• 대한기계학회논문집A
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• 제30권7호
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• pp.773-778
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• 2006

High-aspect-ratio nano-hair or nano-pillar arrays have great potential in a variety of applications. In this study, we present a simple and cost-effective replication method of high-aspect-ratio polymer nano-hair arrays. Highly ordered nano-porous AAO (anodic aluminum oxide) template was utilized as a reusable nano-mold insert. The AAO nano-mold insert fabricated by the two-step anodization process in this study had close- packed straight nano-pores, which enabled us to replicate densely arranged nano-hairs. The diameter, depth and pore spacing of the nano-pores in the fabricated AAO nano-mold insert were about 200nm, $1{\mu}m$ and 450nm, respectively. For the replication of polymer nano-hair arrays, a UV nano embossing process was applied as a mass production method. The UV nano embossing machine was developed by our group for the purpose of replicating nano-structures by means of non-transparent nano-mold inserts. Densely arranged high-aspect-ratio nano-hair arrays have been successfully manufactured by means of the UV nano embossing process with the AAO nano-mold insert under the optimum processing condition.

• 소성∙가공
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• 제19권2호
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• pp.73-78
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• 2010

Recently, many researches on the development of super-hydrophobic surface have been concentrated on the fabrication of nano-patterned products. Nano-patterned mold is a key to replicate nano-patterned products by mass production process such as injection molding and UV molding. The present paper proposes the new fabricating method of nano-patterned mold at low cost. The nano-patterned mold was fabricated by electroforming the anodic aluminum oxide membrane filled with UV curable resin in nano-hole by capillary phenomenon. As a result, the final mold with nano-patterns which have the holes with the diameter of 100~200 nm was fabricated. Furthermore, the UV-molded products with clear nano- patterns which have the pillars with the diameter of 100~200nm were achieved.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 추계학술대회 논문집
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• pp.189-192
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• 2002

Recently, micro-nano system is fabricated by photolithograph method. This method can not have mass production, so this method wastes time and human effort. accordingly, the aim of this paper is to research on injection molding of micro-nano system. For injection molding process, development of micro-nano mold is required. Mold for injection mold process is maintained its shape in high pressure and temperature. So in this paper, we studied the simulation of mold fur injection molding and then we consider a result of injection molding simulation.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2009년도 춘계학술대회 논문집
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• pp.240-243
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• 2009

Recently, many researches on the development of super-hydrophobic and anti-reflective surfaces have been concentrated on the fabrication of nano-patterned products. The nano-patterned mold is a key to replicate nano-patterned products by mass production techniques such as injection molding and UV molding. The present paper proposes fabricating nano-patterned mold with cost-effective method. The nano-pattern molded was fabricated by electroforming the anodic aluminum oxide template without E-beam lithography. The final mold with nano-patterns showed the pores with the diameter of $100{\sim}120$ nm and the height of 150 nm was fabricated.

• 한국정밀공학회지
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• 제29권10호
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• pp.1144-1148
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• 2012

Process conditions for generating nano patterns handle different process according to the pattern characteristics, and different process data according to patterns in questions. To efficiently find optimal process conditions for generating nano patterns, process data by experiment is needed consideration of the pattern characteristics concerning the equipment. In particular, coating methods of a cylindrical mold differ from it of a flat plate because of viscosity of coating materials. Also the coating thickness affects nano process and pattern line width. So coating method of coating thickness for cylindrical mold is very important on nano pattern generating. In this study, a method is proposed for coating Photo Resist through the spray in order to coat cylindrical mold and measuring the thickness of coating using measuring tip considering the size of cylindrical mold because there is no method in the existing SEM. The proposed method is applied to a real printed electronics system to verify its accuracy and efficiency.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1073-1077
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• 2003

This study aims to investigate the fabrication process of nano silicon mold using electron beam lithography (EBL) to generate the nanometer level patterns by nano-imprinting technology. the nano-patterned mold including 100mm pattern size has been fabricated by EBL with different doses ranged from 22 to 38 ${\mu}C/cm^2$ on silicon using the conventional polymethylmetharcylate(PMMA) resist. The silicon mold is fabricated with various patterns such as circles, rectangles, crosses, oblique lines and mixed forms, The effect of dosage on pattern density in EBL is discussed based on SEM (Scannning Electron Microscopy) analysis of fabricated molds. The mold surface is modified by hydrophobic fluorocarbon (FC) thin films to avoid the stiction during nano-imprinting process.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.435-436
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• 2010

• 한국재료학회지
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• 제19권4호
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• pp.224-227
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• 2009

Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).

• 대한기계학회논문집A
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• 제33권3호
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• pp.224-230
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• 2009

FIB has been commonly used as a very powerful tool in the semiconductor industry. It is mainly used for mask repair, device correction, failure analysis and IC error correction, etc. Currently, FIB is not being applied to the fabrication of the micro and nano-structured mold, because of low productivity. And also sputtering rate has been required to fabricate 3D shape. In the paper, we studied the FIB-Sputtering rate according to mold materials. And surface roughness characteristics had been analysed for micro or nano mold fabrication. Si wafer, Glassy Carbon, STAVAX and DLC that have been normally considered as good micro or nano mold materials were used in the study.

• 한국산학기술학회논문지
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• 제5권3호
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• pp.223-226
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• 2004

나노 패턴을 갖는 미세 구조물을 낮은 비용으로 생산하기 위해서는 플라스틱 재료를 이용하는 것이 필수적이고, 대량생산이 가능한 가공방법으로 사출성형 공정기술이 유망하다. 본 연구에서는 e-beam 리소그라피로 제작된 석영원판 내의 100-500nm크기의 선과 점 형상을 간단한 thermal embossing 공정을 이용하여 액상 PDMS를 고형화 시킨 후에 원판과 분리시켜 PDMS 몰드를 제작하였다. 실험결과, 원판에 있는 나노 크기의 다양한 패턴들은 PDMS 몰드에 균일하게 전사되었고, 이 몰드는 사출성형용 스탬퍼 제작에 유용하게 이용될 수 있을 것으로 사료된다.