• 제목/요약/키워드: Nano-channel

검색결과 247건 처리시간 0.033초

Label-free Femtomolar Detection of Cancer Biomarker by Reduced Graphene Oxide Field-effect Transistor

  • Kim, Duck-Jin;Sohn, Il-Yung;Jung, Jin-Heak;Yoon, Ok-Ja;Lee, N.E.;Park, Joon-Shik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.549-549
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    • 2012
  • Early detection of cancer biomarkers in the blood is of vital importance for reducing the mortality and morbidity in a number of cancers. From this point of view, immunosensors based on nanowire (NW) and carbon nanotube (CNT) field-effect transistors (FETs) that allow the ultra-sensitive, highly specific, and label-free electrical detection of biomarkers received much attention. Nevertheless 1D nano-FET biosensors showed high performance, several challenges remain to be resolved for the uncomplicated, reproducible, low-cost and high-throughput nanofabrication. Recently, two-dimensional (2D) graphene and reduced GO (RGO) nanosheets or films find widespread applications such as clean energy storage and conversion devices, optical detector, field-effect transistors, electromechanical resonators, and chemical & biological sensors. In particular, the graphene- and RGO-FETs devices are very promising for sensing applications because of advantages including large detection area, low noise level in solution, ease of fabrication, and the high sensitivity to ions and biomolecules comparable to 1D nano-FETs. Even though a limited number of biosensor applications including chemical vapor deposition (CVD) grown graphene film for DNA detection, single-layer graphene for protein detection and single-layer graphene or solution-processed RGO film for cell monitoring have been reported, development of facile fabrication methods and full understanding of sensing mechanism are still lacking. Furthermore, there have been no reports on demonstration of ultrasensitive electrical detection of a cancer biomarker using the graphene- or RGO-FET. Here we describe scalable and facile fabrication of reduced graphene oxide FET (RGO-FET) with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}$ 1-antichymotrypsin (PSA-ACT) complex, in which the ultrathin RGO channel was formed by a uniform self-assembly of two-dimensional RGO nanosheets, and also we will discuss about the immunosensing mechanism.

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스트레스 감도 향상을 위한 턴 온 직후의 조름 효과를 이용한 얇은 질화막 폴리실리콘 전계 효과 트랜지스터 압력센서 (A Polysilicon Field Effect Transistor Pressure Sensor of Thin Nitride Membrane Choking Effect of Right After Turn-on for Stress Sensitivity Improvement)

  • 정한영;이정훈
    • 센서학회지
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    • 제23권2호
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    • pp.114-121
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    • 2014
  • We report a polysilicon active area membrane field effect transistor (PSAFET) pressure sensor for low stress deflection of membrane. The PSAFET was produced in conventional FET semiconductor fabrication and backside wet etching. The PSAFET located at the front side measured pressure change using 300 nm thin-nitride membrane when a membrane was slightly strained by the small deflection of membrane shape from backside with any physical force. The PSAFET showed high sensitivity around threshold voltage, because threshold voltage variation was composed of fractional function form in sensitivity equation of current variation. When gate voltage was biased close to threshold voltage, a fractional function form had infinite value at $V_{tn}$, which increased the current variation of sensitivity. Threshold voltage effect was dominant right after the PSAFET was turned on. Narrow transistor channel established by small current flow was choked because electron could barely cross drain-source electrodes. When gate voltage was far from threshold voltage, threshold voltage effect converged to zero in fractional form of threshold voltage variations and drain current change was mostly determined by mobility changes. As the PSAFET fabrication was compatible with a polysilicon FET in CMOS fabrication, it could be adapted in low pressure sensor and bio molecular sensor.

X-ray/gamma radiation shielding properties of Aluminium-Bariume-Zinc Oxide nanoparticles synthesized via low temperature solution combustion method

  • K.V. Sathish;K.N. Sridhar;L. Seenappa;H.C. Manjunatha;Y.S. Vidya;B. Chinnappa Reddy;S. Manjunatha;A.N. Santhosh;R. Munirathnam;Alfred Cecil Raj;P.S. Damodara Gupta;B.M. Sankarshan
    • Nuclear Engineering and Technology
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    • 제55권5호
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    • pp.1519-1526
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    • 2023
  • For the first time Aluminium-BariumeZinc oxide nanocomposite (ZABONC) was synthesized by solution combustion method where calcination was carried out at low temperatures (600℃) to study the electromagnetic (EM) (X/γ) radiation shielding properties. Further for characterization purpose standard techniques like PXRD, SEM, UV-VISIBLE, FTIR were used to find phase purity, functional groups, surface morphology, and to do structural analysis and energy band gap determination. The PXRD pattern shows (hkl) planes corresponding to spinel cubic phase of ZnAl2O4, cubic Ba(NO3)2, α and γ phase of Al2O3 which clearly confirms the formation of complex nano composite. From SEM histogram mean size of nano particles was calculated and is in the order of 17 nm. Wood and Tauc's relation direct energy band gap calculation gives energy gap of 2.9 eV. In addition, EM (X/γ) shielding properties were measured and compared with the theoretical ones using standard procedures (NaI (Tl) detector and multi channel analyzer MCA). For energy above 356 keV the measured shielding parameters agree well with the theory, while below this value slight deviation is observed, due to the influence of atomic/crystallite size of the ZABONC. Hence synthesized ZABONC can be used as a shielding material in EM (X/γ) radiation shielding.

더블게이트MOSFET의 도핑농도에 따른 단채널 효과 분석 - 문턱전압을 중심으로 (Analysis of short-shannel effect for doping concentration of DGMOSFET - On threshold Voltage)

  • 고효근;한지형;정학기
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2012년도 춘계학술대회
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    • pp.731-733
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    • 2012
  • 더블게이트MOSFET는 두 개의 게이트를 가지고 있기 때문에 전류제어 능력이 기존 MOSFET보다 두배에 가깝고 나노소자에서 단채널 효과를 감소시킬 수 있다는 장점을 가지고 있다. 본 연구에서는 더블게이트MOSFET 제작시 단채널 효과에 큰 영향을 미치는 도핑농도에 따른 문턱전압의 변화를 분석하고자 한다. 더블게이트MOSFET에서 문턱전압에 영향을 미치는 구조적 요소 중 도핑농도는 매우 중요한 소자파라미터이다. 본 논문에서는 도핑농도를 $10^{15}cm^{-3}$에서 $10^{19}cm^{-3}$까지 변화시키면서 문턱 전압을 분석한 결과 도핑농도가 증가하면 문턱전압도 커짐을 알 수 있었다.

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Remote O2 plasma functionalization for integration of uniform high-k dielectrics on large area synthesized few-layer MoSe2

  • Jeong, Jaehun;Choi, Yoon Ho;Park, Dambi;Cho, Leo;Lim, Dong-Hyeok;An, Youngseo;Yi, Sum-Gyun;Kim, Hyoungsub;Yoo, Kyung-Hwa;Cho, Mann?Ho
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.281.1-281.1
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    • 2016
  • Transition metal dichalcogenides (TMDCs) are promising layered structure materials for next-generation nano electronic devices. Many investigation on the FET device using TMDCs channel material have been performed with some integrated approach. To use TMDCs for channel material of top-gate thin film transistor(TFT), the study on high-k dielectrics on TMDCs is necessary. However, uniform growth of atomic-layer-deposited high-k dielectric film on TMDCs is difficult, owing to the lack of dangling bonds and functional groups on TMDC's basal plane. We demonstrate the effect of remote oxygen plasma pretreatment of large area synthesized few-layer MoSe2 on the growth behavior of Al2O3, which were formed by atomic layer deposition (ALD) using tri-methylaluminum (TMA) metal precursors with water oxidant. We investigated uniformity of Al2O3 by Atomic force microscopy (AFM) and Scanning electron microscopy (SEM). Raman features of MoSe2 with remote plasma pretreatment time were obtained to confirm physical plasma damage. In addition, X-ray photoelectron spectroscopy (XPS) was measured to investigate the reaction between MoSe2 and oxygen atom after the remote O2 plasma pretreatment. Finally, we have uniform Al2O3 thin film on the MoSe2 by remote O2 plasma pretreatment before ALD. This study can provide interfacial engineering process to decrease the leakage current and to improve mobility of top-gate TFT much higher.

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분자-연속체 하이브리드 기법을 이용한 구조물이 있는 나노 채널에서의 쿠에트 유동에 대한 수치적 연구 (Numerical Study on Couette Flow in Nanostructured Channel using Molecular-continuum Hybrid Method)

  • 김영진;정명근;하만영
    • 대한기계학회논문집B
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    • 제41권6호
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    • pp.429-434
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    • 2017
  • 분자-연속체 하이브리드 기법은 연속체 유체역학으로 예측하기 어려운 마이크로/나노 스케일 유동에 대해 개발되고 발전해 왔다. 분자동역학은 고체표면 주변 영역에서 사용되고, 나머지 영역에서는 나비아스톡스 방정식이 사용된다. 본 연구에서는 나노채널에서 고체-액체 상호작용과 표면 거칠기의 영향을 연구하기 위해 분자-연속체 하이브리드 기법을 이용하여 쿠에트 유동을 해석하였다. 우리는 고체-액체 상호작용 힘인 표면 에너지와 표면 거칠기가 유동의 표면 경계조건에 영향을 주는 것을 발견하였다. 표면 에너지가 낮을 때에는 유동이 고체 표면에서 미끄러짐이 발생하였고, 표면 에너지가 증가함에 따라 미끄러짐의 크기가 감소하였다. 표면 에너지가 높을 때에는 로킹(locking) 경계조건이 형성되었다. 또한 표면 거칠기는 유동이 고체 표면에서 미끄러지는 것을 방해하여 로킹 경계조건이 잘 형성되도록 영향을 주었다.

비선형도핑분포를 이용한 DGMOSFET의 산화막두께에 대한 문턱전압이하 특성분석 (Analysis of Subthreshold Characteristics for DGMOSFET according to Oxide Thickness Using Nonuniform Doping Distribution)

  • 정학기
    • 한국정보통신학회논문지
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    • 제15권7호
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    • pp.1537-1542
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    • 2011
  • 본 연구에서는 이중게이트 MOSFET의 채널도핑이 비산형분포를 가질 때 게이트 산화막의 두께를 변화시키면서 문턱전압이하특성을 분석하였다. 이중게이트 MOSFET는 차세대 나노소자로서 단채널효과를 감소시킬 수 있다는 장점 때문에 많은 연구가 진행 중에 있다. 이에 이중게이트 MOSFET에서 단채널효과로서 잘 알여진 문턱전압 이하 스윙의 저하에 대하여 비선형도핑분포를 이용한 포아송방정식의 분석학적 모델로 분석하고자 한다. 또한 나노소자인 이중게이트 MOSFET의 구조적 파라미터 중 가장 중요한 게이트 산화막의 두께에 대하여 문턱전압이하 특성을 분석하였다. 본 논문에서 사용한 분석학적 포아송방정식의 포텐셜모델 및 전송모델의 타당성을 입증하기 위하여 수치해석학적 결과값과 비교하였으며 이 모델을 이용하여 이중게이트 MOSFET의 문턱전압이하 스윙을 분석하였다.

CHE 주입방법과 기판 순바이어스를 이용한 새로운 고온 전자 주입방법의 프로그램 효율성 비교에 관한 연구 (A Study on The Comparison of The Program Efficiency in The Conventional CHE Injection Method and a novel Hot Electron Injection Method Using A Substrate forward Bias)

  • 장영걸;안호명;김희동;김태근
    • 대한전자공학회논문지SD
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    • 제47권1호
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    • pp.1-5
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    • 2010
  • 본 논문에서는, SONOS 소자에서의 일반적인 CHE(Channel Hot Electron) 주입 방법과 기판 순바이어스를 이용한 새로운 전자 주입 방법의 프로그램 효율성에 대해 직접 비교하였다. 기존의 CHE 주입 방법과 비교해서, 새로운 전자 주입 방법은 낮은 구동전압, 빠른 프로그램 속도 등의 특성을 포함하여 높은 프로그램효율을 보였으며, 또한 드레인 영역에서의 순방향 읽기와 역방향 읽기의 문턱전압 차이가 1 V 가량 발생한다는 점에서 국소 주입 동작이 가능함을 확인하였다. 이렇게 제안된 전자주입 방법은 차세대 나노 크기 멀티-비트 SONOS 소자의 동작에 매우 유용하게 사용될 것으로 기대된다.

Transparent and Flexible All-Organic Multi-Functional Sensing Devices Based on Field-effect Transistor Structure

  • Trung, Tran Quang;Tien, Nguyen Thanh;Seol, Young-Gug;Lee, Nae-Eung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.491-491
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    • 2011
  • Transparent and flexible electronic devices that are light-weight, unbreakable, low power consumption, optically transparent, and mechanical flexible possibly have great potential in new applications of digital gadgets. Potential applications include transparent displays, heads-up display, sensor, and artificial skin. Recent reports on transparent and flexible field-effect transistors (tf-FETs) have focused on improving mechanical properties, optical transmittance, and performances. Most of tf-FET devices were fabricated with transparent oxide semiconductors which mechanical flexibility is limited. And, there have been no reports of transparent and flexible all-organic tf-FETs fabricated with organic semiconductor channel, gate dielectric, gate electrode, source/drain electrode, and encapsulation for sensor applications. We present the first demonstration of transparent, flexible all-organic sensor based on multifunctional organic FETs with organic semiconductor channel, gate dielectric, and electrodes having a capability of sensing infrared (IR) radiation and mechanical strain. The key component of our device design is to integrate the poly(vinylidene fluoride-triflouroethylene) (P(VDF-TrFE) co-polymer directly into transparent and flexible OFETs as a multi-functional dielectric layer, which has both piezoelectric and pyroelectric properties. The P(VDF-TrFE) co-polumer gate dielectric has a high sensitivity to the wavelength regime over 800 nm. In particular, wavelength variations of P(VDF-TrFE) molecules coincide with wavelength range of IR radiation from human body (7000 nm ~14000 nm) so that the devices are highly sensitive with IR radiation of human body. Devices were examined by measuring IR light response at different powers. After that, we continued to measure IR response under various bending radius. AC (alternating current) gate biasing method was used to separate the response of direct pyroelectric gate dielectric and other electrical parameters such as mobility, capacitance, and contact resistance. Experiment results demonstrate that the tf-OTFT with high sensitivity to IR radiation can be applied for IR sensors.

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실리콘 게이트전극을 갖는 고온소자와 금속 게이트전극을 갖는 P형 저온 다결정 실리콘 박막 트랜지스터의 전기특성 비교 연구 (A Research About P-type Polycrystalline Silicon Thin Film Transistors of Low Temperature with Metal Gate Electrode and High Temperature with Gate Poly Silicon)

  • 이진민
    • 한국전기전자재료학회논문지
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    • 제24권6호
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    • pp.433-439
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    • 2011
  • Poly Si TFTs (poly silicon thin film transistors) with p channel those are annealed HT (high temperature) with gate poly crystalline silicon and LT (low temperature) with metal gate electrode were fabricated on quartz substrate using the analyzed data and compared according to the activated grade silicon thin films and the size of device channel. The electrical characteristics of HT poly-Si TFTs increased those are the on current, electron mobility and decrease threshold voltage by the quality of particles of active thin films annealed at high temperature. But the on/off current ratio reduced by increase of the off current depend on the hot carrier applied to high gate voltage. Even though the size of the particles annealed at low temperature are bigger than HT poly-Si TFTs due to defect in the activated grade poly crystal silicon and the grain boundary, the characteristics of LT poly-Si TFTs were investigated deterioration phenomena those are decrease the electric off current, electron mobility and increase threshold voltage. The results of transconductance show that slope depend on the quality of particles and the amplitude depend on the size of the active silicon particles.