• Title/Summary/Keyword: N deposition

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The Characteristic of Formation CoSi2/Si Thin Film by the RF-Sputtering Method (RF-Sputtering법에 의한 CoSi2/Si 박막 형성에 관한 특성)

  • Cho, Geum-Bae;Lee, Kang-Yoen;Choi, Youn-Ok;Kim, Nam-Oh;Jeong, Byeong-Ho
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.59 no.7
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    • pp.1255-1258
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    • 2010
  • In this paper, the $CoSi_2$ thin films with thicknesses of about $5{\mu}m$ were deposited on n-type silicon (111) substrates by RF magnetron sputtering method using a $CoSi_2$ target (99.99%). The flow rate of argon of 50 sccm, substrate temperature of $100^{\circ}C$, RF power of 60 watts, deposition time of 30 minutes, and the vacuum of $1\times10^{-6}$ Torr. The annealing treatments of the $CoSi_2$ thin film were performed from 500, 700 and $900^{\circ}C$ for 1h in air ambient by an electric furnace. In order to investigate the $CoSi_2$ thin film X-ray diffraction patterns were measured using the X-ray diffractometer (XRD). The structure of the thin films were investigated by using scanning the electron microscope (SEM) were used for review. The surface morphology of the thin films was measured with a atomic force microscopy (AFM). Temperature dependence of sheet resistivity and property of Hall effect was measured in the $CoSi_2$ thin film.

Electroluminescence device of the new organic materials using Langmuir-Blodgett(LB) method (LB 법을 이용한 새로운 유기물의 전기 발광 소자에 관한 연구)

  • 이호식;이원재;박종욱;김태완;강도열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.601-604
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    • 1999
  • Electroluminescence(EL) devices based on organic thin films have attracted lots of interests in large-area light-emitting display. Recently, many EL researcher have interested a new emissive organic material. In this study, light-emitting organic electroluminescent devices were fabricated using Langmuir-Blodgett(LB) technique with new emissive organic material. This new emissive organic material were synthesis by our teams and we called PECCP [poly(3,6-N-2ethylhexyl carbazoly cyanoterephthalidene)] which has strong electron donor group and electron acceptor group in main chain repeat unit. This material has good solubility in common organic solvent such as chloroform. THF, etc. and has a good stability in air. In here, the new emissive material is applied to Langmuir-Blodgett(LB) method because our new material has a good stability in air. Optimum conditions of film deposition were examined by a surface pressure-area( $\pi$ -A) isotherms with various factors. The LB film were deposited on a indium Tin Oxide(ITO) glass. We were investigated by measuring current-voltage(I-V) characteristics. Also we were measured the UV/visible absorption at about 410nm and PL spectrum at about 530nm. We are attempt to the electroluminescence device properties of the new emissive material by Langmuir-Blodgett(LB) technique.

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Design and Fabrication of Movable Micro-Fersnel Lens on XY-stage (XY-Stage에 의해 정적인 변위를 갖는 미세 프레넬 렌즈(Micro-Fresnel Lens)의 설계 및 제작)

  • Kim, Che-Heung;Ahn, Si-Hong;Lim, Hyung-Taek;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 1998.07g
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    • pp.2515-2517
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    • 1998
  • The micro fresnel lens(MFL) was modeled and fabricated on a XY-stage electrostatically driven by comb actuator. The modeled MFL was approximated as a step shape with 4-phase and 4-zone plate. The focal length and diameter of the MFL is 20mm and 912${\mu}m$, respectively. The XY-stage suspending the MFL is designed to generate a large static displacement up to about 20${\mu}m$. On SOI substrates, we first fabricated MFL using the RIE(reactive Ion etching) technology and then patterned and etched bulk silicon to make XY-stage. After the fabrication of all structures on top side of the SOI substrates. $Si_3N_4$ was deposited for passivation of all structures using PECVD(plasma enhanced chemical vapor deposition). All the MFL systems width comb drive actuator were released by KOH etching from the bottom side of the SOI wafer using double-sided alignment technique. In fabrication of MFL, a dry etching conditions is established in order to improve surface roughness and to control the etched depth.

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Transparent ZnO thin film transistor with long channel length of 1mm (1mm의 채널을 갖는 ZnO 투명 박막 트랜지스터)

  • Lee, Choong-Hee;Ahn, Byung-Du;Oh, Sang-Hoon;Kim, Gun-Hee;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.34-35
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    • 2006
  • Transparent ZnO thin film transistor (TFT) is fabricated on the glass substrates. The device consists of a high mobility intrinsic ZnO as a semiconductor active channel, Ga doped ZnO (GZO) as an electrode, $HfO_2$ as a gate insulator. GZO and $HfO_2$ layers are prepared by using a pulsed laser deposition and intrinsic ZnO layers are fabricated by using an rf-magnetron sputtering, respectively. The transparent TFT is highly transparent (> 87 %) and exhibits n-channel, enhancement mode behavior with a field-effect mobility as large as $11.7\;cm^2/Vs$ and a drain current on-to-off ratio of about $10^5$.

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Effect of double pinning mechanism in BSO-added GdBa2Cu3O7-x thin films

  • Oh, J.Y.;Jeon, H.K.;Lee, J.M.;Kang, W.N.;Kang, B.
    • Progress in Superconductivity and Cryogenics
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    • v.19 no.3
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    • pp.13-17
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    • 2017
  • We investigated the effect of self-assembled BSO nano-defects as pinning centers in BSO-added GdBCO films when the thicknesses of films were varied. 3.5 vol. % BSO-added GdBCO films with varying thicknesses from 200 nm to 1000 nm were deposited on $SrTiO_3$ (STO) substrate by using pulsed laser deposition (PLD) process. For the films with thicknesses of 400 nm and 600 nm, 'anomaly shoulders' in $J_c-H$ characteristic curves were observed near the matching field. The anomaly shoulders appeared in the field dependence of $J_c$ may be attributed to the existence of double pinning mechanisms in thin films. The fit to the pinning force density as a function of reduced field h ($H/H_{irr}$) using the Dew-Hughes' scaling law shows that both the 400 nm- and the 600 nm-thick films have double pinning mechanisms while the other films have a single pinning mechanism. These results indicate that the self-assembled property of BSO result in different role as pinning centers with different thickness.

Strategic coating of NdFeB magnets with Dy to improve the coercivity of permanent magnets

  • Ucar, Huseyin;Parker, David S.;Nlebedim, I.C.;McCallum, R.W.;McCall, S.K.;Parans Paranthaman, M.
    • Advances in materials Research
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    • v.4 no.4
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    • pp.227-233
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    • 2015
  • We present a method, supported by theoretical analysis, for optimizing the usage of the critical rare earth element dysprosium in $Nd_2Fe_{14}B$ (NdFeB)-based permanent magnets. In this method, we use Dy selectively in locations such as magnet edges and faces, where demagnetization factors are largest, rather than uniformly throughout the bulk sample. A200 nm thick Dy film was sputtered onto a commercial N-38, NdFeB magnets with a thickness of 3 mm and post-annealed at temperatures from $600-700^{\circ}C$. Magnets displayed enhanced coercivities after post-annealing and as much as a 5 % increase in the energy product, while requiring a total Dy content of 0.06 wt. % - a small fraction of that used in the commercial grade Dy-NdFeB magnets. By assuming all Dy diffused into NdFeB magnets, the improvement in energy product corresponds to a saving of over 1% Dy (critical element). Magnets manufactured using this technique will therefore be higher performing which would potentially broaden the application space of these magnets in the traction motors of hybrid and pure electric vehicles, and wind generators.

Growth and Characterization of Vertically Aligned ZnO nanowires with different Surface morphology

  • Das, S.N.;Choi, J.H.;Kar, J.P.;Myoung, J.M.
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.05a
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    • pp.35.1-35.1
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    • 2009
  • Vertically aligned zinc oxide (ZnO) nanorods (NRs) with different surface morphology were grown by metal organic chemical vapor deposition (MOCVD) on sapphire substrate. The films thus prepared were characterized by measuring X-ray diffraction (XRD), Scanning electron microscopy (SEM) and Transmission electron microscopy (TEM) studies. To study the effect of surface morphology on wettability, the contact angle (CA) of water was measured. It was demonstrated that the CA of the deposited ZnO NRs varied between $104^{\circ}$ and $135^{\circ}$ depending upon the surface morphology. Variable temperature photoluminescence (PL) have employed to probe the exciton recombination in high density and vertically aligned ZnO Nanorod arrays. The low-temperature PL characterizes the dominant near-band-edge excitonic emissions from such nanorod arrays.

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Synthesis of Si Nanowire/Multiwalled Carbon Nanotube Core-Shell Nanocomposites (실리콘 나노선/다중벽 탄소나노튜브 Core-Shell나노복합체의 합성)

  • Kim, Sung-Won;Lee, Hyun-Ju;Kim, Jun-Hee;Son, Chang-Sik;Kim, Dong-Hwan
    • Korean Journal of Materials Research
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    • v.20 no.1
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    • pp.25-30
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    • 2010
  • Si nanowire/multiwalled carbon nanotube nanocomposite arrays were synthesized. Vertically aligned Si nanowire arrays were fabricated by Ag nanodendrite-assisted wet chemical etching of n-type wafers using $HF/AgNO_3$ solution. The composite structure was synthesized by formation of a sheath of carbon multilayers on a Si nanowire template surface through a thermal CVD process under various conditions. The results of Raman spectroscopy, scanning electron microscopy, and high resolution transmission electron microcopy demonstrate that the obtained nanocomposite has a Si nanowire core/carbon nanotube shell structure. The remarkable feature of the proposed method is that the vertically aligned Si nanowire was encapsulated with a multiwalled carbon nanotube without metal catalysts, which is important for nanodevice fabrication. It can be expected that the introduction of Si nanowires into multiwalled carbon nanotubes may significantly alter their electronic and mechanical properties, and may even result in some unexpected material properties. The proposed method possesses great potential for fabricating other semiconductor/CNT nanocomposites.

Microencapsulation of Isoprinosine with Ethylcellulose

  • Kim, Chong-Kook;Hwang, Sung-Joo
    • Archives of Pharmacal Research
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    • v.14 no.4
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    • pp.298-304
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    • 1991
  • Isoprinosine, an antiviral agent with a bitter taste, has been clinically used up to a maximum of 4 g daily in 4-8 doses. In this investigation, isoprinosine was microencapsulated with ethylcellulose 22 cps, 50 cps and 100 cps by means of polymer deposition from cyclohexane through temperature change. Complete removal of cyclohexane from the microcapsules was necessary, since ethylcellulose-coated microcapsules obtained from cyclohexane medium were heavily solvated with cyclohexane and formed lumps even after drying. The displacement of cyclohexane by n-hexane during isolation of microcapsules (Method III) or the freezing of the anal-washed microcapsules before drying (Mothod II) provided the dried products which were more discrete microcapsules than those which were simply dried in the air overnight (Method I). Method III was especially the most effective procedure in preparing finer and more discrete microcapsules. The drug-release from microcapsules was influenced by the ratio of core to wall, the viscosity grade of ethylcellulose and the overall microcapsule size. The release rate was adequately fitted to both the first-order and the diffusion-controlled processes. It is therefore possible to design the release-controlled microcapsules with ethylcellulose of different viscosity along with various core to wall ratio.

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Fabrication of Anodic Aluminum Oxide on Si and Sapphire Substrate (실리콘 및 사파이어 기판을 이용한 알루미늄의 양극산화 공정에 관한 연구)

  • Kim Munja;Lee Jin-Seung;Yoo Ji-Beom
    • Korean Journal of Materials Research
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    • v.14 no.2
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    • pp.133-140
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    • 2004
  • We carried out anodic aluminum oxide (AAO) on a Si and a sapphire substrate. For anodic oxidation of Al two types of specimens prepared were Al(0.5 $\mu\textrm{m}$)!Si and Al(0.5 $\mu\textrm{m}$)/Ti(0.1 $\mu\textrm{m}$)$SiO_2$(0.1 $\mu\textrm{m}$)/GaN(2 $\mu\textrm{m}$)/Sapphire. Surface morphology of Al film was analyzed depending on the deposition methods such as sputtering, thermal evaporation, and electron beam evaporation. Without conventional electron lithography, we obtained ordered nano-pattern of porous alumina by in- situ process. Electropolishing of Al layer was carried out to improve the surface morphology and evaluated. Two step anodizing was adopted for ordered regular array of AAO formation. The applied electric voltage was 40 V and oxalic acid was used as an electrolyte. The reference electrode was graphite. Through the optimization of process parameters such as electrolyte concentration, temperature, and process time, a regular array of AAO was formed on Si and sapphire substrate. In case of Si substrate the diameter of pore and distance between pores was 50 and 100 nm, respectively. In case of sapphire substrate, the diameter of pore and distance between pores was 40 and 80 nm, respectively