• 제목/요약/키워드: Nano-processing

검색결과 551건 처리시간 0.025초

새도우마스크 제조공정 중 발생되는 폐액으로부터 니켈 페라이트 나노 분말 제조 (Fabrication of Nano-Sized Ni-ferrite Powder from Waste Solution Produced by Shadow Mask Processing)

  • 유재근;서상기
    • 한국분말재료학회지
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    • 제10권4호
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    • pp.262-269
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    • 2003
  • Nano-sized Ni-ferrite powder was fabricated by spray pyrolysis process using the waste solution resulting from shadow mask processing. The average particle size of the powder was below 100 nm. The effects of the concentration of raw material solution, the nozzle tip size and air pressure on the properties of powder were studied. As the concentration increased, the average particle size of the powder gradually increased and its specific surface area decreased, but size distribution was much wider and the fraction of the Ni-ferrite phase greatly increased as the concentration increasing. As the nozzle tip size increased from 1 mm to 2 mm, the average particle size of the powder decreased. In case of 3 mm nozzle tip size, the average particle size of the powder increased slightly. On the other hand, in case of 5 mm nozzle tip size, average particle size of the powder decreased. Size distribution of the powder was unhomogeneous, and the fraction of the Ni-ferrite phase decreased as the nozzle tip size increasing. As air pressure increased up to 1 kg/$cm^2$, the average particle size of the powder decreased slightly, on the other hand, the fraction of the Ni-ferrite phase was almost constant. In case of 3kg/$cm^2$ air pressure, average particle size of the powder and the fraction of the Ni-ferrite phase remarkably decreased, but size distribution was narrow.

분말 ECAP 공정에 미치는 금형 모서리각 효과에 대한 유한요소해석 (Finite Element Analysis on the Effect of Die Corner Angle in Equal Channel Angular Pressing Process of Powders)

  • 윤승채;복천희;팜쾅;김형섭
    • 한국분말재료학회지
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    • 제14권1호
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    • pp.26-31
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    • 2007
  • Manufacturing bulk nanostructured materials with least grain growth from initial powders is challenging because of the bottle neck of bottom-up methods using the conventional powder metallurgy of compaction and sintering. In this study, bottom-up type powder metallurgy processing and top-down type SPD (Severe Plastic Deformation) approaches were combined in order to achieve both real density and grain refinement of metallic powders. ECAP (Equal Channel Angular Pressing), one of the most promising processes in SPD, was used for the powder consolidation method. For understanding the ECAP process, investigating the powder density as well as internal stress, strain distribution is crucial. We investigated the consolidation and plastic deformation of the metallic powders during ECAP using the finite element simulations. Almost independent behavior of powder densification in the entry channel and shear deformation in the main deformation zone was found by the finite element method. Effects of processing parameters on densification and density distributions were investigated.

고온 임프린팅을 통한 알루미늄합금 표면의 마이크로/나노 구조 성형 기술 (Hot Imprinted Hierarchical Micro/Nano Structures on Aluminum Alloy Surfaces)

  • 문인용;이호원;오영석;김세종;김지훈;강성훈
    • 소성∙가공
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    • 제28권5호
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    • pp.239-246
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    • 2019
  • Various surface texturing techniques have been studied because of the effective applicability of micro or nano scale surface patterns. Particularly, the most promising types of patterns include the hierarchical patterns, which consists of micro/nano structures. Different processes such as MEMS, laser machining, micro cutting and micro grinding have been applied in the production of hierarchical patterns on various material surfaces. This study demonstrates the process of hot imprinting to induce the hierarchical patterns on the Al alloy surfaces. Wire electrical discharge machining (WEDM) process was used to imprint molds with micro scale sinusoidal pattern. In addition, the sinusoidal pattern with rough surface morphology was obtained as a result of the discharge craters. Consequently, the hierarchical patterns consisting of the sinusoidal pattern and the discharge craters were prepared on the imprinting mold surface. Hot imprinting process for the Al plates was conducted on the prepared mold, and the replication performance was analyzed. As a result, it was confirmed that the hierarchical patterns of the mold were effectively duplicated on the surface of Al plate.

Comparative study of InGaN/GaN multi-quantum wells in polar (0001) and semipolar (11-22) GaN-based light emitting diodes

  • Song, Ki-Ryong;Oh, Dong-Sub;Shin, Min-Jae;Lee, Sung-Nam
    • Journal of Ceramic Processing Research
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    • 제13권spc2호
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    • pp.295-299
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    • 2012
  • We investigated the crystal and the optical properties of GaN-based blue light emitting diodes (LEDs) which were simultaneously grown on c-plane (0001) and semipolar (11-22) GaN templates by using metal-organic chemical vapor deposition (MOCVD). The X-ray rocking curves (XRCs) full width at half maximums (FWHMs) of c-plane (0001) and semipolar (11-22) GaN templates were 275 and 889 arcsec, respectively. In addition, high-resolution X-ray ω-2θ scan showed that satellite peaks of semipolar (11-22) InGaN quantum-wells (QWs) was weaker and broader than that of c-plane (0001) InGaN QWs, indicating that the interface quality of c-plane (0001) QWs was superior to that of semipolar (11-22) QWs. Photoluminescence (PL) and electroluminescence (EL) results showed that the emission intensity and the FWHMs of polar c-plane (0001) LED were much higher and narrower than those of semipolar (11-22) LED, respectively. From these results, we believed that relative poor crystal quality of semipolar (11-22) GaN template might give rise to the poor interfacial quality of QWs, resulting in lower output power than conventional c-plane (0001) GaN-based LEDs.

Optical diffraction gratings embedded in BK-7 glasses by tightly focused femtosecond laser

  • Yoon, Ji Wook;Choi, Won Suk;Kim, Hoon Young;Cho, Sung-Hak
    • 한국레이저가공학회지
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    • 제17권2호
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    • pp.19-25
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    • 2014
  • Optical embedded diffraction gratings with the bulk modification in BK-7 glass plates excited by tightly focused high-intensity femtosecond (130fs) Ti: sapphire laser (peak wavelength = 790nm) were demonstrated. The structural modifications with diameters ranging from 400nm to $4{\mu}m$ were photo-induced after plasma formation occurred upon irradiation with peak intensities of more than $1{\times}1013W/cm^2$. The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred. The maximum refractive index change was estimated to be $1.5{\times}10^{-2}$. The two optical embedded gratings in BK-7 glass plate were demonstrated with refractive index modification induced by the scanning of low-density plasma formation.

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탄소나노튜브를 활용한 나노 통신 시스템 연구 (Nano Communication Systems Using Carbon Nanotube)

  • 권태수;황경호
    • 한국전자통신학회논문지
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    • 제11권9호
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    • pp.877-884
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    • 2016
  • 나노 통신 시스템 기술은 통신기술과 나노기술의 융합 분야로서 밀리미터 수준의 통신 모듈 크기에 머물고 있는 현 기술수준을 뛰어넘어 수백 나노미터에서 수십 마이크로미터 이하 단위의 극소형 무선통신 시스템 구현을 가능케 하는 미래 핵심 기술 분야이다. 특히, 최근 제안된 탄소나노튜브의 전기적/기계적 속성을 활용한 신규 극소형 나노 무선 통신시스템 기술은 기존 송수신 구조를 단순히 소형화하는 것이 아니라 구조 자체를 바꾸는 새로운 접근 방식을 제시하고 있다. 따라서, 본 논문에서는 탄소나노튜브(carbon nanotube, CNT)를 활용한 극소형 나노 무선 송수신기 실현 관점에서의 연구현황을 살펴보고 나노 기술과 통신 기술의 융합을 위한 주요 핵심 연구이슈를 제시한다.

스탬퍼 가열/냉각을 이용한 고세장비 나노 구조물 성형 (Injection Molding of High Aspect Ratio Nano Features Using Stamper Heating/Cooling Process)

  • 유영은;최성주;김선경;최두선;황경현
    • 소성∙가공
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    • 제16권1호
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    • pp.20-24
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    • 2007
  • Polypropylene substrate with hair-like nano features(aspect $ratio{\sim}10$) on the surface is fabricated by injection molding process. Pure aluminum plate is anodized to have nano pore array on the surface and used as a stamper for molding nano features, The size and the thickness of the stamper is $30mm{\times}30mm$ and 1mm. The fabricated pore is about 120nm in diameter and 1.5 um deep. For molding of a substrate with nano-hair type of surface features, the stamper is heated up over $150^{\circ}C$ before the filling stage and cooled down below $70^{\circ}C$ after filling to release the molded part. For heating the stamper, stamper itself is used as a heating element by applying electrical power directly to each end of the stamper. The stamper becomes cooled down without circulation of coolant such as water or oil. With this new stamper heating method, nano hairs with aspect ratio of about 10 was successfully injection molded. We also found the heating & cooling process of the stamper is good for releasing of molded nano-hairs.

금속 배선 제작을 위한 메탈 나노 파우더 임프린팅 공정기술 개발 (Development of Metal nano Powder Imprinting Process for Fabrication of Conductive Tracks)

  • 김진수;김호관;임지석;배형대;최민석;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2007년도 춘계학술대회 논문집
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    • pp.371-374
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    • 2007
  • A method for metal nano powder imprinting is proposed as a patterning process for conductive tracks that is inexpensive and scalable down to the nanoscale. Conductive tracks with line widths of $0.5{\sim}20{\mu}m$ were fabricated using this method. The processing conditions were optimized to avoid various types of defects, and to increase the degree of sintering and electric conductivity of the imprinted conductive tracks. The mean electric resistivity of the conductive tracks imprinted under optimum conditions was $8.95{\mu}{\Omega}{\cdot}cm$, which is in the range required for practical applications.

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STI CMP용 나노 세리아 슬러리에서 연마입자의 결정특성에 따른 평탄화 효율의 의존성 (Dependency of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing)

  • Kang, Hyun-Goo;Takeo Katoh;Kim, Sung-Jun;Ungyu Paik;Park, Jea-Gun
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.65-65
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    • 2003
  • Chemical mechanical polishing (CMP) is one of the most important processes in recent ULSI (Ultra Large Scale Integrated Circuit) manufacturing technology. Recently, ceria slurries with surfactant have recently been used in STI-CMP,[1] became they have high oxide-to-nitride removal selectivity and widen the processing margin The role of the abrasives, however, on the effect of planarization on STI-CMP is not yet clear. In this study, we investigated how the crystal characteristic affects the planarization efficiency of wafer surface with controlling crystallite size and poly crystalline abrasive size independently.

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The Partial Discharge Resistances of Epoxy-Nano-and-Micro Composites

  • Lee, Chang-Hoon;Park, Jae-Jun
    • Transactions on Electrical and Electronic Materials
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    • 제11권2호
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    • pp.89-91
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    • 2010
  • Partial discharge (PD) resistances were investigated for three types of samples: original epoxy resins, epoxy micro composites with and without the silane processing, and mixture composites with micro and nano particles. The PD was applied to these materials using rod, gap, and plane electrodes. The partial discharge resistance found in the micro composites was better than that found in the original epoxy resin. Moreover, the mixture composites of $SiO_2$ nano and micro particles had much larger resistances than the original epoxy resin or microcomposites. It can be regarded that this excellent property was due to the fact that the nano particles have a dense structure between the micro particles.