• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.11
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• pp.2236-2241
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• 2009

In this study, the electron behavior was investigated numerically in order to obtain guidelines for design and operation of a new plasma source by a magnetic neutral loop discharge (NLD). The optimum plasma production was investigated by using a 3-dimensional simulation model which enables the electron behavior calculation from source region to downstream region. The results showed that the high-density plasma produced around the magnetic neutral loop (NL) is transferred from the NL region to the downstream region along magnetic force lines. Also the avaraged electron energy is increased with the normalized RF electric field (F), which can be used to characterize the plasma production efficiency of NLD system. Considering the relation between F and plasma production, in-depth plasma control can be achieved at a given specific process condition.

• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.4
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• pp.107-112
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• 2001

Laser Thomson scattering measurements of electrom temperature and density in a neutral loop discharge (NLD) plasma were performed in order to reveal the electron behavior around the neutral loop (NL). The experimental results were examined by using a simulation model that included effects of a three dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma posses the electron temeprature $T_{e}$ and density ne peaks around the NL is essential for the formation of plasma. Also, the optimum condition of plasma production could be simply estimated by the calculation of $U_{av}$ and $F_{0}$././.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.50 no.6
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• pp.281-287
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• 2001

In order to obtain guidelines for design and operation of a new plasma source by a magnetic neutral loop discharge(NLD), the electron behavior was studied experimentally and numerically. Experimentally, the magnetic field gradient was changed over a wide range, and it was found that there existed an optimum value for efficient plasma production. Analyses of the electron behavior were performed using a model that included effects of a three dimensional electromagnetic field configuration considering the spatial decay of the electric field, and the limitation to the motion of electron caused by the existence of walls and thus electron loss at wall surfaces. These three dimensional factors were found to explain the existence of the optimum magnetic field gradient. It was shown that the L dependence of the plasma production efficiency was firstly decided by the finite decay length of the electric field strength, which was further modified by electron elastic collisions with neutral atoms which drove the electron to walls. The latter effect tends to reduce the optimum value of L.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.138-138
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• 2003

광대역 LiNbO$_3$ 광변조기의 초고속 광 변조 구현을 위해서는 RF/ optical 속도 정합 및 임피던스 매칭 조건 하에서 낮은 구동전압을 얻을 수 있는 ridge 구조의 제작이 필수적이며 이런 구조 제작하기 위해서는 식각 속도와 식각면 거칠기 식각 profile 및 식각 과정에서의 반응물의 감소 등과 같은 개선을 위한 연구가 필요하다. 본 연구에서는 LiNbO$_3$ 기판 위에 메탈 마스크를 형성한 후 비등방성 (anisotropic) 건식 식각 방법인 NLD (Neutral Loop Discharge)로 플라즈마 식각을 하였다. NLD plasma 식각은 1Pa 이하의 압력에서 낮은 전자 온도를 갖는 고밀도 플라즈마를 생성하고 이온 플라즈마를 형성하여 LiNbO$_3$ 표면의 원자와 분자를 이온충돌효과를 이용하여 물리적인 식각과 discharge로 형성된 레디칼 (radical)과의 상호작용에 의한 화학적 식각 메커니즘에 의한 방법으로 plasma에 의한 시편의 손상이 적으며 식각 속도가 또한 높은 것이 특징이다. 본 논문에서는 안테나 파워와 가스의 유량에 따른 LiNbO$_3$ 식각 profile 특성에 관하여 연구 하고자 한다.

• Journal of the Korean Ceramic Society
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• v.42 no.4
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• pp.232-236
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• 2005

The etching characteristics of a $LiNbO_{3}$ optical waveguide structure have been investigated using neutral loop discharge plasma with the mixture of $C_{3}F_{8}$ and Ar and the bias power parameters. The etching rate and profile angle of optical waveguide with etching parameters were evaluated by scanning electron microscopy. Also, the etching RMS roughness was evaluated by atomic force microscopy. From the results of optimum etching conditions are the $C_{3}F_{8}$ gas flow ratio of 0.2 and the bias power of 300 W.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.8
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• pp.731-735
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• 2003

Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.