• Title/Summary/Keyword: Nano process

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Effect of Oxygen in the Synthesis of ZnO Nanowires (ZnO 나노선의 합성에서의 미량산소의 영향)

  • Park, Kyung-Su;Choi, Young-Jin;Park, Jae-Gwan;Kang, Gyo-Sung;Lim, Dong-Gun;Park, Jae-Hwan
    • Korean Journal of Materials Research
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    • v.17 no.9
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    • pp.458-462
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    • 2007
  • The effect of oxygen in the synthesis of oxide nanowires by using carbothermal reduction process have been studied thermodynamically and kinetically. By using laboratory air, ZnO nanowires could be fabricated in the carbothermal reduction process and a metal oxidation process. As the processing pressure decreases, the diameter of the nanowires decreases and the oxygen vacancy increases. As the processing pressure increases, the oxygen vacancy decreases and the shape of the ZnO becomes plate-like.

Evaluation for Adhesion Characteristics of UV-curable Bump Shape Stamp for Transfer Process (전사공정을 위한 UV 경화성 범프형 스탬프의 점착특성 평가)

  • Jeong, Yeon-Woo;Kim, Kyung-Shik;Lee, Chung-Woo;Lee, Jae-Hak;Kim, Jae-Hyun;Kim, Kwang-Seop
    • Tribology and Lubricants
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    • v.32 no.3
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    • pp.75-81
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    • 2016
  • Future electronics such as electronic paper and foldable cellphone are required to be flexible and transparent and should have a high performance. In order to fabricate the flexible electronics using flexibility transfer process, techniques for transferring various devices from rigid substrate onto flexible substrate by elastomeric stamp, have been developed. Adhesion between the elastomeric stamp and various devices is crucial for successful transfer process. The adhesion can be controlled by the thickness of the stamp, separation velocity, contact load, and stamp surface treatment. In this study, we fabricated the bump shape stamp consisting of a UV-curable polymer and investigated the effects of curing condition, separation velocity, and contact load on the adhesion characteristics of bumps. The bumps with hemispherical shape were fabricated using a dispensing process, which is one of the ink-jet printing techniques. Curing conditions of the bumps were controlled by the amount of UV irradiation energy. The adhesion characteristics of bumps are evaluated by adhesion test. The results show that the pull-off forces of bumps were increased and decreased as UV irradiation energy increased. For UV irradiation energies of 300 and 500 mJ/cm2, the pull-off forces were increased as the separation velocity increased. The pull-off forces also increased with the increase of contact load. In the case of UV irradiation energy above 600 mJ/cm2, however, the pull-off forces were not changed. Therefore, we believe that the bump shape stamp can be applied to roll-based transfer process and selective transfer process as an elastomeric stamp.

Numerical Analysis Based on Continuum Hypothesis in Nano-imprining process (연속체 개념에 기반한 나노 임프린트 공정해석 연구)

  • 김현칠;이우일
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.10a
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    • pp.333-338
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    • 2003
  • Nano-imprint lithography(NIL) is a polymer embossing technique, capable of transferring nano-scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate(PMMA) using this parallel process. Feature size down 10 nm have been demonstrated. In NIL, the pattern is formed by displacing polymer material, which can be squeeze flow of a viscous liquid. Due to the size of the pattern, a thorough understood of the process through experiments may be very different. Therefore we nead to resort to numerical simulation on the embossing process. Generally, there are two ways of numerical simulation on nano-scale flow, namely top-down and bottom-up approach. Top-down approach is a way to simulate the flow assuming that polymer is a continuum. On the contrary, in the bottom-up approach, simulation is peformed using molecular dynamics(MD). However, as latter method is not feasible yet. we chose the top-down approach. For the numerical analysis, two dimensional moving grid was used since the moving grid can predict the flow front. Effects of surface tension as well as the slip at the boundary were also considered.

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Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing and Its Numerical Simulation (기계.화학적인 연마에서 슬러리의 특성에 따른 나노토포그래피의 영향과 numerical시뮬레이션)

  • Takeo Katoh;Kim, Min-Seok;Ungyu Paik;Park, Jea-Gun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.63-63
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    • 2003
  • The nanotopography of silicon wafers has emerged as an important factor in the STI process since it affects the post-CMP thickness deviation (OTD) of dielectric films. Ceria slurry with surfactant is widely applied to STI-CMP as it offers high oxide-to-nitride removal selectivity. Aiming to control the nanotopography impact through ceria slurry characteristics, we examhed the effect of surfactant concentration and abrasive size on the nanotopography impact. The ceria slurries for this study were produced with cerium carbonate as the starting material. Four kinds of slurry with different size of abrasives were prepared through a mechanical treatment The averaged abrasive size for each slurry varied from 70 nm to 290 nm. An anionic organic surfactant was added with the concentration from 0 to 0.8 wt %. We prepared commercial 8 inch silicon wafers. Oxide Shu were deposited using the plasma-enhanced tetra-ethyl-ortho-silicate (PETEOS) method, The films on wafers were polished on a Strasbaugh 6EC. Film thickness before and after CMP was measured with a spectroscopic ellipsometer, ES4G (SOPRA). The nanotopogrphy height of the wafer was measured with an optical interferometer, NanoMapper (ADE Phase Shift)

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Electrical Characterization of Nano SOI Wafer by Pseudo MOSFET (Pseudo MOSFET을 이용한 Nano SOI 웨이퍼의 전기적 특성분석)

  • Bae, Young-Ho;Kim, Byoung-Gil;Kwon, Kyung-Wook
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.12
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    • pp.1075-1079
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    • 2005
  • The Pseudo MOSFET measurements technique has been used for the electrical characterization of the nano SOI wafer. Silicon islands for the Pseudo MOSFET measurements were fabricated by selective etching of surface silicon film with dry or wet etching to examine the effects of the etching process on the device properties. The characteristics of the Pseudo MOSFET were not changed greatly in the case of thick SOI film which was 205 nm. However the characteristics of the device were dependent on etching process in the case of less than 100 nm thick SOI film. The sub 100 nm SOI was obtained by thinning the silicon film of standard thick SOI wafer. The thickness of SOI film was varied from 88 nm to 44 nm by chemical etching. The etching process effects on the properties of pseudo MOSFET characteristics, such as mobility, turn-on voltage, and drain current transient. The etching Process dependency is greater in the thinner SOI wafer.

Wear Characteristics of CBN Tools on Hard Turning of AISI 4140 (고경도강(AISI 4140, HrC60)의 하드터닝에서 가공속도 및 윤활조건 변경에 따른 CBN 공구의 마모 특성)

  • Yang, Gi-Dong;Park, Kyung-Hee;Lee, Myung-Gyu;Lee, Dong Yoon
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.9
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    • pp.799-804
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    • 2014
  • Hard turning is a machining process for hardened materials with high surface quality so that grinding process can be eliminated. Therefore, the hard turning is capable of reducing machining time and improving productivity. In this study, hardened AISI4140 (high-carbon chromium steel) that has excellent yield strength, toughness and wear resistance was finish turned using CBN tools. Wear characteristics of CBN tool was analyzed in dry and MQL mixed with nano-particle (Nano-MQL). The dominant fracture mechanism of CBN tool is diffusion and dissolution wear on the rake surface resulting in thinner cutting edge. Abrasive wear by hard inclusion in AISI4140 was dominant on the flank surface. Nano-MQL reduced tool wear comparing with the dry machining but chip evacuation should be considered. A cryogenically treated tool showed promising result in tool wear.

Fabrication of Three-Dimensional Micro-Shell Structures Using Two-Photon Polymerization (이광자 흡수 광중합에 의한 3차원 마이크로 쉘 구조물 제작)

  • Park Sang Hu;Lim Tae Woo;Yang Dong-Yol
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.7 s.238
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    • pp.998-1004
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    • 2005
  • A nano-stereolithography (NSL) process has been developed for fabrication of 3D shell structures which can be applied to various nano/micro-fluidic devices. By the process, a complicated 3D shell structure on a scale of several microns can be fabricated using lamination of layers with a resolution of 150 nm in size, so it does not require the use of my sacrificial layer or any supporting structure. A layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) induced using a femtosecond laser processing. When the polymerization process is finished, unsolidified liquid state resins can be removed easily by dropping several droplets of ethanol fur developing the fabricated structure. Through this work, some 3D shell structures, which can be applied to various applications such as nano/micro-fluidic devices and MEMS system, were fabricated using the developed process.

Powder Densification Using Equal Channel Angular Pressing (ECAP 공정을 이용한 분말의 치밀화)

  • Yoon Seung-Chae;Seo Min-Hong;Hong Sun-Ig;Kim Hyoung-Seop
    • Journal of Powder Materials
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    • v.13 no.2 s.55
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    • pp.124-128
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    • 2006
  • In recent years, equal channel angular pressing (ECAP) has been the subject of intensive study due to its capability of producing fully dense samples having a ultrafine grain size. In this paper, the ECAP process was applied to metallic powders in order to achieve both powder consolidation and grain refinement. In the ECAP process for solid and powder metals, knowledge of the internal stress, strain and strain rate distribution is fundamental to the determination of the optimum process conditions for a given material. The properties of the ECAP processed solid and powder materials are strongly dependent on the shear plastic deformation behavior during ECAP, which is controlled mainly by die geometry, material properties, and process conditions. In this study, we investigated the consolidation, plastic deformation and microstructure evolution behaviour of the powder compact during ECAP.

Synthesis and Characterization of Cathode Materials for the Lithium Secondary Batteries by Spray Drying Method

  • Oh, Si-Hyoung;Jeong, Woon-Tae;Cho, Won-Il;Cho, Byung-Won
    • Journal of the Korean Electrochemical Society
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    • v.8 no.1
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    • pp.42-46
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    • 2005
  • It has been known that the synthesis of the cathode materials for the lithium rechargeable batteries by the sol-gel process has many advantages over the conventional solid-state method. It has been, however, a continuing issue that new additional steps should be introduced to commercialize this process. In this work, spray drying was introduced to the existing sol-gel process as a continuous mass production method of the pre-heat treatment precursor materials. The precursors of $LiCoO_2$ and $LiNi_{0.8}Co_{0.2}O_2$ were continuously produced through spray drying from the solution containing stoichiometric amount of lithium, cobalt, and nickel sources as well as a chelating agent. The process variables, such as pH of the starting solution, spray drying conditions, and calcination conditions were optimized. The XRD pattern for the synthesized material indicated a good crystallinity with a layered structure.

Microstructure Evolution of Cu-based BMG Coating during APS Process and Phase Analysis by Nano-indentation Test (대기 플라즈마 용사공정을 이용한 Cu계 벌크 비정질 금속 코팅의 미세조직 분석과 나노 압입시험을 이용한 상 분석)

  • Kim, Jung-Hwan;Kang, Ki-Cheol;Yoon, Sang-Hoon;Na, Hyun-Taek;Lee, Chang-Hee
    • Journal of Welding and Joining
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    • v.27 no.6
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    • pp.43-48
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    • 2009
  • In this study, Cu-based bulk metallic glass (BMG) coatings were deposited by atmospheric plasma spraying (APS) process with different process conditions (with- and without hydrogen gas). As adding the hydrogen gas, thermal energy in the plasma flame increased and induced difference in the melting state of the Cu-based BMG particles. The microstructure and mechanical properties of the coatings were analyzed using a scanning electron microscope (SEM) with an energy dispersive spectroscopy (EDS) and nano-indentation tester in the light of phase analysis. It was elucidated by the nano-indentation tests that un-melted region was a mainly amorphous phase which showed discrete plasticity observed as the flow serrations on the load.displacement (P - h) curves, and the curves of solidified region showed lower flow serrations as amorphous phase mingled with crystalline phase. Oxides produced during the spraying process had the highest hardness value among the phases and were well mixed with other phases resulted from the increase in melting degree.