• Title/Summary/Keyword: Ni film

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The Effects of Deposition Rates on Exchange Coupling and Magnetoresistance in NiO Spin-Valve Films

  • D. G. Hwang;Park, C. M.;Lee, S. S.;Lee, K. A.
    • Journal of Magnetics
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    • v.2 no.4
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    • pp.143-146
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    • 1997
  • The effects of deposition rate on exchange coupling field Hex and coercive field Hc in NiO spin-valves are discussed. The Hex and Hc increased with deposition rate of NiO film. The rms roughnesses of the NiO deposited at 6 ${\AA}$/min (NiO-Low) and 30${\AA}$/min (NiO-High) were almost similar, however, the short-range roughness increased with the deposition rate. The Hex, Hc and surface morphologies for the modulated NiO spin-valve films such as NiO-Low\NiO-High\NiO-Low and NiO-High\NiO-Low were investigated.

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