• 제목/요약/키워드: Microscale patterning

검색결과 13건 처리시간 0.023초

Polyelectrolyte Micropatterning Using Agarose Plane Stamp and a Substrate Having Microscale Features on Its Surface

  • Lee, Min-Jung;Lee, Nae-Yoon;Lee, Sang-Kil;Park, Sung-Su;Kim, Youn-Sang
    • Bulletin of the Korean Chemical Society
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    • 제26권10호
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    • pp.1539-1542
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    • 2005
  • We have introduced polyelectrolyte micro-patterning technique employing agarose plane stamp and a hard substrate having microscale features on its surface. With this method, chemically micropatterned surfaces with both positive and negative functionalities were successfully embedded in well-defined microstructures, and selective impartment of charge functionalities was confirmed by patterning bead bearing surface charge. Furthermore, this technique allows highly sensitive immobilization of protein onto targeted surface simply by endowing functionalities, which extends the potential of its use as a tool for high-throughput protein microarray and proteomics. Because plane agarose stamp is free of structures on its surface, there is no concern for pattern collapse, and the combination of agarose plane stamp with patterned substrate is more suited for selective protein patterning compared with adopting surface-patterned agarose stamp with flat substrate. Our technique using agarose plane stamp and a substrate having microscale features on its surface suggests a range of possible applications, including the micropatterning of biofunctionalized copolymer having polyelectrolyte block, immobilization of micro- and nanoparticle with biofunctionalities such as biotin and streptavidine, and establishing optoelectronic microstructures with micro-beads on various surfaces.

Microscale BTS sculptured by electron beam

  • Choi, Haneul;Jeong, Young Woo;Chang, Hye Jung
    • Applied Microscopy
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    • 제49권
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    • pp.4.1-4.2
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    • 2019
  • We applied the advanced bitmap-assisted patterning function of focused ion beam to fabricate microscale sculpture of the 'BangTanSoNyeonDan' known as BTS members, the world-wide famous K-pop boyband. With the help of an electron microscope, you can carve your idols on your accessories at micro scale. Fun applications of electron microscopes are not limited to science.

감광성 에칭 레지스트의 잉크젯 인쇄를 이용한 인쇄회로 기판 제작 (Fabrication of the Printed Circuit Board by Direct Photosensitive Etch Resist Patterning)

  • 박성준;이로운;정재우
    • 한국정밀공학회지
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    • 제24권5호
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    • pp.97-103
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    • 2007
  • A novel selective metallization process to fabricate the fine conductive line based on inkjet printing has been investigated. Recently, Inkjet printing has been widely used in flat panel display, electronic circuits, biochips and bioMEMS because direct inkjet printing is an alternative and cost-effective technology for patterning and fabricating objects directly from design without masks. The photosensitive etching resist used in this process is an organic polymer which becomes solidified when exposed to ultraviolet lights and has high viscosity at ambient temperature. A piezoelectric-driven inkjet printhead is used to dispense 20-30 ${\mu}m$ diameter droplets onto the copper substrate to prevent subsequent etching. Repeatability of circuitry fabrication is closely related to the formation of steady droplets, adhesion between etching resist and copper substrate. Therefore, the ability to form small and stable droplets and surface topography of the copper surface and chemical attack must be taken into consideration for fine and precise patterns. In this study, factors affecting the pattern formation such as adhesion strength, etching mechanism, UV curing have been investigated. As a result, microscale copper patterns with tens of urn high have been fabricated.

탄성 몰드 변형을 이용한 은 이온 잉크의 원-스텝 나노스케일 패터닝 (One-Step Nanoscale Patterning of Silver Ionic Ink via Elastic Mold Deformation)

  • 오용석
    • 센서학회지
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    • 제32권4호
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    • pp.252-256
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    • 2023
  • A one-step method for nanoscale patterning of silver ionic ink on a substrate is developed using a microscale, elastic mold deformation. This method yields unique micro/nanoscale metallic structures that differ from those produced using the original molds. The linewidth of these metallic structures is significantly reduced (approximately 10 times) through the sidewall deformation of the original mold cavity on a thin liquid film, as verified by finite element analysis. The process facilitates the fabrication of various, isolated and complex micro/nanoscale metallic structures with negligible residual layers at low cost and high throughput. These structures can be utilized for various applications, including optoelectronics, wearable sensors, and metaverse-related devices. Our approach offers a promising tool for manipulation and fabrication of micro/nanoscale structures of various functional materials.

유기 자기조립 단분자막을 이용한 레이저 포토패터닝 기술 (Laser Photo Patterning Using Organic Self-Assembled Monolayers)

  • 최무진;장원석;신보성;김재구;황경현
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 하계학술발표회
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    • pp.288-289
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    • 2003
  • 금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

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Photopatternable Conducting Polymer Nanocomposite with Incorporated Gold Nanoparticles for Use in Organic Field Effect Transistors

  • Huh, Sung;Choi, Hyun-Ho;Cho, Kil-Won;Kim, Seung-Bin
    • Bulletin of the Korean Chemical Society
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    • 제33권4호
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    • pp.1128-1134
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    • 2012
  • We investigated a new method for patterning organic field-effect transistors (OFETs) using a photopatternable conducting polymer nanocomposite, consisting of poly(3-hexylthiophene) (P3HT)-coated gold nanoparticles (AuNPs) that had been modified with a photoreactive cinnamate group, to form P3HT-AuNP-CI. We found that the addition of the cinnamate group to the nanoparticle surface assisted the preparation of a solvent-resistive semiconducting film and preserved the P3HT ordering, which was interrupted by Au-P3HT interactions, as well as provided UV-controllable electrical properties. The P3HT-AuNPs-CI films could be microscale-patterned via a UV crosslinking photoreaction, represented as a promising photopatternable semiconductor material for use in advanced applications, with tunable electrical properties for fabrication of sub-micron and microscale electronic devices.

직접패턴형 SnO2 박막의 전도성 나노구조체 첨가연구 (Direct-Patternable SnO2 Thin Films Incorporated with Conducting Nanostructure Materials)

  • 김현철;박형호
    • 한국재료학회지
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    • 제20권10호
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    • pp.513-517
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    • 2010
  • There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable $SnO_2$ thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable $SnO_2$ thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the $SnO_2$ thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of $SnO_2$ thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized $SnO_2$ thin films showed a relation between band structural change and electrical resistance. Direct-patterning of $SnO_2$ hybrid films with a line-width of 30 ${\mu}m$ was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of $SnO_2$ films can be improved by incorporating Ag nanoparticles and MWNTs.

잉크젯 인쇄기술을 이용한 인쇄회로기판의 에칭 레지스터 패터닝 (Etch resist patterning of printed circuit board by ink jet printing technology)

  • 서상훈;이로운;김용식;김태구;박성준;윤관수;박재찬;정경진;정재우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.108-108
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    • 2007
  • Inkjet printing is a non-contact and direct writing associated with a computer. In the industrial field, there have been many efforts to utilize the inkjet printing as a new way of manufacturing, especially for electronic devices. The etching resist used in this process is an organic polymer which becomes solidified when exposed to ultraviolet lights and has high viscosity of 300 cPs at ambient temperature. A piezoelectric-driven ink jet printhead is used to dispense $20-40\;{\mu}m$ diameter droplets onto the copper substrate to prevent subsequent etching. In this study, factors affecting the pattern formation such as printing resolution, jetting property, adhesion strength, etching and strip mechanism, UV pinning energy have been investigated. As a result, microscale Etch resist patterning of printed circuit board with tens of ${\mu}m$ high have been fabricated.

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Liquid Crystal Droplet Patterns to Monitor Catalase Activity at Femtomolar Levels

  • Yoon, Stephanie;Jang, Chang-Hyun
    • Bulletin of the Korean Chemical Society
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    • 제35권9호
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    • pp.2704-2710
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    • 2014
  • Catalase (CAT) decomposes hydrogen peroxide that is toxic to the body. In this study, simple and sensitive detector has been developed for observing catalase activity using liquid crystal droplet system. Microscale LC droplet patterns are formed by spreading aldehyde-doped nematic liquid crystal on pre-treated glass slides. When hydrogen peroxide is added, aldehyde is oxidized and amphiphiles are formed. Dodecanoates cause the pattern to transit from bright to dark as they self-assemble to form a carboxyalte monolayer at the interface. When a drop of pre-incubated CAT and hydrogen peroxide mixture is placed onto the pattern, bright fan-shape is observed. This planar optical appearance indicates that catalase has decomposed hydrogen peroxide. Compared to the detectors that have been previously developed, this system is more sensitive with detection limit of 1fM. This research suggests further studies to be on LC droplet patterning to develop highly sensitive and methodologically simple sensors for various chemicals.

Self-activated Graphene Gas Sensors: A Mini Review

  • Kim, Taehoon;Eom, Tae Hoon;Jang, Ho Won
    • 센서학회지
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    • 제29권4호
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    • pp.220-226
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    • 2020
  • Graphene has been widely considered a promising candidate for high-quality chemical sensors, owing to its outstanding characteristics, such as sensitive gas adsorption at room temperature, high conductivity, high flexibility, and high transparency. However, the main drawback of a graphene-based gas sensor is the necessity for external heaters due to its slow response, incomplete recovery, and low selectivity at room temperature. Conventional heating devices have limitations such as large volume, thermal safety issues, and high power consumption. Moreover, metal-based heating systems cannot be applied to transparent and flexible devices. Thus, to solve this problem, a method of supplying the thermal energy necessary for gas sensing via the self-heating of graphene by utilizing its high carrier mobility has been studied. Herein, we provide a brief review of recent studies on self-activated graphene-based gas sensors. This review also describes various strategies for the self-activation of graphene sensors and the enhancement of their sensing properties.