• Journal of the Korean Society for Precision Engineering
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• v.23 no.6 s.183
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• pp.96-103
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• 2006

To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In the long range (about several tens of ${\mu}m$), measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100{\mu}m\times100{\mu}m$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. As a result, XY scanner can have good performance. Using this AFM system, 3um pitch specimen was measured. The uncertainty of total system has been evaluated. X and Y direction performance is different. X-direction measuring performance is better. So to evaluate only ID pitch length, X-direction scanning is preferable. Its expanded uncertainty(k=2) is $\sqrt{(3.96)^2+(4.10\times10^{-5}{\times}p)^2}$ measured length in nm.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.231-231
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• 2012

Correct determination of the interface locations is critical for the calibration of the depth scale and measurement of layer thickness in SIMS depth profiling analysis of multilayer films. However, the interface locations are difficult to determine due to the unwanted distortion from the real ones by the several effects due to sputtering with energetic ions. In this study, the layer thicknesses of Si/Ge and Si/Ti multilayer films were measured by SIMS depth profiling analysis using the oxygen and cesium primary ion beam. The interface locations in the multilayer films could be determined by two methods. The interfaces can be determined by the 50 at% definition where the atomic fractions of the constituent layer elements drop or rise to 50 at% at the interfaces. In this method, the raw depth profiles were converted to compositional depth profiles through the two-step conversion process using the alloy reference relative sensitivity factors (AR-RSF) determined by the alloy reference films with well-known compositions determined by Rutherford backscattering spectroscopy (RBS). The interface locations of the Si/Ge and Si/Ti multilayer films were also determined from the intensities of the interfacial composited ions (SiGe+, SiTi+). The determination of the interface locations from the composited ions was found to be difficult to apply due to the small intensity and the unclear variation at the interfaces.

• Korean Journal of Materials Research
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• v.25 no.9
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• pp.492-496
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• 2015

Hydroxyapatite (HA), which is an important calcium phosphate mineral, has been applied in orthopedics, dentistry, and many other fields depending upon its morphology. HA can be synthesized with different morphologies through controlling the synthesis method and several parameters. Here, we synthesize various morphologies of HA using two simple methods: hydrothermal combustion and solution combustion. The phase purity of the synthesized HA is confirmed using X-ray diffractometry. It demonstrates that pure phased hydroxyapatite can be synthesized using both methods. The morphology of the synthesized powder is examined using scanning electron microscopy. The effects of pH and temperature on the final powder are also investigated. At $140^{\circ}C$, using the hydrothermal method, nano-micro HA rods with a hexagonal crystal structure can be synthesized, whereas using solution combustion method at $600^{\circ}C$, a dense cubic morphology can be synthesized, which exhibits monoclinic crystal structures.

• Journal of the korean academy of Pediatric Dentistry
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• v.51 no.1
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• pp.22-31
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• 2024

The objective of this study was to assess the wear resistance of tooth-colored materials used in crown restoration for primary molars with a chewing simulator. In this study, four groups-three experimental groups and one control group-were included. They consisted of three-dimensional (3D) printed resin crowns (NextDent and Graphy), milled nano-hybrid ceramic crowns (MAZIC Duro), and prefabricated zirconia crowns (NuSmile). Twelve mandibular second molar specimens were prepared from each group. In the wear experiment, 6.0 × 10⁵ cycles were conducted with a force of 50 N, and a 6 mm-diameter steatite ball was used as an antagonist. The amount of wear was calculated by comparing the scan files before and after the chewing simulation using 3D metrology software, and the worn cross-section was confirmed by scanning electron microscopy (SEM). The resin and ceramic groups did not exhibit any statistically significant differences. However, compared to other crown groups, the zirconia crown group demonstrated notably reduced levels of wear (p < 0.05). In SEM images, layers and cracks were observed in the 3D-printed resin crown groups, which differed from those in the other groups.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.

• Journal of the Korean Vacuum Society
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• v.15 no.3
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• pp.308-313
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• 2006

We report a photoluminescence (PL) study on the growth process of self-assembled InAs quantum dots (QDs) under the various growth conditions. Distinctive double-peak feature was observed in the PL spectra of the QD samples grown at the relatively high substrate temperature. From the excitation power-dependent PL and the temperature-dependent PL measurements, the double-peak feature is associated with the ground state transitions from InAs QDs with two different size branches. In addition, the variation in the bimodal size distribution of the QD ensembles with different InAs coverage is demonstrated.

• Journal of Korean Society of Industrial and Systems Engineering
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• v.39 no.2
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• pp.72-81
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• 2016

There can be included a variety of uncertainties in all measurement results whether we can perceive or not on the causes. These uncertainties may end up in lowering the reliability of measurement results and also deteriorate the level of quality. For the purpose, we tried to combine the strengths of measurement uncertainty and measurement system analysis together to present a practical flowchart so as to verify those potential variation factors in general measurement processes. As a case study, we did an experiment and gathered data on the length between two holes of an engine cylinder head which is a core part for vehicles with a coordinate measuring machine and estimated nine uncertainty factors of it. Consequently, it was identified that the four primary factors among the nine which were related to the measurement standard, random errors or spread of the repeat measurements, differences between the coefficients of thermal expansion and the environment especially had been the influence around the laboratory. Since it is impossible to analyze the equipment and appraisal variations respectively through the only measurement uncertainty, we have used the measurement system analysis following the flowchart. Showing the result of being just about 0.5% lower for the appraisal variation, and the equipment variation occupied about 7% for the total Gage R&R. Through this research, we have come to a conclusion that much more detail analysis on variation factors can be possible to be identified in measurement processes by using the developed flowchart which is composed of measurement uncertainty and measurement system analysis. Therefore, we expect engineers who are involved in quality and measurements to utilize this developed method.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.8 s.185
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• pp.72-79
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• 2006

We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.