• Korean Journal of Materials Research
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• v.29 no.9
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• pp.547-552
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• 2019

In the present study, the thermal conductivity of a silicon nitride($Si_3N_4$) thin-film is evaluated using the dual-wavelength pump-probe technique. A 100-nm thick $Si_3N_4$ film is deposited on a silicon (100) wafer using the radio frequency plasma enhanced chemical vapor deposition technique and film structural characteristics are observed using the X-ray reflectivity technique. The film's thermal conductivity is measured using a pump-probe setup powered by a femtosecond laser system of which pump-beam wavelength is frequency-doubled using a beta barium borate crystal. A multilayer transient heat conduction equation is numerically solved to quantify the film property. A finite difference method based on the Crank-Nicolson scheme is employed for the computation so that the experimental data can be curve-fitted. Results show that the thermal conductivity value of the film is lower than that of its bulk status by an order of magnitude. This investigation offers an effective way to evaluate thermophysical properties of nanoscale ceramic and dielectric materials with high temporal and spatial resolutions.

• Journal of the Korean Magnetics Society
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• v.21 no.5
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• pp.185-192
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• 2011

The technique of producing thin film plays a crucial role in modern science and technology as well as in industrial purposes. Numerous efforts have been made to get high quality thin film through surface treatment of materials. PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two of the most popular deposition techniques used in both scientific study and industrial use. It is well known that the film deposited by PVD and CVD commonly possesses a columnar microstructure which affects many film properties. In recent years, various types of deposition sources which feature high material uses and excellent film properties have been developed. Electromagnetic levitation source appeared as an alternative deposition source to realize high deposition rate for industrial use. Complex film structures such as nano multilayer and multi-components have been prepared to achieve better film properties. Glancing angle deposition (GLAD) has also been developed as a technique to engineer the columnar structure of thin films on the micro- and nanoscale. In this paper, the trends and major issues of thin film technology based on PVD and CVD have been discussed together with the prospect of thin film technology.

• Journal of the Korean Applied Science and Technology
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• v.39 no.1
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• pp.34-41
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• 2022

As the use of chemical products increases in daily life, the removal of dye waste has also emerged as an important environmental issue. This dye waste can be decomposed using a photocatalyst, and the photocatalyst can be synthesized very cost-effectively by using the sol-gel technology. The sol-gel technology is not only very useful for nanoscale film formation, but also can simply form multilayer structures. Using a multiple spin coating method, in this study, a ZnO film with a multilayered structure (3 layers, 5 layers) was formed by using zinc oxide (ZnO), which is effective in decomposing various dyes. For performance comparison, a ZnO film having a single layer structure by a single spin coating method was prepared as a control. Structural and elemental analysis of ZnO film was performed using an X-ray diffraction analyzer and an energy dispersive X-ray spectrometer. A nanowire-like surface morphology could be observed through a scanning electron microscope. Additionally, UV-Vis spectrophotometer was used to measure the absorbance of UV light. The ZnO film with a five-layer structure degraded the simulated methylene blue by 49% more than the ZnO film with a single-layer structure. In conclusion, it was found that ZnO having a multilayered structure is useful as a photocatalyst that decomposes methylene blue dye more effectively.