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검색결과 613건 처리시간 0.028초

RF Magnetron Sputtering에 의한 BiFeO3 박막의 제조 및 전기적 특성 (Preparation and Electrical Properties of BiFeO3 Films by RF Magnetron Sputtering)

  • 박상식
    • 한국재료학회지
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    • 제19권5호
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    • pp.253-258
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    • 2009
  • Mn-substituted $BiFeO_3$(BFO) thin films were prepared by r.f. magnetron sputtering under an Ar/$O_2$ mixture of various deposition pressures at room temperature. The effects of the deposition pressure and annealing temperature on the crystallization and electrical properties of BFO films were investigated. X-ray diffraction patterns revealed that BFO films were crystallized for films annealed above $500^{\circ}C$. BFO films annealed at $550^{\circ}C$ for 5 min in $N_2$ atmosphere exhibited the crystallized perovskite phase. The (Fe+Mn)/Bi ratio decreased with an increase in the deposition pressure due to the difference of sputtering yield. The grain size and surface roughness of films increased with an increase in the deposition pressure. The dielectric constant of BFO films prepared at various conditions shows $127{\sim}187$ at 1 kHz. The leakage current density of BFO films annealed at $500^{\circ}C$ was approximately two orders of magnitude lower than that of $550^{\circ}C$. The leakage current density of the BFO films deposited at $10{\sim}30\;m$ Torr was about $5{\times}10^{-6}{\sim}3{\times}10^{-2}A/cm^2$ at 100 kV/cm. Due to the high leakage current, saturated P-E curves were not obtained in BFO films. BFO film annealed at $500^{\circ}C$ exhibited remnant polarization(2Pr) of $26.4{\mu}C/cm^2$ at 470 kV/cm.

UHF 대역 수동형 RFID 태그 쇼트키 다이오드 특성 분석 및 전압체배기 설계 (Characterization of Schottky Diodes and Design of Voltage Multiplier for UHF-band Passive RFID Transponder)

  • 이종욱;트란난
    • 대한전자공학회논문지SD
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    • 제44권7호통권361호
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    • pp.9-15
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    • 2007
  • 본 논문에서는 UHF 대역 수동 RFID 태그(UHF-band passive RFID tag) 칩 제작에 필수적인 요소인 쇼트키(Schottky) 다이오드를 CMOS 공정으로 제작하고 크기에 따른 특성을 분석하였으며 이를 이용하여 전압체배기를 설계하였다. 쇼트키 다이오드는 Titanium-Silicon 접합을 이용하여 제작되었으며, $4{\times}10{\times}10\;{\mu}m^{2}$의 면적을 가지는 쇼트키 다이오드는 $20\;{\mu}A$의 전류 구동에 대해 약 0.15 V의 순방향 전압 강하의 우수한 특성을 나타내었다. 역방향 파괴전압(breakdown)은 약 -9 V로 수동 RFID 태그칩의 전압체배기에 사용될 수 있는 충분한 값을 나타내었다. 제작된 쇼트키 다이오드의 소신호 등가모델을 이용하여 다이오드의 크기에 따른 순방향 전압강하와 입력 임피던스간의 trade-off에 대해 분석하였다. 이를 이용하여 제작된 6-단 전압체배기는 900 MHz 주파수, 200mV 최대 입력 전압에 대해 1.3 V이상의 출력 전압 특성을 나타내어 인식거리가 비교적 큰 수동형 태그에 적합한 특성을 나타내었다.

Nano-granular Co-Fe-Al-Q Soft Ferromagnetic Thin Films for RF Electromagnetic-noise Filters

  • Sohn, Jae-Cheon;Byun, Dong-Jin
    • Transactions on Electrical and Electronic Materials
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    • 제7권1호
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    • pp.42-50
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    • 2006
  • Co-Fe-Al-O nano-granular thin films with high electrical resistivity, fabricated by radio frequency magnetron sputtering under an $Ar+O_2$ atmosphere, are found to show good soft magnetic properties in the GHz frequency range. The real part value of the relative permeability is 260 at low frequencies and this value is maintained up to the GHz frequency range. A non-integrated type noise filter on a coplanar waveguide transmission line is demonstrated by using the Co-Fe-Al-O nano-granular thin film with the dimensions of $4\;mm(l){\times}4\;mm(w){\times}0.1\;{\mu}m(t)$. The insertion loss is very low being less than 0.3 dB and this low value is maintained up to 2 GHz. At a ferromagnetic resonance frequency of 3.3 GHz, the degree of noise suppression is measured to be 3 dB. This level of noise attenuation is small for real applications, but there is much room for further improvement by increasing the magnetic volume and integrating the magnetic thin film into the CPW transmission line.

High-Efficiency CMOS Power Amplifier Using Uneven Bias for Wireless LAN Application

  • Ryu, Namsik;Jung, Jae-Ho;Jeong, Yongchae
    • ETRI Journal
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    • 제34권6호
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    • pp.885-891
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    • 2012
  • This paper proposes a high-efficiency power amplifier (PA) with uneven bias. The proposed amplifier consists of a driver amplifier, power stages of the main amplifier with class AB bias, and an auxiliary amplifier with class C bias. Unlike other CMOS PAs, the amplifier adopts a current-mode transformer-based combiner to reduce the output stage loss and size. As a result, the amplifier can improve the efficiency and reduce the quiescent current. The fully integrated CMOS PA is implemented using the commercial Taiwan Semiconductor Manufacturing Company 0.18-${\mu}m$ RF-CMOS process with a supply voltage of 3.3 V. The measured gain, $P_{1dB}$, and efficiency at $P_{1dB}$ are 29 dB, 28.1 dBm, and 37.9%, respectively. When the PA is tested with 54 Mbps of an 802.11g WLAN orthogonal frequency division multiplexing signal, a 25-dB error vector magnitude compliant output power of 22 dBm and a 21.5% efficiency can be obtained.

Na이 CIGS 박막 태양전지에 미치는 영향에 관한 연구 (Effects of Na on CIGS thin film solar cell)

  • 김재웅;김대성;김태성;김진혁
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.62.1-62.1
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    • 2010
  • CIS(CuInSe2)계 화합물 태양전지는 높은 광흡수계수와 열적 안정성 및 조성 조절을 통한 밴드갭 조절이 용이해 고효율 박막 태양전지로 각광 받고 있다. 또한 CIGS 태양전지는 기존의 유리기판 대신 유연한 기판을 사용해 flexible 태양전지 제조가 가능하다. 이러한 유연기판은 보통 stainless steel과 같은 금속 기판이 많이 사용되는데 기존의 soda-lime glass 기판과는 달리 금속기판에는 Na이 첨가되어 있지 않아 별도의 Na첨가를 필요로 한다. Na은 CIGS 흡수층의 조성조절을 용이하게 하여 태양전지의 변환 효율을 향상시키는 역할을 한다. 본 연구에서 기판은 Na이 첨가되어있지 않은 corning glass를 사용 하였으며 NaF를 이용해 Mo가 증착된 기판에 NaF의 두께를 달리하며 증착해 CIGS 흡수층의 grain 사이즈를 비교 하였으며 그 후 태양전지 소자를 제조해 광전특성을 분석하였다. 후면 전극으로 약60nm 두께의 Mo를 DC Sputtering 방법을 이용해 증착 하였다. buffer층으로는 약 50nm의 CdS층을 CBD방법을 이용하여 제조 하였으며 TCO 층으로 약 50nm의 i-ZnO와 약 450nm의 Al-ZnO를 RF Sputtering방법으로 증착 하였다. 마지막으로 앞면 전극으로 약 $1{\mu}m$의 Al을 Thermal Evaporation방법으로 증착하였다. 태양전지 소자의 면적은 $0.49cm^2$로 효율을 비교 분석하였다.

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16-QAM OFDM-Based W-Band Polarization-Division Duplex Communication System with Multi-gigabit Performance

  • Kim, Kwang Seon;Kim, Bong-Su;Kang, Min-Soo;Byun, Woo-Jin;Park, Hyung Chul
    • ETRI Journal
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    • 제36권2호
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    • pp.206-213
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    • 2014
  • This paper presents a novel 90 GHz band 16-quadrature amplitude modulation (16-QAM) orthogonal frequency-division multiplexing (OFDM) communication system. The system can deliver 6 Gbps through six channels with a bandwidth of 3 GHz. Each channel occupies 500 MHz and delivers 1 Gbps using 16-QAM OFDM. To implement the system, a low-noise amplifier and an RF up/down conversion fourth-harmonically pumped mixer are implemented using a $0.1-{\mu}m$ gallium arsenide pseudomorphic high-electron-mobility transistor process. A polarization-division duplex architecture is used for full-duplex communication. In a digital modem, OFDM with 256-point fast Fourier transform and (255, 239) Reed-Solomon forward error correction codecs are used. The modem can compensate for a carrier-frequency offset of up to 50 ppm and a symbol rate offset of up to 1 ppm. Experiment results show that the system can achieve a bit error rate of $10^{-5}$ at a signal-to-noise ratio of about 19.8 dB.

Optimization of Operation Frequency of Orthogonal Fluxgate Sensor Fabricated with Co Based Amorphous Wire

  • Kim, Young-Hak;Kim, Yongmin;Yang, Chang-Seob;Shin, Kwang-Ho
    • Journal of Magnetics
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    • 제18권2호
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    • pp.159-162
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    • 2013
  • We present how to optimize the operation condition including frequency of the orthogonal fluxgate sensor in this paper. The orthogonal fluxgate sensor was fabricated with a Co-based amorphous wire with 10 mm long and 100 ${\mu}m$ in the diameter and a 270-turn pickup coil wound on the amorphous wire. In order to investigate the frequency dependence of the sensitivity, output spectra of the sensor which was connected by using a coaxial cable with various lengths of 0.5-5 m were measured with a RF lock-in amplifier. The maximum sensitivities were obtained at different frequencies according to coaxial cable lengths. It was found that the optimal operation frequencies, at which maximum sensitivities were appeared, were almost identical to the frequencies of impedance resonance. The maximum sensitivity and optimal operation frequency were 1.1 V/Oe (${\approx}$ 11000 V/T) and 1.25 MHz respectively.

실리콘 태양전지의 피라미드와 반구형 표면 조직화 (Pyramid and Half-Sphere Type of Surface Texturing for Si-Solar Cell)

  • 표대승;조준환;홍표환;이종현;김봉환;조찬섭
    • 센서학회지
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    • 제22권6호
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    • pp.433-438
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    • 2013
  • In this paper, we found surface shapes are affected by several parameters of RIE, such as RF power, pressure, temp, and process times. The reflectance of pyramid and half sphere structures show differences among shapes, size, height, and depth of those structures. We made about $1{\mu}m$ pyramid and half sphere shapes of silicon surface with RIE. For comparing the reflectance, pyramid and half sphere structures are fabricated with same height. Pyramid structure cell shows higher cell efficiency of 12.5% by 1.1% than one of half sphere structure of 11.4%. The light absorption is more increased through the pyramid structure than half sphere structure.

RF마그네트론 스퍼터링 법에 의해 증착된 SrBi2Nb2O9 박막의 Bi 량의 조절에 따른 특성분석 (Characteristics of the SrBi2Nb2O9 Thin Films Deposited by RF Magnetron Sputtering with Controlling of Bi Contents)

  • 이종한;최훈상;성현주;임근식;권영석;최인훈;손창식
    • 한국재료학회지
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    • 제12권12호
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    • pp.962-966
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    • 2002
  • The $SrBi_2$$Nb_2$$O_{9}$ (SBN) thin films were deposited with $SrNb_2$$O_{6}$ / (SNO) and $Bi_2$$O_3$ targets by co-sputtering method. For the growth of SBN thin films, we adopted the various power ratios of two targets; the power ratios of the SNO target to $Bi_2$$O_3$ target were 100 W : 20 W, 100 W : 25 W, and 100 W : 30 W during sputtering the SBN films. We found that the electrical properties of SBN films were greatly dependent on Bi content in films. The $Bi_2$Pt and $Bi_2$$O_3$ phase as second phases occurred at the films with excess Bi content greater than 2.4, resulting in poor ferroelectric properties. The best growth condition of the SBN films was obtained at the power ratio of 100 W : 25 W for the two targets. At this condition, the crystallinity and electrical properties of the films were improved at even low annealing temperature as $700^{\circ}C$ for 1h in oxygen ambient and the Sr, Bi and Nb component in the SBN films were about 0.9, 2.4, and 1.8 respectively. From the P-E and I-V curves for the specimen, the remnant polarization value ($2P_{r}$) of the SBN films was obtained about 6 $\mu$C/c $m^2$ at 250 kV/cm and the leakage current density of this thin film was $2.45$\times$10^{-7}$ $A/cm^2$ at an applied voltage of 3 V.V.

열처리에 따른 Pb[(Zr,Sn)Ti]N$bO_3$ 박막의 강유전 특성 (Ferroelectric Properties of Pb[(Zr,Sn)Ti]N$bO_3$ Thin Films by Annealing)

  • 최우창;최혁환;이명교;권태하
    • 대한전자공학회논문지SD
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    • 제38권7호
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    • pp.473-478
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    • 2001
  • 강유전 물질인 Pb/sub 0.99/[(Zr/sub 0/6Sn/sub 0.4/)/0.9/Ti/sub 0.1/]0.98/Nb/sub 0.02/O₃(PNZST) 박막을 10 mole%의 과잉 PbO가 첨가된 타겟을 이용하여 La/sub 0.5/Sr/sub 0.5/CoO₃(LSCO)/Pt/Ti/SiO₂/Si 기판상에 RF 마그네트론 스퍼터링 방법으로 증착하였다. 증착된 박막에 대하여 온도와 시간을 다양하게 변화시키면서 급속 열처리(rapid thermal annealing) 한 후, 그 결정성과 전기적 특성을 조사하였다. 80 W의 RF 전력, 500 ℃의 기판온도에서 증착한 후, 급속 열처리된 박막이 페로브스카이트상으로 결정화되었으며, 650 ℃, 공기중에서 10초동안 급속 열처리된 박막이 가장 우수한 결정성을 나타내었다. 이러한 박막으로 제작된 PNZST 커패시터는 약 20 μC/㎠정도의 잔류 분극과 약 50 kV/cm 정도의 항전계를 나타내었으며, 2.2×10/sup 9/의 스위칭 후에도 잔류분극의 감소는 10 %미만이었다.

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