• 제목/요약/키워드: N-doping

검색결과 703건 처리시간 0.035초

형광염료 도핑이 유기발광소자의 효율에 미치는 영향 (The Influence of Fluorescent Dye Doping on Efficiency of Organic Light-Emitting Diodes)

  • 이정구
    • 한국콘텐츠학회:학술대회논문집
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    • 한국콘텐츠학회 2008년도 춘계 종합학술대회 논문집
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    • pp.301-305
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    • 2008
  • 유기 발광 다이오드(Organic light-emitting diode, OLED)는 저전력 구동, 자체발광, 넓은 시야각, 우수한 고해상도, 풀 칼라, 높은 재현성, 빠른 응답속도, 간편한 제조 공정 등의 장점을 가지고 있으나, 고성능 디스플레이로서 실용화하기 위해서는 아직도 해결되어야 할 과제가 많다. 소자의 저소비전력, 제조공정의 안정성, 대형 기판기술, 봉지 기술, 소자의 수명, 풀 컬러화를 위한 적색, 청색, 발광소자의 고휘도 등이 시급하다. 무엇보다 중요한 것은 유기 발광 소자의 효율을 향상시키는 것이 상용화를 위한 키(key) 이다. 이를 위해서 유기 발광 소자의 구조 개선과 새로운 유기 물질 적용을 통해 구동전압을 낮춤으로써 효율을 향상시킬 수 있다. 따라서 본 연구에서는 유기 발광 소자의 효율을 향상시킬 목적으로 ITO/TPD/Znq2+DCJTB/Znq2/Al의 구조와 ITO/CuPc/N PB/Alq3+DCJTB/Alq3/Al의 구조를 가지는 소자의 발광층에 형광염료를 도포한 적색 발광 소자를 제작하고, 그 전기적 및 광학적인 특성을 평가하였다.

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웨이퍼 도핑 농도 조절에 의한 sheet resistance 변화와 이에 따른 태양전지의 효율 분석

  • 이원백;공대영;정성욱;장경수;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.282-282
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    • 2010
  • 결정질 태양전지는 상대적으로 고효율이 보장되며, 낮은 공정 비용 등의 이유로 널리 사용되고 있는 기술이다. 결정질 태양전지의 효율을 증가시키는 공정 방법에는 표면 구조화, 도핑 농도, 반사방지막, 금속전극 형성 등이 있다. 특히, 도핑 공정에서 도핑 농도를 변화시킬 수 있으며, 이에 의하여 면 저항값을 변화 시킬 수 있다. 본 연구에서는 결정질 태양 전지에서 도핑 농도의 조절에 의한 이상적인 sheet resistance를 얻기 위한 실험을 진행하였다. 3개의 실험 set을 두고 각각의 경우를 실험하였다. 본 연구에서는 Pre-deposition과 drive-in 방법을 사용한 doping의 2가지 step으로 실험을 진행하였다. pre-deposition의 시간 condition은 21분으로 하였다. $N_2$ 분위기에서 $O_2$$POCl_3$ 의 비율을 각각 100sccm, 200sccm으로 하여 실험을 진행하였다. 변수인 온도의 경우는 각각의 set에 대하여, $830^{\circ}C$, $840^{\circ}C$, $850^{\circ}C$ 로 가변하였다. pre-deposition을 끝낸 뒤, sheet resistance의 값은 각각 $75{\sim}90\;\Omega/square$, $68{\sim}75\;\Omega/square$, $56{\sim}63\;\Omega/square$의 값을 나타내었다. 도핑의 경우에는 drive-in 방법을 사용하였으며, 모든 경우에서 20분에서 $890^{\circ}C$에서 진행하였다. 최종 sheet resistance의 값은 각각의 경우 최대 $33\;\Omega/square$, $34\;\Omega/square$, $30\;\Omega/square$의 값을 나타내었다. $40{\sim}45\;\Omega/square$ 정도의 sheet resistance가 많은 연구에서 이상적인 sheet resistance로 연구되고 있다. 본 연구에서 두 번째 조건이 이상적인 sheet resistance에 가장 접근 하였음을 확인 할 수 있다.

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Simultaneously Enhanced Magnetic and Ferroelectric Properties of $Bi_{0.9}Dy_{0.1}Fe_{0.97}Co_{0.03}O_3 $ compound

  • 유영준;황지섭;박정수;이주열;강지훈;이광훈;이보화;김기원;이영백
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.147-147
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    • 2013
  • Multiferroic material $BiFeO_3$ (BFO) is a typical multiferroic material with a room-temperature magnetoelectric coupling in view of high magnetic- and ferroelectric-ordering temperatures (Neel temperature $T_N$ ~ 647 K and Curie temperature TC ~1,103 K). Rare-earth ion substitution at the Bi sites is very interesting, which induces suppressed volatility of the Bi ion and improved ferroelectric properties. At the same time, the Fe-site substitution with magnetic ions is also attracting, since the enhanced ferromagnetism was reported. In this study, BFO, $Bi_{0.9}Dy_{0.1}FeO_3$ (BDFO), $BiFe_{0.97}Co_{0.03}O_3$ (BFCO) and $Bi_{0.9}Dy_{0.1}Fe_{0.97}Co_{0.03}O_3 $ (BDFCO) compounds were prepared by conventional solid-state reaction and wet-mixing method. High-purity $Bi_2O_3$, $Dy_2O_3$, $Fe_2O_3$ and $Co_3O_4$ powders with the stoichiometric proportions were mixed, and calcined at $500^{\circ}C$ for 24 h. The samples were immediately put into an oven, which was heated up to 800oC and sintered in air for 1 h. The crystalline structure of samples was investigated at room temperature by using a Rigaku Miniflex powder diffractometer. The field-dependent magnetization measurements were performed with a vibrating-sample magnetometer. The electric polarization was measured at room temperature by using a standard ferroelectric tester (RT66B, Radiant Technologies). Dy and Co co-doping at the Bi and the Fe sites induce the enhancement of both magnetic and ferroelectric properties of $BiFeO_3$.

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RF Sputter 방법으로 제조한 투명전도막 ZnO 특성 (Properties of Transparent Conducting Zinc Oxide Films Prepared by RF Sputtering)

  • 최병호
    • 한국재료학회지
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    • 제2권5호
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    • pp.360-365
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    • 1992
  • Ga 첨가효과 및 Sputter 제조조건이 전기적 특성에 미치는 영향을 고찰하기 위해 ZnO분말과 G$a_2O_3$분말을 소결하여 타겟트를 제조하여 Sputter법으로 유리기판에 Ga-doped ZnO 다결정박막을 제조하였다. RF 전력밀도, 아르곤 개스압력 및 Ga 함유량등을 최적화한 후 제조한 투명한 Ga-doped ZnO 박막의 비저항은 1$0^{-3}$ohm-cm이며, undoped 및 Ga-doped ZnO 박막의 전자농도는 각 $10^{18}$, $10^{21}$/c$m^2$이였다. 공기와 질소분위기에서 열처리를 행하였을 때 Ga-doped ZnO 박막의 비저항은 $10^{2}$ order 증가하였다. 가시광영역의 투과율은 80% 이상이였으며, Ga 함유량이 증가하면 optical band gap도 넓어졌다.

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산화 아연에서의 질소 용해도에 대한 알루미늄의 효과 : 밀도 범함수 이론 (Effect of Aluminum on Nitrogen Solubility in Zinc Oxide: Density Functional Theory)

  • 김대희;이가원;김영철
    • 한국재료학회지
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    • 제21권12호
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    • pp.639-643
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    • 2011
  • Zinc oxide as an optoelectronic device material was studied to utilize its wide band gap of 3.37 eV and high exciton biding energy of 60 meV. Using anti-site nitrogen to generate p-type zinc oxide has shown a deep acceptor level and low solubility. To increase the nitrogen solubility in zinc oxide, group 13 elements (aluminum, gallium, and indium) was co-added to nitrogen. The effect of aluminum on nitrogen solubility in a $3{\times}3{\times}2$ zinc oxide super cell containing 72 atoms was investigated using density functional theory with hybrid functionals of Heyd, Scuseria, and Ernzerhof (HSE). Aluminum and nitrogen were substituted for zinc and oxygen sites in the super cell, respectively. The band gap of the undoped super cell was calculated to be 3.36 eV from the density of states, and was in good agreement with the experimentally obtained value. Formation energies of a nitrogen molecule and nitric oxide in the zinc oxide super cell in zinc-rich conditions were lower than those in oxygen-rich conditions. When the number of nitrogen molecules near the aluminum increased from one to four in the super cell, their formation energies decreased to approach the valence band maximum to some degree. However, the acceptor level of nitrogen in zinc oxide with the co-incorporation of aluminum was still deep.

Effect of Deposition and Annealing Temperature on Structural, Electrical and Optical Properties of Ag Doped ZnO Thin Films

  • Jeong, Eun-Kyung;Kim, In-Soo;Kim, Dae-Hyun;Choi, Se-Young
    • 한국재료학회지
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    • 제18권2호
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    • pp.84-91
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    • 2008
  • The effects of the deposition and annealing temperature on the structural, electrical and optical properties of Ag doped ZnO (ZnO : Ag) thin films were investigated. All of the films were deposited with a 2wt% $Ag_2O-doped$ ZnO target using an e-beam evaporator. The substrate temperature varied from room temperature (RT) to $250^{\circ}C$. An undoped ZnO thin film was also fabricated at $150^{\circ}C$ as a reference. The as-grown films were annealed in temperatures ranging from 350 to $650^{\circ}C$ for 5 h in air. The Ag content in the film decreased as the deposition and the post-annealing temperature increased due to the evaporation of the Ag in the film. During the annealing process, grain growth occurred, as confirmed from XRD and SEM results. The as-grown film deposited at RT showed n-type conduction; however, the films deposited at higher temperatures showed p-type conduction. The films fabricated at $150^{\circ}C$ revealed the highest hole concentration of $3.98{\times}1019\;cm^{-3}$ and a resistivity of $0.347\;{\Omega}{\cdot}cm$. The RT PL spectra of the as-grown ZnO : Ag films exhibited very weak emission intensity compared to undoped ZnO; moreover, the emission intensities became stronger as the annealing temperature increased with two main emission bands of near band-edge UV and defect-related green luminescence exhibited. The film deposited at $150^{\circ}C$ and annealed at $350^{\circ}C$ exhibited the lowest value of $I_{vis}/I_{uv}$ of 0.05.

Effect of Mn-addition on Catalytic Activity of $Mn/In_2O_3$ in Methane Activation

  • Park, Jong Sik;Jun Jong Ho;Kim Yong Rok;Lee Sung Han
    • Bulletin of the Korean Chemical Society
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    • 제15권12호
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    • pp.1058-1064
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    • 1994
  • Mn/In$_2O_3$ systems with a variety of Mn mol${\%}$ were prepared to investigate the effect of Mn-addition on the catalytic activity of Mn/In$_2O_3$ in the oxidative coupling of methane. The oxidative coupling of methane was examined on pure In$_2O_3$ and Mn/In$_2O_3$ catalysts by cofeeding gaseous methane and oxygen under atmospheric pressure between 650 and 830 $^{\circ}C$. Although pure In$_2O_3$ showed no C$_2$ selectivity, both the C$_2$ yield and the C$_2$ selectivity were increased by Mn-doping. The 5.1 mol${\%}$ Mn-doped In$_2O_3$ catalyst showed the best C$_2$ yield of 2.6${\%}$ with a selectivity of 19.1${\%}$. The electrical conductivities of pure and Mn-doped In$_2O_3$ systems were measured in the temperature range of 25 to 100 $^{\circ}C$ at PO$_2$'S of 1 ${\times}$ 10$^{-7}$ to 1 ${\times}$ 10 $^{-1}$ atm. The electrical conductivities were decreased with increasing Mn mol${\%}$ and PO$_2$, indicating the specimens to be n-type semiconductors. Electrons serve as the carriers and manganese can act as an electron acceptor in the specimens. Manganese ions doped in In$_2O_3$ inhibit the ionization of neutral interstitial indium or the transfer of lattice indium to interstitial sites and increase the formation of oxygen vacancy, giving rise to the increase of the concentration of active oxygen ion on the surface. It is suggested that the active oxygen species adsorbed on oxygen vacancies are responsible for the activation of methane.

Photoconductive Atomic Force Microscopy를 이용한 빛의 세기 및 파장의 변화에 따른 폴리실리콘 태양전지의 광전특성 분석 (Characterization of Light Effect on Photovoltaic Property of Poly-Si Solar Cell by Using Photoconductive Atomic Force Microscopy)

  • 허진희
    • 한국재료학회지
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    • 제28권11호
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    • pp.680-684
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    • 2018
  • We investigate the effect of light intensity and wavelength of a solar cell device using photoconductive atomic force microscopy(PC-AFM). A $POCl_3$ diffusion doping process is used to produce a p-n junction solar cell device based on a polySi wafer, and the electrical properties of prepared solar cells are measured using a solar cell simulator system. The measured open circuit voltage($V_{oc}$) is 0.59 V and the short circuit current($I_{sc}$) is 48.5 mA. Moreover, the values of the fill factors and efficiencies of the devices are 0.7 and approximately 13.6 %, respectively. In addition, PC-AFM, a recent notable method for nano-scale characterization of photovoltaic elements, is used for direct measurements of photoelectric characteristics in limited areas instead of large areas. The effects of changes in the intensity and wavelength of light shining on the element on the photoelectric characteristics are observed. Results obtained through PC-AFM are compared with the electric/optical characteristics data obtained through a solar simulator. The voltage($V_{PC-AFM}$) at which the current is 0 A in the I-V characteristic curves increases sharply up to $18W/m^2$, peaking and slowly falling as light intensity increases. Here, $V_{PC-AFM}$ at $18W/m^2$ is 0.29 V, which corresponds to 59 % of the average $V_{oc}$ value, as measured with the solar simulator. Furthermore, while the light wavelength increases from 300 nm to 1,100 nm, the external quantum efficiency(EQE) and results from PC-AFM show similar trends at the macro scale but reveal different results in several sections, indicating the need for detailed analysis and improvement in the future.

4인치 광점호 Thyristor의 제조 및 특성 분석에 대한 연구 (Fabrication and Characterization of 5000V class 4-inch Light Triggered Thyristor)

  • 조두형;원종일;유성욱;고상춘;박종문;이병하;배영석;구인수;박건식
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2019년도 전력전자학술대회
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    • pp.230-232
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    • 2019
  • Light Triggerd Thyristor (LTT)는 HVDC 및 산업용 스위치 등에 사용되는 대전력 반도체소자이다. 일반적인 Thyristor가 전기적 신호에 의해 trigger 되는 것과는 다르게 LTT는 광신호에 의해 동작하는 소자이다. 본 논문에서는 5,000V, 2,200A 급의 4인치 LTT 소자의 제작 및 전기적인 특성평가 결과를 기술하였다. 4인치 LTT의 구조적인 특징은 전면부 중앙에 광신호가 주입되는 수광부가 위치해 있으며 입력 전류 증폭을 위한 4-단계 증폭 게이트 (gate) 구조를 가지도록 설계하였다. $400{\Omega}{\cdot}cm$ 비저항을 갖는 1mm 두께의 n-형 실리콘 웨이퍼에 boron 이온주입과 열처리 공정으로 약 $30{\mu}m$ 깊이의 p-base를 형성하였으며, 고내압 저지를 위한 edge termination은 VLD (variable lateral doping) 기술을 적용하였다. 제작된 4인치 LTT는 6,500 V의 순방향 항복전압 ($V_{DRM}$) 특성을 나타내었으며, 100V의 어노드전압 ($V_A$)과 20 mA의 게이트전류 ($I_G$)에 의하여 thyristor가 trigger 됨을 확인하였다. 제작한 LTT 소자는 disk형 press-pack 패키지를 진행한 후, LTT의 수광부에 $10{\mu}s$, 50 mW의 900 nm 광 펄스를 조사하여 전류 특성을 평가하였다. LTT 패키지 샘플에 60 Hz 주파수의 광 펄스를 조사한 경우 2,460 A의 순방향 평균전류 ($I_T$)와 $336A/{\mu}s$의 반복전류상승기울기 (repetitive di/dt)에 안정적으로 동작함을 확인하였다. 또한, 펄스 전류 시험의 경우 61.6 kA의 최대 통전 전류 (ITSM, surge current)와 $1,050A/{\mu}s$의 펄스전류 상승 기울기 (di/dt of on-state pulse current)에도 LTT의 손상 없이 동작함을 확인하였다.

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입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구 (Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology)

  • 하주환;박소담;이학지;신석윤;변창우
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.101-104
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    • 2022
  • Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga2O3 is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.