• 제목/요약/키워드: NH gas

검색결과 835건 처리시간 0.024초

스윕 가스-진공 하이브리드식 탈기막 공정을 활용한 암모니아 폐수처리 및 선택적 회수 (Ammonia Wastewater Treatment and Selective Recovery Using a Sweep Gas-Vacuum Hybrid Type Membrane Degassing Process)

  • 윤홍식;민태진;전민규;임성일;오세철;류경하;이충성;강보식
    • 한국산업융합학회 논문집
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    • 제26권6_2호
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    • pp.1171-1181
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    • 2023
  • In this study, a sweep gas - vacuum hybrid type membrane degassing process was proposed for ammonia wastewater treatment. In addition, the ammonia selective recovery of the hybrid type membrane degassing process was also investigated. As a result, the hybrid type membrane degassing process showed better degassing performance (54.9 mg NH3/m2min for 360 min) than the sweep gas type (32.3 mg NH3/m2min) or vacuum type (22 mg NH3/m2min). Additionally, the hybrid type membrane degassing process showed an excellent ammonia selectivity (103 times compared to Na+ Na+, 133 times compared to Ca2+). The ammonia selectivity was appeared to be due to the conversion characteristics of ammonium ion / dissolved ammonia depending on pH. The results in this study are expected to be used in the development of ammonia wastewater treatment and ammonia recovery in the future.

Biomedia를 충전한 Biofilter에서 H2S와 NH3 혼합악취의 제거 (Removal of Mixed Gases of H2S and NH3 by the Biofilter Packed with Biomedia)

  • 임정수;조욱상;이은영
    • 청정기술
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    • 제12권3호
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    • pp.165-170
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    • 2006
  • Polyurethane, PVA(polyvinyl alcohol)와 지렁이 분변토로 제작한 biomedia를 충진한 바이오필터(biofilter)를 이용하여 $H_2S$$NH_3$의 혼합 악취를 제거하였다. $NH_3$ 농도를 50 ppmv로 고정시킨 후, $H_2S$의 농도는 1~489 ppmv까지 증가시키며 제거효율을 살펴보았다. 또한 $NH_3$의 농도를 점진적으로 증가시켜 80, 100, 200, 300, 400, 500 ppmv 으로 설정하여 각각의 $NH_3$농도가 고정된 조건에서는 $H_2S$를 점차적으로 농도를 증가시켜주며 $NH_3$$H_2S$ 가스의 제거효율을 알아보았다. 혼합 악취가 공급되는 조건에서 $NH_3$의 유입 부하량은 입구농도가 50~300 ppmv 까지는 부하량 $11.14g\;N{\cdot}m^{-3}{\cdot}h^{-1}$이 증가함에 따라 제거용량도 비례하여 증가하였다. 입구농도가 300 ppmv 이상으로 증가함에 따라 유입 부하량은 증가하는 반면, 제거효율과 제거용량은 감소되는 것을 볼 수 있었다. 복합악취가 공급되는 조건에서 $H_2S$ 최대 부하량은 $40.27g\;S{\cdot}m^{-3}{\cdot}h^{-1}$이하이며, $NH_3$ 부하량이 $15.25g\;N{\cdot}m^{-3}{\cdot}h^{-1}$ 이하인 조건에서는 $NH_3$의 공급에 의해 $H_2S$의 제거효율은 큰 영향을 받지 않는 것으로 나타났다.

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수평형 폐열회수보일러 배기탈질 SCR시스템의 최적설계를 위한 수치해석적 연구 (Numerical Study on Optimization of the SCR Process Design in Horizontal HRSG for NOx Reduction)

  • 김경숙;이경옥
    • 한국환경과학회지
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    • 제22권11호
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    • pp.1481-1498
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    • 2013
  • The SCR (selective catalytic reduction) system is highly-effective technique for NOx reduction from exhaust gases. In this study, the effects of the direction and size of nozzle and the ammonia injection concentration on the performance of SCR system are analyzed by using the computational fluid dynamics method. When the nozzle is arranged in zigzaged direction which is normal to exhausted gas flow, it is shown that the uniformity of gas flow and the NH3/NO molar ratio is improved remarkably. With the change of the ammonia injection concentration from 0.2 vol%(wet) to 1.0 vol%(wet), the uniformity of gas flow shows a good results. As the size of nozzle diameter changes from 6 mm to 12 mm, the uniformity of gas flow is maintained well. It is shown that the uniformity of the $NH_3/NO$ molar ratio becomes better with decreasing the ammonia injection concentration and the size of nozzle diameter.

오스테나이트계 스테인리스강에 대한 질소 고용화 처리 및 그 효과 (Solution Nitriding and Its Effect on the Austenitic Stainless Steels)

  • 허정;남태운
    • 열처리공학회지
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    • 제13권5호
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    • pp.337-345
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    • 2000
  • As a case hardening process for stainless steels, nitriding is more preferred and widely used than carburizing which deterioates corrosion resistance severely. In order to add the nitrogen into the stainless steels, passive film on the surface must be removed effectively before nitriding. Conventional gas nitriding process is performed in the temperature range of 500 to $600^{\circ}C$ with $NH_3$ gas, which often leads to sensitization of stainless steels. In this study, we tried to activate passive film of austenitic stainless steels by heating at low pressure. ($900^{\circ}C$, $5{\times}10^{-2}$ Torr.) Nitriding was performed at the solution treatment temperature of $1100^{\circ}C$ with nitrogen molecules instead of $NH_3$ gas. An attainable nitrogen content in a case depends on the nitrogen gas pressure at constant nitriding temperature. A case depth is proportional to the square root of solution time, which suggests that inward diffusion of nitrogen follows the Fick's 2nd law. Surface nitrogen atoms are dissolved as interstitial solutes, or precipitated in the form of MN, $M_2N$ nitrides, which increase the case hardeness. Dissolved nitrogen in the case enhances the cavitation resistance of austenitic stainless steels dramatically.

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반도체식 가스센서와 퍼지 ART를 이용한 혼합가스의 농도 추정 (Concentration estimation of gas mixtures using a tin oxide gas sensor and fuzzy ART)

  • 이정헌;조정환;전기준
    • 전자공학회논문지SC
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    • 제43권4호
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    • pp.21-29
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    • 2006
  • 본 논문에서는 혼합가스의 종류를 구분하고 농도를 추정하기 위하여 퍼지 ARTMAP 신경회로망과 퍼지 ART 신경회로망을 각각 사용하였다. 온도변환 구동방식의 반도체식 가스센서를 이용하여 $NH_3,\;H_2S$, 그리고 그들의 혼합가스에 대해서 데이터를 획득하였고, 데이터들을 제안한 패턴인식방법의 입력으로 사용하기 위해서 전 처리 과정을 통해 데이터들의 차원을 줄여주었다. 실험을 통해서 본 논문에서 사용한 방법이 이전의 다른 방법들과 비교하여 학습시간을 줄이면서 좀더 안정된 농도 추정 성능을 보여줌을 확인하였다.

RF magnetron sputtering법으로 제조한 $MoO_3$ 박막의 가스 감지 특성 및 첨가물의 영향 (Gas Sensing Characteristics and Doping Effect of $MoO_3$ Thin Films prepared by RF magnetron sputtering)

  • 황종택;장건익
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.460-463
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    • 2002
  • $MoO_3$ thin films were deposited on electrode and heater screen-printed alumina substrates in $O_2$ atmosphere by RF reactive sputtering using Molybdenum metal target. The deposition was performed at $300^{\circ}C$ with 350W of a forward power in an $Ar-O_2$ atmosphere. The working pressure was maintained at $3{\times}10^{-2}mtorr$ and all deposited films were annealed at $500^{\circ}C$ for 5hours. To investigate gas sensing characteristics of the addition doped $MoO_3$ thin film, Co, Ni and Pt were used as adding dopants. The sensing properties were investigated in tenn of gas concentration under exposure of reducing gases such as $H_2$, $NH_3$ and CO at optimum working temperature. Co-doped $MoO_3$ thin film shows the maximum 46.8% of sensitivity in $NH_3$ and Ni-doped $MoO_3$ thin film exhibits 49.7% of sensitivity in $H_2$.

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박막형 MoO3가스센서의 가스 감지 특성 및 첨가물의 영향 (Gas Sensing Characteristics and Doping Effect of MoO3Thin Films Sensor)

  • 황종택;장건익;윤대호
    • 한국전기전자재료학회논문지
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    • 제16권8호
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    • pp.705-710
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    • 2003
  • MoO$_3$thin films were deposited on electrode of alumina substrates in $O_2$atmosphere by RF reactive sputtering using molybdenum metal target. The deposition was performed at 30$0^{\circ}C$ with 350 W of a forward power in an Ar-O$_2$atmosphere. The working pressure was maintained at 3$\times$10$^{-2}$ torr and all deposited films were annealed at 50$0^{\circ}C$ for 5 hours. The surface morphology of films was observed by using a SEM and crystalline phases were analyzed by using a XRD. To investigate gas sensing characteristics of the doped MoO$_3$thin film, Co, Ni and Pt were used as dopants. The sensing properties were investigated in term of gas concentration under exposure of reducing gases such as H$_2$, NH$_3$and CO at optimum working temperature. Co-doped MoO3 thin film shows the maximum 46.8 % of sensitivity in NH$_3$ and Ni-doped MoO$_3$thin film exhibits 49.7 % of sensitivity in H$_2$.

$N_2O$가스를 사용하여 PECVD로 성장된 Oxynitride막의 특성 (Characteristics of oxynitride films grown by PECVD using $N_2O$ gas)

  • 최현식;이철인;장의구
    • E2M - 전기 전자와 첨단 소재
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    • 제9권1호
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    • pp.9-17
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    • 1996
  • Plasma enhanced chemical vapor deposition (PECVD) allows low temperature processing and so it is widely used, but it causes instability of devices due to serious amount of impurities within the film. In this paper, electrical and chemical characteristics of the PECVD oxynitride film formed by different N$_{2}$O to N$_{2}$O+NH$_{3}$ gas ratio is studied. It has been found that hydrogen concentration of PECVD oxynitride film was decreased from 4.25*10$^{22}$ [cm$^{-2}$ ] to 1.18*10$^{21}$ [cm$^{-2}$ ] according to the increase of N$_{2}$O gas. It was also found that PECVD oxynitride films have low trap density in the oxide and interface in comparison with PECVD nitroxide films, and has higher refractive index and capacitance than oxide films. In particular, oxynitride film formed in gas ratio of N$_{2}$O/(N$_{2}$O+NH$_{3}$)= 0.88 shows increased capacitance and decreased leakage current due to small portion of hydrogen in oxide and the accumulation of nitrogen about 4[atm.%] at the interface.

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저온 플라즈마와 $NH_3$ SCR 복합공정을 이용한 디젤엔진 배기가스의 NOx 저감 기술 (Non-thermal Plasma and $NH_3$ SCR Hybrid Process for Treating Diesel Engine Exhaust)

  • 차민석;이재옥;김용호;송영훈
    • 한국연소학회:학술대회논문집
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    • 한국연소학회 2002년도 제25회 KOSCI SYMPOSIUM 논문집
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    • pp.89-95
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    • 2002
  • A hybrid De- NOx technique of non-thermal plasma and $NH_3$ SCR process has been investigated to remove NOx from 300 hp marine engine exhaust under the low temperature conditions, i.e. $100-200^{\circ}C$. Fundamental investigation with Diesel-like simulant gas was also conducted. The performance of the present technique has been demonstrated by treating real diesel exhaust gases, in which high contents of soot, water vapor, $SO_2$, NOx, and unburned HC are included. Detailed engineering data for evaluating the feasibility of the technique are provided in the present investigation.

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과열도 변화에 의한 $NH_3$ 냉동장치의 성능특성 연구 (The Study on Performance Characteristics due to the Superheat Temperature of $NH_3$ Refrigeration System)

  • 전상신;권일욱;하옥남
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2004년도 춘계학술대회
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    • pp.1334-1339
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    • 2004
  • Nowadays CFCs and HCFCs refrigerants are restricted because it cause depletion of ozone layer. Accordingly, this experiment apply the $NH_3$ gas and not CFCs and HCFCs for refrigerant to study the performance characteristic from the superheat control and improve the energy efficiency from the high performance. The condensing pressure of refrigeration system is increased from 14.5bar to 16bar by 0.5bar and superheat temperature is increased from $0^{\circ}C$ to $10^{\circ}C$ by $1^{\circ}C$ at each condensing pressure. As the result of experiment, when the superheat temperature is $1^{\circ}C$ at each condensing pressure, the refrigeration system has the high performance.

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