• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.182-183
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• 2007

In large area scanning with a micro-electron column, the optimal operation condition for the best visibility was studied. A micro-electron column can realize nearly unlimited scanning size with distribution of micro-electron columns, therefore applicable to large sized SEM or VSEM. The maximum scanning size with a micro-electron column was about $200cm^2$ when only one deflector was employed. However, a double deflector equipped micro-electron column provided 1.7 times larger scanning area with the same visibility as that of one deflector.

• 반도체디스플레이기술학회지
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• 제9권1호
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• pp.17-21
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• 2010

Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.777-778
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• 2011

• 반도체디스플레이기술학회지
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• 제8권4호
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• pp.43-48
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• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• 한국전기전자재료학회논문지
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• 제20권6호
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• pp.481-486
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• 2007

In large area scanning with a micro-electron-column, the operating condition for the best resolution was investigated in factors of working distance and field of view. The resolution of a test sample was dependent on electron beam energy and scanning field size. The best resolution with single deflector was obtained at 300 V and 30 mm in the electron emitting tip voltage and a working distance, respectively. The scanning area at that condition was $13.9{\times}13.9mm^2$, linearly increased with the working distance. Double deflector was employed for larger scanning size without increasing working distance, but showed only 1.7 times larger than that of single deflector, and the resolution was inverse proportional to the scanning size.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 추계학술대회 논문집
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• pp.285-286
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• 2008

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.939-940
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• 2008

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.535-536
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• 2010

• 한국광학회지
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• 제17권4호
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• pp.354-358
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• 2006

적층으로 구성되는 초소형 전자렌즈의 실리콘 렌즈와 절연체인 파이렉스는 접합과 정렬을 동시에 수행하여야 한다. 이를 위한 방법으로 회절을 이용한 정렬과 레이저 접합을 이용하였으며, source 렌즈와 Einzel 렌즈의 정렬오차는 가장 큰 개구를 기준으로 최대 $\pm$4% 이내에서 이루어졌다. 정렬 조건과 레이저 접합 조건을 제시하였으며, 접합을 견고히 하기 위한 양극 접합 방식을 기술하였다. 전류영상화를 통해 선폭이 9 $\mu$m인 Cu grid를 시험한 결과 완성된 전자렌즈는 감속모드보다 가속모드에서 분해능이 좋았으며, 작은 개구를 가진 렌즈의 정밀한 정렬과 조합으로 높은 분해능을 믿을 수 있었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2009년도 추계학술대회 논문집
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• pp.383-384
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• 2009