• 제목/요약/키워드: NI method

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가압통전 활성연소에 의한 치밀한 NiSi2와 NiSi2-20vol.%Nb 복합재료 제조 (Simultaneous Synthesis and Densification of NiSi2 and NiSi2-20vol.%Nb Composite by Field-Activated and Pressure-Assisted Combustion)

  • 김환철;손인진;박충도
    • 열처리공학회지
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    • 제14권1호
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    • pp.1-7
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    • 2001
  • A method to simultaneously synthesize and consolidate the silicide $NiSi_2$ and the composite $NiSi_2$-20vol.%Nb from powders of Ni, Si, and Nb was investigated. Combustion synthesis was carried out under the combined effect of an electric field and mechanical pressure. The final density of the products increased nearly linearly with the applied pressure. Highly dense $NiSi_2$ and $NiSi_2$-20vol.%Nb with relative densities of up to 97% were produced under the simultaneous application of a 60MPa pressure and a 3000A current on the reactant powders. The respective Vickers microhardness values for these materials were 6.0 and 5.8 GPa. From indentation crack measurements, the fracture toughness values for $NiSi_2$ and $NiSi_2$-20vol.%Nb were calculated to be 3.3 and 4.7 $MPa{\cdot}m^{1/2}$, respectively.

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Fabrication of Ultra fine WC-Ni Hard Materials by Rapid Sintering Process

  • Kim Hwan-Cheol;Oh Dong-Young;Shon In-Jin
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2004년도 International Symposium on Powder Materials and Processing
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    • pp.98-99
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    • 2004
  • (1) Using high-frequency induction heating sintering and spark plasma sintering method, the densification of WC-Ni hard materials was accomplished using ultra fine power of Ni and WC. (2) Nearly fully dense WC-Ni could be obtained within 1 min. (3) Relative density and mechanical properties of WC-Ni obtained by HFIHS were high than those obtained by SPS. And WC grain size made by HFIHS was smaller than that made by SPS. (4) The fracture toughness and hardness values of WC-8Ni, WC-10Ni, and WC-12Ni made by HFIHS were $13MPa{\cdot}m^{1/2}\;and\;1950kg/mm^2,\;13.5Mpa{\cdot}m^{1/2}\;and\;1810kg/mm^2,\;14.4MPa{\cdot}m^{1/2}\;and\;1690kg/mm^2$, respectively for 60MPa and an induced current for 90% output of total capacity, 15KW. (5) The fracture toughness and hardness values of WC-8Ni, WC-10Ni, and WC-12Ni made by SPS were $12.2MPa{\cdot}m^{1/2}\;and\;1796kg/mm^2,\;12.9MPa{\cdot}m^{1/2}\;and\;1725kg/mm^2,\;13.6MPa{\cdot}m^{1/2}\;and\;1597kg/mm^2$, respectively for 60MPa and the electric current of 2500 A

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2축 정렬된 Ni 위에 MOCVD법에 의한 NiO의 증착조건 (Deposition condition of NiO deposited on biaxially textured Ni by a MOCVD process)

  • 선종원;김형섭;지봉기;박해웅;홍계원;박순동;정충환;전병혁;김찬중
    • 한국초전도ㆍ저온공학회논문지
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    • 제4권2호
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    • pp.5-10
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    • 2002
  • Deposition condition of NiO that is one of Possible buffer layers for YBCO coated conductors was studied. NiO was deposited on textured Ni substrates by a MOCVD (metal-organic chemical vapor deposition) method. The degree of texture, and the surface roughness were analyzed by X-ray Pole figure, atomic force microscope and scanning electron microscope. The (111) and (200) textures were competitively developed , depending on an oxygen partial Pressure(PO2) and deposition temperature (Tp). The (200) textured NiO layer was deposited at Tp=450~47$0^{\circ}C$ and PO2= 1.67 Torr Out-of-Plane ($\omega$-scan) and in-plane ($\Phi$-scan) textures of the (200) NiO films were as good as 10.34$^{\circ}$ and 10.00$^{\circ}$ respectively The AFM surface roughness of NiO was in the range of 3~4.5 nm at PO2=0.91~3.34 Torr and at Tp=47$0^{\circ}C$ , and in the range of 3~13 nm at TP=450~53$0^{\circ}C$ and at PO2=1.67 Torr.

Investigation on Mechanical Property and Adhesion of Oxide Films Formed on Ni and Ni-Co Alloy in Room and High Temperature Environments

  • Oka, Yoshinori I.;Watanabe, Hisanobu
    • Corrosion Science and Technology
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    • 제7권3호
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    • pp.145-151
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    • 2008
  • Material degradation such as high temperature oxidation of metallic material is a severe problem in energy generation systems or manufacturing industries. The metallic materials are oxidized to form oxide films in high temperature environments. The oxide films act as diffusion barriers of oxygen and metal ions and thereafter decrease oxidation rates of metals. The metal oxidation is, however, accelerated by mechanical fracture and spalling of the oxide films caused by thermal stresses by repetition of temperature change, vibration and by the impact of solid particles. It is therefore very important to investigate mechanical properties and adhesion of oxide films in high temperature environments, as well as the properties in a room temperature environment. The oxidation tests were conducted for Ni and Ni-Co alloy under high temperature corrosive environments. The hardness distributions against the indentation depth from the top surface were examined at room temperature. Dynamic indentation tests were performed on Ni oxide films formed on Ni surfaces at room and high temperature to observe fractures or cracks generated around impact craters. As a result, it was found that the mechanical property as hardness of the oxide films were different between Ni and Ni-Co alloy, and between room and high temperatures, and that the adhesion of Ni oxide films was relatively stronger than that of Co oxide films.

기계적합금화법에 의해 제조된 NiAl 나노금속간화합물 소결체의 인성 및 제진특성 (Toughness and Damping Properties of Nanostructured Ni-Al Alloys Produced by Mechanical Alloying Methods)

  • 안인섭;김형범;김영도;김지순
    • 한국분말재료학회지
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    • 제7권3호
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    • pp.143-148
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    • 2000
  • NiAl alloy powders were prepared by mechanical alloying method and bulk specimens were produced using hot isostatic pressing techniques. This study focused on the transformation behavior and properties of Ni-Al mechanically alloyed powders and bulk alloys. Transformation behavior was investigated by differential scanning calorimeter (DSC), XRD and TEM. Particle size distribution and microstructures of mechanically alloyed powders were studied by particle size analyzer and scanning electron microscope (SEM). After 10 hours milling, XRB peak broadening appeared at the alloyed powders with compositions of Ni-36at%Al to 40at%Al. The NiAl and $Ni_3Al$ intermetallic compounds were formed after water quenching of solution treated powders and bulk samples at $1200^{\circ}C$, but the martensite phase was observed after liquid nitrogen quenching of solution treated powders. However, the formation of $Ni_3Al$ intermetallic compounds were not restricted by fast quenching into liquid nitrogen. It is considered to be caused by fast diffusion of atoms for the formation of stable $\beta$(NiAl) phase and $Ni_3Al$ due to nano sized grains during quenching. Amounts of martensite phase increased as the composition of aluminium component decreased in the Ni-Al alloy, which resulted in the increasing damping properties.

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PLIC 방법을 사용한 Ni-P 디스크의 레이저 존 텍스처링 모사 (Simulation of laser zone texturing of Ni-P disk substrates by PLIC method)

  • 김헌준;하응지;김우승
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2000년도 추계학술대회논문집B
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    • pp.255-260
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    • 2000
  • Laser zone texture technology is widely used to enhance the tribological performance of high areal density media. This work investigates the transient process of melting and microscale surface deformation upon pulsed laser heating of Ni-P hard disk substrates by PLIC(Piecewise Linear Interface Calculation) method. The present results are compared with both the experimental and the Donor-Acceptor method results. It is found that the results from PLIC method are better than those of Donor-Acceptor method and they are in good agreements with the experimental results.

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네오디뮴이 첨가된 니켈 촉매의 티오펜 탈황 반응 (Hydrodesulfuriztion of Thiophene over Neodymium Added Nickel Catalysts)

  • 문영환;임선기
    • 공업화학
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    • 제7권5호
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    • pp.913-924
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    • 1996
  • 본 연구에서는 소량의 네오디뮴이 첨가된 니켈 촉매에 대하여 티오펜 탈황 반응을 조사하였으며, 촉매 제조 방법에 따라, 공침법으로 제조된 비담지 NdNi 촉매, 비담지 금속간 화합물 $NdNi_5$ 촉매, 활성탄에 담지된 NdNi 촉매 등이 연구되었다. 공침법으로 제조된 비담지 NdNi 촉매의 경우 소량의 네오디뮴이 첨가되면 티오펜 탈황 반응성이 급격히 증가하여 니켈 촉매에서 네오디뮴의 역할이 아주 큼을 알 수 있다. 비담지 금속간 화합물 $NdNi_5$ 촉매는 소성, 황화 처리의 과정을 거치면서 금속간 화합물이 파괴되고 산화물, 황화물로 각각 변하였다. 비담지 촉매의 경우 티오펜 탈황 반응성은 촉매의 표면적으로 설명이 가능하고 네오디뮴의 역할은 니켈 촉매의 표면적을 높게 유지시키는 구조 촉진제(structural promoter)로 작용한다. 니켈의 분산도가 다른, 금속간 화합물 $NdNi_5$ 촉매, 공침법으로 제조된 NdNi 촉매, 활성탄에 담지 된 NdNi 촉매 순으로 니켈을 기준으로 할 때 티오펜 탈황 반응활성이 각각 10배씩 증가하였다.

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TLM pattern을 사용한 Cr/Ag 및 Ni 전극에 따른 접합 저항 연구 (Study of contact resistance using the transmission line method (TLM) pattern for metal of electrode (Cr/Ag & Ni))

  • 황민영;구기모;구선우;오규진;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.349-349
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    • 2010
  • Great performance of many semiconductor devices requirs the use of low-resistance ohmic contact. Typically, transmission line method (TLM) patterns are used to measure the specific contact resistance between silicon and metal. In this works, we investigate contact resistance for metal dependent (Cr/Ag, Ni) using TLM pattern based on silicon-on-insulator (SOI) wafer. The electrode with Ni linearly increases contact resistance as the pattern distance increase from $15{\mu}m$ to $75{\mu}m$ in accumulation part, but non-linearly increase in inversion part. In additional, the electrode with Cr/Ag linearly increases contact resistance as the pattern distance increase from $15{\mu}m$ to $75{\mu}m$ in inversion part, but non-linearly increase in accumulation part.

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