• 한국정밀공학회지
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• 제21권2호
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• pp.210-217
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• 2004

In this study, a new process, named as nano replication printing(nRP) process, is developed for printing any figure in the range of several micrometers by using voxel matrix scanning scheme. In this newly developed process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid resin according to a voxel matrix which is transformed from bitmap format file. After the polymerization, a droplet of ethanol is dropt to remove the unnecessary remaining liquid resin and then the polymerized figures with nano-scaled precision are only remaining on the glass plate. By the nRP process, any figure file of bitmap format could be reproduced as nano-scaled precision replication in the range of several micrometers. Also, nano/micro-scaled patterns for an extremely wide range of applications would become a technologically feasible reality. Some of figures with nano-scaled precision were printed in scaled replication as examples to prove the usefulness of this study.

• 대한기계학회논문집A
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• 제28권7호
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• pp.999-1005
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• 2004

A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

• 한국정밀공학회지
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• 제22권1호
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• pp.175-182
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• 2005

A laser beam expanding technique is employed to fabricate precise nano-patterns in a nano-replication printing (nRP) process. In the nRP process, some patterns can be fabricated in the range of several microns inside on a polymerizable resin by using a volume-pixel (voxel) matrix that is transformed from a two-tone bitmap figure file. The liquid monomers are polymerized by means of a two-photon-absorption (TPA) phenomenon that is induced by a femtosecond (fs)-pulse laser. The yokels are generated consecutively to merge into adjoining yokels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam by the two-photon absorbed polymerization (TPP). In this work, a beam-expanding technique has been applied to enlarge a working area and to fabricate precise patterns. Through this work, a working area is expanded by the technique as much as 2.5 times compared with a case of without a beam expanding technique, and precision of outside patterns is improved.

• 한국정밀공학회지
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• 제21권6호
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• pp.160-166
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• 2004

In this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy.

• 한국정밀공학회지
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• 제21권6호
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• pp.153-159
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• 2004

In this study, a new process to pattern directly on a thin metal layer using improved nano replication printing (nRP) process is suggested to evaluate the possibilities of fabricating a stamp for nano-imprinting. In the nRP process, any figure can be replicated from a bitmap figure file in the range of several micrometers with nano-scaled details. In the process, liquid-state resins are polymerized by two-photon absorption which is induced by femto-second laser. A thin gold layer was sputtered on a glass plate and then, designed patterns or figures were developed on the gold layer by newly developed top-down building approach. Generally, stamps fur nano-imprinting have been fabricated by using the costly electron-beam lithography process combined with a reactive ion-etching process. Through this study, the effectiveness of the improved nRP process is evaluated to make a stamp with the resolution of around 200nm with reduced cost.

• 폴리머
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• 제28권4호
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• pp.305-313
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• 2004

본 연구는 나노 복화공정을 이용하여 마이크로 혹은 나노공정에 응용이 가능한 형상모형 제작공정 개발과 폴리디메틸실록산 (polydimethylsiloxane)를 이용하여 만들어진 형상모형의 몰드로 나노급 정밀도의 폴리디메틸실록산 형상을 복제하는 공정에 관한 것이다. 본 연구에서 제안한 나노 복화공정은 복잡한 형상모형 (pattern)이나 2차원 형상을 CAD 파일 없이 비트맵 그림파일을 이용하여 직접적으로 200nm 정밀도를 가지는 형상으로 만들 수 있다. 형상모형은 펨토초 레이저를 이용하여 이광자 흡수 중합법으로 제작하기 때문에 형상의 정밀도는 레이저 범의 회절한계 이하로 얻을 수 있다. 이렇게 제작된 마스터 형상모형은 본 연구에서 제안한 진공압력차이법으로 폴리디메틸실록산 몰드를 제작하여 기존의 제작방법에 비하여 정밀한 제작이 가능함을 보였으며 또한 제작된 몰드를 이용하여 양각의 플리디메틸실록산 스탬프를 제작하였다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.41-41
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• 2003