• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.65-70
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• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.39-45
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

• Journal of Energy Engineering
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• v.29 no.1
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• pp.75-84
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• 2020

This study investigates a simple, yet effective and affordable, manufacturing method to increase the electrical efficiency by triboelectric generator (TEG) applying 3D printers. In this study, we propose the newly manufacturing method for producing a macroscale surface patterning. Overall experiments were conducted in designed test-bed chamber system which can control the magnitude and frequency of the frictional force and the relative humidity. Furthermore, we can demonstrate the voltage enhancement of macroscale surface patterns about 1.6-fold. The peak voltage producing by TEG was as high as 18 V. In comparison with conventional process that employ micro- and nanoscale patterns, the proposed process by 3D printer is faster and more suitable for mass production.

• Korean Journal of Materials Research
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• v.21 no.10
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• pp.525-531
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• 2011

Two dimensional (2D) arrays of noble metal nanoparticles are widely used in the sensing of nanoscale biological and chemical events. Research in this area has sparked considerable interest in many fields owing to the novel optical properties, e.g., the localized surface plasmon resonance, of these metallic nanoarrays. In this paper, we report successes in fabricating 2D arrays of gold nano-islands using nanosphere lithography. The reproducibility and the effectiveness of the nano-patterning method are tested by means of spin coating and capillary force deposition. We found that the capillary force deposition method was more effective for nanospheres with diameters greater than 600 nm, whereas the spin coating method works better for nanospheres with diameters less than 600 nm. The optimal deposition parameters for both methods were reported, showing about 80% reproducibility. In addition, we characterize gold nano-island arrays both geometrically with AFM as well as optically with UV-VIS spectrometry. The AFM images revealed that the obtained nano-arrays formed a hexagonal pattern of truncated tetrahedron nano-islands. The experimental and theoretical values of the geometric parameters were compared. The 2D gold nano-arrays showed strong LSPR in the absorption spectra. As the nano-islands increased in size, the LSPR absorption bands became red-shifted. Linear dependence of the plasmon absorption maximum on the size of the gold nano-islands was identified through the increment in the plasmon absorption maximum rate for a one nanometer increase in the characteristic length of the nano-islands. We found that the 2D gold nano-arrays showed nearly seven-fold higher sensitivity of the absorption spectrum to the size of the nano-islands as compared to colloidal gold nano-particles.

• KSBB Journal
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• v.22 no.6
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• pp.433-437
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• 2007

A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.13-20
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• 2023

The process of microelectromechanical system (MEMS) fabrication involves surface treatment to impart functionality to the device. Such surface treatment method is the self-assembled monolayer (SAM) technique, which modifies and functionalizes the surface of MEMS components with organic molecule monolayer, possessing a precisely controllable strength that depends on immersion time and solution concentration. These monolayers spontaneously adsorb on polymeric substrates or metal/ceramic components offering high precision at the nanoscale and modifying surface properties. SAM technology has been utilized in various fields, such as tribological property control, mass-production lithography, and ultrasensitive organic/biomolecular sensor applications. This paper provides an overview of the development and application of SAM technology in various fields.