• Journal of the Korean Crystal Growth and Crystal Technology
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• v.5 no.3
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• pp.215-222
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• 1995

Nb doped strontium titanate single crystals were grown by the floating zone method. The doping amount of $Nb_2O_5$ was 0.2 wt %. Those crystals were grown in air and N z atmosphere and the growth rate was 5 mmlhr and rotation speed of upper and lower shaft was 30 rpm. The shapes of melt - feed rod interface depending on sintering temperatures were observed. In air atmosphere, the flow rate of air was 1.5 ${\ell}/min$ and in $N_2$ atmosphere, that of $N_2$ gas was 0.5 ${\ell}/min$. As grown crystals were analyseQ by XRD, Laue back - reflection and chemical etching. After annealing in $N_2$ atmosphere, resistivities of crystals were measured and the activation energies of each samples were calculated.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.11
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• pp.717-721
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• 2017

We studied the performance enhancement of organic light-emitting diodes (OLEDs) using 2,3,5,6-fluoro-7,7,8,8-tetracyanoquinodimethane ($F_4-TCNQ$) as the hole-transport layer. To investigate how $F_4-TCNQ$ affects the device performance, we fabricated a reference device in an ITO (170 nm)/TPD(40 nm)/$Alq_3$(60 nm)/LiF(0.5 nm)/Al(100 nm) structure. Several types of test devices were manufactured by either doping the $F_4-TCNQ$ in the TPD layer or forming a separate $F_4-TCNQ$ layer between the ITO anode and TPD layer. N,N'-diphenyl-N,N'-di(m-tolyl)-benzidine (TPD), tri(8-hydroxyquinoline) aluminum ($Alq_3$), and $F_4-TCNQ$ layers were formed by thermal evaporation at a pressure of $10_{-6}$ torr. The deposition rate was $1.0-1.5{\AA}/s$ for TPD and $Alq_3$. The LiF was subsequently thermally evaporated at a deposition rate of $0.2{\AA}/s$. The performance of the OLEDs was considered with respect to the turn-on voltage, luminance, and current efficiency. It was found that the use of $F_4-TCNQ$ in OLEDs enhances the performance of the device. In particular, the use of a separate layer of $F_4-TCNQ$ realizes better device performance than other types of OLEDs.

• Journal of the Korean Ceramic Society
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• v.45 no.5
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• pp.276-279
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• 2008

In this research, properties of $N_2$-doped $Sb_2Te_3$ thin film were evaluated using 4-point probe, XRD and AFM. $Sb_2Te_3$ material has faster crystallization rate than $Ge_2Sb_2Te_5$, but sheet resistance difference between amorphous and crystallization state is very low. This low sheet resistance difference decreases sensing margin in reading operation at PRAM device operation. Therefore, in order to overcome this weak point, $N_2$ gas was doped on $Sb_2Te_3$ thin film. Sheet resistance difference between amorphous and crystallized state of $N_2$-doped $Sb_2Te_3$ thin film showed about $10^4$ times higher than Un-doped $Sb_2Te_3$ thin film because of the grain boundary scattering.

• JSTS:Journal of Semiconductor Technology and Science
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• v.16 no.6
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• pp.847-853
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• 2016

Applications of Si have been increasingly exploited and extended to More-Moore, More-than-Moore, and beyond-CMOS approaches. Ge is regarded as one of the supplements for Si owing to its higher carrier mobilities and peculiar band structure, facilitating both advanced and optical applications. As an emerging metal-oxide device, the junctionless field-effect transistor (JLFET) has drawn considerable attention because of its simple process, less performance fluctuation, and stronger immunity against short-channel effects due to the absence of anisotype junctions. In this study, we investigated lateral field scalability, which is equivalent to channel-length scaling, in Si and Ge JLFETs. Through this, we can determine the usability of Si CMOS and hypothesize its replacement by Ge. For simulations with high accuracy, we performed rigorous modeling for ${\mu}_n$ and ${\mu}_p$ of Ge, which has seldom been reported. Although Ge has much higher ${\mu}_n$ and ${\mu}_p$ than Si, its saturation velocity ($v_{sat}$) is a more determining factor for maximum $I_{on}$. Thus, there is still room for pushing More-Moore technology because Si and Ge have a slight difference in $v_{sat}$. We compared both p- and n-type JLFETs in terms of $I_{on}$, $I_{off}$, $I_{on}/I_{off}$, and swing with the same channel doping and channel length/thickness. $I_{on}/I_{off}$ is inherently low for Ge but is invariant with $V_{DS}$. It is estimated that More-Moore approach can be further driven if Si is mounted on a JLFET until Ge has a strong possibility to replace Si for both p- and n-type devices for ultra-low-power applications.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2015.10a
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• pp.1121-1124
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• 2015

In this paper, we propose and demonstrate an optimal design of wideband pulsed gamma-ray detectors. Pulsed gamma-ray detectors are designed to operate in a dose rate of $1{\times}10^6{\sim}1{\times}10^8rad(Si)/s$. The input parameter was derived based on the energy ratio of pulse gamma-ray spectrum and the time of the energy. The sensor output current was calculated based on the dose rate control circuit. Using the N-type Epi Wafer, the optimum condition detection sensor was designed based on TCAD. The simulation results show that the optimal Epi layer thickness is 45um when applied voltage 3.3V. The doping concentrations are as follows : N-type is an Arsenic as $1{\times}10^{19}/cm^3$, P-type is a Boron as $1{\times}10^{19}/cm^3$ and Epi layer is Phosphorus as $3.4{\times}10^{12}/cm^3$. Pulse gamma-ray detector diameter is the 1.3mm.

• Journal of Radiation Protection and Research
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• v.28 no.2
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• pp.87-95
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• 2003

The fabrication process and the structure of PIN semiconductor detectors have been designed optimally by simulation for doping concentration and width of p+ layer, impurities re-contribution due to annealing and the current distribution due to guard ring at the sliced edges. The characteristics to radiation response has been also simulated in terms of Monte Carlo Method. The device has been fabricated on n type, $400\;{\Omega}cm$, orientation <100>, Floating-Zone silicon wafer using the simulation results. The leakage current density of $0.7nA/cm^2/100{\mu}m$ is achieved by this process. The good linearity of radiation response to Cs-137 was kept within the exposure ranges between 5 mR/h and 25 R/h. This proposed process could be applied for fabricating a PIN semiconductor detector for measuring individual dose.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.594-597
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• 1999

The new green and red phosphors for PDP application activated by T $b^{3+}$ and E $u^{3+}$ were synthesized, and their photoluminance properties were investigated. It was found that the brightness of $Al_3$Gd $B_4$ $O_{12}$ :T $b^{3+}$ green phosphor under 147nm VUV irradiation was higher than that of commercial Z $n_2$ $SiO_4$:M $n^{2+}$ phosphor. But the emitting intensity of A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ red phosphor was inferior to the commercial (Y,Gd)B $O_3$:E $u^{3+}$. $Al_3$Gd $B_4$ $O_{12}$ Phosphor had a strong excitation band at 160nm associated with the host absorption, and also the photoluminance excitation intensity of $Al_3$Gd $B_4$ $O_{12}$ :T $b^{3+}$ was higher than that of Z $n_2$ $SiO_4$:M $n^{2+}$, but the intensity of $Al_3$Gd $B_4$ $O_{12}$ :E $u^{3+}$ phosphor was smaller than (Y,Gd)B $O_3$:E $u^{3+}$ phosphor In the VUV range. C $e^{3+}$ co-doping in A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ and substitution of $Al^{3+}$ by G $a^{3+}$ A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ phosphor were tried, but they did not improved the optical property .d the optical property .ty .

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.237-237
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• 2010

에너지소비와 엔진 부품의 마모문제를 해결하기 위해, soft-phase를 doping한 hard상의 coating에 대한 실험이 최근 중요한 연구 테마로서 진행 중이다. 특히 MoN-Cu coating은 미국 Argon 연구소의 Erdemer박사 등에 의해, 고온 및 상온 윤활성이 우수한 코팅층으로 보고된 이후 많은 연구가 진행되고 있다. 그러나 기존 연구는 Mo와 Cu의 원소타겟을 이용한 연구가 주력이 되었다. 높은 경도와 저온 고온에서의 낮은 나노 혼합물 코팅 종류는 일반적으로 Mo와 Cu와 같은 원소 합금을 이용한 다수 타겟을 이용한 공정에 의해 진행되어왔다. 이러한 복수의 타겟에 의해 증착 동안에는, 정확한 조성, 큰 크기의 시편들의 균일 증착을 조절하기가 쉽지 않다. 또한, 코팅층에 3번째 성분을 추가하기가 어렵다는 문제점이 있다. 본 연구에서는, 최상의 마찰계수와 표면경도를 보이는 MoN-Cu층을 형성시키기 위하여 합금으로 단일 타겟을 제조하였다. 이를 위한 최적 조성을 결정하기 위하여 Mo, Cu 단일 타겟을 이용한 Unbalanced Magnetron sputtering 법으로 다양한 Cu 함량의 MoN+Cu 합금을 제조하였으며, 이에 대한 경도 및 마찰계수 측정을 통해 최적의 Cu 함량을 결정하였다. 이러한 최적 조성의 Cu 타겟제조를 기계적 합금화와 Spark plasma sintering 기술을 이용하여 제작하였으며, 복수의 합금 타겟과 단일 합금 타겟으로 제조된 코팅층의 물성 비교를 통해 합금 타겟의 우수성 여부를 확인하고자 하였다. 증착된 두 조건의 물성을 비교 단일 타겟은 두가지 타겟으로 증착한 것보다 비슷한 조성에서 경도가 높았으며 경도가 비슷한 조성에서는 마찰계수가 낮았다. 또 입자는 10 at.% Cu 조성에 대해 단일타겟이 50nm 결정립을 갖는 반해 단일타겟은 측정이 불가능할 정도의 미세한 결정립을 가졌다. Erdemir의 연구 결과에 의하면, Cu 함량이 증가함에 따라 columnar 형태의 코팅층구조가 나노 구조로 변한다고 하였는데, 본 연구에서 복수의 원소 타겟에서는 확인이 안되었으며, 단일 합금 타겟에서 완벽한 featurless 형태의 코팅층 구조와 우수한 조도의 박막층을 얻을 수 있었다. 이렇게 제조된 다양한 코팅층에 대한 마찰계수 측정이 진행중이다.

• Korean Journal of Materials Research
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• v.31 no.9
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• pp.502-510
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• 2021

Hierarchically porous carbon materials with high nitrogen functionalities are extensively studied as high-performance supercapacitor electrode materials. In this study, nitrogen-doped porous carbon textile (N-PCT) with hierarchical pore structures is prepared as an electrode material for supercapacitors from a waste cotton T-shirt (WCT). Porous carbon textile (PCT) is first prepared from WCT by two-step heat treatment of stabilization and carbonization. The PCT is then nitrogen-doped with urea at various concentrations. The obtained N-PCT is found to have multi-modal pore structures with a high specific surface area of 1,299 m² g^-1 and large total pore volume of 1.01 cm³ g^-1. The N-PCT-based electrode shows excellent electrochemical performance in a 3-electrode system, such as a specific capacitance of 235 F g^-1 at 1 A g^-1, excellent cycling stability of 100 % at 5 A g^-1 after 1,000 cycles, and a power density of 2,500 W kg^-1 at an energy density of 3.593 Wh kg^-1. Thus, the prepared N-PCT can be used as an electrode material for supercapacitors.

• Clean Technology
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• v.30 no.1
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• pp.23-27
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• 2024

Bismuth is a promising anodic for Li-ion batteries (LIBs) due to its adequate operating voltage and high-volume capacity (3,765 mAh cm^-3). Nevertheless, inevitable volume expansion during Bi alloy reactions leads to severe capacity loss and cell destruction. To address this, a complex of bismuth alloy nanoparticles (Bi@NC) embedded in an N doping-carbon coating is fabricated via a simple pyrolysis method. Nano-sized bismuth alloys can improve the reaction dynamics through a shortened Li⁺-ion diffusion path. In addition, the N-doped carbon coating effectively buffers the volume change of bismuth during the extended alloy/dealloy reaction with Li⁺ ions and maintains an effective conductive network. Based on the Thermogravimetric analysis (TGA) showed high bismuth alloy loading (80.9 wt%) and maintained a high gravimetric capacity of 315 mAh g^-1 up to 100 cycles with high volumetric capacity of 845.6 mAh cm^-3.