• 마이크로전자및패키징학회지
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• 제9권4호
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• pp.47-53
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• 2002

본 연구에서는 습식법으로 합성된 초미세분말을 원료로 사용하여 제조된 (NiCuZn)-ferrite와 시약급원료를 사용하여 제조된 (NiCuZn)-ferrite의 저온소결 특성 및 전자기적 특성을 고찰하고, 상호 비교 분석하였다. 조성은$(Ni_{0.4-x}Cu_xZn_{0.6})_{1+w}(Fe_2O_4)_{1-w}$에서 x의 값을 0.2, w의 값은 0.03으로 고정하였고, 소결은 습식법으로 합성된 분말의 경우, 초기열처리과정을 거쳐 최종적으로 $900^{\circ}C$에서, 건식법의 경우 $1150^{\circ}C$의 온도에서 진행하였다. 그 결과, 습식법으로 제조된 (NiCuZn)-ferrite는 건식법으로 제조된 (NiCuZn)-ferrite보다 $200^{\circ}C$이상 낮은 소결온도에서 높은 소결밀도 값을 가졌으며, 품질계수 등 칩인덕터에서 중요한 요소인 전자기적 특성이 우수하게 나타났다. 또한, 습식법으로 합성된 페라이트는 분말의 초기열처리온도에 따라 최종소결 특성이 크게 변하였다. 그 밖에 습식법과 건식법으로 합성한(NiCuZn)-ferrite의 결정성, 미세구조들을 XRD, SEM, TEM을 이용하여 비교 고찰하였다.

• 한국분말재료학회지
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• 제14권2호
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• pp.108-115
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• 2007

Cu-Ni-P alloy nano powders were fabricated by the electrical explosion of electroless Ni plated Cu wires. The effect of applied voltage on the explosion was examined by applying pulse voltage of 6 and 28 kV, The estimated overheating factor, K, were 1.3 for 6 kV and 2.2 for 28 kV. The powders produced with pulse voltage of 6 kV were composed of Cu-rich solid solution, Ni-rich solid solution, and $Ni_3P$ phase. While, those produced with 28 kV were complete Cu-Ni-P solid solution and small amount of $Ni_3P$ phase. The initial P content of 6.5 at.% was reduced to 2-3 at.% during explosion due to its high vapour pressure.

• 마이크로전자및패키징학회지
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• 제19권2호
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• pp.35-39
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• 2012

플립칩 접합시 발생하는 계면반응 거동과 접합특성을 계면에 생성되는 금속간화합물의 관점에서 접근하였다. 이를 위하여 Al/Cu와 Al/Ni의 under bump metallization(UBM) 층과 Sn-Cu계 솔더(Sn-3Cu, Sn-0.7Cu)와의 반응에 의한 금속간화합물의 형성거동 및 계면접합성을 분석하였다. Al/Cu UBM 상에서 Sn-0.7Cu 솔더를 리플로우한 경우에는 솔더/UBM 계면에서 금속간화합물이 형성되지 않았으며, Sn-3Cu를 리플로우한 경우에는 계면에서 생성된 $Cu_6Sn_5$ 금속간화합물이 spalling 되어 접합면이 분리되었다. 반면에 Al/Ni UBM 상에서 Sn-Cu계 솔더를 리플로우한 경우에는 0.7 wt% 및 3 wt%의 Cu 함량에 관계없이 $(Cu,Ni)_6Sn_5$ 금속간화합물이 계면에 형성되어 있었으며, 계면접합이 안정적으로 유지되었다.

• 한국표면공학회지
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• 제44권3호
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• pp.117-123
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• 2011

We investigated the spectroscopic and electrochemical properties of the citrate-based CuNi solution at different solution pH and analyzed various surface properties of CuNi codeposition layer. By combining UV-Visible spectroscopic data with potentiodynamic polarization curves, it could be found that the complexation of $Ni^{2+}$-citrate pair was completed at lower solution pH than $Cu^{2+}$-citrate pair and was affected by the coexistent $Cu^{2+}$ ions, while the complexation between $Cu^{2+}$ ions and citrate was not sensitive to the presence of $Ni^{2+}$ ions. Also, the electron transfer from cathode to $Cu^{2+}$-citrate and$Ni^{2+}$-citrate was hindered by strong complexation between $Cu^{2+}/Ni^{2+}$ ions and citrate and so apparent codeposition current densities were reduced as the solution pH increases. CuNi codeposited layers had a higher Cu content when they were prepared at high pH solution due to the suppression of Ni deposition, and when codeposition was executed in an agitated condition due to the acceleration of mass transfer of $Cu^{2+}$ ions in the solution. Actually, solution pH had little effect on the surface morphology and deposits orientation, but greatly influenced the corrosion resistance in 3.5% NaCl solution by modifying the chemical composition of CuNi layers and so pH 3 was expected as the most suitable solution pH in the viewpoint of corrosion coatings.

• 한국자기학회지
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• 제20권4호
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• pp.129-133
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• 2010

초연자성을 띠는 코네틱(Conetic; NiFeCuMo) 박막을 상호 중간층으로 강자성체인 CoFe 또는 NiFe 박막 사이에 삽입한 코닝 유리(Corning glass)/Ta(5 nm)/[CoFe or NiFe(5 nm-t/2)]/NiFeCuMo(t = 0, 4, 6, 8, 10 nm)/[CoFe or NiFe(5 nm-t/2)]/Ta(5 nm) 3층 박막구조에 대한 자기적 특성을 조사하였다. CoFe와 NiFe 박막의 자기적 특성은 박막의 두께에 따라 크게 결정되므로 자화 곤란축과 자화 용이축으로 측정된 이방성 자기저항 곡선으로부터 얻은 보자력과 자화율을 각각 비교하였다. 특히 3층 박막구조에서 NiFe 박막 사이에 자유층으로 NiFeCuMo 박막을 삽입하면 높은 자기저항비를 유지하면서 향상된 자장감응도를 유지하는 고감도 바이오센서용 거대자기저항-스핀밸브(giant magnetoresistive-spin valves; GMR-SV) 및 자기터널접합(magnetic tunnel junction; MTJ) 소자로 활용할 수 있다.

• 한국재료학회지
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• 제15권11호
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• pp.735-740
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• 2005

The phase transformation of Ni-B diffusion barrier by Cu diffusion was studied. The Ni-B diffusion barrier, thickness of 10(Inn, was electrolessly deposited on the electroplated Cu interconnect. The specimens were annealed either in Ar atmosphere or in $H_2$ atmosphere from $300^{\circ}C\;to\;800^{\circ}C$ for 30min, respectively. Although the Ni-B coated specimens showed the decomposition of $Ni_3B$ above $400^{\circ}C$ in both Ar atmosphere and $H_2$ atmosphere, Ni-B powders did not show the decomposition of $Ni_3B$. The $Ni_3B$ was decomposed to Ni and B in hi atmospherr: and the metallic Ni formed the solid solution with Cu and the free B was oxidized to $B_2O_3$. However, both the boron hydride and free B were not observed in the diffusion barrier after the annealing in $H_2$ atmos There. These results revealed that the decomposition of $Ni_3B$ by Cu made the Cu diffusion continued toward the Ni-B diffusion barrier.

• 한국표면공학회지
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• 제27권4호
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• pp.223-233
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• 1994

It is well known that compositionally modulated Cu-Ni alloy can be produced by an electrochemical method in Ni sulfate solution containing trace amount of Cu. a mathematical model is presented to describe the current distribution and weight percent of Cu in Ni layer on the rotating disk electrode. The model includes convective-diffusion equation, the Laplace's equation and various overpotentials, and is solved numerically. The thickness of Cu layer is almost uniform whereas the thickness of Ni layer as well as the Ni/Cu weight ratio are increased approaching to the edge of the disk. These results agree well with the experimental values. The ohmic potential drop is suggested as a major cause of a nonuniformity in Ni layer. The optimum plating condition for the fabrication of susperlattice is proposed based on the results of this study.

• 한국자기학회지
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• 제7권3호
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• pp.152-158
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• 1997

Ni$_{66}$Fe$_{16}$ $Co_{18}$ /Cu/Co 삼층막을 4 .deg. tilt-cut Si(111) 기판과 Cu(50 .angs. ) 바닥층 위에 형성하고, 사진식각 및 에칭 작업을 통해 자기저항 메모리 소자를 제작하여 자기저항 메모리 특성을 연구하였다. 외부 자장의 인가 없이 증착한 NiFeCo/Cu/Co 삼층막은 4 .deg. tilt-cut Si(111) 기판과 Cu(50 .angs. ) 바닥층의 영향으로 면내 일축자기이방성을 형성하였으며, 낮은 자장 내에서 높은 자기저항비와 자기저항민감도 등 자기저항 메모리 소자에 응용이 가능한 우수한 자기저항 특성을 나타내었다. NiFeCo/Cu/Co 삼층막의 Cu 사잇층 두께 변화에 따라 삼층막을 이루는 두 자성층 간에 강자성 및 반강자성 결합력이 관찰되었으며, 결합력은 사잇층 두께에 민감하게 변화하여 NiFeCo/Cu/Co 삼층막의 메모리 특성에 영향을 끼쳤다. 사잇층 두께의 변화에 대해 최적화된 [NiFeCo(60 .angs. )/Cu(25 .angs. )/Co(30 .angs. )]/Cu(50 .angs. )/Si(111, 4 .deg. tilt-cut) 스핀밸브 삼층막을 이용하여 거시적 자기저항 메모리 소자를 제작하고, 시험 소자의 메모리 동작에 대해 관찰하였다. Sense 전류는 10 mA로 고정하고, 약 5 * $10^{5}$ A/$cm^{2}$의 word 전류를 가해 약 10 mV의 출력 전압을 시험 소자에서 얻었으며, NiFeCo/Cu/Co 스핀밸브 삼층막의 자기저항 메모리 소자에의 응용 가능성을 확인할 수 있었다.다.

• 한국전기전자재료학회논문지
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• 제30권6호
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• pp.376-380
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• 2017

In this paper, we prepared a metal alloy resistor with stable thermal electro motive force (thermal EMF) as well as a low temperature coefficient of resistance (TCR) by adjusting the manganese proportion from 3 to 12 wt% in the Cu-Mn-Ni alloy. Composition of the fabricated metal alloy was investigated using energy dispersive X-ray (EDX) analysis. The TCR of each sample was measured as 44.56, 40.54, 35.60, and 31.56 ppm for Cu-3Mn-2Ni, Cu-5Mn-2Ni, Cu-10Mn-2Ni, and Cu-12Mn-2Ni, respectively. All the resistor samples were available for the F grade (${\pm}1%$ of the allowable error of resistance) high-precision resistor. All the samples satisfied the baseline of high thermal EMF (under 3 mV at $60^{\circ}C$); however, Cu-3Mn-2Ni and Cu-5Mn-2Ni satisfied the baseline of low thermal EMF (under 0.3 mV at $25^{\circ}C$). We were thus able to design and fabricate the metal alloy resistor of Cu-3Mn-2Ni and Cu-5Mn-2Ni to have low TCR and stable thermal EMF at the same time.

• 한국세라믹학회지
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• 제45권12호
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• pp.807-814
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• 2008

The Cu-Ni-YSZ cermet anodes for direct use of methane in solid oxide fuel cells have been fabricated by electroplating Cu into the porous Ni-YSZ cermet anode. The uniform distribution of Cu in the Ni-YSZ anode could be obtained via pulse electroplating in the aqueous solution mixture of $CuSO_4{\cdot}5H_{2}O$ and ${H_2}{SO_4}$ for 30 min with 0.05 A of average applied current. The power density ($0.17\;Wcm^{-2}$) of a single cell with a Cu-Ni-YSZ anode was shown to be slightly lower in methane at $700^{\circ}C$, compared with the power density ($0.28\;Wcm^{-2}$) of a single cell with a Ni-YSZ anode. However, the performance of the Ni-YSZ anode-supported single cell was abruptly degraded over 21 h because of carbon deposition, whereas the Cu-Ni-YSZ anode-supported single cell showed the enhanced durability upto 52 h.