• Title/Summary/Keyword: Nanoimprint

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Magnetic & Crystallographic Properties of Patterned Media Fabricated by Nanoimprint Lithography and Co-Pt Electroplating (나노임프린트 패터닝과 자성박막도금을 이용하여 제작한 패턴드미디어용 자기패턴의 자기적 및 결정구조특성에 관한 연구)

  • Lee, B.K.;Lee, D.H.;Lee, M.B.;Kim, H.S.;Cho, E.H.;Sohn, J.S.;Lee, C.H.;Jeong, G.H.;Suh, S.J.
    • Journal of the Korean Magnetics Society
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    • v.18 no.2
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    • pp.49-53
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    • 2008

  • Magnetic and crystallographic properties of patterned media fabricated by nanoimprint lithography and Co-Pt electroplating were studied. Thin films of Ru(20 nm)/Ta(5 nm)/$SiO_2$(100 nm) were deposited on Si(100) wafer and then 25 nm hole pattern was fabricated by nanoimprint lithography on substrate. The electroplated Co-Pt nano-dots have the diameter of 35 nm and the height of 27 nm. Magnetic dot patterns of Co-Pt alloy were created using electroplated Co-Pt alloy and then their properties were measured by MFM, SQUID, SEM, TEM and AFM. We observed single domain with perendicular anisotropy for each dot and achieved optimum coercivity of 2900 Oe. These results mean that patterned media fabricated by nanoimprint lithography and electroplating have good properties in view of extending superparamagnetic limit while satisfying the writability requirements with the present write heads.

  • https://doi.org/10.4283/JKMS.2008.18.2.049 인용 PDF KSCI

The Minimization of Residual Layer Thickness by using optimized dispensing method in UVnanoimprint Lithography Process (UV 나노임프린트 리소그래피 공정에서 레지스트 도포의 최적화를 통한 잔류층 두께의 최소화)

  • Kim K.D.;Jeong J.H.;Sim Y.S.;Lee E.S.;Kim J.H.;Cho Y.K.;Hong S.C.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.633-636
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    • 2005

  • Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. As with other nanoimprint methods, ultraviolet-nanoimprint lithography (UV-NIL) resolution appears to be limited only by template resolution, and offers a significant cost of ownership reduction when compared to other next generation lithography (NGL) methods such as EUVL and 157 nm lithography. The purpose of this paper is to suggest optimum values of control parameters of Imprio 100 manufactured by Molecular Imprint, Inc., which is the first commercially available UV-NIL tool, for sound nanoimprint. UV-NIL experiments were performed on Imprio 100 to find dispensing recipe for avoiding air entrapment. Dispensing recipe related to residual layer thickness and uniformity was optimized and 40 nm thick residual layer was achieved.

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