• 제목/요약/키워드: Ni film

검색결과 866건 처리시간 0.039초

Nickel Phosphide Electroless Coating on Cellulose Paper for Lithium Battery Anode

  • Kang, Hyeong-Ku;Shin, Heon-Cheol
    • Journal of Electrochemical Science and Technology
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    • 제11권2호
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    • pp.155-164
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    • 2020
  • Here we report our preliminary results about nickel phosphide (Ni-P) electroless coating on the surface of cellulose paper (CP) and its feasibility as the anode for lithium (Li) batteries. In particular, CP can act as a flexible skeleton to maintain the mechanical structure, and the Ni-P film can play the roles of both the anode substrate and the active material in Li batteries. Ni-P films with different P contents were plated uniformly and compactly on the microfiber strands of CP. When they were tested as the anode for Li battery, their theoretical capacity per physical area was comparable to or higher than hypothetical pure graphite and P film electrodes having the same thickness. After the large irreversible capacity loss in the first charge/discharge process, the samples showed relatively reversible charge/discharge characteristics. All samples showed no separation of the plating layer and no detectable micro-cracks after cycling. When the charge cut-off voltage was adjusted, their capacity retention could be improved significantly. The electrochemical result was just about the same before and after mechanical bending with respect to the overall shape of voltage curve and capacity.

Improvement of Electrochemical Properties and Thermal Stability of a Ni-rich Cathode Material by Polypropylene Coating

  • Yoo, Gi-Won;Son, Jong-Tae
    • Journal of Electrochemical Science and Technology
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    • 제7권2호
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    • pp.179-184
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    • 2016
  • The interface between the surface of a cathode material and the electrolyte gives rise to surface reactions such as solid electrolyte interface (SEI) and chemical side reactions. These reactions lead to increased surface resistance and charge transfer resistance. It is consequently necessary to improve the electrochemical characteristics by suppressing these reactions. In order to suppress unnecessary surface reactions, we coated cathode material using polypropylene (PP). The PP coating layer effectively reduced the SEI film that is generated after a 4.3 V initial charging process. By mitigating the formation of the SEI film, the PP-coated Li[(Ni0.6Co0.1Mn0.3)0.36(Ni0.80Co0.15Al0.05)0.64)]O2(NCS) electrode provided enhanced transport of Li+ ions due to reduced SEI resistance (RSEI) and charge transfer resistance (Rct). The initial charge and discharge efficiency of the PP-coated NCS electrode was 96.2 % at a current density of 17 mA/g in a voltage range of 3.0 ~ 4.3 V, whereas the efficiency of the NCS electrode was only 94.7 %. The presence of the protective PP layer on the cathode improved the thermal stability by reducing the generated heat, and this was confirmed via DSC analysis by an increased exothermic peak.

Synthesis of Few-layer Graphene Film on a Ni Substrate by Using Filtered Vacuum Arc Source Method

  • 김창수;서지훈;강재욱;김도근;김종국;이형우
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.157-157
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    • 2011
  • Graphene has generated significant interest in the recent years as a functional material for electronics, sensing, and energy applications due to its unique electrical, optical, and mechanical properties. Much of the considerable interest in graphene stems from results obtained for samples mechanically exfoliated from graphite. Practical applications, however, require reliable and well-controlled methods for fabrication of large area graphene films. Recently high quality graphene layers were fabricated using chemical vapor deposition (CVD) on nickel and copper with methane as the source of the carbon atoms. Here, we report a simple and efficient method to synthesize graphene layers using solid carbon source. Few-layer graphene films are grown using filtered vacuum arc source (FVAS) technique by evaporation of carbon atom on Ni catalytic metal and subsequent annealing of the samples at 800$^{\circ}$C. In our system, carbon atoms diffuse into the Ni metal layer at elevated temperatures followed by their segregation as graphene on the free surface during the cooling down step as the solubility of carbon in the metal decrease. For a given annealing condition and cooling rate, the number of graphene layers is easily controlled by changing the thickness of the initially evaporated amorphous carbon film. Based on the Raman analysis, the quality of graphene is comparable to other synthesis methods found in the literature, such as CVD and chemical methods.

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Effect of Vacuum Annealing on Thin Film Nickel Silicide for Nano Scale CMOSFETs

  • Zhang, Ying-Ying;Oh, Soon-Young;Kim, Yong-Jin;Lee, Won-Jae;Zhong, Zhun;Jung, Soon-Yen;Li, Shi-Guang;Kim, Yeong-Cheol;Wang, Jin-Suk;Lee, Hi-Deok
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.10-11
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    • 2006
  • In this study, the Ni/Co/TiN (6/2/25 nm) structure was deposited for thermal stability estimation. Vacuum (30 mTorrs) annealing was carried out to compare with furnace annealing in nitrogen ambient. The proposed Ni/Co/TiN structure exhibited low temperature silicidation and wide range of rapid thermal process (RTP) windows. The sheet resistance was too high to measure after furnace annealing at $600^{\circ}C$ due to the thin thickness (15 nm) of the nickel silicide. However, the sheet resistance maintained stable characteristics up to $600^{\circ}C$ for 30 min after vacuum annealing. Therefore, the low resistance of thin film nickel silicide was obtained by vacuum annealing at $600^{\circ}C$.

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초고주파 응용을 위한 (100) 방향으로 성장된 PST / $LaNiO_3$박막의 구조적, 유전적 특성 (Dielectric and Structural properties of highly oriented $PST/LaNiO_3$ Thin Films for Microwave application)

  • 엄준철;이성갑;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.648-651
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    • 2004
  • Pb0.5Sr0.5TiO3(PST) thin films were deposited on the LaNiO3 (LNO(100))/Si and Pt/Ti/SiO2/Si substrates by the alkoxide-based sol-gel method. Structural and dielectric properties of PST thin films for the tunable microwave device applications were investigated. The PST films, which were directly grown on the Pt/Ti/SiO2/Si substrates showed the random orientation. For the LNO/Si substrates, the PST thin films exhibited highly (100) orientation. Compared with randomly oriented films, the highly (100)-oriented PST thin films showed better dielectric constant, tunability, and figure of merit (FOM). The dielectric constant, tunability, and FOM of the highly (100)-oriented PST thin film increased with increasing annealing temperature due to the decrease in lattice distortion. The differences in dielectric properties may be attributed to the change in the film stress and the in-plane oriented Polar axis depending on the substrate was used. The dielectric constants, dielectric loss and tunability of the PST thin films deposited on the LNO/Si substrates measured at 1 MHz were 483, 0.002, and 60.1%, respectively.

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상보형 일렉트로크로믹 소자의 제조 및 특성 ( I ) (Characteristics and Fabrication of Complementary Electrochromic Device ( I ))

  • 이석윤;서동규;김영호;조동율;천희곤
    • 센서학회지
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    • 제6권1호
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    • pp.24-34
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    • 1997
  • 본 연구에서는 비정질 $WO_{3}$ 박막을 작용전극으로 $V_{2}O_{5}$ 박막과 NiO 박막을 각각의 대향전극으로 사용한 두 종류의 상보형 일렉트로크로믹 소자를 제작하고 그 특성을 조사 연구하였다. 그 결과 $100{\sim}150nm$ 두께로 진공증착된 $V_{2}O_{5}$ 박막을 대향전극으로 이용하여 제작된 $ITO/WO_{3}/LiClO_{4}-PC/V_{2}O_{5}/ITO$ 구조의 상보형 소자에서는 $1{\sim}2V$ 정도의 낮은 인가전압에서 광변조량이 $50{\sim}60%$를 나타내는 우수한 특성을 나타냈다. 그리고, RF 반응성 스퍼터링 방법으로 제작된 NiO 박막을 대향전극으로 이용한 $ITO/WO_{3}/LiClO_{4}-PC/NiO/ITO$ 구조의 경우 1.5V의 인가전압에 가시광선 영역(${\lambda}=550nm$)에서 약 25% 정도, 근적외선 영역(${\lambda}=850nm$)에서 약 30% 정도의 태양광을 변조할 수 있는 특성을 보였다.

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자동차용 폐 리튬 이차전지 모듈의 안정적 해체와 알루미늄 박막으로부터 양극활물질의 분리공정 개발 (Safe Decomposition of the Vehicle Waste Battery Module and Development of Separation Process of Cathode Active Material from Aluminum Thin Film)

  • 김연정;오인경;홍용표;유건상
    • 대한화학회지
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    • 제63권6호
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    • pp.440-445
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    • 2019
  • 본 연구는 자동차 폐리튬 이차전지의 모듈로부터 재생할 수 있는 자원을 효율적으로 회수하는 방법을 개발하는 것이다. 모듈의 셀은 구리 박막, 알루미늄 박막, 그리고 이들 사이는 폴리머 재질의 격막으로 이루어져 있다. 셀은 특별히 제작한 글러브 상자 안에서 그리고 여러 번의 단계를 거쳐 손상 없이 완전히 해체 하였다. 우선적으로 양극활물질은 400 ℃에서 열처리하여 알루미늄 박막으로부터 분리하였다. 그런 후 분리된 양극활물질은 잔류되어 있는 탄소 성분을 제거하기 위해 800 ℃에서의 소성 후에 최종적으로 높은 순도로 회수되었다. 본 연구 결과를 바탕으로 해서, 알루미늄 박막으로부터 양극활물질을 구성하고 있는 코발트(Co), 니켈(Ni), 망간(Mn), 리튬(Li)과 같은 희유금속들을 80% 이상 회수할 수 있었다.

표면파의 분산 특성을 이용한 Ni 박막의 두께 측정 (Thickness Measurement of Ni Thin Film Using Dispersion Characteristics of a Surface Acoustic Wave)

  • 박태성;곽동열;박익근;김미소;이승석
    • 비파괴검사학회지
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    • 제34권2호
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    • pp.171-175
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    • 2014
  • 본 연구에서는 박막 표면을 따라 전파하는 표면파의 속도 분산성을 이용하여 박막의 두께를 비파괴적으로 측정할 수 있는 기법을 제안하였다. 표면파의 분산성을 이용하여 박막의 두께를 측정하기 위하여 전자빔증착법(E-beam evaporation)을 이용하여 Si(100) 웨이퍼 위에 니켈의 증착시간을 제어함으로서 두께가 다른 니켈 박막시험편을 제작하였다. 제작된 시험편의 실제 증착된 박막의 두께를 확인하기 위하여 SEM(scanning electron microscope)을 이용하여 박막의 단면사진을 촬영하여 두께를 확인하였다. 그 후에 두께가 다른 시험편에서의 표면파의 속도를 초음파현미경(scanning acoustic microscope)의 V(z) 곡선법을 이용하여 표면파의 속도를 측정하고 실제 측정된 두께와 표면파 속도와의 상관성을 확인하였다. 박막의 두께가 증가함에 따라 표면파의 속도는 감소하는 경향성을 나타내었다. 결론적으로 본 연구에서 제안한 표면파의 속도 분산성을 이용하여 나노 스케일 니켈 박막의 두께를 측정하는 기법이 가능성이 있음을 확인하였다.

비정질 V2O5 중간층 삽입을 통한 고성능 LNMO기반 박막 배터리 개발 (Development of High-Performance LNMO Based Thin-Film Battery through Amorphous V2O5 Interlayer Insertion)

  • 권오혁;김종헌;박준섭;김현석
    • 한국전기전자재료학회논문지
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    • 제35권2호
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    • pp.194-198
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    • 2022
  • All-solid-state thin-film battery can realize the integration of electronic circuits into small devices. However, a high voltage cathode material is required to compensate for the low energy density. Therefore, it is necessary to study all-solid-state thin-film battery based on the high voltage cathode material LNMO. Nevertheless, the electrochemical properties deteriorate due to the problem of the interface between LiNi0.5Mn1.5O4 (LNMO) and the solid electrolyte LiPON. In this study, to solve this problem, amorphous V2O5 was deposited as an interlayer between LNMO and LiPON. We confirmed the possibility of improving cycle performance of LNMO based thin-film battery. We expect that the results of this study can extend the battery lifespan of small devices using LNMO based all-solid-state thin-film battery.

The Effect of Chamber Pressure and Nitrogen Flow Rate on Deposition Characteristics of $(Ni_{0.8}Fe_{0.2})_{20}Ag_{80}$ Thin Films

  • Oh, T.S.;Choo, W.K.
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1997년도 Proceedings of the 12th KACG Technical Meeting and the 4th Korea-Japan EMGS (Electronic Materials Growth Symposium)
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    • pp.275-280
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    • 1997
  • We have investigated the deposition characteristics of (Ni0.8Fe0.2)20Ag80 thin films as a function of chamber pressure and nitrogen flow rate with scanning electron microscopy(SEM), atomic force microscopy(AFM), XRD and $\alpha$-step. The deposition rate of these film is decreased with increasing the chamber pressure and the nitrogen flow rate. With raising the chamber pressure, the growth mode of thin film is changed from island growth to columnar one, which is probably due to energy of atom. Contrary, the nitrogen flow rate is raised, growth mode is changed from columnar to island one. According to the XRD patterns, the preferred orientation is inhibited as the nitrogen flow rate is kept above 10 sccm, but that is nearly independent on the chamber pressure. When the chamber pressure decrease or the nitrogen flow rate increase, phase separation into permoally and silver is occured.

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