• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.10
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• pp.231-238
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• 2013

This paper describes a DC-DC converter IC for Flat Panel Displays. In case of operate LCD devices various type of DC supply voltage is needed. This device can convert DC voltage from 6~14[V] single supply to -5[V], 15[V], 23[V], and 3.3[V] DC supplies. In order to meet current and voltage specification considered different type of DC-DC converter circuits. In this work a negative charge pump DC-DC converter(-5V), a positive charge pump DC-DC converter(15V), a switching Type Boost DC-DC converter(23V) and a buck DC-DC converter(3.3V). And a oscillator, a thermal shut down circuit, level shift circuits, a bandgap reference circuits are designed. This device has been designed in a 0.35[${\mu}m$] triple-well, double poly, double metal 30[V] CMOS process. The designed circuit is simulated and this one chip product could be applicable for flat panel displays.

• Journal of Electrical Engineering and Technology
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• v.5 no.4
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• pp.614-622
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• 2010

This paper presents a control method, which reduces the pulsating torque and DC voltage problems of a doubly fed induction generator (DFIG)-based wind turbine system. To reduce the torque and power ripple, a current control scheme consisting of a proportional integral (PI) controller is presented in a positive synchronously rotating reference frame, which is capable of providing precise current control for a rotor-side converter with separated positive and negative components. The power theory can reduce the oscillation of the DC-link voltage in the grid-side converter. In this paper, the generator model is examined, and simulation results are obtained with a 3 kW DFIG-based wind turbine system to verify the proposed control strategy.

• Journal of international Conference on Electrical Machines and Systems
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• v.3 no.2
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• pp.155-161
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• 2014

Industrial Static Var Generator (SVG) is typically applied at or near the load center to mitigate voltage fluctuation, flicker, phase unbalance, non-sine distortion or other load-related disturbance. Special attention is paid to the influence of grid voltage quality on SVG current, the non-sine distortion and unbalance of grid voltage causes not only the AC current distortion and unbalance but also the DC voltage fluctuation. In order to let the inverter voltage contain the fundamental negative sequence and harmonic component corresponding to the grid voltage, a new dual-loop control scheme is proposed to suppress the influence in this paper. The harmonic and negative sequence voltage decomposition algorithm and DC voltage control are also introduced. All these analyses can guide the practical applications. The simulation results verify the feasibility and effectiveness of the present control strategy and analyses.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.16 no.10
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• pp.2237-2246
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• 2012

A bias circuit required for an oral sensor is manufactured inside the oral sensor chip to reduce its size and cost. The proposed DC-DC converter supplies the required reference and bias currents for their corresponding regulators by using IREF of the reference current generator. Their target voltages of the voltage regulators are regulated by the negative mechanism by generating their reference voltages required for their corresponding regulators. In addition, a constant current IB0/IB1 is supplied by being mirrored by a current mirror ratio and then VREF is generated. It is confirmed by measurements that the average volatge, ${\sigma}$, and $4{\sigma}$ of the designed DC-DC converter for intra oral sensors with a $0.18{\mu}m$ X-ray CMOS process are within their required ranges. And the line-pair pattern image shows a high-resolution characteristic without blurring. Also, a good oral image can be obtained.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.11a
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• pp.233-236
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• 1997

An investigation has been made of the various plasma chemistry reactions that occur in the corona discharge of an electrostatic precipitator operating in a typical flue gas. As the results of investigation, sulphur dioxide is removed principally by reactions with OH radicals to produce sulphuric acid, while nitrogen oxides are removed principally by reduction via the N radical to molecular nitrogen. If electrostatic precipitator\ulcorner used for flue gases are operated with positive voltages instead of negative dc voltages, there are significant reductions in the emission of the undesirable gases SO$_2$, NO, and NO$_2$. Thus, in this paper we design the bidirectional pulse generator for removal of flue gas, where the pulse width is more than 50[nsec] and the maximum output voltage is more than 100[kVl.

• The Transactions of the Korean Institute of Power Electronics
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• v.23 no.2
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• pp.86-93
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• 2018

In this work, control methods and operating modes are proposed to manage standalone microgrid. A standalone microgrid generally consists of two sources, namely, battery energy storage system (BESS) and diesel generator (DG). BESS is the main source that supplies active and reactive power regardless of load conditions, whereas DG functions as an auxiliary power source. BESS operates in a constant voltage constant frequency (CVCF) control, which includes proportional-integral + resonant controller in a parallel structure. In CVCF control, the concept of fundamental positive and negative transformation is utilized to generate a three-phase sinusoidal voltage under imbalanced load condition. Operation modes of a standalone microgrid are divided into three modes, namely, normal, charge, and manual modes. To verify the standalone microgrid along with the proposed control methods, a demonstration site is constructed, which contains 115 kWh lead-acid battery bank, 50 kVA three-phase DC - AC inverter, and 50 kVA DG and controllable loads. In the CVCF control, the total harmonic distortion of output voltage is improved to 1.1% under imbalanced load. This work verifies that the standalone microgrid provides high-quality voltage, and three operation modes are performed from the experimental results.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.