• Journal of the Korean Vacuum Society
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• v.18 no.5
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• pp.372-376
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• 2009

In the modern semiconductor industry, lithography process is used to construct specific patterns. However, due to the decreasing of line width, these days, more and more researchers are interested in PMMA(Poly Methyl Methacrylate) lithography by using e-beam instead of the prior method, PR(Photoresist) lithography by using UV(Ultra-Violet). Additionally, the patterns constructed by lithography are collapsed during the process of cleansing remnants and the resistance against the breakdown of the patterns is known to be proportional to the elastic modulus of pattern-constructing materials. In this research, we measured the change of hardness and elastic modulus of PMMA film surface according to the change of time spent to soft-bake the PMMA film. During the measurement, we controlled the tip pressure from $25{\mu}N$ to $8,500{\mu}N$ having intervals that are $134.52{\mu}N$. For these measurements, we used the Triboindenter from Hysitron to gauge the hardness and elastic modulus and the tip we used was Berkovich diamond Tip.

• Journal of the Korean institute of surface engineering
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• v.46 no.2
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• pp.68-74
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• 2013

For the coating of diamond films on WC-Co tools, a buffer interlayer is needed because Co catalyzes diamond into graphite. W and Ti were chosen as candidate interlayer materials to prevent the diffusion of Co during diamond deposition. W or Ti interlayer of $1{\mu}m$ thickness was deposited on WC-Co substrate under Ar in a DC magnetron sputter. After seeding treatment of the interlayer-deposited specimens in an ultrasonic bath containing nanometer diamond powders, $2{\mu}m$ thick nanocrystalline diamond (NCD) films were deposited at $600^{\circ}C$ over the metal layers in a 2.45 GHz microwave plasma CVD system. The cross-sectional morphology of films was observed by FESEM. X-ray diffraction and visual Raman spectroscopy were used to confirm the NCD crystal structure. Micro hardness was measured by nano-indenter. The coefficient of friction (COF) was measured by tribology test using ball on disk method. After tribology test, wear tracks were examined by optical microscope and alpha step profiler. Rockwell C indentation test was performed to characterize the adhesion between films and substrate. Ti and W were found good interlayer materials to act as Co diffusion barriers and diamond nucleation layers. The COFs on NCD films with W or Ti interlayer were measured as less than 0.1 whereas that on bare WC-Co was 0.6~1.0. However, W interlayer exhibited better results than Ti in terms of the adhesion to WC-Co substrate and to NCD film. This result is believed to be due to smaller difference in the coefficients of thermal expansion of the related films in the case of W interlayer than Ti one. By varying the thickness of W interlayer as 1, 2, and $4{\mu}m$ with a fixed $2{\mu}m$ thick NCD film, no difference in COF and wear behavior but a significant change in adhesion was observed. It was shown that the thicker the interlayer, the stronger the adhesion. It is suggested that thicker W interlayer is more effective in relieving the residual stress of NCD film during cooling after deposition and results in stronger adhesion.

• Journal of Ocean Engineering and Technology
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• v.32 no.6
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• pp.492-501
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• 2018

The following results were obtained from a series of studies to accumulate data to reduce the coefficient of friction for press dies by performing tribological tests before and after the UNSM treatment of SM45C. The UNSM-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those for untreated materials. When loads of 5 N, 7.5 N, and 10 N were applied to the untreated material of SM45C, the coefficient of friction was approximately 0.76-0.78. With the large specimen, a value of 0.72-0.78 was maintained at a load of 50 N despite the differences in the size of the wear specimen and working load. Tribological tests of large specimens of SM45C treated with UNSM under tribological conditions of 100 N and 50 N showed that the frictional coefficient and time constant stably converged between 0.7 and 0.8. The friction coefficients of the small specimens treated with UNSM showed values between 0.78 and 0.75 under 5 N, 7.5 N, and 10 N. The friction coefficients of the SM45C treated with UNSM were comparable to each other.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.35 no.3
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• pp.267-272
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• 2011

We analyzed the wear characterization of $Si_3N_4$ ceramics according to the amount of added $SiO_2$ nanocolloid. The test specimen was prepared by hot-press sintering at 35 MPa and 2123 K in an $N_2$ gas atmosphere for 1 h. A wear test was performed with a block-on-ring tester, and the test conditions were as follows: (1) the ring with a diameter of 35 mm had a rotational speed of 50 rpm; (2) the load was 9.8 N; and (3) the temperature was $25^{\circ}C$. The test results show that $Si_3N_4$ ceramics have a friction coefficient of about 1.0 and a wear loss of about 0.02 mm. Of the specimens used this study, the test specimen with 1.3 wt% of added $SiO_2$ nanocolloid has the best wear resistance because it has the lowest friction coefficient and the smallest wear loss. This specimen also has the highest Vickers hardness and bending strength. In this study, the friction coefficient is inversely proportional to the hardness and bending strength.