RF Plasma Processes Monitoring for Fluorocarbon Polluted Plasma Chamber Cleaning by Optical Emission Spectroscopy and Multivariate Analysis (Optical Emission Spectra 신호와 다변량분석기법을 통한 Fluorocarbon에 의해 오염된 반응기의 RF 플라즈마 세정공정 진단)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2015.11a
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- pp.242-243
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- 2015