• Title/Summary/Keyword: Ni film

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The Effect of Annealing on Corrosion Behavior of CoCrTa/CrNi Magnetic Recording Media (CoCrTa/CrNi 자기기록매체의 열처리에 따른 부식거동 변화)

  • 우준형;남인탁
    • Journal of the Korean Magnetics Society
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    • v.9 no.4
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    • pp.210-216
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    • 1999
  • The objective of this paper is to investigate corrosion behaviors of CoCrTa/CrNi thin film and post heat-treatment effect. An electron beam evaporator was used for films deposition. After evaporation, post heat-treatment was carried out under $5.0{\times}10^3$ Torr vacuum condition. Annealing temperature and time were 400 $^{\circ}C$ and 30 min, respectively. To understand the effect of annealing on corrosion behavior of CoCrTa/CrNi, potentiodynamic polarization technique and accelerated corrosion chamber test were undertaken. Corrosion potential is higher for the annealed samples (CoCrTa 400$\AA$/CrNi 1000$\AA$) than for as-deposited one. This is attributed to an enrichment of Cr in the surface layer of the thinfilm resulting in a more corrosion resistant material.

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Electronic and Electrical Properties of Transparent Conducting Nickel Oxide Thin Films

  • Lee, Kang-Il;Kim, Beom-Sik;Kim, Ju-Hwan;Park, Soo-Jeong;Denny, Yus Rama;Kang, Hee-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.226-226
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    • 2012
  • The electronic and electrical properties of nickel oxide (NiO) thin films were investigated by reflection electron energy loss spectroscopy (REELS), x-ray photoelectron spectroscopy (XPS), and Hall Effect measurements. REELS spectra revealed that the band gap of the NiO thin film was increased from 3.50 eV to 4.02 eV after annealing the sample at $800^{\circ}C$. Our XPS spectra showed that the amount of Ni2O3 decreased after annealing. The Hall Effect results showed that the doping type of the sample changed from n type to p type after annealing. The resistivity decreased drastically from $4.6{\times}10^3$ to $3.5{\times}10^{-2}$ ${\Omega}{\cdot}cm$. The mobility of NiO thin films was changed form $3.29{\times}10^3$ to $3.09{\times}10^5cm^2/V{\cdot}s$. Our results showed that the annealing temperature plays a crucial role in increasing the carrier concentration and the mobility which leads to lowering resistivity of NiO thin films.

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Catalytic NiO Filter Supported on Carbon Fiber for Oxidation of Volatile Organic Compounds

  • Sim, Jong Ki;Seo, Hyun Ook;Jeong, Myung-Geun;Kim, Kwang-Dae;Kim, Young Dok;Lim, Dong Chan
    • Bulletin of the Korean Chemical Society
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    • v.34 no.7
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    • pp.2105-2110
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    • 2013
  • Carbon-fiber-supported NiO catalytic filters for oxidation of volatile organic compounds were prepared by electroless Ni-P plating and subsequent annealing processes. Surface structure and crystallinity of NiO film on carbon fiber could be modified by post-annealing at different temperatures (500 and $650^{\circ}C$). Catalytic thermal decompositions of toluene over these catalytic filters were investigated. $500^{\circ}C$-annealed sample showed a higher catalytic reactivity toward toluene decomposition than $650^{\circ}C$-annealed one under same conditions, despite of its lower surface area and toluene adsorption capacity. X-ray diffraction and X-ray photoelectron spectroscopy studies suggest that amorphous structures of NiO on $500^{\circ}C$-annealed catalyst caused the higher reactivity for oxidation of toluene than that of $650^{\circ}C$-annealed sample with a higher crystallinity.

Optically transparent and electrically conductive indium-tin-oxide nanowires for transparent photodetectors

  • Kim, Hyunki;Park, Wanghee;Ban, Dongkyun;Kim, Hong-Sik;Patel, Malkeshkumar;Yadav, Pankaj;Kim, Joondong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.390.2-390.2
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    • 2016
  • Single crystalline indium-tin-oxide (ITO) nanowires (NWs) were grown by sputtering method. A thin Ni film of 5 nm was coated before ITO sputtering. Thermal treatment forms Ni nanoparticles, which act as templates to diffuse Ni into the sputtered ITO layer to grow single crystalline ITO NWs. Highly optical transparent photoelectric devices were realized by using a transparent metal-oxide semiconductor heterojunction by combining of p-type NiO and n-type ZnO. A functional template of ITO nanowires was applied to this transparent heterojunction device to enlarge the light-reactive surface. The ITO NWs/n-ZnO/p-NiO heterojunction device provided a significant high rectification ratio of 275 with a considerably low reverse saturation current of 0.2 nA. The optical transparency was about 80% for visible wavelengths, however showed an excellent blocking UV light. The nanostructured transparent heterojunction devices were applied for UV photodetectors to show ultra fast photoresponses with a rise time of 8.3 mS and a fall time of 20 ms, respectively. We suggest this transparent and super-performing UV responser can practically applied in transparent electronics and smart window applications.

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Thick Films of LaNiO3 Perovskite Structure Impregnated with In and Bi Oxides as Acetonitrile Sensor

  • Salker, A.V.;Choi, Nak-Jin;Kwak, Jun-Hyuk;Lee, Duk-Dong
    • Journal of Sensor Science and Technology
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    • v.13 no.4
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    • pp.298-302
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    • 2004
  • Thick films of $LaNiO_{3}$ having perovskite structure impregnated with indium and bismuth oxides have been used as sensing material for acetonitrile ($CH_{3}CN$) gas. The sensor response for $CH_{3}CN$ is quite good with an excellent recovery for partial pressure from 3 ppm to 20 ppm between 200 and $250^{\circ}C$. $LaNiO_{3}$ alone has exhibited low response, but after impregnation of $In_{2}O_{3}$ and $Bi_{2}O_{3}$ have given increased sensitivity even with 3 ppm partial pressure of $CH_{3}CN$ at $200^{\circ}C$. It is assumed that $CH_{3}CN$ is undergoing oxidation reaction on surface of the film.

Experimental and Simulation Study of Barrier Properties in Schottky Barrier Thin-Film Transistors with Cr- and Ni- Source/Drain Contacts (Cr- 및 Ni- 소스/드레인 쇼트키 박막 트랜지스터의 장벽 특성에 대한 실험 및 모델링 연구)

  • Jung, Ji-Chul;Moon, Kyoung-Sook;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.10
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    • pp.763-766
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    • 2010
  • By improving the conducting process of metal source/drain (S/D) in direct contact with the channel, schottky barrier metal-oxide-semiconductor field effect transistors (SB MOSFETs) reveal low extrinsic parasitic resistances, offer easy processing and allow for well-defined device geometries down to the smallest dimensions. In this work, we investigated the arrhenius plots of the SB MOSFETs with different S/D schottky barrier (SB) heights between simulated and experimental current-voltage characteristics. We fabricated SB MOSFETs using difference S/D metals such as Cr (${\Phi}_{Cr}$ ~4.5 eV) and Ni (${\Phi}_{Ni}$~5.2 eV), respectively. Schottky barrier height (${\Phi}_B$) of the fabricated devices were measured to be 0.25~0.31 eV (Cr-S/D device) and 0.16~0.18 eV (Ni-S/D device), respectively in the temperature range of 300 K and 475 K. The experimental results have been compared with 2-dimensional simulations, which allowed bandgap diagram analysis.

Catalytic Oxidation of Toluene Using NiO Filter Supported on Carbon Fiber

  • Sim, Jong Ki;Seo, Hyun Ook;Jeong, Myung-Geun;Kim, Kwang-Dae;Nam, Jong Won;Kim, Young Dok;Lim, Dong Chan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.217-217
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    • 2013
  • Carbon-fiber-supported NiO catalytic filters for oxidation of volatile organic compounds were prepared by electroless Ni-P plating and subsequent annealing processes. Surface structure and crystallinity of NiO film on carbon fiber could be modified by post-annealing at different temperatures (500 and $650^{\circ}C$. Catalytic thermal decompositions of toluene over these catalytic filters were investigated. $500^{\circ}C$ annealed sample showed a higher catalytic reactivity toward toluene decomposition than $650^{\circ}C$ annealed one under same conditions, despite of its lower surface area and toluene adsorption capacity. X-ray diffraction and X-ray photoelectron spectroscopy studies suggested that amorphous structures of NiO on $500^{\circ}C$ annealed catalyst caused the higher reactivity for oxidation of toluene than that of $650^{\circ}C$ annealed sample with a higher crystallinity.

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Corrosion and Passivation of Nickel Rotating Disk Electrode in Borate Buffer Solution (Borate 완충용액에서 니켈 회전원판전극의 부식과 부동화)

  • Kim, Younkyoo
    • Journal of the Korean Chemical Society
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    • v.57 no.5
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    • pp.533-539
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    • 2013
  • The electrochemical corrosion and passivation of Ni rotating disk electrod in borate buffer solution was studied with potentiodynamic and electrochemical impedance spectroscopy. The mechanisms of both the active dissolution and passivation of nickel and the hydrogen evolution in reduction reaction were hypothetically established while utilizing the Tafel slope, impedance data, the rotation speed of Ni-RDE and the pH dependence of corrosion potential and current. Based on the EIS data, an equivalent circuit was suggested. In addition, carefully measured were the electrochemical parameters for specific anodic dissolution regions. It can be concluded from the data collected that the $Ni(OH)_2$ oxide film, which is primarily formed by passivation, is converted to NiO by dehydration under the influence of an electrical field.

Sintering Characteristics of Nickel Silicide Alloy (니켈 실리사이드 화합물의 소결특성)

  • Byun, Chang-Sop;Lee, Sang-Hou
    • Korean Journal of Materials Research
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    • v.16 no.6
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    • pp.341-345
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    • 2006
  • [ $Ni_2Si$ ] mixed powders were mechanically alloyed by a ball mill and then processed by hot isostatic pressing (HIP) and spark plasma sintering (SPS). In the powder that was mechanically alloyed for 15minutes(MA 15 min), only Ni and Si were observed but in the powder that was mechanically alloyed for 30minutes(MA 30 min), $Ni_2Si$, Ni and Si were mixed together. Some of the MA 15 min powder and MA 30 min powder were processed by HIP under pressure of 150MPa at the temperature of $1000^{\circ}C$ for two hours and some of them were processed by SPS under pressure of 60 MPa at the temperature of $1000^{\circ}C$ for 60 seconds. Both methods completely compounded the powders to $Ni_2Si$. The maximum density of sintered lumps by HIP method was 99.5% and the maximum density of the sintered lump by SPS method was 99.3%. with the hardness of HRc 66 with the hardness of HRc 63. Therefore, the SPS method that can sinter in short time at low cost is considered to be more economical that the HIP method that requires complicated sintering conditions and high cost and the sintering can produce target materials in desired sizes and shapes to be used for thin film.

Gas Sensing Characteristics and Doping Effect of $MoO_3$ Thin Films prepared by RF magnetron sputtering (RF magnetron sputtering법으로 제조한 $MoO_3$ 박막의 가스 감지 특성 및 첨가물의 영향)

  • Hwang, Jong-Taek;Jang, Gun-Eik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.460-463
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    • 2002
  • $MoO_3$ thin films were deposited on electrode and heater screen-printed alumina substrates in $O_2$ atmosphere by RF reactive sputtering using Molybdenum metal target. The deposition was performed at $300^{\circ}C$ with 350W of a forward power in an $Ar-O_2$ atmosphere. The working pressure was maintained at $3{\times}10^{-2}mtorr$ and all deposited films were annealed at $500^{\circ}C$ for 5hours. To investigate gas sensing characteristics of the addition doped $MoO_3$ thin film, Co, Ni and Pt were used as adding dopants. The sensing properties were investigated in tenn of gas concentration under exposure of reducing gases such as $H_2$, $NH_3$ and CO at optimum working temperature. Co-doped $MoO_3$ thin film shows the maximum 46.8% of sensitivity in $NH_3$ and Ni-doped $MoO_3$ thin film exhibits 49.7% of sensitivity in $H_2$.

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