• Title/Summary/Keyword: Nano-structure fabrication

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Surface Damage Characteristics of Self-Assembled Monolayer and Its Application in Metal Nano-Structure Fabrication (자기 조립 분자막의 표면파손특성 및 미세 금속 구조물 제작에의 응용)

  • Sung, In-Ha;Kim, Dae-Eun
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2002.05a
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    • pp.40-44
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    • 2002
  • The motivation of this work is to use SAM(Self-Assembled Monolayer) for developing a rapid and flexible non-photolithographic nano-structure fabrication technique which can be utilized in micro-machining of metals as well as silicon-based materials. The fabrication technique implemented in this work consists of a two-step process, namely, mechanical scribing followed by chemical etching. From the experimental results, it was found that thiol on copper surface could be removed even under a few nN normal load. The nano-tribological characteristics of thiol-SAM on various metals were largely dependent on the native oxide layer of metals. Based on these findings, nano-patterns with sub-micrometer width and depth on metal surfaces such as Cu, Au and Ag could be obtained using a diamond-coated tip.

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A Novel Fabrication Method of the High-Aspect-Ratio Nano Structure (HAR-Nano Structure) Using a Nano X-Ray Shadow Mask (나노 X-선 쉐도우 마스크를 이용한 고폭비의 나노 구조물 제작)

  • Kim Jong-Hyun;Lee Seung-S.;Kim Yong-Chul
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.30 no.10 s.253
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    • pp.1314-1319
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    • 2006
  • This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.

Ion Beam Induced Micro/Nano Fabrication: Shape Fabrication (이온빔을 이용한 마이크로/나노 가공: 형상가공)

  • Kim, Heung-Bae;Hobler, Gerhard
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.10
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    • pp.109-116
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    • 2007
  • Focused ion beams are a potential tool for micro/nano structure fabrication while several problems still have to be overcome. Redeposition of sputtered atoms limits the accurate fabrication of micro/nano structures. The challenge lies in accurately controlling the focused ion beam to fabricate various arbitrary curved shapes. In this paper a basic approach for the focused ion beam induced direct fabricate of fundamental features is presented. This approach is based on the topography simulation which naturally considers the redeposition of sputtered atoms and sputtered yield changes. Fundamental features such as trapezoidal, circular and triangular were fabricated with this approach using single or multiple pass box milling. The beam diameter(FWHM) and maximum current density are 68 nm and $0.8 A/cm^2$, respectively. The experimental investigations show that the fabricated shape is well suited for the pre-designed fundamental features. The characteristics of ion beam induced direct fabrication and shape formation will be discussed.

New Fabrication method of Planar Micro Gas Sesnor Array (집적도를 높인 평면형 가스감지소자 어레이 제작기술)

  • 정완영
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.727-730
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    • 2003
  • Thin tin oxide film with nano-size particle was prepared on silicon substrate by hydrothermal synthetic method and successive sol-gel spin coating method. The fabrication method of tin oxide film with ultrafine nano-size crystalline structure was tried to be applied to fabrication of micro gas sensor array on silicon substrate. The tin oxide film on silicon substrate was well patterned by chemical etching upto 5${\mu}{\textrm}{m}$width and showed very uniform flatness. The tin oxide film preparation method and patterning method were successfully applied to newly proposed 2-dimensional micro sensor fabrication.

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Survey of the Fabrication of Dry Adhesive Structures (건식부착물 제작에 대한 개관)

  • Cho, Young-Sam
    • Elastomers and Composites
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    • v.44 no.2
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    • pp.112-115
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    • 2009
  • In nature, some creatures have the ability to walk vertically or upside down on various natural surfaces. One of them, Tokay Gecko has billions of nano-hair at the epidermis of its digital. These nano hairs makes atomistic attractive force to the surface, therefore, it could walk and run on the vertical or upside surfaces. Recently, many researchers tried to fabricate the dry adhesive structure mimicking the nano-hair structure. in this study, I tried to survey these studies to discuss the direction of future fabrication works of dry adhesive structures.

Fabrication of nano-structured PMMA substrates for the improvement of the optical transmittance (반구형 나노 패턴의 크기에 따른 PMMA기판의 광특성 평가)

  • Park, Y.M.;Shin, H.G.;Kim, B.H.;Seo, Y.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.10a
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    • pp.217-220
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    • 2009
  • This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

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Silicon Nano Patterning Using Focused ion Beam: Simulation and Fabrication (집속이온빔을 이용한 실리콘 나노 패터닝: 시뮬레이션과 가공)

  • Han J.;Min B.K.;Lee S.J.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.489-490
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    • 2006
  • To establish fabrication techniques for nano structure understanding of focused ion beam (FIB) milling process is required. In this study the mathematical model containing the factors related to FIB milling is developed to acquire the optimal fabrication condition. Then, the model is verified by comparison with various nano pattern fabricated in actual FIB system. Consequently, it is demonstrated that the nano patterns with the smallest pitch can be fabricated using developed FIB milling model.

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Nano imprinting lithography fabrication for photonic crystal waveguides (나노 임프린트 공정에 의한 광자결정 도파로 제조공정)

  • Jung Une-Teak;Kim Chang-Soek;Jeong Myung-Yung
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.498-501
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    • 2005
  • Photonic crystals, periodic structure with a high refractive index contrast modulation, have recently become very interesting platform for manipulation of light. The existence of a photonic bandgap, a frequency range in which propagation of light is prevented in all direction, makes photonic crystal very useful in application where spatial localization of light is required for waveguide, beam splitter, and cavity. But fabrication of 3 dimensional photonic crystal is still difficult process. a concept that has recently attracted a lot of attention is a planar photonic crystal based on a dielectric membrane, suspended in the air, and perforated with 2 dimensional lattice of hole. We show that the polymer slabs suspended in air with triangular lattice of air hole can exhibit the in-plane photonic bandgap for TE-like modes. The fabrication of Si master with pillar structure using hot embossing process was investigated for 2 dimensional low-index-contrast photonic crystal waveguide.

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Development of Nano-Stereolithography Process for Precise Fabrication of Three-Dimensional Micro-Devices (3차원 마이크로 디바이스 개발을 위한 나노 스테레오리소그래피 공정 개발에 관한 연구)

  • Park Sang-Hu;Lim Tae Woo;Yang Dong-Yol;Yi Shin Wook;Kong Hong-Jin;Lee Kwang-Sup
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.1
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    • pp.45-49
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    • 2006
  • A nano-stereolithography (NSL) process has been developed for the fabrication of three-dimensional (3D) micro-devices with high spatital resolution of approximately 100 nm. In the NSL process, a complicated 3D structure can be created by stacking layer-by-layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D stacked structure was finished, unsolidified liquid resins were rinsed by ethanol to develop the fabricated structures; then, the polymerized structure was only left on the glass substrate. Through this work, several 3D microstructures such as a micro-channel, shell structures, and photonic crystals were fabricated to evaluate the possibility of the developed system.

Study on Fabrication of Highly Ordered Nano Patterned Master by Using Anodic Aluminum Oxidation (AAO를 이용한 나노 패턴 마스터 제작에 관한 연구)

  • Shin, H.G.;Kwon, J.T.;Seo, Y.H.;Kim, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.05a
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    • pp.368-370
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    • 2007
  • AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. The resulting good filled uniform nano molded structure through hot embossing molding process shows the validity of the fabricated nano pattern masters.

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