. Nickel sulfate solution with dimethylamine borance(DMAB) as the reducing agent was used. Effects of temperature pH, concentration and complexing agents-citric acid, EDTA, tartaric acid-were studied.Experimental meas-urements showed that the rate of electroless nickel deposition was closely related to electrochemical parame-ters such as temdperature, pH, concentration and the properties of complexing agets.

• Journal of Korean Society for Atmospheric Environment
• /
• v.3 no.1
• /
• pp.1-12
• /
• 1987

A series of supported sulfided Ni-W/$\gamma-Al_2O_3$ and Co-W/$\gamma-Al_2O_3$ catalysts with different nickel and cobalt contents were studied in the hydrodenitrogenation of pyridine dissolved in n-heptane. The ranges of experimental conditions were at the temperatures between 453 and 753 K, and the pressures between 30 and 50 Bar. The catalytic activities with different nickel and cobalt contents were shown to be maximum at Ni/Ni+W = 0.2 - 0.3, Co/Co+W = 0.3 - 0.4. Pyridine conversion increased with pressure and temperature and the step of piperidine formation was found to be irreversible. The reaction orders in Ni-W/$\gamma-Al_2O_3$ and Co-W/$\gamma-Al_2O_3$ catalysts were the first with respect to pyridine and reaction rate constants decreased with increase of initial pyridine concentration and their activation energies were 12.98 and 9.23 kcal/mol, respectively.

• Journal of Surface Science and Engineering
• /
• v.36 no.3
• /
• pp.263-271
• /
• 2003

Optimal conditions of electroless nickel plating in acid baths has been studied for industrial applications of a developed EN solution. The phosphorus content in the deposition ranges from 8 to $12\;wt.\%$. The investigated EN plating parameters are ion concentrations of nickel and hypophosphite, concentration of reducing and complexing agent, temperature, and pH. The average plating rate of Ni-P deposition was ca. $14{\mu}m/h$. The EN solution used shows a deposition rate of $10{\mu}m/h$ up to seven metal turnovers.

• Proceedings of the Korean Powder Metallurgy Institute Conference
• /
• 2006.09b
• /
• pp.1124-1125
• /
• 2006

Dry sliding wear behavior of electro-pressure sintered Co-Fe, Co-Ni and Co-Fe-Ni compacts was investigated. Pin-on-disk wear tests were performed on the sintered compacts disk specimens against alumina $(Al_2O_3)$ and silica $(SiO_2)$ ball counterparts at various loads ranging from 3N to 12N. Two sliding speeds of 0.1m/sec and 0.2m/sec and a fixed sliding distance of 1,000m were employed. Worn surfaces and cross sections of them were examined by a scanning electron microscopy, and wear mechanism of the compacts was investigated. Effects of the oxide layer that was formed on wearing surface of the compacts on the wear were also studied.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.397-397
• /
• 2013

The electrical, electronic, optical properties and the local structure of Nickel Oxide (NiO) thin film have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), UV-spectrometer,Hall Effect measurement and X-ray absorption spectroscopy (XAS). The XPS results show that the Ni 2p spectra for all films consist of $Ni2p_{3/2}$ at around 854.5 eV which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The REELS spectra showed that the band gaps of the NiO thin films were abruptly decreased with increasing temperature. The values of the band gaps are consistent with the optical band gaps estimated by UV-Spectrometer. The optical transmittance spectra shows that the transparency of NiO thin films in the visible light region was deteriorated with higher temperature due to existence of $Ni^0$. Hall Effect measurement suggest that the NiO thin films prepared at relatively low temperatures (RT and $100^{\circ}C$) are suitable for fabricating p-type semiconductor which showed that the best properties was achieved at $100^{\circ}C$, such as a low resistivity of $7.49{\Omega}.cm$. It can be concluded that the annealing process plays a crucial role in converting from p type to n type semiconductor which leads to reducing electrical resistivity of NiO thin films. Furthermore, the extended X-ray absorption fine structure (EXAFS) spectrum at the Ni K-edge was used to address the local structure of NiO thin films. It was found that the thermal treatments increase the order in the vicinity of Ni atom and lead the NiO thin films to bunsenite crystal structure. Moreover, EXAFS spectra show in increasing of coordination number for the first Ni-O shell and the bond distance of Ni-O with the increase of substrate temperature.

• Journal of Hydrogen and New Energy
• /
• v.9 no.4
• /
• pp.151-160
• /
• 1998

The variation of the hydrogen-storage properties of Mg contained in the mechanically-allyed mixture with the weight percentage of nickel in the sample is investigated. The weight percentage of nickel transformed into the Mg2Ni phase, on the basis of the nickel weight, is highest in the Mg-10 wt.%Ni sample. For the first hydriding cycle, the effect of mechanical alloying on the hydriding rate of Mg is highest in the Mg-25 wt.%Ni sample. After activation, the effects of mechanical alloying and hydriding-dehydriding cycling on the hydriding rate of Mg are highest in the Mg-10 wt.%Ni sample. After sufficient hydriding-dehydriding cycling, the effects on the hydrogen-storage capacity of Mg are highest in the Mg-10 wt.%Ni sample. The effects on the hydriding and dehydriding rates of Mg are highest in the Mg-25wt.%Ni sample. Mg-25wt.%Ni, followed by Mg-10 wt.%Ni, is the optimum composition which has the best effects on the hydrogen-storage properties of Mg contained in the sample. The mechanical alloying and the hydriding-dehydriding cycling produce many defects, which can act as active nucleation sites, and increase the specific surface area, shortening the diffusion distance of hydrogen.

• Resources Recycling
• /
• v.17 no.1
• /
• pp.59-65
• /
• 2008

The adsorption features of nickel ion in wastewater on manganese dioxide from spent batteries were investigated for its usage as an adsorbent. The aquatic behavior of nickel ion was characterized by MINTEQ program and the considered influential variables on the adsorption of nickel ion were its initial concentration, reaction temperature, the amount of adsorbent, and pH. The adsorption ratio of nickel ion decreased with increasing its initial concentration and thermodynamic estimation has been carried out based on the adsorption characteristics of nickel ion depending on temperature. In addition, the adsorption of nickel ion was shown to be promoted according to the amount of manganese dioxide and a lot of nickel ions were adsorbed as the solution pH was raised.

• Carbon letters
• /
• v.26
• /
• pp.51-60
• /
• 2018

An electroless deposition method was used to modify the surface properties of rice husk ceramic particles (RHC) by depositing nano-nickel on the surface of the RHC (Ni-RHC). The dry tribological performances of aluminum matrix composite adobes containing different contents of RHC and Ni-RHC particles have been investigated using a micro-tribometer. Results showed that the Ni-RHC particles substantially improved both the friction and wear properties of the Ni-RHC/aluminum matrix adobes. The optimal concentration was determined to be 15 wt% for both the RHC and Ni-RHC particles. The improvements in the tribological properties of aluminum adobes including the Ni-RHC were ascribed to friction-induced peeling off of Ni coating and formation of protection layer on the wear zone, both of which led to low friction and wear volume.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.542-543
• /
• 2012

Coherent diffraction imaging (CDI) method using hard x-ray at 5.46 keV was applied to study assembly of Ni and Ni oxide nano structures formed on a Si3N4 membrane. Density distribution of Ni nano-particles was obtained quantitatively with about 15 nm lateral resolution by reconstructing images from the speckle diffraction pattern. In addition, reconstructed images of nickel oxide particles indicated that Ni atoms diffuse out during the oxidation process leaving pores inside the nickel oxide crust. Furthermore, we recognize that really weak phase object, less than 5 nm thickness of Ni residues, can be reconstructed due to the reference particles. We achieved quantitative information of nanometer sized materials and demonstrate the effect of reference particles by using hard x-ray coherent diffractive imaging method.

• Korean Journal of Materials Research
• /
• v.14 no.12
• /
• pp.846-850
• /
• 2004

NiCo silicide films have been fabricated from $300{\AA}-thick\;Ni_{1-x}Co_{x}(x=0.1\sim0.9)$ on Si-substrates by varying RTA(rapid thermal annealing) temperatures from $700^{\circ}C\;to\;1100^{\circ}C$ for 40 sec. Sheet resistance, cross-sectional microstructure, and chemical composition evolution were measured by a four point probe, a transmission electron microscope(TEM), and an Auger depth profilemeter, respectively. For silicides of the all composition and temperatures except for $80\%$ of the Ni composition, we observed small sheet resistance of sub- $7\;{\Omega}/sq.,$ which was stable even at $1100^{\circ}C$. We report that our newly proposed NiCo silicides may obtain sub 50 nm-thick films by tunning the nickel composition and silicidation temperature. New NiCo silicides from NiCo-alloys may be more appropriate for sub-0.1${\mu}m$ CMOS process, compared to conventional single phase or stacked composit silicides.