• Title/Summary/Keyword: NO gas annealing

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An Electrochemical Evaluation on the Corrosion Resistance of Welding Zone due to Kinds of Repair Welding Filler Metals and Post Weld Heat Treatment (보수용접봉의 종류와 용접후 열처리가 용접금속부의 내식성에 미치는 영향에 관한 전기화학적 평가)

  • Shin, Jae-Hyun;Moon, Kyung-Man
    • Corrosion Science and Technology
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    • v.9 no.6
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    • pp.310-316
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    • 2010
  • Recently a fuel oil of the diesel engine of the marine ship is being changed with heavy oil of low quality as the oil price is higher more and more. Therefore the wear and corrosion in all parts of the engine such as cylinder liner, piston crown, spindle and seat ring of exhaust valves are predominantly increased. In particular the degree of wear and corrosion of piston crown is more seriously compared to the other parts of the engine due to operating in severe environment such as the high temperature of exhaust gas and repeating impact. Thus the repair weldment of the piston crown is a unique method to prolong the its life in a economical point of view. In this case, filler metals having a high corrosion and wear resistance such as stellite 6, Inconel 625 and Inconel 718 are mainly being used for repair welding. However it has been often happened that piston crown on the ship,s job site is being actually inevitably welded with mild filler metals. Therefore in this study, filler metals such as E4301, E4313 and E4316 were welded at SS401 steel as the base metal, and corrosion property of their weld metals in the case of post weld heat treatment or not was investigated with some electrochemical methods such as measurement of corrosion potential, cathodic and anodic polarization curves, cyclic voltammogram and polarization resistance etc. in 0.1% $H_2SO_4$ solution. Corrosion resistance of the weld metal of E4301 was better than the other weld metals in the case of no heat treatment, however, its resistance was considerably decreased with post weld heat treatment(annealing:$625^{\circ}C$, 2 hr) compared to other weld metals. The weld metals of E4313 and E4316 showed a relatively good corrosion resistance by post weld heat treatment.

Low-Temperature Growth of N-doped SiO2 Layer Using Inductively-Coupled Plasma Oxidation and Its Effect on the Characteristics of Thin Film Transistors (플라즈마 산화방법을 이용한 질소가 첨가된 실리콘 산화막의 제조와 산화막 내의 질소가 박막트랜지스터의 특성에 미치는 영향)

  • Kim, Bo-Hyun;Lee, Seung-Ryul;Ahn, Kyung-Min;Kang, Seung-Mo;Yang, Yong-Ho;Ahn, Byung-Tae
    • Korean Journal of Materials Research
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    • v.19 no.1
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    • pp.37-43
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    • 2009
  • Silicon dioxide as gate dielectrics was grown at $400^{\circ}C$ on a polycrystalline Si substrate by inductively coupled plasma oxidation using a mixture of $O_2$ and $N_2O$ to improve the performance of polycrystalline Si thin film transistors. In conventional high-temperature $N_2O$ annealing, nitrogen can be supplied to the $Si/SiO_2$ interface because a NO molecule can diffuse through the oxide. However, it was found that nitrogen cannot be supplied to the Si/$SiO_2$ interface by plasma oxidation as the $N_2O$ molecule is broken in the plasma and because a dense Si-N bond is formed at the $SiO_2$ surface, preventing further diffusion of nitrogen into the oxide. Nitrogen was added to the $Si/SiO_2$ interface by the plasma oxidation of mixtures of $O_2/N_2O$ gas, leading to an enhancement of the field effect mobility of polycrystalline Si TFTs due to the reduction in the number of trap densities at the interface and at the Si grain boundaries due to nitrogen passivation.

Hydrogen shallow donors in ZnO and $SnO_2$ thin films prepared by sputtering methods

  • Kim, Dong-Ho;Kim, Hyeon-Beom;Kim, Hye-Ri;Lee, Geon-Hwan;Song, Pung-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.145-145
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    • 2010
  • In this paper, we report that the effects of hydrogen doping on the electrical and optical properties of typical transparent conducting oxide films such as ZnO and $SnO_2$ prepared by magnetron sputtering. Recently, density functional theory (DFT) calculations have shown strong evidence that hydrogen acts as a source of n-type conductivity in ZnO. In this work, the beneficial effect of hydrogen incorporation on Ga-doped ZnO thin films was demonstrated. It was found that hydrogen doping results a noticeable improvement of the conductivity mainly due to the increases in carrier concentration. Extent of the improvement was found to be quite dependent on the deposition temperature. A low resistivity of $4.0{\times}10^{-4}\;{\Omega}{\cdot}cm$ was obtained for the film grown at $160^{\circ}C$ with $H_2$ 10% in sputtering gas. However, the beneficial effect of hydrogen doping was not observed for the films deposited at $270^{\circ}C$. Variations of the electrical transport properties upon vacuum annealing showed that the difference is attributed to the thermal stability of interstitial hydrogen atoms in the films. Theoretical calculations also suggested that hydrogen forms a shallow-donor state in $SnO_2$, even though no experimental determination has yet been performed. We prepared undoped $SnO_2$ thin films by RF magnetron sputtering under various hydrogen contents in sputtering ambient and then exposed them to H-plasma. Our results clearly showed that the hydrogen incorporation in $SnO_2$ leads to the increase in carrier concentration. Our experimental observation supports the fact that hydrogen acting as a shallow donor seems to be a general feature of the TCOs.

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COMPARISON OF DIFFUSION COEFFICIENTS AND ACTIVATION ENERGIES FOR AG DIFFUSION IN SILICON CARBIDE

  • KIM, BONG GOO;YEO, SUNGHWAN;LEE, YOUNG WOO;CHO, MOON SUNG
    • Nuclear Engineering and Technology
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    • v.47 no.5
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    • pp.608-616
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    • 2015
  • The migration of silver (Ag) in silicon carbide (SiC) and $^{110m}Ag$ through SiC of irradiated tristructural isotropic (TRISO) fuel has been studied for the past three to four decades. However, there is no satisfactory explanation for the transport mechanism of Ag in SiC. In this work, the diffusion coefficients of Ag measured and/or estimated in previous studies were reviewed, and then pre-exponential factors and activation energies from the previous experiments were evaluated using Arrhenius equation. The activation energy is $247.4kJ{\cdot}mol^{-1}$ from Ag paste experiments between two SiC layers produced using fluidized-bed chemical vapor deposition (FBCVD), $125.3kJ{\cdot}mol^{-1}$ from integral release experiments (annealing of irradiated TRISO fuel), $121.8kJ{\cdot}mol^{-1}$ from fractional Ag release during irradiation of TRISO fuel in high flux reactor (HFR), and $274.8kJ{\cdot}mol^{-1}$ from Ag ion implantation experiments, respectively. The activation energy from ion implantation experiments is greater than that from Ag paste, fractional release and integral release, and the activation energy from Ag paste experiments is approximately two times greater than that from integral release experiments and fractional Ag release during the irradiation of TRISO fuel in HFR. The pre-exponential factors are also very different depending on the experimental methods and estimation. From a comparison of the pre-exponential factors and activation energies, it can be analogized that the diffusion mechanism of Ag using ion implantation experiment is different from other experiments, such as a Ag paste experiment, integral release experiments, and heating experiments after irradiating TRISO fuel in HFR. However, the results of this work do not support the long held assumption that Ag release from FBCVD-SiC, used for the coating layer in TRISO fuel, is dominated by grain boundary diffusion. In order to understand in detail the transport mechanism of Ag through the coating layer, FBCVD-SiC in TRISO fuel, a microstructural change caused by neutron irradiation during operation has to be fully considered.