• 제목/요약/키워드: Nano Replication Process

검색결과 42건 처리시간 0.026초

초음파성형을 이용한 폴리에틸렌 나노 마이크로 구조물의 복제 (Replication of Polyethylene Nano-Microstructures Using Ultrasonic Forming)

  • 이치훈;유현우;신보성;고종수
    • 대한기계학회논문집A
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    • 제33권11호
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    • pp.1209-1216
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    • 2009
  • Nano-micro hierarchical structures that nanoprotrusions were formed on the network-type microstructures were fabricated using an ultrasonic vibration forming technology. A commercial ultrasonic welding system was used to apply ultrasonic vibration energy. To evaluate the formability of ultrasonic vibration forming, nickel nano-micro hierarchical mold was fabricated and polyethylene (PE) was used as the replication material. The optimal molding time was 3.5 sec for PE nano-micro hierarchical structures. The molding process was conducted at atmospheric pressure.

고밀도 패턴드 미디어 성형에 관한 연구 (Replication of High Density Patterned Media)

  • 이남석;최용;강신일
    • 정보저장시스템학회논문집
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    • 제1권2호
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    • pp.192-196
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    • 2005
  • In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. The nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. In nano-injection molding process, since the solidified layer, generated during the polymer filling, deteriorates transcribability of nano patterns by preventing the polymer melt from filling the nano cavities, an injection-mold system was constructed to actively control the stamper surface temperature using MEMS heater and sensors. The replicated polymeric patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth. The replicated polymeric patterns can be applied to high density patterned media.

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패턴드 미디어를 위한 나노 사출 성형 공정에 관한 연구 (Replication of Patterned Media Using Nano-injection Molding Process)

  • 이남석;최용;강신일
    • 소성∙가공
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    • 제14권7호
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    • pp.624-627
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    • 2005
  • In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by I-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50nm in diameter, 150nm in pitch, and 50nm in depth.

패턴드 미디어를 위한 나노 사출 성형 공정에 관한 연구 (Replication of Patterned Media Using Nano-injection Molding Process)

  • 이남석;최용;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 춘계학술대회 논문집
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    • pp.60-63
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    • 2005
  • In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth.

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진공 압력차이법에 의한 나노 정밀도를 가지는 폴리디메틸실록산 형상복제 (Fabrication Process of a Nano-precision Polydimethylsiloxane Replica using Vacuum Pressure-Difference Technique)

  • 박상후;임태우;양동열;공홍진;이광섭
    • 폴리머
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    • 제28권4호
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    • pp.305-313
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    • 2004
  • 본 연구는 나노 복화공정을 이용하여 마이크로 혹은 나노공정에 응용이 가능한 형상모형 제작공정 개발과 폴리디메틸실록산 (polydimethylsiloxane)를 이용하여 만들어진 형상모형의 몰드로 나노급 정밀도의 폴리디메틸실록산 형상을 복제하는 공정에 관한 것이다. 본 연구에서 제안한 나노 복화공정은 복잡한 형상모형 (pattern)이나 2차원 형상을 CAD 파일 없이 비트맵 그림파일을 이용하여 직접적으로 200nm 정밀도를 가지는 형상으로 만들 수 있다. 형상모형은 펨토초 레이저를 이용하여 이광자 흡수 중합법으로 제작하기 때문에 형상의 정밀도는 레이저 범의 회절한계 이하로 얻을 수 있다. 이렇게 제작된 마스터 형상모형은 본 연구에서 제안한 진공압력차이법으로 폴리디메틸실록산 몰드를 제작하여 기존의 제작방법에 비하여 정밀한 제작이 가능함을 보였으며 또한 제작된 몰드를 이용하여 양각의 플리디메틸실록산 스탬프를 제작하였다.

DVD/Blu-ray 스템퍼를 이용한 핫엠보싱 특성 (Characteristics of Hot Embossing using DVD/Blu-ray Stamper)

  • 김병희;반준호;신재구;김헌영
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 추계학술대회논문집
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    • pp.305-310
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    • 2004
  • The Hot Embossing Lithography(HEL) as a method for the fabrication of nanostructure with polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this study, we investigated the characteristics of hot embossing lithography as a nanoreplication technique. To grasp characteristics of nano patterning rheology by process parameters(embossing temperature, pressure and time), we have carried out various experiments by using the DVD(400nm pattern width) and Blu-ray nickel stamps(150nm pattern width). During the hot embossing process, we have observed the characteristics of the size effect. The quality of products made by hot embossing is affected by its cooling shrinkage. The demolding process at the glass transition temperature results in low quality because of the shrinkage of the polymer. Therefore, the quantification of the temperature condition is essential for the replication of high quality.

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광자결정 도파로 성형용 PDMS 스탬프 제작 (PDMS Stamp Fabrication for Photonic Crystal Waveguides)

  • 오승훈;최두선;김창석;정명영
    • 한국정밀공학회지
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    • 제24권4호
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    • pp.153-158
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    • 2007
  • Recently nano imprint lithography to fabricate photonic crystal on polymer is preferred because of its simplicity and short process time and ease of precise manufacturing. But, the technique requires the precise mold as an imprinting tool for good replication. These molds are made of the silicon, nickel and quartz. But this is not desirable due to complex fabrication process, high cost. So, we describe a simple, precise and low cost method of fabricating PDMS stamp to make the photonic crystals. In order to fabricate the PDMS mold, we make the original pattern with designed hole array by finding the optimal electron beam writing condition. And then, we have tried to fabricate PDMS mold by the replica molding with ultrasonic vibration and pressure system. We have used the cleaning process to solve the detaching problem on the interface. Using these methods, we acquired the PDMS mold for photonic crystals with characteristics of a good replication. And the accuracy of replication shows below 1% in 440nm at diameter and in 610nm at lattice constant by dimensional analysis by SEM and AFM.

핫엠보싱 공정에서 PMMA의 마이크로/나노 레올로지 특성 (Micro/Nano Rheological Characteristics of PMMA in Hot Embossing Process)

  • 김병희;김광순;반준호;신재구;김헌영
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.259-264
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    • 2004
  • The hot embossing process as a method for the fabrication of polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this paper, we carried out experimental studies and numerical simulations in order to understand the viscous flow of polymer film during hot embossing process. As the initial step of quantitating the hot embossing process, simple parametric studies for the embossing conditions have been carried out using high resolution masters which patterned by DRIE process. Under different embossing times and pressures, the viscous flow of PMMA films into micro/nano cavities has been investigated. Also, the viscous flow during the hot embossing process has been simulated by the continuum based FDM analysis considering micro/nano effect, such as surface tension and contact angle.

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Development of Roll-to- Flat Thermal Imprinting Equipment and Experimental Study of Large Area Pattern Replication on Polymer Substrate

  • 이문구;란 슈하이;이수훈;이혜진;;성연욱
    • 한국생산제조학회지
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    • 제18권3호
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    • pp.307-314
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    • 2009
  • Large area micro pattern replication has promising application potential in many areas. Rolling imprint process has been demonstrated as one of the most competitive processes for such micro pattern replication, because it has advantages in low cost, high throughput and high efficiency. In this paper, we developed a prototype of roll-to-flat(R2F) thermal imprint system for large area micro pattern replication process, which is one of the key processes in the fabrication of flexible displays. Experimental tests were conducted to evaluate the feasibility of system and the parameters' effect on the process, such as flat mold temperature, loading pressure and rolling speed. 100mm $\times$ 100mm stainless steel flat mold and commercially available polycarbonate sheets were used for the tests. The experimental results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern over large area.

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