• 제목/요약/키워드: Nano Pattern

검색결과 478건 처리시간 0.031초

Members of the ran family of stress-inducible small GTP-binding proteins are differentially regulated in sweetpotato plants

  • Kim, Young-Hwa;Huh, Gyung Hye
    • Journal of Plant Biotechnology
    • /
    • 제40권1호
    • /
    • pp.9-17
    • /
    • 2013
  • Ran is a small GTP-binding protein that binds and subsequently hydrolyzes GTP. The functions of Ran in nuclear transport and mitotic progression are well conserved in plants and animals. In animal cells, stress treatments cause Ran relocalization and slowing of nuclear transport, but the role of Ran proteins in plant cells exposed to stress is still unclear. We have therefore compared Ran genes from three EST libraries construed from different cell types of sweetpotato and the distribution pattern of Ran ESTs differed according to cell type. We further characterized two IbRan genes. IbRan1 is a specific EST to the suspension cells and leaf libraries, and IbRan2 is specific EST to the root library. IbRan1 showed 94.6 % identity with IbRan2 at the amino acid level, but the C-terminal region of IbRan1 differed from that of IbRan2. These two genes showed tissue-specific differential regulation in wounded tissues. Chilling stress induced a similar expression pattern in both IbRan genes in the leaves and petioles, but they were differently regulated in the roots. Hydrogen peroxide treatment highly stimulated IbRan2 mRNA expression in the leaves and petioles, but had no significant effect on IbRan1 gene expression. These results showed that the transcription of these two IbRan genes responds differentially to abiotic stresses and that they are subjected to tissue-specific regulation. Plant Ran-type small G-proteins are a multigenic family, and the characterization of each Ran genes under various environmental stresses will contribute toward our understanding of the distinctive function of each plant Ran isoform.

블록 공중합체를 이용한 나노패턴의 크기제어방법 (Method to control the Sizes of the Nanopatterns Using Block Copolymer)

  • 강길범;김성일;한일기
    • 한국진공학회지
    • /
    • 제16권5호
    • /
    • pp.366-370
    • /
    • 2007
  • 밀도가 높고 주기적으로 배열된 나노 크기의 기공이 25nm 두께의 실리콘 산화막 기판위에 형성 되었다. 나노미터 크기의 패턴을 형성시키기 위해서 자기조립물질을 사용했으며 폴리스티렌(PS) 바탕에 벌집형태로 평행하게 배열된 실린더 모양의 폴리메틸메타아크릴레이트(PMMA)의 구조를 형성하였다. 폴리메틸메타아크릴레이트를 아세트산으로 제거하여 폴리스티렌만 남아있는 나노크기의 마스크를 만들었다. 폴리스티렌으로 이루어진 나노패턴의 지름은 $8{\sim}30nm$ 였고 높이는 40nm였으며, 패턴과 패턴사이의 간격은 60nm였다. 형성된 패턴을 실리콘 산화막 위에 전사시키기 위해 불소 기반의 화학 반응성 식각을 사용하였다. 실리콘 산화막에 형성된 기공의 지름은 $9{\sim}33nm$였다. 실리콘 산화막을 불산으로 제거하여 실리콘에 형성된 기공을 관찰하였고, 실리콘기판에 형성된 기공의 지름은 $6{\sim}22nm$였다. 형성된 기공의 크기는 폴리메틸메타아크릴레이트의 분자량과 관계가 있음을 알 수 있었다.

열처리와 복합구조화를 통한 디스플레이용 기능성 고분자 필름의 내구성 향상 연구 (Durability Improvement of Functional Polymer Film by Heat Treatment and Micro/nano Hierarchical Structure for Display Applications)

  • 여나은;조원경;김두인;정명영
    • 마이크로전자및패키징학회지
    • /
    • 제25권4호
    • /
    • pp.47-52
    • /
    • 2018
  • 본 연구에서는 디스플레이에 적용되는 기능성 고분자 필름의 나노구조에 의한 기계적 물성 저하 문제를 해결하기 위해 열처리 방법과 멀티스케일 계층구조를 통한 PMMA(Poly(methyl-methacrylate)) 필름의 내구성 향상에 대해 연구하였다. PMMA 필름의 기계적 특성을 향상시키기 위한 열처리 공정은 고온/고압의 자유제적 제어공정과 고온 공정 후 급속히 냉각시키는 공정으로 구성되어 있으며, 열 나노임프린트를 이용하여 스크래치로부터 나노구조를 보호하기 위한 멀티스케일 계층구조를 형성하였다. 연필경도 시험에 의해 발생한 미세구조의 손상에 대한 평가를 위해 표면 형상 변화와 기능성 변화를 평가하였으며, 이를 통하여 열처리와 멀티스케일 계층구조가 스크래치에 의한 정접촉각 감소와 투과율 손실 저감에 효과적임을 확인하였다.

프리즘 패턴의 기계적 절삭 가공 (Mechanical Machining of Prism Pattern)

  • 유영은;홍성민;제태진;최두선
    • 소성∙가공
    • /
    • 제15권1호
    • /
    • pp.71-75
    • /
    • 2006
  • In recent, various shapes of pattern in micron or nano scale are adapted in many applications due to their good mechanical or optical properties. Light guide panel (LGP) of the LCD is one of important applications for micro pattern and micro prism shape is one of the typical patterns. The size of the surface patterns in most applications is decreasing to the order of micron or even under micron. On the other hand, the area to be patterned keeps enlarging. These two trends in patterned products require tooling micro patterns on large surface, which has still many technical problems to be solved mainly due to pattern size and the tooling area. In this study, we fabricated prism shape of patterns using diamond cutting tool on some metal core and plastic core like PMMA. Some cutting conditions were investigated including cutting force, cutting depth and speed for different core materials.

AFM을 이용한 미세 패턴 가공 시 접촉 하중에 따른 선폭 변화에 대한 연구 (Investigation on the Effect of Contact Load on Fine Pattern Fabrication by AFM)

  • 조상범;김대은
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2005년도 추계학술대회 논문집
    • /
    • pp.502-505
    • /
    • 2005
  • To overcome some of the limitations in the conventional photolithography technique, MC-SPL which has advantages such as flexibility and high speed was developed in the past. To make a fine pattern using MC-SPL, there are many variables to control, for example, applied load, scribing speed, chemical etching condition, and etc. In this work, the effect of contact load on the width of the pattern was investigated. The load not only influences the width of the pattern but it also affects the wear of the probe tip. It was found that it is beneficial to load the tip in two stages. Futhermore, the experimental results showed that the pattern width was more sensitive to the initial contact force.

  • PDF

표면 고분자 안정화를 이용한 고 광효율 VA 디스플레이 연구 (Investigation on High Transmittance Vertical Alignment (VA) display associated with Surface Polymer Stabilization)

  • 김우일;김성민;조인영;김대현;권동원;정연학;류재진;김경현;이승희
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
    • /
    • pp.39-40
    • /
    • 2009
  • The patterned vertical alignment (PVA) display showed good electro-optic properties such as wide viewing angle, fast response time, high Contrast Ratio. However, the device has patterned electrode on both top and bottom electrodes which requires high accuracy of assembling of top and bottom substrates in order to exhibit a high performance. So, they have disadvantage about low yield. In order to resolve these problem, in this paper, we studied about top substrate pattern free vertical alignment device associated with surface polymer stabilization using the UV curable monomer. This method shows simple progress, low cost and good electro-optic properties such as high transmittance and fast response time.

  • PDF

잉크젯 기법을 이용한 은 미세라인 형성 (Fabrication of Silver Micro Lines by Ink-Jet Method)

  • 변종훈;서동수;최영민;장현주;공기정;이정오;류병환
    • 한국세라믹학회지
    • /
    • 제41권10호
    • /
    • pp.788-791
    • /
    • 2004
  • 입자크기가 수 nm인 고농도 은 나노 졸을 이용하여 잉크젯 기법으로 은 미세라인을 형성하고자 하였다. 고분자전해질을 사용하여 합성한 $10wt\%$ 농도의 은 나노 졸의 입자크기는 10nm 이하였으며, 은 나노 졸을 이용한 미세 라인의 인쇄특성은 은 나노 졸의 접촉각에 매우 깊은 관계를 갖고 있었다. 순수한 ITO 기판에서 은 나노 졸은 높은 접촉각을 나타내었으며, dot 형상이 나타났다. 그러나 100ppm의 Polyethylenimine(PEI)을 코팅한 ITO 기판은 젖음성이 크게 개선되었으며, 잉크젯 기법을 이용하여 $60\~100{\mu}m$의 선폭을 갖는 은 나노 졸의 미세라인 형성이 가능함을 확인할 수 있었다.

폐암 바이오마커 검출용 나노SPR 바이오센서 (Nano SPR Biosensor for Detecting Lung Cancer-Specific Biomarker)

  • 장은윤;염세혁;엄년식;한정현;김형경;신용범;강신원
    • 센서학회지
    • /
    • 제22권2호
    • /
    • pp.144-149
    • /
    • 2013
  • In this research, we developed a biosensor to detect lung cancer-specific biomarker using Anodic Aluminum Oxide (AAO) chip based on interference and nano surface plasmon resonance (nanoSPR). The nano-porous AAO chip was fabricated $2{\mu}m$ of pore-depth by two-step anodizing method for surface uniformity. NanoSPR has sensitivity to the refractive index (RI) of the surrounding medium and also provides simple and label-free detection when specific antibodies are immobilized to the Au-deposited surface of nano-porous AAO chip. To detect the lung cancer-specific biomarker, antibodies were immobilized on the surface of the chip by Self Assembled Monolayer (SAM) method. Since then lung cancer-specific biomarker was applied atop the antibodies immobilized layer. The specific reaction of the antigen-antibody contributed to the change in the refractive index that cause shift of resonance spectrum in the interference pattern. The Limit of Detection (LOD) was 1 fg/ml by using our nano-porous AAO biosensor chip.

나노스크래치와 HF 식각을 병용한 보로실리케이트 요/철형 구조체 패턴 제작 기술 (Fabrication Technique of Nano/Micro Pattern with Concave and Convex Structures on the Borosilicate Surface by Using Nanoscratch and HF etching)

  • 윤성원;강충길
    • 한국정밀공학회지
    • /
    • 제21권4호
    • /
    • pp.24-31
    • /
    • 2004
  • The objective of this work is to suggest a mastless pattern fabrication technique using the combination of machining by Nanoindenter(equation omitted) XP and HF wet etching. Sample line patterns were machined on a borosilicate surface by constant load scratch (CLS) of the Nanoindenter(equation omitted) XP with a Berkovich diamond tip, and they were etched in HF solution to investigate chemical characteristics of the machined borosilicate surface. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

Fabrication of 70nm-sized metal patterns on flexible PET Film using nanoimprint lithography

  • Lee, Heon;Lee, Jong-Hwa
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
    • /
    • pp.1119-1120
    • /
    • 2007
  • Nano-sized metal patterns were successfully fabricated on flexible PET substrate using nanoimprint lithography. 70nm line and space PMMA resist pattern was formed on PET substrate without residual layer by 'artial filling effect' and 20nm thin Cr metal layer was deposited by e-beam evaporation. Then, PMMA resist was selectively removed by acetone and 70nm narrow Cr pattern was formed.

  • PDF