• Title/Summary/Keyword: Morphology of oxide film

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Photoeletrochemical Properties of α-Fe2O3 Film Deposited on ITO Prepared by Cathodic Electrodeposition (음극전착법을 이용한 α-Fe2O3 막의 광전기화학적특성)

  • 이은호;주오심;정광덕;최승철
    • Journal of the Korean Ceramic Society
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    • v.40 no.9
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    • pp.842-848
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    • 2003
  • Semiconducting $\alpha$-Fe$_2$O$_3$ film was prepared by the cathodic electrodeposition method on Indium Tin Oxide (ITO) substrate for photoelectrochemical cell application. After heat treatment at 50$0^{\circ}C$, the phase was changed from Fe to $\alpha$-Fe$_2$O$_3$. The phase, morphology, absorbance, and photocurrent density (A/$\textrm{cm}^2$) of the film depended on the preparation conditions: deposition time, applied voltage, and the duration of heat treatment. The $\alpha$-Fe$_2$O$_3$ film was characterized by X-Ray Diffractometer (XRD), Scanning Electron Microscope (SEM), and UV -Visible Spectrophotometer. The stability of the $\alpha$-Fe$_2$O$_3$ film in aqueous solution was tested at zero bias potential under the white-light source of 100 mW/$\textrm{cm}^2$. The apparent grain size of the films formed at -2.0 V was larger than that grown at -2.5 V. The $\alpha$-Fe$_2$O$_3$ film deposited at -2.0 V for 180 s and heat-treated at 50$0^{\circ}C$ for 1 h showed the predominant photocurrent of 834$\mu$A/$\textrm{cm}^2$.

Dielectric Properties of Poly(vinyl phenol)/Titanium Oxide Nanocomposite Thin Films formed by Sol-gel Process

  • Myoung, Hey-J;Kim, Chul-A;You, In-Kyu;Kang, Seung-Y;Ahn, Seong-D;Kim, Gi-H;Oh, ji-young;Baek, Kyu-Ha;Suh, Kyung-S;Chin, In-Joo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1572-1575
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    • 2005
  • Poly(vinyl phenol)(PVP)/$TiO_2$ nanocomposite the films have been prepared incorporating metal alkoxide with vinyl polymer to obtain high dielectric constant gate insulating material for a organic thin film transistor. The surface composition, the morphology, and the thermal and electrical properties of the hybrid nanocomposite films were observed by ESCA, scanning electron microscopy (SEM), atomic force microscopy(AFM), and thermogravimetric analysis (TGA). Thin hybrid films exhibit much higher dielectric constants (7.79 at 40wt% metal alkoxide).

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HVCVD를 이용한 다결정 SiGe 박막의 증착 및 활성화 메카니즘 분석

  • 강성관;고대홍;전인규;양두영;안태항
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.66-66
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    • 1999
  • 최근 들어 다결정 SiGe은 MOS(Metal-Oxide-Semiconductor)에서 기존에 사용되던 다결정 Si 공정과의 호환성 및 여러 장점으로 인하여 다결정 Si 대안으로 많은 연구가 진행되고 있다. 고농도로 도핑된 P type의 다결정 SiGe은 Ge의 함량에 따른 일함수의 조절과 낮은 비저항으로 submicrometer CMOS 공정에서 게이트 전극으로 이용하려는 연구가 진행되고 있으며, 55$0^{\circ}C$ 이하의 낮은 온도에서도 증착이 가능하고, 도펀트의 활성화도가 높아서 TFT(Thin Film Transistor)에서도 유용한 재료로 검토되고 있다. 현재까지 다결정 SiGe의 증착은 MBE, APCVD, RECVD. HV/LPCVD 등 다양한 방법으로 이루어지고 있다. 이중 HV/LPCVD 방법을 이용한 증착은 반도체 공정에서 게이트 전극, 유전체, 금속화 공정 등 다양한 공정에서 사용되고 있는 방법으로 현재 사용되고 있는 반도체 공정과의 호환성의 장점으로 다결정 SiGe 게이트 전극의 증착 공정에 적합하다고 할 수 있다. 본 연구에서는 HV/LPCVD 방법을 이용하여 게이트 전극으로의 활용을 위한 다결정 SiGe의 증착 메카니즘을 분석하고 Ex-situ implantation 후 열처리에 따라 나타나는 활성화 정도를 분석하였다. 도펀트를 첨가하지 않은 다결정 SiGe을 주성엔지니어링의 EUREKA 2000 장비를 이용하여, 1000$\AA$의 열산화막이 덮혀있는 8 in 웨이퍼에 증착하였다. 증착 온도는 55$0^{\circ}C$에서 6$25^{\circ}C$까지 변화를 주었으며, 증착압력은 1mtorr-4mtorr로 유지하였다. 낮은 증착압력으로 인한 증착속도의 감소를 방지하기 위하여 Si source로서 Si2H6를 사용하였으며, Ge의 Source는 수소로 희석된 10% GeH4와 100% GeH4를 사용하였다. 증착된 다결정 SiGe의 Ge 함량은 RBS, XPS로 분석하였으며, 증착된 박막의 두께는 Nanospec과 SEM으로 관찰하였다. 또한 Ge 함량 변화에 따른 morphology 관찰과 변화 관찰을 위하여 AFM, SEM, XRD를 이용하였으며, 이온주입후 열처리 온도에 따른 활성화 정도의 관찰을 위하여 4-point probe와 Hall measurement를 이용하였다. 증착된 다결정 SiGe의 두게를 nanospec과 SEM으로 분석한 결과 Gem이 함량이 적을 때는 높은 온도에서의 증착이 더 빠른 증착속도를 나타내었지만, Ge의 함량이 30% 되었을 때는 온도에 관계없이 일정한 것으로 나타났다. XRD 분석을 한 결과 Peak의 위치가 순수한 Si과 순수한 Ge 사이에 존재하는 것으로 나타났으며, ge 함량이 많아짐에 따라 순수한 Ge쪽으로 옮겨가는 경향을 보였다. SEM, ASFM으로 증착한 다결정 SiGe의 morphology 관찰결과 Ge 함량이 높은 박막의 입계가 다결정 Si의 입계에 비해 훨씬 큰 것으로 나타났으며 근 값도 증가하는 것으로 나타났다.

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Observation of Corrosion Behavior with Aluminum 5052 Alloy by Modulating Anodization Time (양극산화 공정시간에 따른 알루미늄 5052 합금의 산화피막 성장 및 내식성 관찰)

  • Ji, HyeJeong;Choi, Dongjin;Jeong, Chanyoung
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.67-67
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    • 2018
  • The 5xxx series aluminum alloys are recently used in not only marine system but also automotive area because of a low density material, good mechanical properties and better resistance to corrosion. However, Aluminum alloys are less resistant than the purest aluminum such as 1xxx aluminum alloy. Electrochemical anodization technique has attracted in the area of surface treatment because of a simple procedure, a low-cost efficiency than other techniques such as lithography and a large volume of productivity, and so on. Here, The relationship between the corrosion behavior and the thickness of aluminum anodic oxide have been studied. Prior to anodization, The 5052 aluminum sheets ($30{\times}20{\times}1mm$) were degreased by ultra-sonication in acetone and ethanol for 10 minutes and eletropolished in a mixture of perchloric acid and ethanol (1:4, volume ratio) under an applied potential of 20V for 60 seconds to obtain a regular surface. During anodization process, Aluminum alloy was used as a working electrode and a platinum was used as a counter electrode. The two electrodes were separated at a distance of 5cm. The applied voltage of anodization is conducted at 40V in a 0.3M oxalic acid solution at $0^{\circ}C$ with appropriate magnetic stirring. The surface morphology and the thickness of AAO films was observed with a Scanning Electron Microscopy (SEM). The corrosion behavior of all samples was evaluated by an open-circuit potential and potentio-dynamic polarization test in 3.5wt% NaCl solution. Thus, The corrosion resistance of 5052 aluminum alloy is improved by the formation of an anodized oxide film as function of increase anodization time which artificially develops on the metal surface. The detailed electrochemical behavior of aluminum 5052 alloy will be discussed in view of the surface structures modified by anodization conditions such as applied voltages, concentration of electrolyte, and temperature of electrolyte.

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Highly Reliable Solder ACFs FOB (Flex-on-Board) Interconnection Using Ultrasonic Bonding

  • Kim, Yoo-Sun;Zhang, Shuye;Paik, Kyung-Wook
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.1
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    • pp.35-41
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    • 2015
  • In this study, in order to improve the reliability of ACF interconnections, solder ACF joints were investigated interms of solder joint morphology and solder wetting areas, and evaluated the electrical properties of Flex-on-Board (FOB) interconncections. Solder ACF joints with the ultrasonic bonding method showed excellent solder wetting by broken solder oxide layers on solder surfaces compared with solder joints with remaining solder oxide layer bonded by the conventional thermo-compression (TC) bonding method. When higher target temperature was used, Sn58Bi solder joints showed concave shape due to lower degree of cure of resin at solder MP by higher heating rate. ACFs with epoxy resins and SAC305 solders showed lower degree of resin cure at solder MP due to the slow curing rate resulting in concave shaped solder joints. In terms of solder wetting area, solder ACFs with $25-32{\mu}m$ diameters and 30-40 wt% showed highest wetted solder areas. Solder ACF joints with the concave shape and the highest wetting area showed lower contact resistances and higher reliability in PCT results than conventional ACF joints. These results indicate that solder morphologies and wetting areas of solder ACF joints can be controlled by adjustment of bonding conditions and material properties of solder and polymer resin to improve reliability of ACF joints.

Change of Anti-reflective Optical Property by Nano-structural Control of Alumina Layer through Hydro-thermal Process (수열합성 공정을 통한 알루미나 코팅층의 나노구조 조절에 의한 반사방지 특성의 변화)

  • Lee, Yun-Yi;Son, Dae-Hee;Lee, Seung-Ho;Lee, Gun-Dae;Hong, Seong-Soo;Park, Seong-Soo
    • Applied Chemistry for Engineering
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    • v.21 no.5
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    • pp.564-569
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    • 2010
  • Highly anti-reflective optical property has been focussed in the field of thin film and display because of increasing demands to the high transparency and clearness of optical component. In this study, to obtain anti-reflective property, the formation of aluminium oxide with nanoscaled flowerlike frame structure was introduced as oxide material monolayer on the substrate by hydrothermal synthesis through sol-gel method. The properties of coating layer were measured by the means of UV-Vis spectroscopy, FT-IR spectroscopy, XRD, and FE-SEM. The morphology of coating layer in alumina-sol coated samples was controlled by hydrothermal temperature and time with aid of ultrasound. It was found that high transparency and anti-reflective optical properties were obtained the formation of flowerlike nanoframe structure.

The Effects of Composition and Microstructure Variation on the Oxidation Characteristics of Stainless Steels Manufactured by Powder Metallurgy Method (분말야금 스테인리스 스틸의 산화특성에 미치는 조성 및 조직변화의 영향)

  • Lee, Jong-Pil;Hong, Ji-Hyun;Park, Dong-Kyu;Ahn, In-Shup
    • Journal of Powder Materials
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    • v.22 no.1
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    • pp.52-59
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    • 2015
  • As well-known wrought stainless steel, sintered stainless steel (STS) has excellent high-temperature anti-corrosion even at high temperature of $800^{\circ}C$, and exhibits good corrosion resistance in air. However, when temperature increases above $900^{\circ}C$, the corrosion resistance of STS begins to deteriorate and dramatically decreases. In this study, the effects of phase and composition of STS on high-temperature corrosion resistances are investigated for STS 316L, STS 304 and STS 434L above $800^{\circ}C$. The morphology of the oxide layers are observed. The oxides phase and composition are identified using X-ray diffractometer and energy dispersive spectroscopy. The results demonstrate that the best corrosion resistance of STS could be improved to that of 434L. The poor corrosion resistance of the austenitic stainless steels is due to the fact that $NiFe_2O_4$ oxides forming poor adhesion between the matrix and oxide film increase the oxidation susceptibility of the material at high temperature.

Polarity-tuned Gel Polymer Electrolyte Coating of High-voltage LiCoO2 Cathode Materials

  • Park, Jang-Hoon;Cho, Ju-Hyun;Kim, Jong-Su;Shim, Eun-Gi;Lee, Yun-Sung;Lee, Sang-Young
    • Journal of the Korean Electrochemical Society
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    • v.14 no.2
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    • pp.117-124
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    • 2011
  • We demonstrate a new surface modification of high-voltage lithium cobalt oxide ($LiCoO_2$) cathode active materials for lithium-ion batteries. This approach is based on exploitation of a polarity-tuned gel polymer electrolyte (GPE) coating. Herein, two contrast polymers having different polarity are chosen: polyimide (PI) synthesized from thermally curing 4-component (pyromellitic dianhydride/biphenyl dianhydride/phenylenediamine/oxydianiline) polyamic acid (as a polar GPE) and ethylene-vinyl acetate copolymer (EVA) containing 12 wt% vinyl acetate repeating unit (as a less polar GPE). The strong affinity of polyamic acid for $LiCoO_2$ allows the resulting PI coating layer to present a highly-continuous surface film of nanometer thickness. On the other hand, the less polar EVA coating layer is poorly deposited onto the $LiCoO_2$, resulting in a locally agglomerated morphology with relatively high thickness. Based on the characterization of GPE coating layers, their structural difference on the electrochemical performance and thermal stability of high-voltage (herein, 4.4 V) $LiCoO_2$ is thoroughly investigated. In comparison to the EVA coating layer, the PI coating layer is effective in preventing the direct exposure of $LiCoO_2$ to liquid electrolyte, which thus plays a viable role in improving the high-voltage cell performance and mitigating the interfacial exothermic reaction between the charged $LiCoO_2$ and liquid electrolytes.

Field-emission Properties and Long-term Stability of Tip-type Carbon Nanotubes Coated with Gallium-incorporated Zinc Oxide Films (갈륨이 첨가된 산화아연막의 코팅에 따른 미세팁 구조 탄소나노튜브의 전계방출 특성 및 장시간 안정성)

  • Kim, Jong-Pil;Noh, Young-Rok;Jo, Kyoung-Chul;Lee, Sang-Yeol;Park, Jin-Seok
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.65-69
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    • 2009
  • Carbon nanotubes (CNTs) were coated with undoped zinc oxide (ZnO) or 5 wt% gallium-incorporated ZnO (GZO) using various deposition conditions. The CNTs were directly grown on conical-type tungsten substrates at $700^{\circ}C$ using inductively coupled plasma-chemical vapor deposition. The pulsed laser deposition technique was used to deposit the ZnO and GZO thin films with very low stress. Field-emission scanning electron microscopy and high-resolution transmission electron microscopy were used to monitor the variations in the morphology and microstructure of CNTs prior to and after ZnO or GZO coating. The formation of ZnO and GZO films on CNTs was confirmed using energy-dispersive x-ray spectroscopy. In comparison to the as-grown (uncoated) CNT emitter, the CNT emitter that was coated with a thin (10 nm) GZO film showed remarkably improved field emission characteristics, such as the emission current of $325\;{\mu}A$ at 1 kV and the threshold field of $1.96\;V/{\mu}m$ at $0.1\;{\mu}A$, and it also exhibited the highly stable operation of emission current up to 40 h.

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Molybdenum Oxides as Diffusion Barrier Layers against MoSe2 Formation in A Nonvacuum Process for CuInSe2 Solar Cells (비진공법 CuInSe2 태양전지에서 MoSe2의 생성을 억제하기 위한 산화 몰리브데늄 확산장벽 층)

  • Lee, Byung-Seok;Lee, Doh-Kwon
    • Current Photovoltaic Research
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    • v.3 no.3
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    • pp.85-90
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    • 2015
  • Two-step processes for preparing $Cu(In,Ga)Se_2$ absorber layers consist of precursor layer formation and subsequent annealing in a Se-containing atmosphere. Among the various deposition methods for precursor layer, the nonvacuum (wet) processes have been spotlighted as alternatives to vacuum-based methods due to their potential to realize low-cost, scalable PV devices. However, due to its porous nature, the precursor layer deposited on Mo substrate by nonvacuum methods often suffers from thick $MoSe_2$ formation during selenization under a high Se vapor pressure. On the contrary, selenization under a low Se pressure to avoid $MoSe_2$ formation typically leads to low crystal quality of absorber films. Although TiN has been reported as a diffusion barrier against Se, the additional sputtering to deposit TiN layer may induce the complexity of fabrication process and nullify the advantages of nonvacuum deposition of absorber film. In this work, Mo oxide layers via thermal oxidation of Mo substrate have been explored as an alternative diffusion barrier. The morphology and phase evolution was examined as a function of oxidation temperature. The resulting Mo/Mo oxides double layers were employed as a back contact electrode for $CuInSe_2$ solar cells and were found to effectively suppress the formation of $MoSe_2$ layer.