• Journal of Electrical Engineering and information Science
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• v.2 no.6
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• pp.208-211
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• 1997

We have fabricated a single-electron-tunneling(SET) transistor with a dual gate geometry based on the SOI structure prepared by SIMOX wafers. The split-gate is the lower-gate is the lower-level gate and located ∼ 100${\AA}$ right above the inversion layer 2DEG active channel, which yields strong carrier confinement with fully controllable tunneling potential barrier. The transistor is operating at low temperatures and exhibits the single electron tunneling behavior through nano-size quantum dot. The Coulomb-Blockade oscillation is demonstrated at 15mK and its periodicity of 16.4mV in the upper-gate voltage corresponds to the formation of quantum dots with a capacity of 9.7aF. For non-linear transport regime, Coulomb-staircases are clearly observed up to four current steps in the range of 100mV drain-source bias. The I-V characteristics near the zero-bias displays typical Coulomb-gap due to one-electron charging effect.

• Bulletin of the Korean Chemical Society
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• v.34 no.2
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• pp.510-514
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• 2013

The structural change of Nafion polymer electrolyte membrane (PEM) induced by hot-pressing, which is one of the representative procedures for preparing membrane-electrode-assembly for low temperature fuel cells, was investigated by $^2H$ nuclear magnetic resonance (NMR) spectroscopy. The hydrophilic channels were asymmetrically flattened and more aligned in the membrane plane than along the hot-pressing direction. The average O-$^2H$ director of $^2H_2O$ in polymer electrolyte membrane was employed to extract the structural information from the $^2H$ NMR peak splitting data. The dependence of $^2H$ NMR data on water contents was systematically analyzed for the first time. The approach presented here can be used to understand the chemicals' behavior in nano-spaces, especially those reshaping and functioning interactively with the chemicals in the wet and/or mixed state.

• Transactions on Electrical and Electronic Materials
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• v.7 no.4
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• pp.173-179
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• 2006

Due to the limitations of the channel length, the lateral spread for two-dimensional impurity distributions is critical for the analysis of devices including the integrated complementary metal oxide semiconductor (CMOS) circuits and high frequency semiconductor devices. The developed codes were then compared with the two-dimensional implanted profiles measured by transmission electron microscope (TEM) as well as simulated by a commercial TSUPREM4 for verification purposes. The measured two-dimensional TEM data obtained by chemical etching-method was consistent with the results of the developed analytical model, and it seemed to be more accurate than the results attained by a commercial TSUPREM4. The developed codes can be applied on a wider energy range $(1KeV{\sim}30MeV)$ than a commercial TSUPREM4 of which the maximum energy range cannot exceed 1MeV for the limited doping elements. Moreover, it is not only limited to diffusion process but also can be applied to implantation due to the sloped and nano scale structure of the mask.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.26-27
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• 2006

To develop tera-bit level SONOS flash memories, SONOS unit memory and 64 bit flash arrays are fabricated. The unit cells have both channel length and width of 30nm. The NAND & NOR arrays are fabricated on SOI wafer and patterned by E-beam. The unit cells represent good write/erase characteristics and reliability characteristics. SSL-NOR array have normal write/erase operation. These researches are leading the realization of Tera-bit level non-volatile nano flash memory.

• 전자공학회논문지 IE
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• v.48 no.4
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• pp.13-18
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• 2011

In this paper, we have examined electrical characteristics of LDO regulator according to the process variation using a 1 ${\mu}m$ 20 V high voltage CMOS process. The electrical analysis of LDO regulator have been performed with three kind of SPICE parameter sets (Typ : typical, FF : fast, SS : slow) by process variation which cause change of SPICE parameter such as threshold voltage and effective channel length of MOS devices. From simulation results, we confirmed that in case of SS type SPICE parameter set, the LDO regulator has 3.6 mV/V line regulation, 0.4 mV/mA load regulation and 0.86 ${\mu}s$ output voltage settling time. And in case of Typ type SPICE parameter set, the LDO regulatorhas 4.2 mV/V line regulation, 0.44 mV/mA load regulation and 0.62 ${\mu}s$ output voltage settling time. Finally, in the FF type SPICE parameter set, the LDO regulator has 7.0 mV/V line regulation, 0.56 mV/mA load regulation and 0.27 ${\mu}s$ output voltage settling time.

• Transactions of the KSME C: Technology and Education
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• v.3 no.3
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• pp.217-223
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• 2015

The patterning of microbead in microfluidics channel is a practical technique for application in bio and medical areas. An approach is described for a direct patterning of magnetically active microbeads in microfluidic devices without inner structure. Local magnet arrangements - flat arrangement and stack arrangement - contacting same poles or opposite poles of magnet were utilized for generating trapping magnetic fields. The arrangement of magnets contacting same poles generated isolated patterns by repelling of magnetic field. The flat arrangement of vertically reverse magnet arrays shaped trapping patterns repelling magnetic field line between same poles. Spatially, the stack compositions of magnet arrangements allow diverse isolated trapped patterns of magnetic particles. Trapped magnetic particles in fluidic channels were stable on the $18m{\ell}/hr$ flow conditions and magnetic force of 1.08 mT in the all experiments. This experimental study suggests the simple and versatile methods to pattern magnetic particles, and has potential of wide application to bio and medical area.

• Journal of the Korean Graphic Arts Communication Society
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• v.29 no.1
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• pp.23-33
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• 2011

This experimental focus to characterize luminescence properties related to CNT (Carbon Nano Tube) element dispersedly implanted in ZnS-based phosphor thin film panel fabricated by a screen printing method. More specifically FE-SEM measurements, L-V(Luminescence vs. Voltage) and photo luminescence were carried out to determine an optimum value of CNT concentration and film thickness for the thin film structure of CNT-ZnS:(Cu, Al) by the screen printing method. We confirmed that an optimum value of CNT concentration in the ZnS:(Cu, Al) film panel is about 0.75 wt% resulting that the electric conductivity is 1.6 times higher than that of pure CNT sample and showing that the luminescence intensity is increasing until the optimum concentration. Clearly, CNT is presenting in the luminescence process providing a pathway for the creation of hot electron and a channel for the electron-hole recombination but overly inserted CNT may hinder to produce the hot electron for making an avalanching process. In case of the overly doped CNT 1.0 wt% in the ZnS-based phosphor, the luminescence intensity is decreasing although the electric conductivity is exponentially increasing. Based on these results, we realized that hot electron occurred by the external electric field or exciton arose by the external photon source are reduced dramatically over the critical value of CNT concentration because CNT element provide various isolated residues in the composites of ZnS based phosphor rather than pathway or channel for the D-A(Donnor to Acceptor) pair transition or the radiative recombination of electron-hole.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.7
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• pp.472-476
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• 2014

We report the characteristics of thin-film transistor (TFT) to make the bi-channel structure with stacked $Mg_{0.1}Zn_{0.9}O$ (Mg= 10 at.%) and ZnO. The ZnO and $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited by radio frequency (RF) co-sputter system onto the thermally oxidized silicon substrate. A total thickness of active layer was 50 nm. Firstly, the ZnO thin films were deposited to control the thickness from 5 nm to 30 nm. Sequentially, the $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited to change from 45 nm to 20 nm. The bi-layer TFT shows more improved properties than the single layer TFT. The field effect mobility and subthreshold slope for $Mg_{0.1}ZnO_{0.9}O$/ZnO-TFT are $7.40cm^2V^{-1}s^{-1}$ and 0.24 V/decade at the ZnO thickness of 10 nm, respectively.

• Membrane Journal
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• v.26 no.4
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• pp.291-300
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• 2016

Techniques for selectively separating molecules of gas and liquid states using various separation membranes have been widely used in variety of applications such as chemical, biological, pharmaceutical, and petrochemical industries. As the nanochannel diameter, inter-channel distance and length of the nanochannel of the anodic aluminum oxide (AAO) membranes can be precisely controlled, various studies to effectively separate mixture of various molecules using AAO membrane have been widely carried out. In this study, we fabricated AAO membranes of cylindrical nanochannels of various diameter sizes and of through-hole structure, that is, nanochannels of which both ends of each nanochannel are open. Using those AAO membranes of through-hole nanochannel structure, we studied the selective permeation polymer chains dissolved in a solvent based on hydraulic volume of the polymer chains. We found a precise, quantitative relationship between the radius of gyration of polymer chains that permeated through nanochannels inside AAO membrane and the diameter of nanochannels. In addition, we demonstrate that the behavior of the polymer solution flowing through nanochannel of the AAO membrane can be successfully described with the Hagen-Poiseuille relationship. It is, therefore, possible to theoretically interpret the nanoflow of the solution flowing inside the cylindrical nanochannel.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.8
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• pp.875-881
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• 2004

Fundamental results obtained from an atomic force microscope (AFM) chemically-induced direct nano-lithography process are presented, which is regarded as a simple method for fabrication nm-scale devices such as superconducting flux flow transistors (SFFTs) and single electron tunneling transistors (SETs). Si cantilevers with Pt coating and with 30 nm thick TiO coating were used as conducting AFM tips in this study. We observed the surfaces of superconducting strip lines modified by AFM anodization' process. First, superconducting strip lines with scan size 2 ${\mu}{\textrm}{m}$${\times}$2 ${\mu}{\textrm}{m}$ have been anodized by AFM technology. The surface roughness was increased with the number of AFM scanning, The roughness variation was higher in case of the AFM tip with a positive voltage than with a negative voltage in respect of the strip surface. Second, we have patterned nm-scale oxide lines on ${YBa}-2{Cu}_3{O}_{7-x}$ superconducting microstrip surfaces by AFM conductive cantilever with a negative bias voltage. The ${YBa}-2{Cu}_3{O}_{7-x}$ oxide lines could be patterned by anodization technique. This research showed that the critical characteristics of superconducting thin films were be controlled by AFM anodization process technique. The AFM technique was expected to be used as a promising anodization technique for fabrication of an SFFT with nano-channel.