• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.710-713
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• 2005

In this study, waffle type barrier ribs for counter electrode discharge cells were prepared via micro-molding process. The master mold was prepared by UV lithography and working mold was manufactured by replicating the master mold. The UV paste used in this study consisted of ceramic powders for the barrier ribs, binder, hardener, and dispersant was filled into cavities of a polymeric mold by action of capillary pressure developed between mold and paste. The results demonstrated a possibility of one-step process for the manufacturing of waffle type barrier ribs embedded with sustaining electrodes.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1293-1296
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• 2009

The synthesis of nano-size ($Y_{0.955}Eu_{0.1}$)($P_{0.7}V_{0.45}$)$O_4$ red phosphors were conducted by using a Liquid Phase Precursor (LPP) method. In this method, cellulose pulp was used as a template showing the micro fibre structures to obtain the nano size YPV red phosphor. Aqueous solutions of raw materials were impregnated into cellulose pulp and subsequently impregnated pulp was dried and fired at $800-1200^{\circ}C$ for 1h. The effect of luminescence properties on compositions and temperatures was evaluated with photoluminescence spectrum, X-ray diffraction and FE-SEM, and TEM. High efficiency (~110%) of phosphor of size of ~500nm fired at $1150^{\circ}C$ was obtained compared with the micro size of commercial product. High efficiency behaviors of nano size phosphors were discussed in this paper.

• Journal of the Microelectronics and Packaging Society
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• v.24 no.2
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• pp.55-59
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• 2017

An optical method to inspect the 3-D shape of surface of Micro BGA is proposed, where spatially arranged LED light sources and specular reflection are considered. The reflected image captured by a vision system was analyzed to calculate the relative displacements of LED's in the image. Also, the statistics for all BGA's contained in a captured image are used together to find out the criteria for the detection of existing defects, and the usefulness of the proposed method is shown via experiments.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.223-228
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• 2004

Miniaturization is the central theme in modern fabrication technology. Many of the components used in modern products are becoming smaller and smaller. The direct write FIB technology has several advantages over contemporary micromachining technology, including better feature resolution with low lateral scattering and capability of maskless fabrication. Therefore, the application of FIB technology in micro fabrication has become increasingly popular. In recent model of FIB, however the feeding system has been a very coarse resolution of about a few $\mu\;\textrm{m}$. It is not unsuitable to the sputtering and the deposition to make the high-precision structure in micro or macro scale. Our research is the development of nano stage of 200mm strokes and 10nm resolutions. Also, this stage should be effectively operating in ultra high vacuum of about $1\times10^{-7}$ torr. This paper presents the concept of nano stages and the discussion of the material treatment for ultra high vacuum.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2008.05a
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• pp.277-280
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• 2008

Recently, a demand of nano/micro patterned polymer for display or biochip has been rising. Then many studies have been carried out. Nano/micro-embossing is a deformation process where the workpiece materials is heated to permit easier material flow and then forced over a planar patterned tool. In this work, the hot-emboss process is performed with different forming conditions; forming temperature, load, press hold time, to get the proper condition for linear pattern fabrication on plated-type polymers (PC). Replicated pattern depth increases in proportion to the forming temperature, load and time. Reduction of the workpiece thickness increases according to press hold time. In process of time, reduction ratio of workpiece thickness decreases because of surface area increment of the workpiece and pressure decline on it.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.655-659
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• 2006

This paper presents a novel electrostatic drop-on-demand inkjet device featured by a MEMS fabricated pole-type and hole-type nozzle with tube shaped orifice and investigates the feasibility of applying the inkjet device to display fabrication process. The electric voltage signal applied to the ring shaped upper electrode plate, against the hole-shaped ground or pole-shaped ground, referred here pole-type and hole-type nozzle respectively, allows ejection of small droplet to take place: That is, a tiny droplet is taken away from the peak of the mountain shaped liquid meniscus formed at the nozzle orifice. It is verified experimentally that the use of the pole type nozzle allows a stable and sustainable micro-dripping mode of droplet ejection for a wider range of applied voltages and of liquid viscosities. This demonstrates a feasibility of electrostatic drop-on-demand inkjet device as a disruptive alternative to conventional print heads such as thermal bubble or piezoelectric inkjet heads.

• Journal of the Korean Society for Precision Engineering
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• v.31 no.12
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• pp.1107-1113
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• 2014

In this article, the megasonic cleaning system for cleaning micro/nano particles from flat panel display (FPD) surfaces was developed. A piezoelectric actuator and a waveguide were designed by finite element method (FEM) analysis. The calculated peak frequency value of the quartz waveguide was 1002 kHz, which agreed well with the measured value of 1003 kHz. The average acoustic pressure of the megasonic cleaning system was 43.1 kPa, which is three times greater than that of the conventional type of 13.9 kPa. Particle removal efficiency (PRE) tests were performed, and the cleaning efficiency of the developed system was proven to be 99%. The power consumption of the developed system was 64% lower than that of the commercial system. These results show that the developed megasonic cleaning system can be an effective solution in particle removing from FPD substrate with higher energy efficiency and lower chemical and ultra pure water (UPW) consumption.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.11a
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• pp.37-41
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• 2005

When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.

• Journal of the Semiconductor & Display Technology
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• v.11 no.1
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• pp.73-78
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• 2012

In this study, the optimal process condition was induced about the pillar arrangement process of applying the screen printing method in the manufacture process of vacuum glazing panel. The high precision screen printing is technology which pushes out the paste and spreads it by using the squeegee on the stainless steel plate in which the pattern is formed. The screen printing method is much used in the flat panel display field including the LCD, PDP, FED, organic EL, and etc for forming the high precision micro-pattern. Also a number of studies of screen printing method have been conducted as the method for the cost down through the improvement of productivity. The screen printing method has many parameters. So we used Taguchi method in order to decrease test frequencies and optimize this parameters efficiently. In this study, experiments of pillar arrangement were performed by using Taguchi experimental design. We analyzed experimental results and obtained optimal conditions which are 4 m/s of squeegee speed, $40^{\circ}$ of squeegee angle and distance between metal mask and glass.

• Journal of the Semiconductor & Display Technology
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• v.11 no.4
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• pp.43-48
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• 2012

The screen printing method is much used in the flat panel display field including the LCD, PDP, FED, organic EL, and etc. for forming the high precision micro-pattern. Also A number of studies of screen printing method has been conducted as the method for the cost down through the improvement of productivity. Because of being the dot printing method of the cylindrical shape not being the line printing method like the existing PDP barrier rib and phosphor, the pillar arrays using the screen printing method is deposited in the hemispherical type not being cylindrical shape in the existing printing process conditions. In this paper, the parameters were set on the screen printing device in order to deposit the cross-sectional shape with the cone or trapezoid shape of the pillar in depositing the pillars used the screen printing device for vacuum glazing. The cross-sectional shape slope of the pillar according to the parameters was measured. And analysis the effect of the screen printing process conditions on the cross-sectional shape slope of pillars based upon the result of being measured. The processing conditions were drawn to minimize the cross-sectional shape slope of pillar.